{"id":2426,"date":"2026-04-27T05:56:44","date_gmt":"2026-04-27T05:56:44","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2426"},"modified":"2026-06-11T09:58:11","modified_gmt":"2026-06-11T09:58:11","slug":"ti-cu-metal-coated-silicon-wafer-titanium-copper-sputtered-wafer-for-mems-microelectronics-conductive-substrate","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/pt\/product\/ti-cu-metal-coated-silicon-wafer-titanium-copper-sputtered-wafer-for-mems-microelectronics-conductive-substrate\/","title":{"rendered":"Disco de sil\u00edcio revestido de metal Ti\/Cu Disco de cobre e tit\u00e2nio pulverizado para substrato condutor de microeletr\u00f3nica MEMS"},"content":{"rendered":"<p data-start=\"662\" data-end=\"949\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2430 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-1-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-1-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-1-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-1-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-1-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-1-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-1-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-1.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>A pastilha de sil\u00edcio revestida de metal Ti\/Cu foi concebida como um substrato condutor padr\u00e3o e compat\u00edvel com o processo para investiga\u00e7\u00e3o avan\u00e7ada e aplica\u00e7\u00f5es industriais. Ao combinar a tecnologia de pastilha de sil\u00edcio com o revestimento de pel\u00edcula fina de metal, proporciona uma plataforma est\u00e1vel para processos el\u00e9ctricos, qu\u00edmicos e de microfabrica\u00e7\u00e3o.<\/p>\n<p data-start=\"951\" data-end=\"1236\">A estrutura do sistema de revestimento Ti\/Cu assegura tanto a fiabilidade mec\u00e2nica como a condutividade funcional. \u00c9 especialmente adequado para aplica\u00e7\u00f5es que requerem interfaces met\u00e1licas fi\u00e1veis, condutividade de superf\u00edcie uniforme e compatibilidade com t\u00e9cnicas de processamento de semicondutores padr\u00e3o.<\/p>\n<p data-start=\"1238\" data-end=\"1419\">O produto permite a personaliza\u00e7\u00e3o do tamanho da bolacha, do tipo de substrato e da espessura da pel\u00edcula, tornando-o adequado tanto para experi\u00eancias de investiga\u00e7\u00e3o em pequena escala como para ambientes de produ\u00e7\u00e3o piloto.<\/p>\n<hr data-start=\"1421\" data-end=\"1424\" \/>\n<h2 data-section-id=\"1j5qwet\" data-start=\"1426\" data-end=\"1445\"><span role=\"text\"><strong data-start=\"1429\" data-end=\"1445\"><img decoding=\"async\" class=\"size-medium wp-image-2429 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-4-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-4-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-4-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-4-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-4-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-4-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-4-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-4.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Carater\u00edsticas principais<\/strong><\/span><\/h2>\n<ul data-start=\"1447\" data-end=\"2217\">\n<li data-section-id=\"z0jlco\" data-start=\"1447\" data-end=\"1623\"><strong data-start=\"1449\" data-end=\"1480\">Forte desempenho de ader\u00eancia<\/strong><br data-start=\"1480\" data-end=\"1483\" \/>A camada de ades\u00e3o de tit\u00e2nio melhora significativamente a liga\u00e7\u00e3o entre a pel\u00edcula de cobre e o substrato de sil\u00edcio, reduzindo os riscos de descama\u00e7\u00e3o e delamina\u00e7\u00e3o.<\/li>\n<li data-section-id=\"1lerftp\" data-start=\"1625\" data-end=\"1790\"><strong data-start=\"1627\" data-end=\"1659\">Elevada condutividade el\u00e9ctrica<\/strong><br data-start=\"1659\" data-end=\"1662\" \/>A camada de superf\u00edcie de cobre proporciona uma baixa resist\u00eancia e um desempenho el\u00e9trico est\u00e1vel para testes de dispositivos e aplica\u00e7\u00f5es condutoras.<\/li>\n<li data-section-id=\"2zjwp0\" data-start=\"1792\" data-end=\"1937\"><strong data-start=\"1794\" data-end=\"1823\">Excelente uniformidade da pel\u00edcula<\/strong><br data-start=\"1823\" data-end=\"1826\" \/>A pulveriza\u00e7\u00e3o cat\u00f3dica por magnetr\u00e3o garante uma espessura de revestimento uniforme e uma morfologia de superf\u00edcie lisa em toda a bolacha.<\/li>\n<li data-section-id=\"1wjo8iu\" data-start=\"1939\" data-end=\"2091\"><strong data-start=\"1941\" data-end=\"1971\">Boa compatibilidade de processos<\/strong><br data-start=\"1971\" data-end=\"1974\" \/>Compat\u00edvel com litografia, grava\u00e7\u00e3o, galvanoplastia, deposi\u00e7\u00e3o e processos normais de fabrico de semicondutores.<\/li>\n<li data-section-id=\"1xkuces\" data-start=\"2093\" data-end=\"2217\"><strong data-start=\"2095\" data-end=\"2121\">Personaliza\u00e7\u00e3o flex\u00edvel<\/strong><br data-start=\"2121\" data-end=\"2124\" \/>Dispon\u00edvel em v\u00e1rios tamanhos de bolacha, tipos de substrato e combina\u00e7\u00f5es de espessura de camada met\u00e1lica.<\/li>\n<\/ul>\n<hr data-start=\"2219\" data-end=\"2222\" \/>\n<h2 data-section-id=\"e5d2y2\" data-start=\"2224\" data-end=\"2248\"><span role=\"text\"><strong data-start=\"2227\" data-end=\"2248\"><img decoding=\"async\" class=\"size-medium wp-image-2428 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-3-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-3-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-3-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-3-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-3-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-3-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-3-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-3.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Estrutura t\u00edpica<\/strong><\/span><\/h2>\n<p data-start=\"2250\" data-end=\"2315\"><strong data-start=\"2250\" data-end=\"2315\">Substrato + camada de ader\u00eancia de tit\u00e2nio + camada condutora de cobre<\/strong><\/p>\n<ul data-start=\"2317\" data-end=\"2471\">\n<li data-section-id=\"wt95ma\" data-start=\"2317\" data-end=\"2365\">Substrato: Sil\u00edcio \/ Quartzo \/ Vidro (opcional)<\/li>\n<li data-section-id=\"rsr2x5\" data-start=\"2366\" data-end=\"2397\">Camada de ader\u00eancia: Tit\u00e2nio (Ti)<\/li>\n<li data-section-id=\"b6l0gz\" data-start=\"2398\" data-end=\"2429\">Camada condutora: Cobre (Cu)<\/li>\n<li data-section-id=\"1mrq7wz\" data-start=\"2430\" data-end=\"2471\">M\u00e9todo de deposi\u00e7\u00e3o: Magnetron sputtering<\/li>\n<\/ul>\n<p data-start=\"2473\" data-end=\"2687\">A camada de Ti actua como uma camada de liga\u00e7\u00e3o de interface entre o substrato e a pel\u00edcula de cobre, assegurando a estabilidade estrutural. A camada de Cu fornece a superf\u00edcie condutora funcional para aplica\u00e7\u00f5es el\u00e9ctricas e de processo.<\/p>\n<hr data-start=\"2689\" data-end=\"2692\" \/>\n<h2 data-section-id=\"q11yyz\" data-start=\"2694\" data-end=\"2715\"><span role=\"text\"><strong data-start=\"2697\" data-end=\"2715\">Especifica\u00e7\u00f5es<\/strong><\/span><\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2717\" data-end=\"3173\">\n<thead data-start=\"2717\" data-end=\"2739\">\n<tr data-start=\"2717\" data-end=\"2739\">\n<th class=\"\" data-start=\"2717\" data-end=\"2724\" data-col-size=\"sm\">Item<\/th>\n<th class=\"\" data-start=\"2724\" data-end=\"2739\" data-col-size=\"md\">Descri\u00e7\u00e3o<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2762\" data-end=\"3173\">\n<tr data-start=\"2762\" data-end=\"2807\">\n<td data-start=\"2762\" data-end=\"2775\" data-col-size=\"sm\">Tamanho da pastilha<\/td>\n<td data-start=\"2775\" data-end=\"2807\" data-col-size=\"md\">2\u2033, 4\u2033, 6\u2033, 8\u2033, tamanhos personalizados<\/td>\n<\/tr>\n<tr data-start=\"2808\" data-end=\"2871\">\n<td data-start=\"2808\" data-end=\"2829\" data-col-size=\"sm\">Material do substrato<\/td>\n<td data-start=\"2829\" data-end=\"2871\" data-col-size=\"md\">Sil\u00edcio, quartzo, vidro BF33 (opcional)<\/td>\n<\/tr>\n<tr data-start=\"2872\" data-end=\"2916\">\n<td data-start=\"2872\" data-end=\"2894\" data-col-size=\"sm\">Orienta\u00e7\u00e3o do cristal<\/td>\n<td data-start=\"2894\" data-end=\"2916\" data-col-size=\"md\">, , etc.<\/td>\n<\/tr>\n<tr data-start=\"2917\" data-end=\"2969\">\n<td data-start=\"2917\" data-end=\"2931\" data-col-size=\"sm\">Resistividade<\/td>\n<td data-col-size=\"md\" data-start=\"2931\" data-end=\"2969\">Baixo \/ M\u00e9dio \/ Alto (personaliz\u00e1vel)<\/td>\n<\/tr>\n<tr data-start=\"2970\" data-end=\"3013\">\n<td data-start=\"2970\" data-end=\"2985\" data-col-size=\"sm\">Espessura de Ti<\/td>\n<td data-start=\"2985\" data-end=\"3013\" data-col-size=\"md\">10-50 nm (gama t\u00edpica)<\/td>\n<\/tr>\n<tr data-start=\"3014\" data-end=\"3085\">\n<td data-start=\"3014\" data-end=\"3029\" data-col-size=\"sm\">Espessura do Cu<\/td>\n<td data-start=\"3029\" data-end=\"3085\" data-col-size=\"md\">50 nm - 1 \u00b5m (pulverizado), mais espesso por galvanoplastia<\/td>\n<\/tr>\n<tr data-start=\"3086\" data-end=\"3127\">\n<td data-start=\"3086\" data-end=\"3103\" data-col-size=\"sm\">M\u00e9todo de revestimento<\/td>\n<td data-start=\"3103\" data-end=\"3127\" data-col-size=\"md\">Pulveriza\u00e7\u00e3o cat\u00f3dica por magnetr\u00e3o<\/td>\n<\/tr>\n<tr data-start=\"3128\" data-end=\"3173\">\n<td data-start=\"3128\" data-end=\"3143\" data-col-size=\"sm\">Lado do revestimento<\/td>\n<td data-start=\"3143\" data-end=\"3173\" data-col-size=\"md\">Face simples ou face dupla<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"3175\" data-end=\"3178\" \/>\n<h2 data-section-id=\"1alkwpa\" data-start=\"3180\" data-end=\"3208\"><span role=\"text\"><strong data-start=\"3183\" data-end=\"3208\"><img loading=\"lazy\" decoding=\"async\" class=\"size-medium wp-image-2427 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-2-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-2-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-2-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-2-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-2-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-2-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-2-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ti-Cu-Metal-Coated-Silicon-Wafer-Titanium-Copper-Sputtered-Wafer-for-MEMS-Microelectronics-2.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Processo de fabrico<\/strong><\/span><\/h2>\n<p data-start=\"3210\" data-end=\"3484\">A bolacha revestida com metal Ti\/Cu \u00e9 produzida utilizando a tecnologia de pulveriza\u00e7\u00e3o cat\u00f3dica por magnetr\u00e3o no v\u00e1cuo. Em primeiro lugar, \u00e9 depositada uma camada de tit\u00e2nio sobre a superf\u00edcie de sil\u00edcio limpa para melhorar a ades\u00e3o. De seguida, \u00e9 depositada uma camada de cobre sobre a pel\u00edcula de tit\u00e2nio para formar uma superf\u00edcie condutora uniforme.<\/p>\n<p data-start=\"3486\" data-end=\"3708\">Para aplica\u00e7\u00f5es que exijam pel\u00edculas de cobre mais espessas, a camada de cobre pulverizada pode ser utilizada como camada de semente para galvanoplastia, permitindo um maior crescimento do metal para atingir uma espessura ao n\u00edvel do m\u00edcron, mantendo uma forte ades\u00e3o.<\/p>\n<p data-start=\"3710\" data-end=\"3800\">Este processo combinado garante uma elevada qualidade da pel\u00edcula e uma expans\u00e3o funcional flex\u00edvel.<\/p>\n<hr data-start=\"3802\" data-end=\"3805\" \/>\n<h2 data-section-id=\"k0zlak\" data-start=\"3807\" data-end=\"3826\"><span role=\"text\"><strong data-start=\"3810\" data-end=\"3826\">Aplica\u00e7\u00f5es<\/strong><\/span><\/h2>\n<ul data-start=\"3828\" data-end=\"4242\">\n<li data-section-id=\"ufn29u\" data-start=\"3828\" data-end=\"3877\">Investiga\u00e7\u00e3o e cria\u00e7\u00e3o de prot\u00f3tipos de dispositivos semicondutores<\/li>\n<li data-section-id=\"jnb8n8\" data-start=\"3878\" data-end=\"3921\">Contacto \u00f3hmico e fabrico de el\u00e9ctrodos<\/li>\n<li data-section-id=\"amhiqe\" data-start=\"3922\" data-end=\"3968\">Desenvolvimento da camada de semente da microestrutura MEMS<\/li>\n<li data-section-id=\"kkxae0\" data-start=\"3969\" data-end=\"4028\">Base de galvanoplastia para RDL e estruturas de cobre espessas<\/li>\n<li data-section-id=\"p4inkr\" data-start=\"4029\" data-end=\"4075\">Investiga\u00e7\u00e3o sobre o crescimento de pel\u00edculas finas e nanomateriais<\/li>\n<li data-section-id=\"4azdd2\" data-start=\"4076\" data-end=\"4130\">Ensaios de condutividade de superf\u00edcie e an\u00e1lise de materiais<\/li>\n<li data-section-id=\"1wa4yo4\" data-start=\"4131\" data-end=\"4185\">SEM, AFM e prepara\u00e7\u00e3o de amostras para metrologia de superf\u00edcies<\/li>\n<li data-section-id=\"1s1aa6a\" data-start=\"4186\" data-end=\"4242\">Sensores bio-electroqu\u00edmicos e plataformas de microarray<\/li>\n<\/ul>\n<hr data-start=\"4244\" data-end=\"4247\" \/>\n<h2 data-section-id=\"1m0hhqv\" data-start=\"4249\" data-end=\"4299\"><span role=\"text\"><strong data-start=\"4252\" data-end=\"4299\">Vantagens em compara\u00e7\u00e3o com o revestimento de metal simples<\/strong><\/span><\/h2>\n<p data-start=\"4301\" data-end=\"4378\">Em compara\u00e7\u00e3o com o revestimento direto de cobre sobre sil\u00edcio, a estrutura Ti\/Cu proporciona<\/p>\n<ul data-start=\"4380\" data-end=\"4657\">\n<li data-section-id=\"631e5u\" data-start=\"4380\" data-end=\"4443\">Melhor estabilidade de ader\u00eancia sob tens\u00e3o t\u00e9rmica e qu\u00edmica<\/li>\n<li data-section-id=\"iu92ys\" data-start=\"4444\" data-end=\"4490\">Redu\u00e7\u00e3o do risco de descama\u00e7\u00e3o ou fissura\u00e7\u00e3o do cobre<\/li>\n<li data-section-id=\"aldlo\" data-start=\"4491\" data-end=\"4543\">Melhoria do rendimento do processo nas etapas de microfabrica\u00e7\u00e3o<\/li>\n<li data-section-id=\"tyryal\" data-start=\"4544\" data-end=\"4592\">Desempenho el\u00e9trico mais est\u00e1vel ao longo do tempo<\/li>\n<li data-section-id=\"1qj1cxg\" data-start=\"4593\" data-end=\"4657\">Melhor compatibilidade com processos de semicondutores de v\u00e1rias etapas<\/li>\n<\/ul>\n<p data-start=\"4659\" data-end=\"4761\">Isto torna-o uma solu\u00e7\u00e3o mais fi\u00e1vel para laborat\u00f3rios de investiga\u00e7\u00e3o e ambientes industriais de I&amp;D.<\/p>\n<hr data-start=\"4763\" data-end=\"4766\" \/>\n<h2 data-section-id=\"elc90z\" data-start=\"4768\" data-end=\"4778\"><span role=\"text\"><strong data-start=\"4771\" data-end=\"4778\">FAQ<\/strong><\/span><\/h2>\n<p data-start=\"4780\" data-end=\"4979\"><strong data-start=\"4780\" data-end=\"4830\">Q1: Porque \u00e9 que o tit\u00e2nio \u00e9 utilizado sob um revestimento de cobre?<\/strong><br data-start=\"4830\" data-end=\"4833\" \/>O tit\u00e2nio actua como uma camada de ades\u00e3o que melhora a liga\u00e7\u00e3o entre os substratos de cobre e sil\u00edcio, evitando a delamina\u00e7\u00e3o durante o processamento e a utiliza\u00e7\u00e3o.<\/p>\n<p data-start=\"4981\" data-end=\"5165\"><strong data-start=\"4981\" data-end=\"5023\">Q2: A espessura do cobre pode ser aumentada?<\/strong><br data-start=\"5023\" data-end=\"5026\" \/>Sim. O cobre pulverizado pode ser utilizado como uma camada de semente para galvanoplastia para obter camadas met\u00e1licas mais espessas, dependendo dos requisitos da aplica\u00e7\u00e3o.<\/p>\n<p data-start=\"5167\" data-end=\"5291\"><strong data-start=\"5167\" data-end=\"5213\">Q3: Podem ser revestidos os dois lados da bolacha?<\/strong><br data-start=\"5213\" data-end=\"5216\" \/>Sim. As op\u00e7\u00f5es de revestimento de uma ou duas faces est\u00e3o dispon\u00edveis mediante pedido.<\/p>\n<p data-start=\"5293\" data-end=\"5470\"><strong data-start=\"5293\" data-end=\"5338\">Q4: Que op\u00e7\u00f5es de substrato est\u00e3o dispon\u00edveis?<\/strong><br data-start=\"5338\" data-end=\"5341\" \/>O sil\u00edcio padr\u00e3o \u00e9 o mais comum, mas os substratos de quartzo e vidro tamb\u00e9m est\u00e3o dispon\u00edveis para aplica\u00e7\u00f5es \u00f3pticas ou qu\u00edmicas especiais.<\/p>","protected":false},"excerpt":{"rendered":"<p>A pastilha de sil\u00edcio revestida com metal Ti\/Cu \u00e9 uma pastilha funcional de alta qualidade preparada atrav\u00e9s da deposi\u00e7\u00e3o de uma camada de ades\u00e3o de tit\u00e2nio e de uma camada condutora de cobre num substrato de sil\u00edcio, utilizando a tecnologia de pulveriza\u00e7\u00e3o cat\u00f3dica por magnetr\u00e3o. A camada de tit\u00e2nio melhora a ader\u00eancia e a estabilidade da pel\u00edcula, enquanto a camada de cobre proporciona uma excelente condutividade el\u00e9ctrica. Este produto \u00e9 amplamente utilizado em microeletr\u00f3nica, fabrico de MEMS, investiga\u00e7\u00e3o laboratorial e desenvolvimento de processos de pel\u00edcula fina.<\/p>","protected":false},"featured_media":2428,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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