{"id":2077,"date":"2026-04-03T02:07:51","date_gmt":"2026-04-03T02:07:51","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2077"},"modified":"2026-04-03T02:09:04","modified_gmt":"2026-04-03T02:09:04","slug":"integrated-vertical-airflow-sic-epitaxy-equipment-for-6-8-epi-wafers","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/sv\/product\/integrated-vertical-airflow-sic-epitaxy-equipment-for-6-8-epi-wafers\/","title":{"rendered":"Integrerad SiC-epitaxiutrustning med vertikalt luftfl\u00f6de f\u00f6r 6\u201d\/8\u201d epi-wafers"},"content":{"rendered":"<p data-start=\"187\" data-end=\"641\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2079 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Integrated Vertical Airflow Silicon Carbide (SiC) Epitaxy Equipment \u00e4r ett avancerat epitaxiskt tillv\u00e4xtsystem som \u00e4r konstruerat f\u00f6r h\u00f6geffektiv produktion av 6-tums och 8-tums SiC-epi-wafers. Systemet \u00e4r utformat f\u00f6r att m\u00f6ta de v\u00e4xande kraven fr\u00e5n tillverkning av krafthalvledare och integrerar exakt termisk kontroll, optimerad gasfl\u00f6desdynamik och intelligent automatisering f\u00f6r att leverera exceptionella prestanda inom enhetlighet, genomstr\u00f6mning och defektkontroll.<\/p>\n<p data-start=\"643\" data-end=\"982\">K\u00e4rnan i systemet \u00e4r en innovativ duschhuvuddesign med vertikalt luftfl\u00f6de, som m\u00f6jligg\u00f6r j\u00e4mn f\u00f6rdelning av processgaser \u00f6ver waferytan. I kombination med temperaturf\u00e4ltkontroll i flera zoner s\u00e4kerst\u00e4lls en utm\u00e4rkt j\u00e4mn tjocklek och stabil dopningskoncentration - vilket \u00e4r avg\u00f6rande f\u00f6r h\u00f6gpresterande SiC-enheter.<\/p>\n<p data-start=\"984\" data-end=\"1310\">Systemet har en mycket integrerad struktur med automatiserad waferhantering via ett EFEM-system, tillsammans med en mekanism f\u00f6r wafer\u00f6verf\u00f6ring vid h\u00f6g temperatur. Detta m\u00f6jligg\u00f6r s\u00f6ml\u00f6s integration i moderna tillverkningslinjer f\u00f6r halvledare, minskar manuella ingrepp och f\u00f6rb\u00e4ttrar processkonsistensen och driftseffektiviteten.<\/p>\n<p data-start=\"1312\" data-end=\"1615\">F\u00f6r att st\u00f6dja tillverkning i industriell skala har utrustningen en dubbelkammarkonfiguration som klarar kontinuerlig drift med flera br\u00e4nnare. Med en genomstr\u00f6mning p\u00e5 \u00f6ver 1100 wafers per m\u00e5nad - och upp till 1200 wafers genom processoptimering - \u00e4r den v\u00e4l l\u00e4mpad f\u00f6r h\u00f6gvolymproduktionsmilj\u00f6er.<\/p>\n<p data-start=\"1617\" data-end=\"1971\">Utrustningen \u00e4r kompatibel med b\u00e5de 6-tums och 8-tums SiC-wafers, vilket ger flexibilitet f\u00f6r tillverkare som \u00f6verg\u00e5r till st\u00f6rre waferstorlekar. Utrustningen har ocks\u00e5 utm\u00e4rkta egenskaper f\u00f6r tillv\u00e4xt av tjocka epitaxialskikt och epitaxi med trench-filling, vilket g\u00f6r den s\u00e4rskilt l\u00e4mplig f\u00f6r tillverkning av avancerade h\u00f6gsp\u00e4nnings- och h\u00f6geffektsapparater.<\/p>\n<p data-start=\"1973\" data-end=\"2214\">Dessutom s\u00e4kerst\u00e4ller den optimerade reaktordesignen l\u00e5g defektt\u00e4thet, f\u00f6rb\u00e4ttrat utbyte och l\u00e4gre \u00e4gandekostnader. Den robusta konstruktionen och den underh\u00e5llsv\u00e4nliga designen f\u00f6rb\u00e4ttrar ytterligare den l\u00e5ngsiktiga tillf\u00f6rlitligheten och driftstabiliteten.<\/p>\n<h2 data-section-id=\"qpn8c9\" data-start=\"2221\" data-end=\"2252\"><span role=\"text\"><img decoding=\"async\" class=\"size-medium wp-image-2078 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Viktiga tekniska f\u00f6rdelar<\/span><\/h2>\n<ul data-start=\"2254\" data-end=\"2704\">\n<li data-section-id=\"1q2t12k\" data-start=\"2254\" data-end=\"2321\">Duschhuvud med vertikalt luftfl\u00f6de f\u00f6r j\u00e4mn gasf\u00f6rdelning<\/li>\n<li data-section-id=\"1lzu0dd\" data-start=\"2322\" data-end=\"2387\">Temperaturkontroll med flera zoner f\u00f6r exakt v\u00e4rmehantering<\/li>\n<li data-section-id=\"1emeqzr\" data-start=\"2388\" data-end=\"2449\">Konfiguration med dubbla kammare f\u00f6r produktion med h\u00f6g genomstr\u00f6mning<\/li>\n<li data-section-id=\"rs6yfl\" data-start=\"2450\" data-end=\"2499\">L\u00e5g defektt\u00e4thet och h\u00f6g avkastningsf\u00f6rm\u00e5ga<\/li>\n<li data-section-id=\"h9m4ox\" data-start=\"2500\" data-end=\"2550\">Automatiserad waferhantering med EFEM-integration<\/li>\n<li data-section-id=\"bze71o\" data-start=\"2551\" data-end=\"2594\">Kompatibilitet med 6\u201d och 8\u201d SiC-wafers<\/li>\n<li data-section-id=\"xhhop\" data-start=\"2595\" data-end=\"2655\">Optimerad f\u00f6r tjock epitaxi och trench-filling-processer<\/li>\n<li data-section-id=\"1a3549x\" data-start=\"2656\" data-end=\"2704\">H\u00f6g tillf\u00f6rlitlighet med f\u00f6renklat underh\u00e5ll<\/li>\n<\/ul>\n<h2 data-section-id=\"ca04ra\" data-start=\"2711\" data-end=\"2737\"><span role=\"text\">Process Prestanda<\/span><\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2739\" data-end=\"3287\">\n<thead data-start=\"2739\" data-end=\"2768\">\n<tr data-start=\"2739\" data-end=\"2768\">\n<th class=\"\" data-start=\"2739\" data-end=\"2751\" data-col-size=\"sm\">Parameter<\/th>\n<th class=\"\" data-start=\"2751\" data-end=\"2768\" data-col-size=\"md\">Specifikation<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2796\" data-end=\"3287\">\n<tr data-start=\"2796\" data-end=\"2884\">\n<td data-start=\"2796\" data-end=\"2809\" data-col-size=\"sm\">Genomstr\u00f6mning<\/td>\n<td data-start=\"2809\" data-end=\"2884\" data-col-size=\"md\">\u22651100 wafers\/m\u00e5nad (dubbla kammare), upp till 1200 wafers\/m\u00e5nad (optimerad)<\/td>\n<\/tr>\n<tr data-start=\"2885\" data-end=\"2938\">\n<td data-start=\"2885\" data-end=\"2912\" data-col-size=\"sm\">Kompatibilitet med waferstorlek<\/td>\n<td data-col-size=\"md\" data-start=\"2912\" data-end=\"2938\">6\u201d \/ 8\u201d SiC epi-wafers<\/td>\n<\/tr>\n<tr data-start=\"2939\" data-end=\"2975\">\n<td data-start=\"2939\" data-end=\"2961\" data-col-size=\"sm\">Temperaturreglering<\/td>\n<td data-start=\"2961\" data-end=\"2975\" data-col-size=\"md\">Flera zoner<\/td>\n<\/tr>\n<tr data-start=\"2976\" data-end=\"3035\">\n<td data-start=\"2976\" data-end=\"2993\" data-col-size=\"sm\">Luftfl\u00f6dessystem<\/td>\n<td data-start=\"2993\" data-end=\"3035\" data-col-size=\"md\">Vertikalt justerbart luftfl\u00f6de i flera zoner<\/td>\n<\/tr>\n<tr data-start=\"3036\" data-end=\"3067\">\n<td data-start=\"3036\" data-end=\"3053\" data-col-size=\"sm\">Rotationshastighet<\/td>\n<td data-start=\"3053\" data-end=\"3067\" data-col-size=\"md\">0-1000 varv\/min<\/td>\n<\/tr>\n<tr data-start=\"3068\" data-end=\"3101\">\n<td data-start=\"3068\" data-end=\"3086\" data-col-size=\"sm\">Max Tillv\u00e4xttakt<\/td>\n<td data-start=\"3086\" data-end=\"3101\" data-col-size=\"md\">\u226560 \u03bcm\/timme<\/td>\n<\/tr>\n<tr data-start=\"3102\" data-end=\"3163\">\n<td data-start=\"3102\" data-end=\"3125\" data-col-size=\"sm\">Enhetlig tjocklek<\/td>\n<td data-col-size=\"md\" data-start=\"3125\" data-end=\"3163\">\u22642% (optimerad \u22641%, \u03c3\/avg, EE 5mm)<\/td>\n<\/tr>\n<tr data-start=\"3164\" data-end=\"3224\">\n<td data-start=\"3164\" data-end=\"3184\" data-col-size=\"sm\">Dopningsj\u00e4mnhet<\/td>\n<td data-col-size=\"md\" data-start=\"3184\" data-end=\"3224\">\u22643% (optimerad \u22641,5%, \u03c3\/avg, EE 5mm)<\/td>\n<\/tr>\n<tr data-start=\"3225\" data-end=\"3287\">\n<td data-start=\"3225\" data-end=\"3249\" data-col-size=\"sm\">D\u00f6dlig defektt\u00e4thet<\/td>\n<td data-col-size=\"md\" data-start=\"3249\" data-end=\"3287\">\u22640,2 cm-\u00b2 (optimerad till 0,01 cm-\u00b2)<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h2 data-section-id=\"1w46w82\" data-start=\"3294\" data-end=\"3322\"><span role=\"text\">Till\u00e4mpningsscenarier<\/span><\/h2>\n<p data-start=\"3324\" data-end=\"3514\">Denna utrustning anv\u00e4nds ofta vid tillverkning av avancerade SiC-baserade halvledarkomponenter, s\u00e4rskilt i industrier som kr\u00e4ver h\u00f6g effektivitet, h\u00f6g sp\u00e4nning och h\u00f6g termisk prestanda:<\/p>\n<ul data-start=\"3516\" data-end=\"4364\">\n<li data-section-id=\"qrtaas\" data-start=\"3516\" data-end=\"3707\">Elektriska fordon (EV)<br data-start=\"3545\" data-end=\"3548\" \/>Anv\u00e4nds vid tillverkning av SiC MOSFETs och kraftmoduler f\u00f6r v\u00e4xelriktare, ombordladdare och DC-DC-omvandlare, vilket f\u00f6rb\u00e4ttrar energieffektiviteten och r\u00e4ckvidden.<\/li>\n<li data-section-id=\"1j97evh\" data-start=\"3709\" data-end=\"3867\">System f\u00f6r f\u00f6rnybar energi<br data-start=\"3739\" data-end=\"3742\" \/>Anv\u00e4nds i solcellsv\u00e4xelriktare och energilagringssystem, vilket ger h\u00f6gre omvandlingseffektivitet och systemtillf\u00f6rlitlighet.<\/li>\n<li data-section-id=\"8pfhmh\" data-start=\"3869\" data-end=\"4041\">Industriell kraftelektronik<br data-start=\"3903\" data-end=\"3906\" \/>L\u00e4mplig f\u00f6r h\u00f6geffektsmotordrifter, industriella automationssystem och str\u00f6mf\u00f6rs\u00f6rjningsenheter som kr\u00e4ver stabil och effektiv drift.<\/li>\n<li data-section-id=\"frfj8s\" data-start=\"4043\" data-end=\"4206\">J\u00e4rnv\u00e4gstransporter &amp; eln\u00e4t<br data-start=\"4075\" data-end=\"4078\" \/>St\u00f6der h\u00f6gsp\u00e4nnings- och h\u00f6gfrekvensenheter som anv\u00e4nds i smarta eln\u00e4t, traktionssystem och infrastruktur f\u00f6r kraft\u00f6verf\u00f6ring.<\/li>\n<li data-section-id=\"1k6eb43\" data-start=\"4208\" data-end=\"4364\">High-End Power Devices<br data-start=\"4236\" data-end=\"4239\" \/>Idealisk f\u00f6r tillverkning av avancerade SiC-enheter som Schottky-dioder, MOSFET:er och n\u00e4sta generations h\u00f6gsp\u00e4nningskomponenter.<\/li>\n<\/ul>\n<p><img decoding=\"async\" class=\"wp-image-2080 size-large aligncenter\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-1024x578.png\" alt=\"\" width=\"1024\" height=\"578\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-1024x578.png 1024w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-300x169.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-768x433.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-18x10.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-600x339.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application.png 1285w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><\/p>\n<h2 data-section-id=\"elc90z\" data-start=\"4371\" data-end=\"4381\"><span role=\"text\">VANLIGA FR\u00c5GOR<\/span><\/h2>\n<h3 data-section-id=\"1f731tm\" data-start=\"4383\" data-end=\"4453\"><span role=\"text\">1. Vilka skivstorlekar st\u00f6ds av denna epitaxiutrustning?<\/span><\/h3>\n<p data-start=\"4454\" data-end=\"4606\">Systemet st\u00f6der b\u00e5de 6-tums och 8-tums SiC-wafers, vilket g\u00f6r det m\u00f6jligt f\u00f6r tillverkare att uppfylla nuvarande produktionskrav samtidigt som de f\u00f6rbereder sig f\u00f6r framtida skalning.<\/p>\n<h3 data-section-id=\"8a4v60\" data-start=\"4613\" data-end=\"4683\"><span role=\"text\">2. Vilka f\u00f6rdelar ger den vertikala luftfl\u00f6desdesignen?<\/span><\/h3>\n<p data-start=\"4684\" data-end=\"4858\">Det vertikala luftfl\u00f6dessystemet s\u00e4kerst\u00e4ller en j\u00e4mn gasf\u00f6rdelning \u00f6ver wafern, vilket f\u00f6rb\u00e4ttrar tjockleken, minskar antalet defekter och f\u00f6rb\u00e4ttrar den \u00f6vergripande epitaxikvaliteten.<\/p>\n<h3 data-section-id=\"1rbmoqb\" data-start=\"4865\" data-end=\"4935\"><span role=\"text\">3. \u00c4r denna utrustning l\u00e4mplig f\u00f6r tillverkning av stora volymer?<\/span><\/h3>\n<p data-start=\"4936\" data-end=\"5110\">Ja, systemet har en dubbelkammarkonfiguration och kontinuerligt driftl\u00e4ge, med en m\u00e5natlig genomstr\u00f6mning p\u00e5 \u00f6ver 1100 wafers. Den \u00e4r v\u00e4l l\u00e4mpad f\u00f6r stabil, storskalig industriell produktion, vilket s\u00e4kerst\u00e4ller j\u00e4mn produktion, h\u00f6g utbytesstabilitet och l\u00e5ngsiktig driftseffektivitet.<\/p>","protected":false},"excerpt":{"rendered":"<p>Integrated Vertical Airflow Silicon Carbide (SiC) Epitaxy Equipment \u00e4r ett avancerat epitaxiskt tillv\u00e4xtsystem som \u00e4r konstruerat f\u00f6r h\u00f6geffektiv produktion av 6-tums och 8-tums SiC epi-wafers.<\/p>","protected":false},"featured_media":2078,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}}},"product_brand":[],"product_cat":[730],"product_tag":[734,735,737,738,745,740,744,739,733,731,603,732,742,741,736,743],"class_list":{"0":"post-2077","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-epitaxy-equipment","7":"product_tag-6-inch-sic-wafer","8":"product_tag-8-inch-sic-wafer","9":"product_tag-cvd-epitaxy-system","10":"product_tag-epitaxial-growth-system","11":"product_tag-ev-power-semiconductors","12":"product_tag-high-voltage-sic-devices","13":"product_tag-industrial-power-electronics","14":"product_tag-semiconductor-manufacturing-equipment","15":"product_tag-sic-epi-wafer-production","16":"product_tag-sic-epitaxy-equipment","17":"product_tag-sic-power-devices","18":"product_tag-silicon-carbide-epitaxy-reactor","19":"product_tag-thick-epitaxy-growth","20":"product_tag-trench-filling-epitaxy","21":"product_tag-vertical-airflow-epitaxy","22":"product_tag-wafer-epitaxy-reactor","23":"desktop-align-left","24":"tablet-align-left","25":"mobile-align-left","26":"ast-product-gallery-layout-horizontal-slider","27":"ast-product-tabs-layout-horizontal","29":"first","30":"instock","31":"shipping-taxable","32":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/www.zmsh-semitech.com\/sv\/wp-json\/wp\/v2\/product\/2077","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.zmsh-semitech.com\/sv\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.zmsh-semitech.com\/sv\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/sv\/wp-json\/wp\/v2\/comments?post=2077"}],"version-history":[{"count":2,"href":"https:\/\/www.zmsh-semitech.com\/sv\/wp-json\/wp\/v2\/product\/2077\/revisions"}],"predecessor-version":[{"id":2082,"href":"https:\/\/www.zmsh-semitech.com\/sv\/wp-json\/wp\/v2\/product\/2077\/revisions\/2082"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/sv\/wp-json\/wp\/v2\/media\/2078"}],"wp:attachment":[{"href":"https:\/\/www.zmsh-semitech.com\/sv\/wp-json\/wp\/v2\/media?parent=2077"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/sv\/wp-json\/wp\/v2\/product_brand?post=2077"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/sv\/wp-json\/wp\/v2\/product_cat?post=2077"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/sv\/wp-json\/wp\/v2\/product_tag?post=2077"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}