\nPureza ultra-elevada (\u226599,99%)<\/strong>: Minimiza a contamina\u00e7\u00e3o em processos de semicondutores e \u00f3pticos.<\/p>\n<\/li>\n\nEstabilidade t\u00e9rmica excecional<\/strong>: Ponto de amolecimento ~1683\u00b0C, toler\u00e2ncia a curto prazo at\u00e9 1450\u00b0C para processos a alta temperatura.![\"\"](\"https:\/\/www.fuyao-quartz.com\/wp-content\/uploads\/2026\/03\/8inch_quartz_wafer_diameter_200mm_ttv_10_m_ra_1_0_nm_for_high_precision_sensors4-300x300.jpg\")
<\/p>\n<\/li>\n\nExpans\u00e3o t\u00e9rmica ultra-baixa (0,55 \u00d7 10-\u2076\/K)<\/strong>: Assegura a estabilidade dimensional sob tens\u00e3o t\u00e9rmica.<\/p>\n<\/li>\n\nTransmiss\u00e3o \u00f3tica superior<\/strong>: Gama UV-IR 185 nm-2,5 \u00b5m, ideal para fotolitografia, \u00f3tica laser e sensores UV.<\/p>\n<\/li>\n\nElevada qualidade da superf\u00edcie<\/strong>: Ra \u22641,0 nm e TTV \u226410 \u00b5m para uma deposi\u00e7\u00e3o uniforme de pel\u00edcula fina e uma integra\u00e7\u00e3o precisa do sensor.<\/p>\n<\/li>\n\nResist\u00eancia qu\u00edmica<\/strong>: Resistente \u00e0 maioria dos \u00e1cidos (exceto HF) e \u00e1lcalis, adequado para grava\u00e7\u00e3o h\u00famida e ambientes agressivos.<\/p>\n<\/li>\n\nResist\u00eancia \u00e0 radia\u00e7\u00e3o e estabilidade diel\u00e9ctrica<\/strong>: Suporta aplica\u00e7\u00f5es aeroespaciais e de f\u00edsica de alta energia.<\/p>\n<\/li>\n\nFormas e tamanhos personaliz\u00e1veis<\/strong>: Bolachas redondas, quadradas, anulares ou em forma de sector com polimento opcional, revestimentos AR\/IR\/DLC e microfabrica\u00e7\u00e3o.<\/p>\n<\/li>\n<\/ul>\nAplica\u00e7\u00f5es<\/strong><\/h3>\n\n
\n
\n\n\n| Ind\u00fastria<\/th>\n | Aplica\u00e7\u00e3o<\/th>\n | Benef\u00edcio<\/th>\n<\/tr>\n<\/thead>\n |
\n\n| Semicondutores<\/td>\n | Substratos de fotom\u00e1scaras, suportes de grava\u00e7\u00e3o, almofadas de polimento CMP<\/td>\n | Estabilidade a altas temperaturas, defeitos ultra-baixos, garante a precis\u00e3o do fabrico de chips<\/td>\n<\/tr>\n |
\n| Fotovoltaica<\/td>\n | Bolachas de processo PECVD, substratos de deposi\u00e7\u00e3o de pel\u00edcula fina<\/td>\n | Resist\u00eancia ao choque t\u00e9rmico, melhora a efici\u00eancia das c\u00e9lulas solares<\/td>\n<\/tr>\n |
\n| Optoelectr\u00f3nica<\/td>\n | Substratos LED\/LD, janelas laser, sensores \u00f3pticos<\/td>\n | Elevada transmiss\u00e3o UV-IR, baixa autofluoresc\u00eancia, melhora o desempenho do dispositivo<\/td>\n<\/tr>\n |
\n| \u00d3tica de precis\u00e3o<\/td>\n | Substratos de lentes, prismas, divisores de feixe, janelas IR<\/td>\n | Baixa expans\u00e3o t\u00e9rmica, elevada homogeneidade, garante estabilidade \u00f3tica<\/td>\n<\/tr>\n |
\n| Investiga\u00e7\u00e3o e laborat\u00f3rio<\/td>\n | Radia\u00e7\u00e3o sincrotr\u00f3nica, experi\u00eancias VUV, detectores de alta energia<\/td>\n | Resistente \u00e0 radia\u00e7\u00e3o, resiste a condi\u00e7\u00f5es extremas<\/td>\n<\/tr>\n |
\n| Aeroespacial<\/td>\n | Janelas \u00f3pticas de sat\u00e9lite, pain\u00e9is de observa\u00e7\u00e3o de alta temperatura<\/td>\n | Resist\u00eancia a choques t\u00e9rmicos, fiabilidade de n\u00edvel espacial<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\nEspecifica\u00e7\u00f5es t\u00e9cnicas<\/strong><\/h3>\n\n \n \n\n\n| Par\u00e2metro<\/th>\n | Especifica\u00e7\u00e3o<\/th>\n<\/tr>\n<\/thead>\n | \n\n| Material<\/td>\n | Quartzo sint\u00e9tico fundido (SiO\u2082 \u226599,99%)<\/td>\n<\/tr>\n | \n| Di\u00e2metro<\/td>\n | 200 mm (8 polegadas)<\/td>\n<\/tr>\n | \n| Gama de espessuras<\/td>\n | 100 \u00b5m - 3000 \u00b5m (personaliz\u00e1vel)<\/td>\n<\/tr>\n | \n| Varia\u00e7\u00e3o da espessura total (TTV)<\/td>\n | \u226410 \u00b5m<\/td>\n<\/tr>\n | \n| Rugosidade da superf\u00edcie (Ra)<\/td>\n | \u22641,0 nm<\/td>\n<\/tr>\n | \n| Teor total de impurezas<\/td>\n | \u22642,0 \u00b5g\/g<\/td>\n<\/tr>\n | \n| Coeficiente de expans\u00e3o t\u00e9rmica<\/td>\n | 0,55 \u00d7 10-\u2076\/K (20-300\u00b0C)<\/td>\n<\/tr>\n | \n| Resist\u00eancia \u00e0 temperatura<\/td>\n | Ponto de amolecimento 1683\u00b0C, curto prazo at\u00e9 1450\u00b0C<\/td>\n<\/tr>\n | \n| Transmit\u00e2ncia UV<\/td>\n | >90% (200-260 nm)<\/td>\n<\/tr>\n | \n| Nivelamento da superf\u00edcie<\/td>\n | Alta precis\u00e3o, TTV \u226410 \u00b5m<\/td>\n<\/tr>\n | \n| Op\u00e7\u00f5es de forma<\/td>\n | Redondo (padr\u00e3o), formas personalizadas dispon\u00edveis<\/td>\n<\/tr>\n | \n| Certifica\u00e7\u00f5es<\/td>\n | RoHS, ISO9001<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n![\"\"](\"https:\/\/www.fuyao-quartz.com\/wp-content\/uploads\/2026\/03\/8inch_quartz_wafer_diameter_200mm_ttv_10_m_ra_1_0_nm_for_high_precision_sensors3-300x300.jpg\") FAQ<\/strong><\/h3>\n\n- \n
P: Qual \u00e9 a espessura padr\u00e3o de uma pastilha de quartzo de 8 polegadas?<\/strong>
A:<\/strong> A espessura padr\u00e3o \u00e9 de 0,5-1,0 mm, com op\u00e7\u00f5es personalizadas at\u00e9 10 mm para aplica\u00e7\u00f5es especializadas de semicondutores e \u00f3pticas.<\/p>\n<\/li>\n- \n
P: Porqu\u00ea escolher bolachas de quartzo fundido em vez de bolachas de sil\u00edcio?<\/strong>
A:<\/strong> As bolachas de quartzo fundido proporcionam uma transpar\u00eancia UV superior, uma maior estabilidade t\u00e9rmica (at\u00e9 1730\u00b0C), resist\u00eancia qu\u00edmica e estabilidade dimensional, tornando-as ideais para litografia de alta precis\u00e3o e processos exigentes.<\/p>\n<\/li>\n- \n
P: A FUYAO pode fornecer formas de bolacha e tratamentos de superf\u00edcie personalizados?<\/strong>
A:<\/strong> Sim. As op\u00e7\u00f5es incluem bolachas redondas, quadradas, anulares e sectoriais, com tratamentos de superf\u00edcie como polimento \u00f3tico, revestimentos AR\/IR\/DLC, perfura\u00e7\u00e3o e ranhuras.<\/p>\n<\/li>\n<\/ol>","protected":false},"excerpt":{"rendered":"A pastilha de quartzo fundido de 8 polegadas \u00e9 um substrato de quartzo sint\u00e9tico de alta pureza premium (SiO\u2082 \u226599,99%) projetado para aplica\u00e7\u00f5es de alta precis\u00e3o em sistemas de semicondutores, MEMS, \u00f3pticos e laser. A sua expans\u00e3o t\u00e9rmica ultra baixa, a excecional transmit\u00e2ncia UV-IR e a excelente resist\u00eancia qu\u00edmica tornam-no ideal para ambientes exigentes como a fotolitografia, a grava\u00e7\u00e3o, a deposi\u00e7\u00e3o de pel\u00edcula fina e o fabrico de sensores de alta precis\u00e3o.<\/p>","protected":false},"featured_media":2265,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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![\"\"](\"https:\/\/www.fuyao-quartz.com\/wp-content\/uploads\/2026\/03\/8inch_quartz_wafer_diameter_200mm_ttv_10_m_ra_1_0_nm_for_high_precision_sensors2-300x300.jpg\")
A pastilha de quartzo fundido de 8 polegadas \u00e9 um substrato de quartzo sint\u00e9tico de alta pureza premium (SiO\u2082 \u226599,99%) projetado para aplica\u00e7\u00f5es de alta precis\u00e3o em sistemas de semicondutores, MEMS, \u00f3pticos e laser. A sua expans\u00e3o t\u00e9rmica ultra baixa, a excecional transmit\u00e2ncia UV-IR e a excelente resist\u00eancia qu\u00edmica tornam-no ideal para ambientes exigentes como a fotolitografia, a grava\u00e7\u00e3o, a deposi\u00e7\u00e3o de pel\u00edcula fina e o fabrico de sensores de alta precis\u00e3o.<\/p>\n