{"id":2349,"date":"2026-04-22T06:17:36","date_gmt":"2026-04-22T06:17:36","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2349"},"modified":"2026-04-22T07:24:00","modified_gmt":"2026-04-22T07:24:00","slug":"ai200hc-d-high-beam-ion-implantation-system-for-6-8-inch-silicon-wafer-processing-and-smart-cut-applications","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/nl\/product\/ai200hc-d-high-beam-ion-implantation-system-for-6-8-inch-silicon-wafer-processing-and-smart-cut-applications\/","title":{"rendered":"Ai200HC.D ionenimplantatiesysteem met hoge bundel voor 6\/8 inch siliciumwaferverwerking en Smart Cut-toepassingen"},"content":{"rendered":"<p data-start=\"155\" data-end=\"421\"><img decoding=\"async\" class=\"wp-image-2350 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-300x300.png\" alt=\"\" width=\"209\" height=\"209\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System.png 1000w\" sizes=\"(max-width: 209px) 100vw, 209px\" \/>Het Ai200HC.D (High Beam) ionenimplantatiesysteem is ontworpen voor productielijnen voor halfgeleiders van 6 inch en 8 inch siliciumwafers. Het is een ionenimplantator met hoge stroomsterkte, ontwikkeld voor precisiedoping en geavanceerde procestoepassingen bij de productie van ge\u00efntegreerde schakelingen.<\/p>\n<p data-start=\"423\" data-end=\"698\">Het systeem ondersteunt een energiebereik van 5 keV tot 180 keV en levert stabiele bundelprestaties en een hoge procesherhaalbaarheid. Het is geschikt voor halfgeleiderfabricage op basis van silicium en geavanceerde processen die verband houden met wafer bonding, waaronder integratie van Smart Cut-technologie.<\/p>\n<hr data-start=\"700\" data-end=\"703\" \/>\n<h2 data-section-id=\"1d7mrtu\" data-start=\"705\" data-end=\"716\">Kenmerken<\/h2>\n<h3 data-section-id=\"11asise\" data-start=\"718\" data-end=\"753\">Stabiliteit van grootlicht<\/h3>\n<p data-start=\"754\" data-end=\"897\">Het systeem handhaaft een stabiele uitvoer van de ionenbundel met gecontroleerde fluctuatie, waardoor een consistente kwaliteit van de implantatie wordt gegarandeerd tijdens de continue productie.<\/p>\n<h3 data-section-id=\"38j0c\" data-start=\"899\" data-end=\"929\">Brede procescompatibiliteit<\/h3>\n<p data-start=\"930\" data-end=\"1057\">Compatibel met siliciumgebaseerde processen en Smart Cut-gerelateerde toepassingen, met ondersteuning voor geavanceerde wafer-engineering.<\/p>\n<h3 data-section-id=\"2v7p6\" data-start=\"1059\" data-end=\"1093\">Zeer nauwkeurige implantaatcontrole<\/h3>\n<p data-start=\"1094\" data-end=\"1142\">Biedt nauwkeurige implantatieprestaties met:<\/p>\n<ul data-start=\"1143\" data-end=\"1231\">\n<li data-section-id=\"1irf1o\" data-start=\"1143\" data-end=\"1166\">Hoeknauwkeurigheid \u2264 0,2\u00b0<\/li>\n<li data-section-id=\"1hml6xy\" data-start=\"1167\" data-end=\"1192\">Parallelliteit bundel \u2264 0,3\u00b0<\/li>\n<li data-section-id=\"1danezc\" data-start=\"1193\" data-end=\"1210\">Uniformiteit \u2264 1%<\/li>\n<li data-section-id=\"mbe4el\" data-start=\"1211\" data-end=\"1231\">Herhaalbaarheid \u2264 1%<\/li>\n<\/ul>\n<h3 data-section-id=\"8aw6q\" data-start=\"1233\" data-end=\"1263\">Hoge doorvoercapaciteit<\/h3>\n<p data-start=\"1264\" data-end=\"1369\">Ondersteunt \u2265 220 wafers per uur, geschikt voor middelgrote tot grote productieomgevingen voor halfgeleiders.<\/p>\n<h3 data-section-id=\"1e3kdu8\" data-start=\"1371\" data-end=\"1409\">Batch Doel Verwerking<\/h3>\n<p data-start=\"1410\" data-end=\"1554\">Ondersteunt verwerking van batchtargets, wat de procesflexibiliteit verbetert en integratie met geavanceerde productietechnologie\u00ebn voor siliciumwafers mogelijk maakt.<\/p>\n<p data-start=\"1410\" data-end=\"1554\"><img fetchpriority=\"high\" decoding=\"async\" class=\"aligncenter wp-image-2371 size-large\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-1024x388.png\" alt=\"\" width=\"1024\" height=\"388\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-1024x388.png 1024w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-300x114.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-768x291.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-18x7.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-600x227.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs.png 1216w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><\/p>\n<hr data-start=\"1556\" data-end=\"1559\" \/>\n<h2 data-section-id=\"rkota4\" data-start=\"1561\" data-end=\"1582\">Belangrijkste specificaties<\/h2>\n<h3 data-section-id=\"rc5knr\" data-start=\"1584\" data-end=\"1606\">Procesparameters<\/h3>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"1608\" data-end=\"1813\">\n<thead data-start=\"1608\" data-end=\"1632\">\n<tr data-start=\"1608\" data-end=\"1632\">\n<th class=\"\" data-start=\"1608\" data-end=\"1615\" data-col-size=\"sm\">Item<\/th>\n<th class=\"\" data-start=\"1615\" data-end=\"1632\" data-col-size=\"sm\">Specificatie<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"1657\" data-end=\"1813\">\n<tr data-start=\"1657\" data-end=\"1697\">\n<td data-start=\"1657\" data-end=\"1670\" data-col-size=\"sm\">Wafergrootte<\/td>\n<td data-start=\"1670\" data-end=\"1697\" data-col-size=\"sm\">6-8 inch silicium wafers<\/td>\n<\/tr>\n<tr data-start=\"1698\" data-end=\"1726\">\n<td data-start=\"1698\" data-end=\"1713\" data-col-size=\"sm\">Energie Bereik<\/td>\n<td data-start=\"1713\" data-end=\"1726\" data-col-size=\"sm\">5-180 keV<\/td>\n<\/tr>\n<tr data-start=\"1727\" data-end=\"1777\">\n<td data-start=\"1727\" data-end=\"1748\" data-col-size=\"sm\">Ge\u00efmplanteerde elementen<\/td>\n<td data-start=\"1748\" data-end=\"1777\" data-col-size=\"sm\">B+, BF2+, P+, As+, N+, H+<\/td>\n<\/tr>\n<tr data-start=\"1778\" data-end=\"1813\">\n<td data-start=\"1778\" data-end=\"1791\" data-col-size=\"sm\">Dosisbereik<\/td>\n<td data-start=\"1791\" data-end=\"1813\" data-col-size=\"sm\">5E11-1E17 ionen\/cm\u00b2<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h3 data-section-id=\"h0mtjp\" data-start=\"1815\" data-end=\"1835\">Straalprestaties<\/h3>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"1837\" data-end=\"1951\">\n<thead data-start=\"1837\" data-end=\"1861\">\n<tr data-start=\"1837\" data-end=\"1861\">\n<th class=\"\" data-start=\"1837\" data-end=\"1844\" data-col-size=\"sm\">Item<\/th>\n<th class=\"\" data-start=\"1844\" data-end=\"1861\" data-col-size=\"sm\">Specificatie<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"1886\" data-end=\"1951\">\n<tr data-start=\"1886\" data-end=\"1921\">\n<td data-start=\"1886\" data-end=\"1903\" data-col-size=\"sm\">Stabiliteit van de balk<\/td>\n<td data-start=\"1903\" data-end=\"1921\" data-col-size=\"sm\">\u2264 10% per uur<\/td>\n<\/tr>\n<tr data-start=\"1922\" data-end=\"1951\">\n<td data-start=\"1922\" data-end=\"1941\" data-col-size=\"sm\">Parallelliteit van de straal<\/td>\n<td data-start=\"1941\" data-end=\"1951\" data-col-size=\"sm\">\u2264 0.3\u00b0<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h3 data-section-id=\"ieoahx\" data-start=\"1953\" data-end=\"1978\">Nauwkeurigheid van implantatie<\/h3>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"1980\" data-end=\"2191\">\n<thead data-start=\"1980\" data-end=\"2004\">\n<tr data-start=\"1980\" data-end=\"2004\">\n<th class=\"\" data-start=\"1980\" data-end=\"1987\" data-col-size=\"sm\">Item<\/th>\n<th class=\"\" data-start=\"1987\" data-end=\"2004\" data-col-size=\"sm\">Specificatie<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2029\" data-end=\"2191\">\n<tr data-start=\"2029\" data-end=\"2066\">\n<td data-start=\"2029\" data-end=\"2051\" data-col-size=\"sm\">Implantaat hoekbereik<\/td>\n<td data-start=\"2051\" data-end=\"2066\" data-col-size=\"sm\">-11\u00b0 tot 11\u00b0<\/td>\n<\/tr>\n<tr data-start=\"2067\" data-end=\"2094\">\n<td data-start=\"2067\" data-end=\"2084\" data-col-size=\"sm\">Hoeknauwkeurigheid<\/td>\n<td data-start=\"2084\" data-end=\"2094\" data-col-size=\"sm\">\u2264 0.2\u00b0<\/td>\n<\/tr>\n<tr data-start=\"2095\" data-end=\"2141\">\n<td data-start=\"2095\" data-end=\"2113\" data-col-size=\"sm\">Uniformiteit (1\u03c3)<\/td>\n<td data-start=\"2113\" data-end=\"2141\" data-col-size=\"sm\">\u2264 1% (B+, 2E14, 150 keV)<\/td>\n<\/tr>\n<tr data-start=\"2142\" data-end=\"2191\">\n<td data-start=\"2142\" data-end=\"2163\" data-col-size=\"sm\">Herhaalbaarheid (1\u03c3)<\/td>\n<td data-start=\"2163\" data-end=\"2191\" data-col-size=\"sm\">\u2264 1% (B+, 2E14, 150 keV)<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h3 data-section-id=\"1i84h7f\" data-start=\"2193\" data-end=\"2215\">Systeemprestaties<\/h3>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2217\" data-end=\"2347\">\n<thead data-start=\"2217\" data-end=\"2241\">\n<tr data-start=\"2217\" data-end=\"2241\">\n<th class=\"\" data-start=\"2217\" data-end=\"2224\" data-col-size=\"sm\">Item<\/th>\n<th class=\"\" data-start=\"2224\" data-end=\"2241\" data-col-size=\"sm\">Specificatie<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2266\" data-end=\"2347\">\n<tr data-start=\"2266\" data-end=\"2304\">\n<td data-start=\"2266\" data-end=\"2279\" data-col-size=\"sm\">Doorvoer<\/td>\n<td data-start=\"2279\" data-end=\"2304\" data-col-size=\"sm\">\u2265 220 wafels per uur<\/td>\n<\/tr>\n<tr data-start=\"2305\" data-end=\"2347\">\n<td data-start=\"2305\" data-end=\"2322\" data-col-size=\"sm\">Uitrustingsgrootte<\/td>\n<td data-start=\"2322\" data-end=\"2347\" data-col-size=\"sm\">5930 \u00d7 3000 \u00d7 2630 mm<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"2349\" data-end=\"2352\" \/>\n<h2 data-section-id=\"1nd7jny\" data-start=\"2354\" data-end=\"2375\">Toepassing<\/h2>\n<h3 data-section-id=\"kkfbvw\" data-start=\"2377\" data-end=\"2422\">Halfgeleiderfabricage op basis van silicium<\/h3>\n<p data-start=\"2423\" data-end=\"2524\">Gebruikt bij de productie van CMOS en geavanceerde logische apparaten, ter ondersteuning van nauwkeurige doteringsimplantatieprocessen.<\/p>\n<h3 data-section-id=\"167rxyg\" data-start=\"2526\" data-end=\"2559\">Integratie van Smart Cut-proces<\/h3>\n<p data-start=\"2560\" data-end=\"2659\">Geschikt voor wafer bonding en laagovergangsprocessen gebaseerd op de vereisten van Smart Cut technologie.<\/p>\n<h3 data-section-id=\"13cjew6\" data-start=\"2661\" data-end=\"2691\">Geavanceerde wafer-engineering<\/h3>\n<p data-start=\"2692\" data-end=\"2791\">Toegepast bij wijziging van siliciumwafers, structurele optimalisatie en verbetering van apparaatprestaties.<\/p>\n<h3 data-section-id=\"4uip35\" data-start=\"2793\" data-end=\"2826\">Productie ge\u00efntegreerd circuit<\/h3>\n<p data-start=\"2827\" data-end=\"2934\">Ondersteunt de productie van middelgrote tot grote volumes IC's met stabiele procesbesturing en een hoge verwerkingscapaciteit.<\/p>\n<hr data-start=\"2936\" data-end=\"2939\" \/>\n<h2 data-section-id=\"1r8frcv\" data-start=\"2941\" data-end=\"2970\">Veelgestelde vragen<\/h2>\n<h3 data-section-id=\"1og21xu\" data-start=\"2972\" data-end=\"3022\">1. Welke wafermaten ondersteunt de Ai200HC.D?<\/h3>\n<p data-start=\"3023\" data-end=\"3145\">Het systeem ondersteunt 6-inch en 8-inch siliciumwafers en is geschikt voor mainstream halfgeleiderproductieprocessen.<\/p>\n<h3 data-section-id=\"rdwc10\" data-start=\"3147\" data-end=\"3193\">2. Wat is het energiebereik van dit systeem?<\/h3>\n<p data-start=\"3194\" data-end=\"3324\">Het energiebereik is 5 keV tot 180 keV, wat een breed scala aan implantatietoepassingen in halfgeleiderelementen op basis van silicium ondersteunt.<\/p>\n<h3 data-section-id=\"nor4nw\" data-start=\"3326\" data-end=\"3391\">3. Welke speciale procesmogelijkheden ondersteunt dit systeem?<\/h3>\n<p data-start=\"3392\" data-end=\"3551\">Het systeem is compatibel met siliciumgebaseerde processen en Smart Cut technologie en ondersteunt batch target verwerking en geavanceerde wafer engineering toepassingen.<\/p>","protected":false},"excerpt":{"rendered":"<p>Het Ai200HC.D (High Beam) ionenimplantatiesysteem is ontworpen voor productielijnen voor halfgeleiders van 6 inch en 8 inch siliciumwafers. Het is een ionenimplantator met hoge stroomsterkte, ontwikkeld voor precisiedoping en geavanceerde procestoepassingen bij de productie van ge\u00efntegreerde schakelingen.<\/p>","protected":false},"featured_media":2350,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}}},"product_brand":[],"product_cat":[1177],"product_tag":[],"class_list":{"0":"post-2349","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-ion-implantation-equipment","7":"desktop-align-left","8":"tablet-align-left","9":"mobile-align-left","10":"ast-product-gallery-layout-horizontal-slider","11":"ast-product-gallery-with-no-image","12":"ast-product-tabs-layout-horizontal","14":"first","15":"instock","16":"shipping-taxable","17":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/www.zmsh-semitech.com\/nl\/wp-json\/wp\/v2\/product\/2349","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.zmsh-semitech.com\/nl\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.zmsh-semitech.com\/nl\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/nl\/wp-json\/wp\/v2\/comments?post=2349"}],"version-history":[{"count":4,"href":"https:\/\/www.zmsh-semitech.com\/nl\/wp-json\/wp\/v2\/product\/2349\/revisions"}],"predecessor-version":[{"id":2373,"href":"https:\/\/www.zmsh-semitech.com\/nl\/wp-json\/wp\/v2\/product\/2349\/revisions\/2373"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/nl\/wp-json\/wp\/v2\/media\/2350"}],"wp:attachment":[{"href":"https:\/\/www.zmsh-semitech.com\/nl\/wp-json\/wp\/v2\/media?parent=2349"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/nl\/wp-json\/wp\/v2\/product_brand?post=2349"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/nl\/wp-json\/wp\/v2\/product_cat?post=2349"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/nl\/wp-json\/wp\/v2\/product_tag?post=2349"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}