![\"\u0110i\u1ec7n](\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/qdOjBmoV8IvfXCCZyP_TScsFcvsnf_rXpW086f8iuioCNO5yQDt0Z9y7ezVD__Z9xzJIqXRfLcHey9Fywi2oJzAWqcbFTEAZfR8g7LsL3RbSqPh8llkzHKhu9Nukj7rB22Gxq5U3xKXDSW2VQzm-N5hCDNWN3CSGBxRIWYEm0DeDO8KSIBMjrAfKNQtx2jyA-300x262.jpg\")
The silicon electrode is a core functional component used in advanced semiconductor plasma processing equipment, including etching, deposition, and surface modification systems. Manufactured from high-purity single crystal silicon, it plays a critical role in ensuring stable plasma generation, uniform electric field distribution, and precise wafer processing.<\/p>\n
In modern semiconductor fabrication, process stability and yield are directly affected by the performance of internal chamber components. Silicon electrodes are widely preferred due to their excellent compatibility with silicon-based processes, minimizing contamination risks and maintaining high process purity. Compared to metal electrodes, silicon materials exhibit superior resistance to plasma-induced contamination and provide more consistent electrical characteristics.<\/p>\n
These electrodes are typically used in harsh environments involving high-energy plasma, reactive gases such as CF\u2084, SF\u2086, and Cl\u2082, and elevated temperatures. Over time, they undergo gradual erosion and are therefore classified as critical semiconductor consumables<\/strong>, requiring periodic replacement while maintaining high performance throughout their lifecycle.<\/p>\n Silicon electrodes are widely used in semiconductor manufacturing equipment where plasma interaction is required. Typical applications include:<\/p>\n Their ability to maintain plasma uniformity and reduce contamination makes them essential in both mature and advanced process nodes.<\/p>\n Silicon electrodes offer a unique balance between cost efficiency and performance. Compared to SiC components, silicon electrodes are more economical and easier to machine, making them ideal for applications where replacement cycles are acceptable. Additionally, their intrinsic compatibility with silicon wafer processes ensures minimal risk of cross-contamination, which is critical for maintaining high device yields.<\/p>\n For applications requiring longer lifetime or higher corrosion resistance, SiC electrodes may be considered. However, for a wide range of standard semiconductor processes, silicon electrodes remain the industry-standard solution.<\/p>\n Q1: Is the silicon electrode a consumable part?<\/strong> Q2: What resistivity should I choose?<\/strong> C\u00e2u h\u1ecfi 3: C\u00f3 th\u1ec3 t\u00f9y ch\u1ec9nh \u0111i\u1ec7n c\u1ef1c kh\u00f4ng?<\/strong> The silicon electrode is a core functional component used in advanced semiconductor plasma processing equipment, including etching, deposition, and surface modification systems. Manufactured from high-purity single crystal silicon, it plays a critical role in ensuring stable plasma generation, uniform electric field distribution, and precise wafer processing.<\/p>","protected":false},"featured_media":2397,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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\nC\u00e1c t\u00ednh n\u0103ng ch\u00ednh<\/h2>\n
\n
![\"\u0110i\u1ec7n](\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/53ijDEI-Hbi31uz0t_L-DHLJsiyWWfRJlHlxVX1VI2hoHMMjCcOYgDxAcs06M_S4FBCl-zPueLgyH54wg3KtodiwkAok0zCME57k1CV0QE0UhxXuTtBJZpJPZ2eY9AembejJC0C5gN2j4R_87GHMZu-o2kMW4owmMIgDwzwwhM5_TvnzGqj9V0JcNVswUNE-300x281.jpg\")
<\/li>\n
\nTh\u00f4ng s\u1ed1 k\u1ef9 thu\u1eadt<\/h2>\n
\n\n\n\n
\n \nTham s\u1ed1<\/th>\n Th\u00f4ng s\u1ed1 k\u1ef9 thu\u1eadt<\/th>\n<\/tr>\n<\/thead>\n \n Ch\u1ea5t li\u1ec7u<\/td>\n Single Crystal Silicon<\/td>\n<\/tr>\n \n S\u1ef1 tinh khi\u1ebft<\/td>\n \u2265 99,9991% (lo\u1ea1i b\u00e1n d\u1eabn 5N)<\/td>\n<\/tr>\n \n \u0110\u01b0\u1eddng k\u00ednh (t\u1ed1i \u0111a)<\/td>\n T\u1ed1i \u0111a 480 mm<\/td>\n<\/tr>\n \n \u0110\u1ed9 d\u00e0y<\/td>\n Custom (typically 5\u201350 mm depending on design)<\/td>\n<\/tr>\n \n \u0110i\u1ec7n tr\u1edf su\u1ea5t (th\u1ea5p)<\/td>\n < 0,02 \u03a9\u00b7cm<\/td>\n<\/tr>\n \n \u0110i\u1ec7n tr\u1edf su\u1ea5t (Trung b\u00ecnh)<\/td>\n 1 \u2013 4 \u03a9\u00b7cm<\/td>\n<\/tr>\n \n \u0110i\u1ec7n tr\u1edf su\u1ea5t (cao)<\/td>\n 70 \u2013 90 \u03a9\u00b7cm<\/td>\n<\/tr>\n \n \u0110\u1ed9 \u0111\u1ed3ng \u0111\u1ec1u c\u1ee7a \u0111i\u1ec7n tr\u1edf su\u1ea5t (RRG)<\/td>\n < 5%<\/td>\n<\/tr>\n \n \u0110\u01b0\u1eddng k\u00ednh l\u1ed7 kh\u00ed<\/td>\n 0,2 \u2013 0,8 mm (c\u00f3 th\u1ec3 t\u00f9y ch\u1ec9nh)<\/td>\n<\/tr>\n \n T\u00ecnh tr\u1ea1ng b\u1ec1 m\u1eb7t<\/td>\n \u0110\u00e1nh b\u00f3ng \/ \u0110\u00e1nh nh\u00e1m \/ M\u00e0i<\/td>\n<\/tr>\n \n \u0110\u1ed9 nh\u00e1m b\u1ec1 m\u1eb7t (Ra)<\/td>\n \u2264 0.8 \u03bcm (polished option lower)<\/td>\n<\/tr>\n \n \u0110\u1ed9 ch\u00ednh x\u00e1c gia c\u00f4ng<\/td>\n < 10 \u03bcm<\/td>\n<\/tr>\n \n \u0110\u1ed9 ph\u1eb3ng<\/td>\n \u2264 30 \u03bcm (t\u00f9y theo k\u00edch th\u01b0\u1edbc)<\/td>\n<\/tr>\n \n H\u00ecnh d\u1ea1ng c\u1ea1nh<\/td>\n Custom chamfer \/ radius<\/td>\n<\/tr>\n \n Ki\u1ec3m so\u00e1t ch\u1ea5t l\u01b0\u1ee3ng<\/td>\n Free of chip, crack, scratch, contamination<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n
\n\u1ee8ng d\u1ee5ng<\/h2>\n
\n
\nWhy Choose Silicon Electrodes?<\/h2>\n
![\"\"](\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/\u5fae\u4fe1\u56fe\u7247_20260423181006_366_381-1024x486.png\")
<\/p>\n
\nC\u00e2u h\u1ecfi th\u01b0\u1eddng g\u1eb7p<\/h2>\n
Yes, it is classified as a critical semiconductor consumable. Due to plasma exposure and chemical reactions, it gradually wears and requires periodic replacement.<\/p>\n
It depends on your process requirements. Low resistivity is typically used for higher conductivity needs, while high resistivity is suitable for insulation and controlled plasma environments.<\/p>\n
Yes. Dimensions, thickness, gas hole patterns, resistivity, and surface finish can all be customized according to your drawings or equipment requirements.<\/p>","protected":false},"excerpt":{"rendered":"