Categorie: Ion Implantation Equipment
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Ion Implantation Equipment
Ai200HC.D High Beam Ion Implantation System for 6/8 Inch Silicon Wafer Processing and Smart Cut Applications
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Ion Implantation Equipment
Ai250 (Medium Beam) Room-Temperature Ion Implantation System for 6–8 Inch Silicon Wafer Processing
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Ion Implantation Equipment
Ai300 (Medium Beam) High Temperature Ion Implantation System for 12 Inch Wafer Processing
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Ion Implantation Equipment
Ai350HT Medium Beam High Temperature Ion Implantation System for 6/8 Inch SiC and Silicon Wafer Processing
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Ion Implantation Equipment
High Efficiency Ai80HC(High Beam) Ion Implantation Equipment for Advanced Silicon Wafer Doping
