{"id":2349,"date":"2026-04-22T06:17:36","date_gmt":"2026-04-22T06:17:36","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2349"},"modified":"2026-04-22T07:24:00","modified_gmt":"2026-04-22T07:24:00","slug":"ai200hc-d-high-beam-ion-implantation-system-for-6-8-inch-silicon-wafer-processing-and-smart-cut-applications","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/pt\/product\/ai200hc-d-high-beam-ion-implantation-system-for-6-8-inch-silicon-wafer-processing-and-smart-cut-applications\/","title":{"rendered":"Sistema de implanta\u00e7\u00e3o de i\u00f5es de feixe elevado Ai200HC.D para processamento de bolachas de sil\u00edcio de 6\/8 polegadas e aplica\u00e7\u00f5es de corte inteligente"},"content":{"rendered":"<p data-start=\"155\" data-end=\"421\"><img decoding=\"async\" class=\"wp-image-2350 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-300x300.png\" alt=\"\" width=\"209\" height=\"209\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System.png 1000w\" sizes=\"(max-width: 209px) 100vw, 209px\" \/>O sistema de implanta\u00e7\u00e3o i\u00f3nica Ai200HC.D (High Beam) foi concebido para linhas de produ\u00e7\u00e3o de semicondutores de bolachas de sil\u00edcio de 6 e 8 polegadas. \u00c9 um implantador de i\u00f5es de alta corrente desenvolvido para dopagem de precis\u00e3o e aplica\u00e7\u00f5es de processos avan\u00e7ados no fabrico de circuitos integrados.<\/p>\n<p data-start=\"423\" data-end=\"698\">O sistema suporta uma gama de energia de 5 keV a 180 keV, proporcionando um desempenho est\u00e1vel do feixe e uma elevada repetibilidade do processo. \u00c9 adequado para o fabrico de semicondutores \u00e0 base de sil\u00edcio e processos avan\u00e7ados relacionados com a liga\u00e7\u00e3o de bolachas, incluindo a integra\u00e7\u00e3o da tecnologia Smart Cut.<\/p>\n<hr data-start=\"700\" data-end=\"703\" \/>\n<h2 data-section-id=\"1d7mrtu\" data-start=\"705\" data-end=\"716\">Carater\u00edsticas<\/h2>\n<h3 data-section-id=\"11asise\" data-start=\"718\" data-end=\"753\">Desempenho de estabilidade de feixe alto<\/h3>\n<p data-start=\"754\" data-end=\"897\">O sistema mant\u00e9m uma sa\u00edda est\u00e1vel do feixe de i\u00f5es com flutua\u00e7\u00e3o controlada, garantindo uma qualidade de implanta\u00e7\u00e3o consistente durante a produ\u00e7\u00e3o cont\u00ednua.<\/p>\n<h3 data-section-id=\"38j0c\" data-start=\"899\" data-end=\"929\">Ampla compatibilidade de processos<\/h3>\n<p data-start=\"930\" data-end=\"1057\">Compat\u00edvel com processos baseados em sil\u00edcio e aplica\u00e7\u00f5es relacionadas com o corte inteligente, suportando requisitos avan\u00e7ados de engenharia de bolachas.<\/p>\n<h3 data-section-id=\"2v7p6\" data-start=\"1059\" data-end=\"1093\">Controlo de implantes de alta precis\u00e3o<\/h3>\n<p data-start=\"1094\" data-end=\"1142\">Fornece um desempenho de implanta\u00e7\u00e3o preciso com:<\/p>\n<ul data-start=\"1143\" data-end=\"1231\">\n<li data-section-id=\"1irf1o\" data-start=\"1143\" data-end=\"1166\">Precis\u00e3o angular \u2264 0,2\u00b0<\/li>\n<li data-section-id=\"1hml6xy\" data-start=\"1167\" data-end=\"1192\">Paralelismo do feixe \u2264 0,3\u00b0<\/li>\n<li data-section-id=\"1danezc\" data-start=\"1193\" data-end=\"1210\">Uniformidade \u2264 1%<\/li>\n<li data-section-id=\"mbe4el\" data-start=\"1211\" data-end=\"1231\">Repetibilidade \u2264 1%<\/li>\n<\/ul>\n<h3 data-section-id=\"8aw6q\" data-start=\"1233\" data-end=\"1263\">Elevada capacidade de produ\u00e7\u00e3o<\/h3>\n<p data-start=\"1264\" data-end=\"1369\">Suporta \u2265 220 wafers por hora, adequado para ambientes de produ\u00e7\u00e3o de semicondutores de volume m\u00e9dio a elevado.<\/p>\n<h3 data-section-id=\"1e3kdu8\" data-start=\"1371\" data-end=\"1409\">Capacidade de processamento de destino de lote<\/h3>\n<p data-start=\"1410\" data-end=\"1554\">Suporta o processamento de alvos em lote, melhorando a flexibilidade do processo e permitindo a integra\u00e7\u00e3o com tecnologias avan\u00e7adas de fabrico de bolachas de sil\u00edcio.<\/p>\n<p data-start=\"1410\" data-end=\"1554\"><img fetchpriority=\"high\" decoding=\"async\" class=\"aligncenter wp-image-2371 size-large\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-1024x388.png\" alt=\"\" width=\"1024\" height=\"388\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-1024x388.png 1024w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-300x114.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-768x291.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-18x7.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-600x227.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs.png 1216w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><\/p>\n<hr data-start=\"1556\" data-end=\"1559\" \/>\n<h2 data-section-id=\"rkota4\" data-start=\"1561\" data-end=\"1582\">Especifica\u00e7\u00f5es principais<\/h2>\n<h3 data-section-id=\"rc5knr\" data-start=\"1584\" data-end=\"1606\">Par\u00e2metros do processo<\/h3>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"1608\" data-end=\"1813\">\n<thead data-start=\"1608\" data-end=\"1632\">\n<tr data-start=\"1608\" data-end=\"1632\">\n<th class=\"\" data-start=\"1608\" data-end=\"1615\" data-col-size=\"sm\">Item<\/th>\n<th class=\"\" data-start=\"1615\" data-end=\"1632\" data-col-size=\"sm\">Especifica\u00e7\u00e3o<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"1657\" data-end=\"1813\">\n<tr data-start=\"1657\" data-end=\"1697\">\n<td data-start=\"1657\" data-end=\"1670\" data-col-size=\"sm\">Tamanho da pastilha<\/td>\n<td data-start=\"1670\" data-end=\"1697\" data-col-size=\"sm\">Bolachas de silicone de 6-8 polegadas<\/td>\n<\/tr>\n<tr data-start=\"1698\" data-end=\"1726\">\n<td data-start=\"1698\" data-end=\"1713\" data-col-size=\"sm\">Gama de energia<\/td>\n<td data-start=\"1713\" data-end=\"1726\" data-col-size=\"sm\">5-180 keV<\/td>\n<\/tr>\n<tr data-start=\"1727\" data-end=\"1777\">\n<td data-start=\"1727\" data-end=\"1748\" data-col-size=\"sm\">Elementos Implantados<\/td>\n<td data-start=\"1748\" data-end=\"1777\" data-col-size=\"sm\">B+, BF2+, P+, As+, N+, H+<\/td>\n<\/tr>\n<tr data-start=\"1778\" data-end=\"1813\">\n<td data-start=\"1778\" data-end=\"1791\" data-col-size=\"sm\">Intervalo de dose<\/td>\n<td data-start=\"1791\" data-end=\"1813\" data-col-size=\"sm\">5E11-1E17 i\u00f5es\/cm\u00b2<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h3 data-section-id=\"h0mtjp\" data-start=\"1815\" data-end=\"1835\">Desempenho do feixe<\/h3>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"1837\" data-end=\"1951\">\n<thead data-start=\"1837\" data-end=\"1861\">\n<tr data-start=\"1837\" data-end=\"1861\">\n<th class=\"\" data-start=\"1837\" data-end=\"1844\" data-col-size=\"sm\">Item<\/th>\n<th class=\"\" data-start=\"1844\" data-end=\"1861\" data-col-size=\"sm\">Especifica\u00e7\u00e3o<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"1886\" data-end=\"1951\">\n<tr data-start=\"1886\" data-end=\"1921\">\n<td data-start=\"1886\" data-end=\"1903\" data-col-size=\"sm\">Estabilidade da viga<\/td>\n<td data-start=\"1903\" data-end=\"1921\" data-col-size=\"sm\">\u2264 10% por hora<\/td>\n<\/tr>\n<tr data-start=\"1922\" data-end=\"1951\">\n<td data-start=\"1922\" data-end=\"1941\" data-col-size=\"sm\">Paralelismo de vigas<\/td>\n<td data-start=\"1941\" data-end=\"1951\" data-col-size=\"sm\">\u2264 0.3\u00b0<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h3 data-section-id=\"ieoahx\" data-start=\"1953\" data-end=\"1978\">Precis\u00e3o da implanta\u00e7\u00e3o<\/h3>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"1980\" data-end=\"2191\">\n<thead data-start=\"1980\" data-end=\"2004\">\n<tr data-start=\"1980\" data-end=\"2004\">\n<th class=\"\" data-start=\"1980\" data-end=\"1987\" data-col-size=\"sm\">Item<\/th>\n<th class=\"\" data-start=\"1987\" data-end=\"2004\" data-col-size=\"sm\">Especifica\u00e7\u00e3o<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2029\" data-end=\"2191\">\n<tr data-start=\"2029\" data-end=\"2066\">\n<td data-start=\"2029\" data-end=\"2051\" data-col-size=\"sm\">Gama de \u00e2ngulos do implante<\/td>\n<td data-start=\"2051\" data-end=\"2066\" data-col-size=\"sm\">-11\u00b0 a 11\u00b0<\/td>\n<\/tr>\n<tr data-start=\"2067\" data-end=\"2094\">\n<td data-start=\"2067\" data-end=\"2084\" data-col-size=\"sm\">Precis\u00e3o do \u00e2ngulo<\/td>\n<td data-start=\"2084\" data-end=\"2094\" data-col-size=\"sm\">\u2264 0.2\u00b0<\/td>\n<\/tr>\n<tr data-start=\"2095\" data-end=\"2141\">\n<td data-start=\"2095\" data-end=\"2113\" data-col-size=\"sm\">Uniformidade (1\u03c3)<\/td>\n<td data-start=\"2113\" data-end=\"2141\" data-col-size=\"sm\">\u2264 1% (B+, 2E14, 150 keV)<\/td>\n<\/tr>\n<tr data-start=\"2142\" data-end=\"2191\">\n<td data-start=\"2142\" data-end=\"2163\" data-col-size=\"sm\">Repetibilidade (1\u03c3)<\/td>\n<td data-start=\"2163\" data-end=\"2191\" data-col-size=\"sm\">\u2264 1% (B+, 2E14, 150 keV)<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h3 data-section-id=\"1i84h7f\" data-start=\"2193\" data-end=\"2215\">Desempenho do sistema<\/h3>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2217\" data-end=\"2347\">\n<thead data-start=\"2217\" data-end=\"2241\">\n<tr data-start=\"2217\" data-end=\"2241\">\n<th class=\"\" data-start=\"2217\" data-end=\"2224\" data-col-size=\"sm\">Item<\/th>\n<th class=\"\" data-start=\"2224\" data-end=\"2241\" data-col-size=\"sm\">Especifica\u00e7\u00e3o<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2266\" data-end=\"2347\">\n<tr data-start=\"2266\" data-end=\"2304\">\n<td data-start=\"2266\" data-end=\"2279\" data-col-size=\"sm\">Rendimento<\/td>\n<td data-start=\"2279\" data-end=\"2304\" data-col-size=\"sm\">\u2265 220 bolachas por hora<\/td>\n<\/tr>\n<tr data-start=\"2305\" data-end=\"2347\">\n<td data-start=\"2305\" data-end=\"2322\" data-col-size=\"sm\">Tamanho do equipamento<\/td>\n<td data-start=\"2322\" data-end=\"2347\" data-col-size=\"sm\">5930 \u00d7 3000 \u00d7 2630 mm<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"2349\" data-end=\"2352\" \/>\n<h2 data-section-id=\"1nd7jny\" data-start=\"2354\" data-end=\"2375\">Aplica\u00e7\u00e3o<\/h2>\n<h3 data-section-id=\"kkfbvw\" data-start=\"2377\" data-end=\"2422\">Fabrico de semicondutores \u00e0 base de sil\u00edcio<\/h3>\n<p data-start=\"2423\" data-end=\"2524\">Utilizado no fabrico de dispositivos CMOS e de dispositivos l\u00f3gicos avan\u00e7ados, apoiando processos precisos de implanta\u00e7\u00e3o de dopantes.<\/p>\n<h3 data-section-id=\"167rxyg\" data-start=\"2526\" data-end=\"2559\">Integra\u00e7\u00e3o do processo de corte inteligente<\/h3>\n<p data-start=\"2560\" data-end=\"2659\">Adequado para processos de liga\u00e7\u00e3o de bolachas e transfer\u00eancia de camadas com base nos requisitos da tecnologia Smart Cut.<\/p>\n<h3 data-section-id=\"13cjew6\" data-start=\"2661\" data-end=\"2691\">Engenharia avan\u00e7ada de bolachas<\/h3>\n<p data-start=\"2692\" data-end=\"2791\">Aplicado na modifica\u00e7\u00e3o de bolachas de sil\u00edcio, otimiza\u00e7\u00e3o estrutural e melhoria do desempenho de dispositivos.<\/p>\n<h3 data-section-id=\"4uip35\" data-start=\"2793\" data-end=\"2826\">Produ\u00e7\u00e3o de circuitos integrados<\/h3>\n<p data-start=\"2827\" data-end=\"2934\">Suporta o fabrico de circuitos integrados de volume m\u00e9dio a elevado com um controlo est\u00e1vel do processo e uma elevada capacidade de produ\u00e7\u00e3o.<\/p>\n<hr data-start=\"2936\" data-end=\"2939\" \/>\n<h2 data-section-id=\"1r8frcv\" data-start=\"2941\" data-end=\"2970\">Perguntas mais frequentes<\/h2>\n<h3 data-section-id=\"1og21xu\" data-start=\"2972\" data-end=\"3022\">1. Que tamanhos de bolacha s\u00e3o suportados pelo Ai200HC.D<\/h3>\n<p data-start=\"3023\" data-end=\"3145\">O sistema suporta wafers de sil\u00edcio de 6 e 8 polegadas e \u00e9 adequado para os principais processos de fabrico de semicondutores.<\/p>\n<h3 data-section-id=\"rdwc10\" data-start=\"3147\" data-end=\"3193\">2. Qual \u00e9 a gama de energia deste sistema?<\/h3>\n<p data-start=\"3194\" data-end=\"3324\">A gama de energia \u00e9 de 5 keV a 180 keV, suportando uma vasta gama de aplica\u00e7\u00f5es de implanta\u00e7\u00e3o em dispositivos semicondutores \u00e0 base de sil\u00edcio.<\/p>\n<h3 data-section-id=\"nor4nw\" data-start=\"3326\" data-end=\"3391\">3. Quais s\u00e3o as capacidades especiais de processamento suportadas por este sistema?<\/h3>\n<p data-start=\"3392\" data-end=\"3551\">O sistema \u00e9 compat\u00edvel com processos baseados em sil\u00edcio e com a tecnologia Smart Cut, suportando o processamento de alvos em lote e aplica\u00e7\u00f5es avan\u00e7adas de engenharia de bolachas.<\/p>","protected":false},"excerpt":{"rendered":"<p>O sistema de implanta\u00e7\u00e3o i\u00f3nica Ai200HC.D (High Beam) foi concebido para linhas de produ\u00e7\u00e3o de semicondutores de bolachas de sil\u00edcio de 6 e 8 polegadas. \u00c9 um implantador de i\u00f5es de alta corrente desenvolvido para dopagem de precis\u00e3o e aplica\u00e7\u00f5es de processos avan\u00e7ados no fabrico de circuitos integrados.<\/p>","protected":false},"featured_media":2350,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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