Diamond Wire Single / Multiple Wire Saw Machine for Semiconductor Wafer Processing

The diamond  single/multi-wire dual-station wire saw machine is high-end precision equipment designed for processing hard and brittle materials. It uses electroplated diamond wire technology and features dual independent workstations, allowing flexible switching between single-wire precision mode and multi-wire batch production mode.

The diamond  single/multi-wire dual-station wire saw machine is high-end precision equipment designed for processing hard and brittle materials. It uses electroplated diamond wire technology and features dual independent workstations, allowing flexible switching between single-wire precision mode and multi-wire batch production mode.

Equipped with high-precision motion control, intelligent tension systems, and adaptive cooling technology, it is ideal for precision cutting of semiconductor wafers, photovoltaic silicon wafers, and optical components.

Technical Specifications

Parameter Specification
Project Single/multiple wire saw
Maximum Workpiece Size ø320×430mm
Main Roller Coating Diameter ø210×450mm (5 main rollers)
Wire Running Speed 1000 (MIX) m/min
Diamond Wire Diameter 0.2–0.37mm
Line Storage Capacity 20 km (0.25mm wire diameter)
Cutting Thickness Range 1.5–80mm
Cutting Accuracy ±0.01mm
Vertical Lifting Stroke of Workstation 350mm
Cutting Method Workbench swings upwards, diamond wire remains stationary
Cutting Feed Speed 0.01–10mm/min
Workstation 2
Water Tank 300L
Cutting Fluid Anti-rust high-efficiency cutting fluid
Swing Angle ±8°
Swing Speed 0.83°/s
Maximum Cutting Tension 100N (min unit 0.1N)
Cutting Depth 430mm
Power Supply Three-phase five-wire AC380V/50Hz
Total Power ≤52kW
Main Motor 7.5Ă—3kW
Wiring Motor 0.75Ă—2kW
Workbench Swing Motor 1.3Ă—2kW
Tension Control Motor 4.4Ă—2kW
Wire Release & Collection Motor 5.5Ă—2kW
External Dimensions 2310Ă—2660Ă—2893mm
Machine Weight 6000kg

Working Principle

  1. Cutting System

    • Diamond wire forms a closed-loop motion driven by servo motors (adjustable 0.5–3 m/s)

    • Wire tension monitored in real-time via high-precision sensors (20–50N)

    • Worktable with linear motor drive ensures positioning accuracy of ±1 μm

  2. Dual-Station Coordination

    • Station A: Single-wire mode (min diameter 0.1mm) for high-precision processing

    • Station B: Multi-wire mode (up to 200 wires) for mass production

    • Both stations can operate synchronously with automated workpiece transfer via robotic arm

  3. Control System

    • PLC + PC architecture supporting G-code programming

    • Machine vision positioning system with 5 μm repeatability

    • Real-time monitoring of 20+ process parameters including cutting force and temperature

Core Features

  1. High-Precision Processing

    • Sub-micron accuracy with air-bearing spindle and linear motor drive

    • Adaptive tension control for stable cutting

    • Advanced cooling system to control processing temperature

  2. Flexible Production Modes

    • Single-station high-precision mode for R&D and small-batch needs

    • Multi-station parallel processing for high efficiency

    • Quick-change functionality for diverse production requirements

  3. Intelligent Control System

    • Advanced HMI for user-friendly operation

    • Real-time monitoring and automatic optimization of key parameters

    • Remote diagnostics and maintenance capabilities

  4. Robust & Durable Design

    • High-strength, wear-resistant materials for critical components

    • Modular structure facilitates maintenance

    • Comprehensive protection systems extend equipment lifespan

Applications

  1. Semiconductor Wafer Manufacturing

    • SiC/GaN power device wafer cutting for EVs and 5G

    • Sapphire substrates for LEDs and consumer electronics

    • MEMS sensor chip dicing

  2. Photovoltaic Production

    • Large monocrystalline silicon wafer slicing

    • Heterojunction solar cell processing

    • Ultra-thin silicon wafer cutting (<120 μm)

  3. Optical Component Processing

    • Quartz glass optical elements

    • Laser crystals (YAG, sapphire)

    • Infrared optical windows

  4. Special Material Processing

    • AlN / Alâ‚‚O₃ ceramic substrates

    • Silicon carbide composites

    • Ultra-hard materials (CVD diamond)

  5. Research & Special Applications

    • Prototyping novel semiconductor materials

    • Micro-device development

    • Custom-shaped sample preparation

Technical Advantages

  • Stable processing quality with >99.5% yield

  • Adaptable to various hard/brittle materials

  • Significantly higher productivity than conventional methods

  • Easy operation and low total cost of ownership (TCO)

  • Custom solutions available, including cleanroom versions and special dimensions

FAQ

Q: What is the main advantage of a dual-station diamond wire saw?
A: Enables simultaneous single-wire precision cutting and multi-wire batch processing, boosting productivity by 50% compared to single-mode machines.

Q: Which materials can be cut with diamond wire dual-station saws?
A: Hard and brittle materials such as silicon, SiC, GaN, sapphire, quartz, and ceramics, with precision up to ±0.01mm.

Reviews

There are no reviews yet.

Be the first to review “Diamond Wire Single / Multiple Wire Saw Machine for Semiconductor Wafer Processing”

Your email address will not be published. Required fields are marked *