{"id":2316,"date":"2026-04-21T06:05:44","date_gmt":"2026-04-21T06:05:44","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2316"},"modified":"2026-04-21T06:05:45","modified_gmt":"2026-04-21T06:05:45","slug":"ion-beam-etching-machine-for-si-sio2-and-metal-materials-in-semiconductor-fabrication","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/sv\/product\/ion-beam-etching-machine-for-si-sio2-and-metal-materials-in-semiconductor-fabrication\/","title":{"rendered":"Etsningsmaskin med jonstr\u00e5le f\u00f6r Si SiO2 och metallmaterial vid tillverkning av halvledare"},"content":{"rendered":"<p data-start=\"297\" data-end=\"643\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2320 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication-300x300.webp\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication-300x300.webp 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication-150x150.webp 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication-12x12.webp 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication-600x600.webp 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication-100x100.webp 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication.webp 750w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Ion Beam Etching Machine f\u00f6r Si, SiO2 och metallmaterial \u00e4r ett torretsningssystem med h\u00f6g precision som \u00e4r utformat f\u00f6r avancerade mikrofabrikations- och nanotekniktill\u00e4mpningar. Med hj\u00e4lp av jonstr\u00e5leetsning (IBE), \u00e4ven k\u00e4nd som jonfr\u00e4sning, m\u00f6jligg\u00f6r denna utrustning h\u00f6g materialborttagning genom en rent fysisk sputteringsprocess.<\/p>\n<p data-start=\"645\" data-end=\"961\">Till skillnad fr\u00e5n konventionella plasmabaserade etsningstekniker exponeras inte substratet direkt f\u00f6r plasma vid jonstr\u00e5leetsning. Detta minskar avsev\u00e4rt risken f\u00f6r plasmainducerade skador, kontaminering och laddningsackumulering, vilket g\u00f6r den s\u00e4rskilt l\u00e4mplig f\u00f6r tillverkning av k\u00e4nsliga halvledare och optiska enheter.<\/p>\n<p data-start=\"963\" data-end=\"1148\">Med precision p\u00e5 nanometerniv\u00e5 och utm\u00e4rkt processkontroll anv\u00e4nds detta system i stor utstr\u00e4ckning inom halvledartillverkning, tunnfilmsbearbetning och avancerad materialforskning.<\/p>\n<hr data-start=\"1150\" data-end=\"1153\" \/>\n<h2 data-section-id=\"17sw59i\" data-start=\"1155\" data-end=\"1184\"><span role=\"text\"><img decoding=\"async\" class=\"wp-image-2324 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication7-300x125.png\" alt=\"\" width=\"458\" height=\"191\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication7-300x125.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication7-18x7.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication7-600x250.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication7.png 680w\" sizes=\"(max-width: 458px) 100vw, 458px\" \/>Viktiga tekniska egenskaper<\/span><\/h2>\n<ul data-start=\"1186\" data-end=\"1929\">\n<li data-section-id=\"7yo1gz\" data-start=\"1186\" data-end=\"1324\">Ultrah\u00f6g precision<br data-start=\"1212\" data-end=\"1215\" \/>Uppn\u00e5r en etsningsuppl\u00f6sning p\u00e5 \u226410 nm, vilket uppfyller kraven f\u00f6r avancerad halvledar- och nanofabrikation.<\/li>\n<li data-section-id=\"csgjgf\" data-start=\"1326\" data-end=\"1497\">Icke-selektiv etsningskapacitet<br data-start=\"1364\" data-end=\"1367\" \/>M\u00f6jligg\u00f6r enhetlig etsning av flera olika material, inklusive metaller, halvledare och dielektrika, utan kemiskt beroende.<\/li>\n<li data-section-id=\"1xlwjqh\" data-start=\"1499\" data-end=\"1667\">Anisotropisk och riktad styrning<br data-start=\"1540\" data-end=\"1543\" \/>Justerbara jonstr\u00e5levinklar m\u00f6jligg\u00f6r b\u00e5de anisotropiska och isotropiska etsningsprofiler, vilket st\u00f6der komplex m\u00f6nster\u00f6verf\u00f6ring.<\/li>\n<li data-section-id=\"1ialgp0\" data-start=\"1669\" data-end=\"1793\">Plasmafri bearbetningsmilj\u00f6<br data-start=\"1709\" data-end=\"1712\" \/>Eliminerar plasmainducerade skador, vilket ger h\u00f6gre tillf\u00f6rlitlighet och avkastning f\u00f6r enheterna.<\/li>\n<li data-section-id=\"1squn5z\" data-start=\"1795\" data-end=\"1929\">Utm\u00e4rkt ytkvalitet<br data-start=\"1826\" data-end=\"1829\" \/>Ger sl\u00e4ta ytor med minskad oj\u00e4mnhet, vilket \u00e4r avg\u00f6rande f\u00f6r optiska och elektroniska applikationer.<\/li>\n<\/ul>\n<hr data-start=\"1931\" data-end=\"1934\" \/>\n<h2 data-section-id=\"crb813\" data-start=\"1936\" data-end=\"1965\"><span role=\"text\">Centrala systemkomponenter<\/span><\/h2>\n<p data-start=\"1967\" data-end=\"2042\">Ett komplett jonstr\u00e5leetsningssystem best\u00e5r av flera kritiska delsystem:<\/p>\n<h3 data-section-id=\"j86wbp\" data-start=\"2044\" data-end=\"2068\"><span role=\"text\">1. Vakuumsystem<\/span><\/h3>\n<p data-start=\"2069\" data-end=\"2118\">Ger en h\u00f6gvakuummilj\u00f6 som \u00e4r n\u00f6dv\u00e4ndig f\u00f6r:<\/p>\n<ul data-start=\"2119\" data-end=\"2193\">\n<li data-section-id=\"1vzt3vq\" data-start=\"2119\" data-end=\"2137\">Balkens stabilitet<\/li>\n<li data-section-id=\"svkbf3\" data-start=\"2138\" data-end=\"2163\">Kontroll av kontaminering<\/li>\n<li data-section-id=\"19d0yza\" data-start=\"2164\" data-end=\"2193\">H\u00f6gprecisionsbearbetning<\/li>\n<\/ul>\n<h3 data-section-id=\"8jigvj\" data-start=\"2195\" data-end=\"2216\"><span role=\"text\">2. Jonk\u00e4lla<\/span><\/h3>\n<p data-start=\"2217\" data-end=\"2272\">Genererar en h\u00f6genergetisk jonstr\u00e5le (vanligen argonjoner):<\/p>\n<ul data-start=\"2273\" data-end=\"2386\">\n<li data-section-id=\"116c4dh\" data-start=\"2273\" data-end=\"2315\">Best\u00e4mmer etsningens hastighet och j\u00e4mnhet<\/li>\n<li data-section-id=\"bdpzju\" data-start=\"2316\" data-end=\"2386\">St\u00f6djer olika k\u00e4lltyper som RF- och Kaufman-jonk\u00e4llor<\/li>\n<\/ul>\n<h3 data-section-id=\"1tpsqxl\" data-start=\"2388\" data-end=\"2411\"><span role=\"text\">3. Provtagning<\/span><\/h3>\n<ul data-start=\"2412\" data-end=\"2530\">\n<li data-section-id=\"d3z3he\" data-start=\"2412\" data-end=\"2468\">St\u00f6der fleraxlig rotation f\u00f6r enhetlig etsning<\/li>\n<li data-section-id=\"15yipgz\" data-start=\"2469\" data-end=\"2530\">Integrerad temperaturkontroll f\u00f6rb\u00e4ttrar processtabiliteten<\/li>\n<\/ul>\n<h3 data-section-id=\"qoosxq\" data-start=\"2532\" data-end=\"2557\"><span role=\"text\">4. Kontrollsystem<\/span><\/h3>\n<ul data-start=\"2558\" data-end=\"2705\">\n<li data-section-id=\"1mqnqw1\" data-start=\"2558\" data-end=\"2587\">Fullt automatiserad drift<\/li>\n<li data-section-id=\"ymbyxd\" data-start=\"2588\" data-end=\"2643\">M\u00f6jligg\u00f6r exakt parameterkontroll och repeterbarhet<\/li>\n<li data-section-id=\"1kjf28e\" data-start=\"2644\" data-end=\"2705\">Valfri slutpunktsdetektering f\u00f6r avancerad processtyrning<\/li>\n<\/ul>\n<h3 data-section-id=\"97rafg\" data-start=\"2707\" data-end=\"2729\"><span role=\"text\">5. Neutraliserare<\/span><\/h3>\n<ul data-start=\"2730\" data-end=\"2836\">\n<li data-section-id=\"12j0ebp\" data-start=\"2730\" data-end=\"2772\">F\u00f6rhindrar laddningsuppbyggnad under etsning<\/li>\n<li data-section-id=\"1o4nvb1\" data-start=\"2773\" data-end=\"2836\">Viktigt f\u00f6r isolerande material som SiO\u2082 och Si\u2083N\u2084<\/li>\n<\/ul>\n<hr data-start=\"2838\" data-end=\"2841\" \/>\n<h2 data-section-id=\"sgqumq\" data-start=\"2843\" data-end=\"2867\"><span role=\"text\">Arbetsprincip<\/span><\/h2>\n<p data-start=\"2869\" data-end=\"3006\"><img decoding=\"async\" class=\"size-medium wp-image-2321 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-1-300x235.png\" alt=\"\" width=\"300\" height=\"235\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-1-300x235.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-1-15x12.png 15w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-1-600x469.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-1.png 680w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Vid etsning med jonstr\u00e5le riktas en kollimerad jonstr\u00e5le med h\u00f6g energi mot ytan p\u00e5 m\u00e5lmaterialet under vakuumf\u00f6rh\u00e5llanden.<\/p>\n<p data-start=\"3008\" data-end=\"3253\">Jonerna (vanligtvis Ar\u207a) kolliderar med ytatomer, \u00f6verf\u00f6r r\u00f6relsem\u00e4ngdsmoment och orsakar att atomer kastas ut via fysisk sputtering. Denna process avl\u00e4gsnar material lager f\u00f6r lager, vilket m\u00f6jligg\u00f6r exakt m\u00f6nsterdefinition utan kemiska reaktioner.<\/p>\n<p data-start=\"3255\" data-end=\"3296\">Detta g\u00f6r IBE s\u00e4rskilt l\u00e4mplig f\u00f6r:<\/p>\n<ul data-start=\"3297\" data-end=\"3403\">\n<li data-section-id=\"jy9ydi\" data-start=\"3297\" data-end=\"3333\">M\u00f6nster\u00f6verf\u00f6ring med h\u00f6g uppl\u00f6sning<\/li>\n<li data-section-id=\"1ihgsm0\" data-start=\"3334\" data-end=\"3376\">Material med l\u00e5g kemisk reaktivitet<\/li>\n<li data-section-id=\"hl3mzt\" data-start=\"3377\" data-end=\"3403\">Flerskiktsstrukturer<\/li>\n<\/ul>\n<hr data-start=\"3405\" data-end=\"3408\" \/>\n<h2 data-section-id=\"gimyd4\" data-start=\"3410\" data-end=\"3440\"><span role=\"text\">Kapacitet f\u00f6r bearbetning<\/span><\/h2>\n<h3 data-section-id=\"ww5vbk\" data-start=\"3442\" data-end=\"3469\"><span role=\"text\">St\u00f6dda material<\/span><\/h3>\n<ul data-start=\"3470\" data-end=\"3622\">\n<li data-section-id=\"4dwycu\" data-start=\"3470\" data-end=\"3504\">Metaller: Au, Pt, Cu, Ta, Al<\/li>\n<li data-section-id=\"12wc4i0\" data-start=\"3505\" data-end=\"3537\">Halvledare: Si, GaAs<\/li>\n<li data-section-id=\"75kyg7\" data-start=\"3538\" data-end=\"3570\">Dielektrikum: SiO\u2082, Si\u2083N\u2084<\/li>\n<li data-section-id=\"1xmdv1x\" data-start=\"3571\" data-end=\"3622\">Avancerade material: AlN, keramer, polymerer<\/li>\n<\/ul>\n<hr data-start=\"3624\" data-end=\"3627\" \/>\n<h2 data-section-id=\"12vl3dy\" data-start=\"3629\" data-end=\"3656\"><span role=\"text\">Typiskt processfl\u00f6de<\/span><\/h2>\n<ol data-start=\"3658\" data-end=\"4078\">\n<li data-section-id=\"1lq2akh\" data-start=\"3658\" data-end=\"3742\">F\u00f6rberedelse av prov<br data-start=\"3683\" data-end=\"3686\" \/>Reng\u00f6r och montera substratet i vakuumkammaren<\/li>\n<li data-section-id=\"1uf7qj1\" data-start=\"3744\" data-end=\"3821\">Maskering<br data-start=\"3758\" data-end=\"3761\" \/>Applicera fotoresist eller metallmask f\u00f6r att definiera etsningsomr\u00e5den<\/li>\n<li data-section-id=\"1sq3ygn\" data-start=\"3823\" data-end=\"3910\">Generering av jonstr\u00e5lar<br data-start=\"3849\" data-end=\"3852\" \/>Aktivera jonk\u00e4llan med hj\u00e4lp av inert gas (vanligtvis argon)<\/li>\n<li data-section-id=\"46esbg\" data-start=\"3912\" data-end=\"4006\">Etsningsprocess<br data-start=\"3934\" data-end=\"3937\" \/>Justera str\u00e5lens energi, vinkel och tid f\u00f6r att uppn\u00e5 \u00f6nskad struktur<\/li>\n<li data-section-id=\"oeifr6\" data-start=\"4008\" data-end=\"4078\">Borttagning av mask<br data-start=\"4027\" data-end=\"4030\" \/>Avl\u00e4gsna masken f\u00f6r att visa de slutliga etsade m\u00f6nstren<\/li>\n<\/ol>\n<hr data-start=\"4080\" data-end=\"4083\" \/>\n<h2 data-section-id=\"1myoacb\" data-start=\"4085\" data-end=\"4109\"><span role=\"text\">Till\u00e4mpningsomr\u00e5den<\/span><\/h2>\n<h3 data-section-id=\"bm5nu5\" data-start=\"4111\" data-end=\"4146\"><span role=\"text\"><img loading=\"lazy\" decoding=\"async\" class=\"wp-image-2322 aligncenter\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication6-300x65.png\" alt=\"\" width=\"724\" height=\"157\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication6-300x65.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication6-18x4.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication6-600x130.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication6.png 680w\" sizes=\"(max-width: 724px) 100vw, 724px\" \/>Halvledartillverkning<\/span><\/h3>\n<ul data-start=\"4147\" data-end=\"4236\">\n<li data-section-id=\"13vctk4\" data-start=\"4147\" data-end=\"4180\">M\u00f6nstring av integrerade kretsar<\/li>\n<li data-section-id=\"ofwy8d\" data-start=\"4181\" data-end=\"4206\">Strukturering av tunnfilm<\/li>\n<li data-section-id=\"1x3kzva\" data-start=\"4207\" data-end=\"4236\">Avancerad tillverkning av noder<\/li>\n<\/ul>\n<h3 data-section-id=\"1tse075\" data-start=\"4238\" data-end=\"4261\"><span role=\"text\">Optiska enheter<\/span><\/h3>\n<ul data-start=\"4262\" data-end=\"4356\">\n<li data-section-id=\"v6a7ly\" data-start=\"4262\" data-end=\"4309\">Precisionsbearbetning av gitter och linser<\/li>\n<li data-section-id=\"lq2w9m\" data-start=\"4310\" data-end=\"4356\">Ytmodifiering av optiska komponenter<\/li>\n<\/ul>\n<h3 data-section-id=\"1wc0my6\" data-start=\"4358\" data-end=\"4380\"><span role=\"text\">Nanoteknologi<\/span><\/h3>\n<ul data-start=\"4381\" data-end=\"4441\">\n<li data-section-id=\"178ey7v\" data-start=\"4381\" data-end=\"4441\">Tillverkning av nanotr\u00e5dar, nanoporer och MEMS-strukturer<\/li>\n<\/ul>\n<h3 data-section-id=\"krs816\" data-start=\"4443\" data-end=\"4468\"><span role=\"text\">Materialvetenskap<\/span><\/h3>\n<ul data-start=\"4469\" data-end=\"4541\">\n<li data-section-id=\"18ntl16\" data-start=\"4469\" data-end=\"4506\">Analys och modifiering av ytor<\/li>\n<li data-section-id=\"1b8wqpz\" data-start=\"4507\" data-end=\"4541\">F\u00f6rberedelse f\u00f6r funktionell bel\u00e4ggning<\/li>\n<\/ul>\n<hr data-start=\"4543\" data-end=\"4546\" \/>\n<h2 data-section-id=\"13lz0w7\" data-start=\"4548\" data-end=\"4591\"><span role=\"text\">F\u00f6rdelar j\u00e4mf\u00f6rt med konventionell etsning<\/span><\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"4593\" data-end=\"4927\">\n<thead data-start=\"4593\" data-end=\"4646\">\n<tr data-start=\"4593\" data-end=\"4646\">\n<th class=\"\" data-start=\"4593\" data-end=\"4603\" data-col-size=\"sm\">Funktion<\/th>\n<th class=\"\" data-start=\"4603\" data-end=\"4622\" data-col-size=\"sm\">Etsning med jonstr\u00e5le<\/th>\n<th class=\"\" data-start=\"4622\" data-end=\"4646\" data-col-size=\"sm\">Reaktiv jonetsning<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"4697\" data-end=\"4927\">\n<tr data-start=\"4697\" data-end=\"4746\">\n<td data-start=\"4697\" data-end=\"4712\" data-col-size=\"sm\">Typ av process<\/td>\n<td data-start=\"4712\" data-end=\"4723\" data-col-size=\"sm\">Fysiska<\/td>\n<td data-start=\"4723\" data-end=\"4746\" data-col-size=\"sm\">Fysikalisk + kemisk<\/td>\n<\/tr>\n<tr data-start=\"4747\" data-end=\"4805\">\n<td data-start=\"4747\" data-end=\"4765\" data-col-size=\"sm\">Plasmaexponering<\/td>\n<td data-start=\"4765\" data-end=\"4786\" data-col-size=\"sm\">Ingen direkt exponering<\/td>\n<td data-start=\"4786\" data-end=\"4805\" data-col-size=\"sm\">Direkt exponering<\/td>\n<\/tr>\n<tr data-start=\"4806\" data-end=\"4853\">\n<td data-start=\"4806\" data-end=\"4829\" data-col-size=\"sm\">Materialselektivitet<\/td>\n<td data-start=\"4829\" data-end=\"4845\" data-col-size=\"sm\">L\u00e5g (enhetlig)<\/td>\n<td data-start=\"4845\" data-end=\"4853\" data-col-size=\"sm\">H\u00f6g<\/td>\n<\/tr>\n<tr data-start=\"4854\" data-end=\"4893\">\n<td data-start=\"4854\" data-end=\"4871\" data-col-size=\"sm\">Skador p\u00e5 ytan<\/td>\n<td data-start=\"4871\" data-end=\"4881\" data-col-size=\"sm\">Minimal<\/td>\n<td data-start=\"4881\" data-end=\"4893\" data-col-size=\"sm\">M\u00f6jligt<\/td>\n<\/tr>\n<tr data-start=\"4894\" data-end=\"4927\">\n<td data-start=\"4894\" data-end=\"4906\" data-col-size=\"sm\">Precision<\/td>\n<td data-start=\"4906\" data-end=\"4919\" data-col-size=\"sm\">Ultrah\u00f6g<\/td>\n<td data-start=\"4919\" data-end=\"4927\" data-col-size=\"sm\">H\u00f6g<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"4929\" data-end=\"4932\" \/>\n<h2 data-section-id=\"elc90z\" data-start=\"4934\" data-end=\"4944\"><span role=\"text\">VANLIGA FR\u00c5GOR<\/span><\/h2>\n<h3 data-section-id=\"1h3z74f\" data-start=\"4946\" data-end=\"4978\"><span role=\"text\">Vad \u00e4r etsning av jonstr\u00e5le\uff1f<\/span><\/h3>\n<p data-start=\"4979\" data-end=\"5122\">Jonstr\u00e5leetsning \u00e4r en torr etsningsprocess som avl\u00e4gsnar material genom fysisk sputtering med hj\u00e4lp av h\u00f6genergetiska joner i en vakuummilj\u00f6.<\/p>\n<h3 data-section-id=\"1oyreis\" data-start=\"5124\" data-end=\"5153\"><span role=\"text\">Skillnad mellan IBE och RIE\uff1f<\/span><\/h3>\n<ul data-start=\"5154\" data-end=\"5316\">\n<li data-section-id=\"6o7nxe\" data-start=\"5154\" data-end=\"5219\">IBE: rent fysiskt, ingen plasmakontakt, h\u00f6gre precision<\/li>\n<li data-section-id=\"d79ynl\" data-start=\"5220\" data-end=\"5316\">RIE: kombinerar kemiska reaktioner med plasma, h\u00f6gre selektivitet men st\u00f6rre risk f\u00f6r skador<\/li>\n<\/ul>","protected":false},"excerpt":{"rendered":"<p>Ion Beam Etching Machine f\u00f6r Si, SiO2 och metallmaterial \u00e4r ett torretsningssystem med h\u00f6g precision som \u00e4r utformat f\u00f6r avancerade mikrofabrikations- och nanotekniktill\u00e4mpningar. Med hj\u00e4lp av jonstr\u00e5leetsning (IBE), \u00e4ven k\u00e4nd som jonfr\u00e4sning, m\u00f6jligg\u00f6r denna utrustning h\u00f6g materialborttagning genom en rent fysisk sputteringsprocess.<\/p>","protected":false},"featured_media":2320,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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