{"id":2342,"date":"2026-04-22T05:35:46","date_gmt":"2026-04-22T05:35:46","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2342"},"modified":"2026-04-22T07:27:32","modified_gmt":"2026-04-22T07:27:32","slug":"high-efficiency-ai80hchigh-beam-ion-implantation-equipment-for-advanced-silicon-wafer-doping","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/sv\/product\/high-efficiency-ai80hchigh-beam-ion-implantation-equipment-for-advanced-silicon-wafer-doping\/","title":{"rendered":"H\u00f6geffektiv Ai80HC (High Beam) jonimplantationsutrustning f\u00f6r avancerad dopning av kiselskivor"},"content":{"rendered":"<p data-start=\"153\" data-end=\"528\"><img fetchpriority=\"high\" decoding=\"async\" class=\"alignright wp-image-2343 size-medium\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-300x300.png\" alt=\"H\u00f6geffektiv Ai80HC (High Beam) jonimplantationsutrustning f\u00f6r avancerad dopning av kiselskivor\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Ai80HC (High Beam) Ion Implantation Equipment \u00e4r en jonimplanterare med h\u00f6g str\u00f6mstyrka som \u00e4r s\u00e4rskilt utformad f\u00f6r produktionslinjer f\u00f6r halvledare med 12-tums kiselskivor. Den \u00e4r konstruerad f\u00f6r avancerade precisionsdopningsprocesser vid modern tillverkning av integrerade kretsar och ger stabil str\u00e5lprestanda, h\u00f6g processrepeterbarhet och utm\u00e4rkt noggrannhet vid dosstyrning.<\/p>\n<p data-start=\"530\" data-end=\"891\">Systemet arbetar inom ett brett energiomr\u00e5de fr\u00e5n 0,5 keV till 80 keV, vilket m\u00f6jligg\u00f6r flexibla implantationsf\u00f6rh\u00e5llanden f\u00f6r b\u00e5de grund och medeldjup junction engineering. Det st\u00f6der flera implantationsarter, inklusive \u00b9\u00b9B\u207a, \u2074\u2079BF\u2082\u207a, \u00b3\u00b9P\u207a, \u2077\u2075As\u207a, \u00b9\u2074N\u207a och \u00b9H\u207a, vilket g\u00f6r det l\u00e4mpligt f\u00f6r ett brett utbud av tillverkningsprocesser f\u00f6r CMOS och avancerade logiska enheter.<\/p>\n<p data-start=\"893\" data-end=\"1243\">Med ett implantationsvinkelomr\u00e5de p\u00e5 0\u00b0 till 45\u00b0 och en h\u00f6g vinkelnoggrannhet p\u00e5 \u2264 0,1\u00b0 s\u00e4kerst\u00e4ller systemet exakt kontroll av dopantf\u00f6rdelning och konstruktion av jonprofiler. I kombination med en str\u00e5lparallellitet p\u00e5 \u2264 0,3\u00b0 och en uniformitet p\u00e5 \u2264 1% (1\u03c3) ger Ai80HC (High Beam) konsekvent processtabilitet fr\u00e5n wafer till wafer och inom wafer.<\/p>\n<p data-start=\"1245\" data-end=\"1496\">Systemet \u00e4r utformat f\u00f6r h\u00f6geffektiva produktionsmilj\u00f6er och uppn\u00e5r en genomstr\u00f6mning p\u00e5 \u2265 200 wafers per timme (WPH) samtidigt som det uppr\u00e4tth\u00e5ller en strikt processtabilitet, vilket g\u00f6r det l\u00e4mpligt f\u00f6r LSI-kompatibla avancerade tillverkningslinjer f\u00f6r halvledare.<\/p>\n<h2 data-section-id=\"12rj9ab\" data-start=\"1101\" data-end=\"1126\">Systemarkitektur<\/h2>\n<p data-start=\"1128\" data-end=\"1199\">Ai80HC har en mogen och tillf\u00f6rlitlig str\u00e5lr\u00f6rsdesign som best\u00e5r av:<\/p>\n<ul data-start=\"1201\" data-end=\"1436\">\n<li data-section-id=\"1kfcth9\" data-start=\"1201\" data-end=\"1215\">Jonk\u00e4lla<\/li>\n<li data-section-id=\"1r1hm7c\" data-start=\"1216\" data-end=\"1237\">Extraktionssystem<\/li>\n<li data-section-id=\"1twz66q\" data-start=\"1238\" data-end=\"1255\">Massanalysator<\/li>\n<li data-section-id=\"ywuuxz\" data-start=\"1256\" data-end=\"1280\">Magnetiskt linssystem<\/li>\n<li data-section-id=\"1s57tik\" data-start=\"1281\" data-end=\"1302\">Accelerationsr\u00f6r<\/li>\n<li data-section-id=\"pg1cgy\" data-start=\"1303\" data-end=\"1336\">Elektrostatiskt skanningssystem<\/li>\n<li data-section-id=\"1iwk7km\" data-start=\"1337\" data-end=\"1367\">Lins f\u00f6r parallell str\u00e5lformning<\/li>\n<li data-section-id=\"1cur4hx\" data-start=\"1368\" data-end=\"1401\">Processkammare (slutstation)<\/li>\n<li data-section-id=\"qtlnqu\" data-start=\"1402\" data-end=\"1436\">Kassett- och laddningssystem f\u00f6r wafers<\/li>\n<\/ul>\n<p data-start=\"1438\" data-end=\"1458\">Den \u00e4r utrustad med:<\/p>\n<ul data-start=\"1459\" data-end=\"1572\">\n<li data-section-id=\"1jzaueb\" data-start=\"1459\" data-end=\"1494\">Elektrostatiskt chuckbord f\u00f6r wafers<\/li>\n<li data-section-id=\"1s8wavu\" data-start=\"1495\" data-end=\"1530\">Teknik f\u00f6r jonk\u00e4lla med l\u00e5ng livsl\u00e4ngd<\/li>\n<li data-section-id=\"6mih95\" data-start=\"1531\" data-end=\"1572\">Fullt automatiserat system f\u00f6r hantering av wafers<\/li>\n<\/ul>\n<p data-start=\"1574\" data-end=\"1686\">Denna arkitektur s\u00e4kerst\u00e4ller h\u00f6g str\u00e5lstabilitet, minskad stillest\u00e5ndstid f\u00f6r underh\u00e5ll och f\u00f6rb\u00e4ttrad repeterbarhet i processen.<\/p>\n<p data-start=\"1574\" data-end=\"1686\"><img decoding=\"async\" class=\"aligncenter wp-image-2371 size-large\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-1024x388.png\" alt=\"\" width=\"1024\" height=\"388\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-1024x388.png 1024w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-300x114.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-768x291.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-18x7.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-600x227.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs.png 1216w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><\/p>\n<h2 data-section-id=\"106914\" data-start=\"1693\" data-end=\"1727\">Viktiga tekniska specifikationer<\/h2>\n<table>\n<thead>\n<tr>\n<th>F\u00f6rem\u00e5l<\/th>\n<th>Specifikation<\/th>\n<\/tr>\n<\/thead>\n<tbody>\n<tr>\n<td>Wafer-storlek<\/td>\n<td>12 tum<\/td>\n<\/tr>\n<tr>\n<td>Energiomr\u00e5de<\/td>\n<td>0,5 - 80 keV<\/td>\n<\/tr>\n<tr>\n<td>Implanterade element<\/td>\n<td>\u00b9\u00b9B\u207a, \u2074\u2079BF\u2082\u207a, \u00b3\u00b9P\u207a, \u2077\u2075As\u207a, \u00b9\u2074N\u207a, \u00b9H\u207a<\/td>\n<\/tr>\n<tr>\n<td>Implantatets vinkel<\/td>\n<td>0\u00b0 - 45\u00b0<\/td>\n<\/tr>\n<tr>\n<td>Vinkelnoggrannhet<\/td>\n<td>\u2264 0.1\u00b0<\/td>\n<\/tr>\n<tr>\n<td>Dosintervall<\/td>\n<td>5E11 - 1E17 joner\/cm\u00b2<\/td>\n<\/tr>\n<tr>\n<td>Balkens stabilitet<\/td>\n<td>\u2264 10% \/ timme (inom 60 minuter; str\u00e5lavbrott och ljusb\u00e5ge \u2264 1 g\u00e5ng)<\/td>\n<\/tr>\n<tr>\n<td>Balkens parallellitet<\/td>\n<td>\u2264 0.3\u00b0<\/td>\n<\/tr>\n<tr>\n<td>Genomstr\u00f6mning (WPH)<\/td>\n<td>\u2265 200 wafers\/timme<\/td>\n<\/tr>\n<tr>\n<td>Enhetlighet (1\u03c3)<\/td>\n<td>\u2264 1%<\/td>\n<\/tr>\n<tr>\n<td>Repeterbarhet (1\u03c3)<\/td>\n<td>\u2264 1%<\/td>\n<\/tr>\n<tr>\n<td>Processkompatibilitet<\/td>\n<td>Kompatibel med LSI-processen<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<h2 data-section-id=\"yb78ly\" data-start=\"2475\" data-end=\"2506\">Viktiga funktioner och f\u00f6rdelar<\/h2>\n<h3 data-section-id=\"13hha2k\" data-start=\"2508\" data-end=\"2541\">1. Intelligent kontrollsystem<\/h3>\n<p data-start=\"2542\" data-end=\"2706\">Utrustad med en visualiserad och intelligent mjukvaruplattform, vilket m\u00f6jligg\u00f6r f\u00f6renklad drift, snabb feldiagnos och h\u00f6g systemstabilitet under produktionen.<\/p>\n<h3 data-section-id=\"1cy4f9q\" data-start=\"2713\" data-end=\"2740\">2. Jonk\u00e4lla med l\u00e5ng livsl\u00e4ngd<\/h3>\n<p data-start=\"2741\" data-end=\"2863\">Avancerad jonk\u00e4lledesign med en livsl\u00e4ngd p\u00e5 \u2265500 timmar, vilket avsev\u00e4rt minskar stillest\u00e5ndstiden och underh\u00e5llskostnaderna.<\/p>\n<h3 data-section-id=\"4euk5j\" data-start=\"2870\" data-end=\"2903\">3. Kapacitet f\u00f6r str\u00e5ldiagnostik<\/h3>\n<p data-start=\"2904\" data-end=\"2988\">Integrerat 2D-m\u00e4tsystem f\u00f6r str\u00e5lprofiler, med m\u00f6jlighet till noggrann \u00f6vervakning:<\/p>\n<ul data-start=\"2989\" data-end=\"3019\">\n<li data-section-id=\"1ct5xfp\" data-start=\"2989\" data-end=\"3003\">Str\u00e5lbredd<\/li>\n<li data-section-id=\"1vm2uvw\" data-start=\"3004\" data-end=\"3019\">Str\u00e5lh\u00f6jd<\/li>\n<\/ul>\n<p data-start=\"3021\" data-end=\"3092\">Detta f\u00f6rb\u00e4ttrar implantationsnoggrannheten och \u00f6kar processens repeterbarhet.<\/p>\n<h3 data-section-id=\"qq9ajq\" data-start=\"3099\" data-end=\"3132\">4. H\u00f6g produktionseffektivitet<\/h3>\n<p data-start=\"3133\" data-end=\"3310\">Ai80HC har en kapacitet som \u00e4r mer \u00e4n 1,5 g\u00e5nger h\u00f6gre \u00e4n konventionella system, vilket g\u00f6r den l\u00e4mplig f\u00f6r h\u00f6gvolymsmilj\u00f6er inom halvledartillverkning.<\/p>\n<h3 data-section-id=\"1h2ge5m\" data-start=\"3317\" data-end=\"3357\">5. Avancerad m\u00f6nsterimplantatfunktion<\/h3>\n<p data-start=\"3358\" data-end=\"3429\">St\u00f6der m\u00f6nstrad jonimplantation, vilket m\u00f6jligg\u00f6r dosf\u00f6rdelning i:<\/p>\n<ul data-start=\"3430\" data-end=\"3488\">\n<li data-section-id=\"fqh2r6\" data-start=\"3430\" data-end=\"3450\">Cirkul\u00e4ra regioner<\/li>\n<li data-section-id=\"1aoby05\" data-start=\"3451\" data-end=\"3488\">Kvadrantbaserad segmentering av wafers<\/li>\n<\/ul>\n<p data-start=\"3490\" data-end=\"3502\">Detta till\u00e5ter:<\/p>\n<ul data-start=\"3503\" data-end=\"3617\">\n<li data-section-id=\"chxy3y\" data-start=\"3503\" data-end=\"3552\">Flera processf\u00f6rh\u00e5llanden p\u00e5 en enda wafer<\/li>\n<li data-section-id=\"z1xkzj\" data-start=\"3553\" data-end=\"3589\">Minskad kostnad f\u00f6r processutveckling<\/li>\n<li data-section-id=\"15uh0gh\" data-start=\"3590\" data-end=\"3617\">F\u00f6rb\u00e4ttrad effektivitet inom FoU<\/li>\n<\/ul>\n<p data-start=\"3619\" data-end=\"3780\">Exempel: En enda wafer kan samtidigt f\u00e5 fyra olika implantationsf\u00f6rh\u00e5llanden i fyra kvadranter, vilket avsev\u00e4rt p\u00e5skyndar processoptimeringen.<\/p>\n<h2 data-section-id=\"18zz1hm\" data-start=\"3787\" data-end=\"3810\">Till\u00e4mpning<\/h2>\n<ul data-start=\"3812\" data-end=\"4005\">\n<li data-section-id=\"16inq9u\" data-start=\"3812\" data-end=\"3839\">Tillverkning av CMOS-enheter<\/li>\n<li data-section-id=\"xjegvm\" data-start=\"3840\" data-end=\"3875\">Avancerad tillverkning av logiska IC<\/li>\n<li data-section-id=\"1xlm3tz\" data-start=\"3876\" data-end=\"3906\">Dopning av krafthalvledare<\/li>\n<li data-section-id=\"1ursyu4\" data-start=\"3907\" data-end=\"3959\">Pilotlinjer f\u00f6r forskning och utveckling av halvledare<\/li>\n<li data-section-id=\"1k6v1m6\" data-start=\"3960\" data-end=\"4005\">Produktion av kiselbaserade integrerade kretsar<\/li>\n<\/ul>\n<h2 data-section-id=\"1idaiwr\" data-start=\"58\" data-end=\"95\">Vanliga fr\u00e5gor och svar (FAQ)<\/h2>\n<h3 data-section-id=\"squ7m7\" data-start=\"97\" data-end=\"166\">1. Vilken waferstorlek \u00e4r Ai80HC (High Beam)-systemet avsett f\u00f6r?<\/h3>\n<p data-start=\"167\" data-end=\"381\">Ai80HC (High Beam) jonimplantationssystem \u00e4r utformat f\u00f6r produktionslinjer f\u00f6r 12-tums kiselskivor, vilket g\u00f6r det l\u00e4mpligt f\u00f6r avancerad halvledartillverkning och tillverkning av integrerade kretsar i stora volymer.<\/p>\n<h3 data-section-id=\"foelcb\" data-start=\"388\" data-end=\"458\">2. Vad har detta system f\u00f6r energiomr\u00e5de och processf\u00f6rm\u00e5ga?<\/h3>\n<p data-start=\"459\" data-end=\"716\">Systemet arbetar inom ett energiomr\u00e5de p\u00e5 0,5 keV till 80 keV och st\u00f6der b\u00e5de ytlig och medeldjup implantation. Det \u00e4r kompatibelt med LSI-processer, inklusive bildning av grunda \u00f6verg\u00e5ngar och source\/drain-teknik i avancerade komponentstrukturer.<\/p>\n<h3 data-section-id=\"jluc3f\" data-start=\"723\" data-end=\"792\">3. Vilken niv\u00e5 av precision och stabilitet ger systemet?<\/h3>\n<p data-start=\"793\" data-end=\"850\">Ai80HC (High Beam) s\u00e4kerst\u00e4ller h\u00f6g processkonsistens med:<\/p>\n<ul data-start=\"851\" data-end=\"965\">\n<li data-section-id=\"8ldlzj\" data-start=\"851\" data-end=\"878\">Vinkelnoggrannhet \u2264 0,1\u00b0.<\/li>\n<li data-section-id=\"nyztaj\" data-start=\"879\" data-end=\"905\">Enhetlighet (1\u03c3) \u2264 1%<\/li>\n<li data-section-id=\"ai4v3y\" data-start=\"906\" data-end=\"935\">Repeterbarhet (1\u03c3) \u2264 1%<\/li>\n<li data-section-id=\"1hjdqzq\" data-start=\"936\" data-end=\"965\">Balkens parallellitet \u2264 0,3\u00b0.<\/li>\n<\/ul>\n<p data-start=\"967\" data-end=\"1069\">Dessa specifikationer s\u00e4kerst\u00e4ller stabil wafer-to-wafer-prestanda och h\u00f6gavkastande halvledarproduktion.<\/p>","protected":false},"excerpt":{"rendered":"<p>Ai80HC (High Beam) \u00e4r ett jonimplantationssystem med h\u00f6g str\u00f6mstyrka som \u00e4r s\u00e4rskilt utformat f\u00f6r produktionslinjer f\u00f6r halvledare med 12-tums kiselskivor. Den \u00e4r konstruerad f\u00f6r avancerade precisionsdopningsprocesser vid modern tillverkning av integrerade kretsar och ger stabil str\u00e5lprestanda, h\u00f6g processrepeterbarhet och utm\u00e4rkt noggrannhet vid dosstyrning.<\/p>","protected":false},"featured_media":2343,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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