{"id":2623,"date":"2026-07-21T07:00:03","date_gmt":"2026-07-21T07:00:03","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?p=2623"},"modified":"2026-07-21T07:01:31","modified_gmt":"2026-07-21T07:01:31","slug":"how-to-choose-a-wafer-dicing-saw-for-8-inch-and-12-inch-wafers","status":"publish","type":"post","link":"https:\/\/www.zmsh-semitech.com\/it\/how-to-choose-a-wafer-dicing-saw-for-8-inch-and-12-inch-wafers\/","title":{"rendered":"How to Choose a Wafer Dicing Saw for 8-Inch and 12-Inch Wafers"},"content":{"rendered":"<p>Choosing a<a href=\"https:\/\/www.zmsh-semitech.com\/it\/categoria-prodotto\/wire-saw-machine\/\"> <mark style=\"background-color:rgba(0, 0, 0, 0);color:#fcb900\" class=\"has-inline-color\">wafer dicing saw<\/mark><\/a> for 8-inch and 12-inch wafers requires more than confirming the maximum supported wafer diameter.<\/p>\n\n\n\n<p>An 8-inch wafer is generally referred to as a 200 mm wafer, while a 12-inch wafer is commonly specified as a 300 mm wafer. Although both can be processed by precision blade dicing equipment, they have different requirements for machine travel, frame handling, spindle configuration, automation, cleaning and production throughput.<\/p>\n\n\n\n<p>The correct machine should match the wafer material, thickness, dicing street, edge-quality requirement and production volume. Selecting equipment only according to wafer size may lead to insufficient accuracy, low throughput, excessive chipping or unnecessary investment.<\/p>\n\n\n\n<p>This guide explains the main factors buyers should evaluate when selecting a wafer dicing saw for 200 mm and 300 mm wafers.<\/p>\n\n\n\n<figure class=\"wp-block-image size-large\"><img fetchpriority=\"high\" decoding=\"async\" width=\"1024\" height=\"768\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/07\/How-to-Choose-a-Wafer-Dicing-Saw-for-8-Inch-and-12-Inch-Wafers-1024x768.png\" alt=\"\" class=\"wp-image-2624\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/07\/How-to-Choose-a-Wafer-Dicing-Saw-for-8-Inch-and-12-Inch-Wafers-1024x768.png 1024w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/07\/How-to-Choose-a-Wafer-Dicing-Saw-for-8-Inch-and-12-Inch-Wafers-300x225.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/07\/How-to-Choose-a-Wafer-Dicing-Saw-for-8-Inch-and-12-Inch-Wafers-768x576.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/07\/How-to-Choose-a-Wafer-Dicing-Saw-for-8-Inch-and-12-Inch-Wafers-16x12.png 16w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/07\/How-to-Choose-a-Wafer-Dicing-Saw-for-8-Inch-and-12-Inch-Wafers-600x450.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/07\/How-to-Choose-a-Wafer-Dicing-Saw-for-8-Inch-and-12-Inch-Wafers.png 1448w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><\/figure>\n\n\n\n<h2 class=\"wp-block-heading\">8-Inch vs 12-Inch Wafer Dicing Saw<\/h2>\n\n\n\n<figure class=\"wp-block-table\"><table class=\"has-fixed-layout\"><thead><tr><th>Selection factor<\/th><th>8-inch wafer<\/th><th>12-inch wafer<\/th><\/tr><\/thead><tbody><tr><td>Nominal diameter<\/td><td>200 mm<\/td><td>300 mm<\/td><\/tr><tr><td>Typical processing mode<\/td><td>Semi-automatic or fully automatic<\/td><td>Usually fully automatic for volume production<\/td><\/tr><tr><td>Equipment footprint<\/td><td>Relatively compact<\/td><td>Larger cutting and handling platform<\/td><\/tr><tr><td>Common spindle configuration<\/td><td>Single or dual spindle<\/td><td>Single or dual spindle<\/td><\/tr><tr><td>Handling requirements<\/td><td>Manual frame loading or automatic cassette handling<\/td><td>Automatic frame or cassette handling often preferred<\/td><\/tr><tr><td>Production applications<\/td><td>R&amp;D, MEMS, sensors, power devices, compound semiconductors and packaging<\/td><td>Logic, memory, advanced packaging and high-volume semiconductor production<\/td><\/tr><tr><td>Main purchasing concern<\/td><td>Flexibility and cost efficiency<\/td><td>Throughput, handling stability and automation<\/td><\/tr><tr><td>Capital investment<\/td><td>Generally lower<\/td><td>Generally higher<\/td><\/tr><\/tbody><\/table><\/figure>\n\n\n\n<p>A 12-inch system normally requires a larger chuck table, longer motion travel and more robust handling equipment. However, wafer size should not be the only reason to select a larger or more expensive machine.<\/p>\n\n\n\n<p>The buyer should first define the actual processing requirements.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">1. Confirm the Wafer and Dicing Frame Dimensions<\/h2>\n\n\n\n<p>The machine must accommodate the complete mounted workpiece, not only the wafer itself.<\/p>\n\n\n\n<p>Important dimensions include:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Wafer diameter<\/li>\n\n\n\n<li>Wafer thickness<\/li>\n\n\n\n<li>Dicing-frame outer diameter<\/li>\n\n\n\n<li>Tape size<\/li>\n\n\n\n<li>Frame thickness<\/li>\n\n\n\n<li>Wafer mounting position<\/li>\n\n\n\n<li>Edge clearance<\/li>\n\n\n\n<li>Number of substrates mounted on one frame<\/li>\n\n\n\n<li>Maximum wafer bow and warp<\/li>\n<\/ul>\n\n\n\n<p>A 200 mm wafer mounted on a dicing frame requires a cutting table larger than 200 mm. A 300 mm wafer also requires additional space for frame support, alignment and edge cutting.<\/p>\n\n\n\n<p>Before selecting a machine, confirm:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Maximum workpiece diameter<\/li>\n\n\n\n<li>Chuck-table diameter<\/li>\n\n\n\n<li>X-axis cutting range<\/li>\n\n\n\n<li>Y-axis indexing range<\/li>\n\n\n\n<li>Frame-loader compatibility<\/li>\n\n\n\n<li>Maximum substrate thickness<\/li>\n\n\n\n<li>Maximum permitted bow and warp<\/li>\n\n\n\n<li>Clearance between the workpiece and spindle assembly<\/li>\n<\/ul>\n\n\n\n<p>The machine should have enough travel to complete all edge cuts without operating at the extreme limit of the motion platform.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">2. Select the Appropriate Automation Level<\/h2>\n\n\n\n<p>Wafer dicing saws are generally available in manual, semi-automatic and fully automatic configurations.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">Semi-automatic wafer dicing saw<\/h3>\n\n\n\n<p>A semi-automatic machine normally requires the operator to load and unload the wafer frame. Alignment, indexing and cutting are then controlled by the machine.<\/p>\n\n\n\n<p>It is suitable for:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Research laboratories<\/li>\n\n\n\n<li>Process development<\/li>\n\n\n\n<li>Prototype production<\/li>\n\n\n\n<li>Small production batches<\/li>\n\n\n\n<li>Frequent product changes<\/li>\n\n\n\n<li>Multiple wafer materials<\/li>\n\n\n\n<li>Custom substrate cutting<\/li>\n\n\n\n<li>Pilot manufacturing lines<\/li>\n<\/ul>\n\n\n\n<p>The main advantages are:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Lower equipment investment<\/li>\n\n\n\n<li>Smaller footprint<\/li>\n\n\n\n<li>Flexible recipe changes<\/li>\n\n\n\n<li>Easier maintenance<\/li>\n\n\n\n<li>Suitable for different wafer and substrate types<\/li>\n<\/ul>\n\n\n\n<p>A semi-automatic system may be sufficient when daily production volume is limited and operator loading does not create a bottleneck.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">Fully automatic wafer dicing saw<\/h3>\n\n\n\n<p>A fully automatic system may integrate:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Cassette loading<\/li>\n\n\n\n<li>Wafer-frame transfer<\/li>\n\n\n\n<li>Automatic pre-alignment<\/li>\n\n\n\n<li>Pattern recognition<\/li>\n\n\n\n<li>Automatic cutting<\/li>\n\n\n\n<li>Kerf inspection<\/li>\n\n\n\n<li>Wafer cleaning<\/li>\n\n\n\n<li>Spin drying<\/li>\n\n\n\n<li>Automatic unloading<\/li>\n\n\n\n<li>Recipe management<\/li>\n\n\n\n<li>Production-data recording<\/li>\n<\/ul>\n\n\n\n<p>It is more suitable for:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>High-volume semiconductor manufacturing<\/li>\n\n\n\n<li>Continuous production<\/li>\n\n\n\n<li>Strict traceability requirements<\/li>\n\n\n\n<li>Limited manual handling<\/li>\n\n\n\n<li>Stable processing between production shifts<\/li>\n\n\n\n<li>Factory automation integration<\/li>\n<\/ul>\n\n\n\n<p>For 300 mm wafer production, full automation is often preferred because the larger wafer and frame are more difficult to handle manually and have a higher material value.<\/p>\n\n\n\n<p>However, full automation is not always necessary. A semi-automatic 300 mm machine may still be suitable for process development, sampling and low-volume production.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">3. Choose Between Single-Spindle and Dual-Spindle Systems<\/h2>\n\n\n\n<p>The number of spindles affects throughput, process flexibility, machine price and maintenance requirements.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">Single-spindle dicing saw<\/h3>\n\n\n\n<p>A single-spindle system uses one blade to complete the cutting process.<\/p>\n\n\n\n<p>It is commonly used for:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Laboratory applications<\/li>\n\n\n\n<li>Low-volume production<\/li>\n\n\n\n<li>Standard silicon wafer dicing<\/li>\n\n\n\n<li>Thick substrate cutting<\/li>\n\n\n\n<li>Frequent blade changes<\/li>\n\n\n\n<li>Multiple material types<\/li>\n\n\n\n<li>Custom cutting projects<\/li>\n<\/ul>\n\n\n\n<p>Main advantages include:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Lower purchase cost<\/li>\n\n\n\n<li>Simpler machine structure<\/li>\n\n\n\n<li>Easier process setup<\/li>\n\n\n\n<li>Lower maintenance requirements<\/li>\n\n\n\n<li>Greater flexibility for changing applications<\/li>\n<\/ul>\n\n\n\n<p>A single-spindle machine may be the more economical choice when cutting time is not the main production bottleneck.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">Dual-spindle dicing saw<\/h3>\n\n\n\n<p>A dual-spindle system uses two spindles to increase productivity or perform multi-step cutting.<\/p>\n\n\n\n<p>Possible applications include:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Simultaneous cutting<\/li>\n\n\n\n<li>Step cutting<\/li>\n\n\n\n<li>Two-pass cutting<\/li>\n\n\n\n<li>Different blade specifications<\/li>\n\n\n\n<li>Package singulation<\/li>\n\n\n\n<li>High-volume production<\/li>\n\n\n\n<li>Reduced wafer cycle time<\/li>\n<\/ul>\n\n\n\n<p>A dual-spindle system is more suitable when:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>The wafer contains many cutting streets<\/li>\n\n\n\n<li>Production volume is high<\/li>\n\n\n\n<li>Cycle time directly affects manufacturing capacity<\/li>\n\n\n\n<li>Two different blade types are required<\/li>\n\n\n\n<li>Step cutting is part of the process<\/li>\n<\/ul>\n\n\n\n<p>The buyer should compare the cycle-time reduction with the additional cost of the second spindle, control system, blade setup and maintenance.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">4. Match the Spindle to the Wafer Material<\/h2>\n\n\n\n<p>Different wafer materials create different cutting loads.<\/p>\n\n\n\n<p>Common materials include:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Silicio<\/li>\n\n\n\n<li>Carburo di silicio<\/li>\n\n\n\n<li>Zaffiro<\/li>\n\n\n\n<li>Gallium arsenide<\/li>\n\n\n\n<li>Gallium nitride<\/li>\n\n\n\n<li>Glass<\/li>\n\n\n\n<li>Fused silica<\/li>\n\n\n\n<li>Quarzo<\/li>\n\n\n\n<li>Alumina ceramic<\/li>\n\n\n\n<li>Aluminum nitride<\/li>\n\n\n\n<li>LTCC<\/li>\n\n\n\n<li>Molded semiconductor packages<\/li>\n\n\n\n<li>Composite substrates<\/li>\n<\/ul>\n\n\n\n<p>Standard silicon wafers can often be diced using high-speed spindles and thin diamond blades.<\/p>\n\n\n\n<p>Hard or brittle materials may require:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Higher spindle torque<\/li>\n\n\n\n<li>Greater spindle rigidity<\/li>\n\n\n\n<li>Lower cutting speed<\/li>\n\n\n\n<li>Specialized diamond blades<\/li>\n\n\n\n<li>Controlled blade exposure<\/li>\n\n\n\n<li>Improved cooling<\/li>\n\n\n\n<li>Frequent blade dressing<\/li>\n\n\n\n<li>Stable workpiece support<\/li>\n\n\n\n<li>More effective debris removal<\/li>\n<\/ul>\n\n\n\n<p>Important spindle specifications include:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Spindle power<\/li>\n\n\n\n<li>Spindle torque<\/li>\n\n\n\n<li>Rotation-speed range<\/li>\n\n\n\n<li>Radial runout<\/li>\n\n\n\n<li>Blade diameter<\/li>\n\n\n\n<li>Blade flange type<\/li>\n\n\n\n<li>Cooling method<\/li>\n\n\n\n<li>Maximum cutting load<\/li>\n\n\n\n<li>Blade-breakage detection<\/li>\n<\/ul>\n\n\n\n<p>A high-speed spindle is not automatically better than a high-torque spindle.<\/p>\n\n\n\n<p>For thin silicon wafers, high rotational speed may help support a narrow kerf and thin blade. For thick ceramics, glass or hard compound semiconductor materials, spindle torque and rigidity may be more important.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">5. Evaluate Positioning Accuracy and Repeatability<\/h2>\n\n\n\n<p>Machine accuracy should not be judged by a single specification.<\/p>\n\n\n\n<p>Important parameters include:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>X-axis positioning accuracy<\/li>\n\n\n\n<li>Y-axis indexing accuracy<\/li>\n\n\n\n<li>Z-axis height accuracy<\/li>\n\n\n\n<li>Theta-axis rotation accuracy<\/li>\n\n\n\n<li>Axis repeatability<\/li>\n\n\n\n<li>Full-travel cumulative error<\/li>\n\n\n\n<li>Single-pitch error<\/li>\n\n\n\n<li>Thermal drift<\/li>\n\n\n\n<li>Spindle runout<\/li>\n<\/ul>\n\n\n\n<p>For narrow dicing streets, even a small positioning error can damage active die areas, metal structures or seal rings.<\/p>\n\n\n\n<p>The required accuracy depends on:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Dicing-street width<\/li>\n\n\n\n<li>Die dimensions<\/li>\n\n\n\n<li>Blade thickness<\/li>\n\n\n\n<li>Required kerf width<\/li>\n\n\n\n<li>Wafer pattern<\/li>\n\n\n\n<li>Alignment-mark quality<\/li>\n\n\n\n<li>Maximum permitted edge damage<\/li>\n<\/ul>\n\n\n\n<p>The supplier should demonstrate actual cutting results rather than relying only on motion-system specifications.<\/p>\n\n\n\n<p>Recommended acceptance measurements include:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Cut-position deviation<\/li>\n\n\n\n<li>Kerf-width variation<\/li>\n\n\n\n<li>Front-side chipping<\/li>\n\n\n\n<li>Back-side chipping<\/li>\n\n\n\n<li>Cut-depth variation<\/li>\n\n\n\n<li>Corner damage<\/li>\n\n\n\n<li>Blade marks<\/li>\n\n\n\n<li>Burrs<\/li>\n\n\n\n<li>Delamination<\/li>\n\n\n\n<li>Repeatability across multiple wafers<\/li>\n<\/ul>\n\n\n\n<p>A machine with high positioning resolution can still produce poor results if the spindle, blade, coolant or mounting process is unstable.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">6. Define the Dicing Street and Kerf Width<\/h2>\n\n\n\n<p>The dicing street is the space between adjacent dies where the blade performs the cut.<\/p>\n\n\n\n<p>The buyer should provide:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Dicing-street width<\/li>\n\n\n\n<li>Blade thickness<\/li>\n\n\n\n<li>Target kerf width<\/li>\n\n\n\n<li>Maximum cut-position deviation<\/li>\n\n\n\n<li>Distance between the cut and active die area<\/li>\n\n\n\n<li>Seal-ring position<\/li>\n\n\n\n<li>Metal-test structure position<\/li>\n\n\n\n<li>Passivation-layer condition<\/li>\n\n\n\n<li>Maximum permitted chipping<\/li>\n<\/ul>\n\n\n\n<p>The actual kerf is normally wider than the nominal blade thickness.<\/p>\n\n\n\n<p>Kerf width can be affected by:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Blade vibration<\/li>\n\n\n\n<li>Spindle runout<\/li>\n\n\n\n<li>Usura della lama<\/li>\n\n\n\n<li>Feed speed<\/li>\n\n\n\n<li>Cutting depth<\/li>\n\n\n\n<li>Material hardness<\/li>\n\n\n\n<li>Coolant flow<\/li>\n\n\n\n<li>Blade dressing condition<\/li>\n<\/ul>\n\n\n\n<p>For narrow-street wafers, the machine should provide:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>High-resolution vision alignment<\/li>\n\n\n\n<li>Stable indexing accuracy<\/li>\n\n\n\n<li>Automatic theta correction<\/li>\n\n\n\n<li>Kerf inspection<\/li>\n\n\n\n<li>Cut-position compensation<\/li>\n\n\n\n<li>Thin-blade compatibility<\/li>\n<\/ul>\n\n\n\n<p>Actual kerf width should be measured during sample cutting.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">7. Compare Real Production Throughput<\/h2>\n\n\n\n<p>Maximum cutting speed does not represent actual production capacity.<\/p>\n\n\n\n<p>The total wafer cycle time may include:<\/p>\n\n\n\n<ol class=\"wp-block-list\">\n<li>Wafer loading<\/li>\n\n\n\n<li>Frame recognition<\/li>\n\n\n\n<li>Pre-alignment<\/li>\n\n\n\n<li>Pattern recognition<\/li>\n\n\n\n<li>First-direction cutting<\/li>\n\n\n\n<li>Wafer rotation<\/li>\n\n\n\n<li>Second-direction cutting<\/li>\n\n\n\n<li>Kerf inspection<\/li>\n\n\n\n<li>Wafer cleaning<\/li>\n\n\n\n<li>Spin drying<\/li>\n\n\n\n<li>Wafer unloading<\/li>\n<\/ol>\n\n\n\n<p>Actual throughput depends on:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Wafer diameter<\/li>\n\n\n\n<li>Number of dicing streets<\/li>\n\n\n\n<li>Die size<\/li>\n\n\n\n<li>Feed speed<\/li>\n\n\n\n<li>Number of cutting passes<\/li>\n\n\n\n<li>Alignment time<\/li>\n\n\n\n<li>Cleaning time<\/li>\n\n\n\n<li>Blade-change frequency<\/li>\n\n\n\n<li>Recipe-change frequency<\/li>\n\n\n\n<li>Operator handling<\/li>\n\n\n\n<li>Inspection requirements<\/li>\n<\/ul>\n\n\n\n<p>A 12-inch wafer contains a larger processing area than an 8-inch wafer. However, the final cycle time also depends on die dimensions and cut pitch.<\/p>\n\n\n\n<p>When comparing equipment, ask the supplier to provide:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Estimated cycle time per wafer<\/li>\n\n\n\n<li>Wafers per hour<\/li>\n\n\n\n<li>Wafers per shift<\/li>\n\n\n\n<li>Cutting time<\/li>\n\n\n\n<li>Non-cutting time<\/li>\n\n\n\n<li>Cleaning and drying time<\/li>\n\n\n\n<li>Blade-change downtime<\/li>\n\n\n\n<li>Expected equipment utilization<\/li>\n<\/ul>\n\n\n\n<p>Throughput estimates should be based on the buyer\u2019s actual wafer map and dicing pattern.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">8. Check Thin-Wafer and Warped-Wafer Capability<\/h2>\n\n\n\n<p>Thin wafers require careful handling during mounting, cutting, cleaning and unloading.<\/p>\n\n\n\n<p>Potential problems include:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Fessurazione del wafer<\/li>\n\n\n\n<li>Deformazione del nastro<\/li>\n\n\n\n<li>Edge lifting<\/li>\n\n\n\n<li>Vacuum instability<\/li>\n\n\n\n<li>Wafer vibration<\/li>\n\n\n\n<li>Die movement<\/li>\n\n\n\n<li>Backside chipping<\/li>\n\n\n\n<li>Water penetration<\/li>\n\n\n\n<li>Broken dies during unloading<\/li>\n<\/ul>\n\n\n\n<p>The supplier should confirm:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Minimum supported wafer thickness<\/li>\n\n\n\n<li>Maximum permitted wafer bow<\/li>\n\n\n\n<li>Maximum permitted wafer warp<\/li>\n\n\n\n<li>Recommended dicing tape<\/li>\n\n\n\n<li>Frame-stiffness requirement<\/li>\n\n\n\n<li>Chuck-table vacuum zoning<\/li>\n\n\n\n<li>Wafer-breakage detection<\/li>\n\n\n\n<li>Low-pressure cleaning capability<\/li>\n\n\n\n<li>Compatibility with temporary bonding<\/li>\n\n\n\n<li>Compatibility with dicing-before-grinding processes<\/li>\n<\/ul>\n\n\n\n<p>For ultra-thin wafers, the complete process should be tested from wafer loading through final cleaning and unloading.<\/p>\n\n\n\n<p>Cutting quality alone is not enough if the wafer breaks during handling.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">9. Evaluate the Vision and Alignment System<\/h2>\n\n\n\n<p>The alignment system must recognize the actual wafer pattern under production conditions.<\/p>\n\n\n\n<p>Important functions include:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Manual alignment<\/li>\n\n\n\n<li>Automatic dicing-street recognition<\/li>\n\n\n\n<li>Pattern matching<\/li>\n\n\n\n<li>Multiple alignment points<\/li>\n\n\n\n<li>Automatic theta correction<\/li>\n\n\n\n<li>Low-contrast pattern recognition<\/li>\n\n\n\n<li>Backside alignment<\/li>\n\n\n\n<li>Infrared alignment<\/li>\n\n\n\n<li>Wafer-map integration<\/li>\n\n\n\n<li>Kerf inspection<\/li>\n\n\n\n<li>Automatic cut-position correction<\/li>\n<\/ul>\n\n\n\n<p>Patterned semiconductor wafers normally require a more advanced vision system than blank glass, quartz or ceramic substrates.<\/p>\n\n\n\n<p>Before purchasing the machine, provide representative images or sample wafers showing:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Alignment marks<\/li>\n\n\n\n<li>Dicing streets<\/li>\n\n\n\n<li>Reflective metal layers<\/li>\n\n\n\n<li>Protective coatings<\/li>\n\n\n\n<li>Low-contrast patterns<\/li>\n\n\n\n<li>Different wafer orientations<\/li>\n\n\n\n<li>Edge exclusion areas<\/li>\n<\/ul>\n\n\n\n<p>The supplier should verify that the vision system can consistently identify the cutting streets.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">10. Review Wafer Cleaning and Drying<\/h2>\n\n\n\n<p>Blade dicing uses water to cool the blade and remove cutting debris.<\/p>\n\n\n\n<p>After dicing, the wafer may need:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Rinsing<\/li>\n\n\n\n<li>Particle removal<\/li>\n\n\n\n<li>Low-pressure cleaning<\/li>\n\n\n\n<li>Two-fluid cleaning<\/li>\n\n\n\n<li>CO\u2082-added water<\/li>\n\n\n\n<li>Spin rinsing<\/li>\n\n\n\n<li>Spin drying<\/li>\n\n\n\n<li>Corrosion control<\/li>\n\n\n\n<li>Watermark prevention<\/li>\n<\/ul>\n\n\n\n<p>Cleaning requirements depend on the wafer structure.<\/p>\n\n\n\n<p>Special attention may be required for:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>MEMS wafers<\/li>\n\n\n\n<li>Wafers with cavities<\/li>\n\n\n\n<li>Exposed metal layers<\/li>\n\n\n\n<li>Fragile dies<\/li>\n\n\n\n<li>Optical devices<\/li>\n\n\n\n<li>Porous materials<\/li>\n\n\n\n<li>Bonded wafers<\/li>\n\n\n\n<li>Devices sensitive to water pressure<\/li>\n<\/ul>\n\n\n\n<p>The cleaning unit may be integrated into the dicing saw or installed as separate equipment.<\/p>\n\n\n\n<p>An integrated system reduces manual handling. A separate cleaning system may provide greater process flexibility.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">11. Consider Blade and Consumable Availability<\/h2>\n\n\n\n<p>The machine should support blades that are readily available for the intended material and kerf requirement.<\/p>\n\n\n\n<p>Consumables may include:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Diamond dicing blades<\/li>\n\n\n\n<li>Blade flanges<\/li>\n\n\n\n<li>Dicing tape<\/li>\n\n\n\n<li>Wafer frames<\/li>\n\n\n\n<li>Dressing boards<\/li>\n\n\n\n<li>Water filters<\/li>\n\n\n\n<li>Nozzles<\/li>\n\n\n\n<li>Cleaning chemicals<\/li>\n\n\n\n<li>Coolant additives<\/li>\n<\/ul>\n\n\n\n<p>Before purchasing equipment, confirm:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Supported blade diameter<\/li>\n\n\n\n<li>Supported blade thickness<\/li>\n\n\n\n<li>Maximum blade exposure<\/li>\n\n\n\n<li>Blade-flange dimensions<\/li>\n\n\n\n<li>Compatible tape-frame sizes<\/li>\n\n\n\n<li>Blade availability<\/li>\n\n\n\n<li>Consumable lead time<\/li>\n\n\n\n<li>Blade-life monitoring<\/li>\n\n\n\n<li>Automatic blade setup<\/li>\n\n\n\n<li>Blade-breakage detection<\/li>\n<\/ul>\n\n\n\n<p>A machine may have a competitive purchase price but become expensive to operate if the required blades and spare parts are difficult to obtain.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">12. Compare Equipment Footprint and Factory Requirements<\/h2>\n\n\n\n<p>A 300 mm dicing system normally requires more floor space and utility capacity than a 200 mm system.<\/p>\n\n\n\n<p>Factory requirements may include:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Electrical power<\/li>\n\n\n\n<li>Compressed air<\/li>\n\n\n\n<li>Vacuum<\/li>\n\n\n\n<li>Exhaust<\/li>\n\n\n\n<li>Deionized water<\/li>\n\n\n\n<li>Water chiller<\/li>\n\n\n\n<li>Drainage<\/li>\n\n\n\n<li>CO\u2082 supply<\/li>\n\n\n\n<li>Cleanroom space<\/li>\n\n\n\n<li>Temperature control<\/li>\n\n\n\n<li>Vibration control<\/li>\n\n\n\n<li>Network connection<\/li>\n<\/ul>\n\n\n\n<p>The quotation should clearly state which peripheral systems are included.<\/p>\n\n\n\n<p>Possible additional equipment includes:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Water chiller<\/li>\n\n\n\n<li>Filtration system<\/li>\n\n\n\n<li>CO\u2082 injection unit<\/li>\n\n\n\n<li>Tape-mounting machine<\/li>\n\n\n\n<li>Wafer cleaning system<\/li>\n\n\n\n<li>Wafer inspection equipment<\/li>\n\n\n\n<li>Blade-dressing equipment<\/li>\n\n\n\n<li>Frame storage system<\/li>\n<\/ul>\n\n\n\n<p>These items should be included in the total investment calculation.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">13. Calculate the Total Cost of Ownership<\/h2>\n\n\n\n<p>The machine purchase price is only one part of the total cost.<\/p>\n\n\n\n<p>Buyers should calculate:<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">Initial investment<\/h3>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Equipment price<\/li>\n\n\n\n<li>Optional functions<\/li>\n\n\n\n<li>Shipping<\/li>\n\n\n\n<li>Insurance<\/li>\n\n\n\n<li>Import duties<\/li>\n\n\n\n<li>Installation<\/li>\n\n\n\n<li>Calibration<\/li>\n\n\n\n<li>Training<\/li>\n\n\n\n<li>Factory acceptance testing<\/li>\n\n\n\n<li>Site acceptance testing<\/li>\n<\/ul>\n\n\n\n<h3 class=\"wp-block-heading\">Facility cost<\/h3>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Electrical installation<\/li>\n\n\n\n<li>Water system<\/li>\n\n\n\n<li>Chiller<\/li>\n\n\n\n<li>Compressed air<\/li>\n\n\n\n<li>Vacuum<\/li>\n\n\n\n<li>Exhaust<\/li>\n\n\n\n<li>Drainage<\/li>\n\n\n\n<li>Cleanroom modification<\/li>\n<\/ul>\n\n\n\n<h3 class=\"wp-block-heading\">Operating cost<\/h3>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Dicing blades<\/li>\n\n\n\n<li>Dicing tape<\/li>\n\n\n\n<li>Water filters<\/li>\n\n\n\n<li>Cleaning materials<\/li>\n\n\n\n<li>Electricity<\/li>\n\n\n\n<li>Deionized water<\/li>\n\n\n\n<li>Labor<\/li>\n\n\n\n<li>Preventive maintenance<\/li>\n\n\n\n<li>Spare parts<\/li>\n<\/ul>\n\n\n\n<h3 class=\"wp-block-heading\">Process-related cost<\/h3>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Broken wafers<\/li>\n\n\n\n<li>Scheggiatura dei bordi<\/li>\n\n\n\n<li>Blade breakage<\/li>\n\n\n\n<li>Equipment downtime<\/li>\n\n\n\n<li>Recipe-development wafers<\/li>\n\n\n\n<li>Qualification samples<\/li>\n\n\n\n<li>Yield loss<\/li>\n\n\n\n<li>Production delays<\/li>\n<\/ul>\n\n\n\n<p>A lower-priced machine may have a higher total cost if it creates more downtime, consumes more blades or produces unstable dicing quality.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">14. When to Choose an 8-Inch Dicing Saw<\/h2>\n\n\n\n<p>An 8-inch system may be the better choice when:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>The maximum wafer diameter is 200 mm<\/li>\n\n\n\n<li>The factory mainly processes 100\u2013200 mm wafers<\/li>\n\n\n\n<li>Production volume is moderate<\/li>\n\n\n\n<li>Floor space is limited<\/li>\n\n\n\n<li>Frequent process changes are required<\/li>\n\n\n\n<li>Multiple substrate materials are processed<\/li>\n\n\n\n<li>The project is in R&amp;D or pilot production<\/li>\n\n\n\n<li>Lower equipment investment is important<\/li>\n<\/ul>\n\n\n\n<p>A 200 mm system can provide a good balance between capability, flexibility and cost.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">15. When to Choose a 12-Inch Dicing Saw<\/h2>\n\n\n\n<p>A 12-inch system may be necessary when:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>The product uses 300 mm wafers<\/li>\n\n\n\n<li>Future production will move to 300 mm<\/li>\n\n\n\n<li>High-volume manufacturing is planned<\/li>\n\n\n\n<li>Automatic wafer handling is required<\/li>\n\n\n\n<li>Factory integration is required<\/li>\n\n\n\n<li>Manual handling must be minimized<\/li>\n\n\n\n<li>Production traceability is required<\/li>\n\n\n\n<li>Large wafer-frame compatibility is essential<\/li>\n<\/ul>\n\n\n\n<p>A 300 mm system can sometimes process smaller wafers with suitable fixtures and recipes. However, this should be confirmed with the supplier.<\/p>\n\n\n\n<p>Purchasing a 300 mm machine only for possible future demand may not be economical when current production is limited to 200 mm wafers.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">Wafer Dicing Saw RFQ Checklist<\/h2>\n\n\n\n<p>Provide the following information when requesting a machine quotation.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">Wafer information<\/h3>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Wafer material<\/li>\n\n\n\n<li>Wafer diameter<\/li>\n\n\n\n<li>Wafer thickness<\/li>\n\n\n\n<li>Surface condition<\/li>\n\n\n\n<li>Wafer bow and warp<\/li>\n\n\n\n<li>Patterned or unpatterned<\/li>\n\n\n\n<li>Frame dimensions<\/li>\n\n\n\n<li>Dicing-tape type<\/li>\n<\/ul>\n\n\n\n<h3 class=\"wp-block-heading\">Cutting requirements<\/h3>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Die dimensions<\/li>\n\n\n\n<li>Dicing-street width<\/li>\n\n\n\n<li>Blade thickness<\/li>\n\n\n\n<li>Required kerf width<\/li>\n\n\n\n<li>Full cut or half cut<\/li>\n\n\n\n<li>Cut depth<\/li>\n\n\n\n<li>Number of passes<\/li>\n\n\n\n<li>Maximum front-side chipping<\/li>\n\n\n\n<li>Maximum back-side chipping<\/li>\n\n\n\n<li>Cut-position tolerance<\/li>\n<\/ul>\n\n\n\n<h3 class=\"wp-block-heading\">Production requirements<\/h3>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Wafers per hour<\/li>\n\n\n\n<li>Wafers per day<\/li>\n\n\n\n<li>Number of product types<\/li>\n\n\n\n<li>Frequency of recipe changes<\/li>\n\n\n\n<li>Required automation level<\/li>\n\n\n\n<li>Single- or dual-spindle preference<\/li>\n\n\n\n<li>Loading and unloading method<\/li>\n\n\n\n<li>Cleaning and drying requirements<\/li>\n<\/ul>\n\n\n\n<h3 class=\"wp-block-heading\">Quality requirements<\/h3>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Precisione di allineamento<\/li>\n\n\n\n<li>Kerf inspection<\/li>\n\n\n\n<li>Die-strength requirement<\/li>\n\n\n\n<li>Particle requirement<\/li>\n\n\n\n<li>Traceability<\/li>\n\n\n\n<li>Production-data recording<\/li>\n\n\n\n<li>Acceptance-test standard<\/li>\n<\/ul>\n\n\n\n<h2 class=\"wp-block-heading\">Sample Cutting and Machine Acceptance<\/h2>\n\n\n\n<p>Before final machine selection, buyers should request a cutting trial using actual wafers or representative substrates.<\/p>\n\n\n\n<p>The trial should use:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Actual wafer material<\/li>\n\n\n\n<li>Actual wafer thickness<\/li>\n\n\n\n<li>Actual dicing tape<\/li>\n\n\n\n<li>Target blade specification<\/li>\n\n\n\n<li>Required feed speed<\/li>\n\n\n\n<li>Actual dicing-street width<\/li>\n\n\n\n<li>Actual cleaning process<\/li>\n<\/ul>\n\n\n\n<p>Inspect the samples for:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Cut-position accuracy<\/li>\n\n\n\n<li>Kerf width<\/li>\n\n\n\n<li>Front-side chipping<\/li>\n\n\n\n<li>Back-side chipping<\/li>\n\n\n\n<li>Corner damage<\/li>\n\n\n\n<li>Delamination<\/li>\n\n\n\n<li>Burrs<\/li>\n\n\n\n<li>Cracks<\/li>\n\n\n\n<li>Surface contamination<\/li>\n\n\n\n<li>Die strength<\/li>\n<\/ul>\n\n\n\n<p>The purchase agreement should include measurable acceptance criteria.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">Domande frequenti<\/h2>\n\n\n\n<h3 class=\"wp-block-heading\">Can one dicing saw process both 8-inch and 12-inch wafers?<\/h3>\n\n\n\n<p>Some 300 mm systems can process smaller wafers by using appropriate chuck tables, adapters, frames and recipes. Compatibility should be confirmed before purchase.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">Is a 12-inch dicing saw more accurate than an 8-inch saw?<\/h3>\n\n\n\n<p>Not necessarily. Accuracy depends on the machine design, spindle stability, motion control, alignment system and process setup. Wafer capacity alone does not determine accuracy.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">Is a dual-spindle system necessary for 300 mm wafers?<\/h3>\n\n\n\n<p>No. A single-spindle system may be suitable for R&amp;D, sampling and low-volume production. Dual spindles are mainly used to increase throughput or support multi-step cutting.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">What is the most important machine specification?<\/h3>\n\n\n\n<p>There is no single most important specification. Buyers should evaluate positioning accuracy, spindle performance, alignment, chipping, kerf stability, throughput and wafer-handling reliability together.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">Can the same machine dice silicon, SiC, sapphire and glass?<\/h3>\n\n\n\n<p>A machine may support multiple materials, but each material requires different blades, spindle settings, cooling conditions, dressing methods and feed speeds. Sample testing is recommended.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">How should buyers compare dicing-saw quotations?<\/h3>\n\n\n\n<p>Compare the complete installed configuration, including the spindle, vision system, automation, cleaning, peripherals, installation, training, warranty and acceptance testing.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">Should a laboratory purchase a fully automatic system?<\/h3>\n\n\n\n<p>A fully automatic system may be unnecessary when production volume is low and products change frequently. A semi-automatic machine may provide better flexibility and lower total cost.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">What information is needed for an accurate quotation?<\/h3>\n\n\n\n<p>The supplier needs the wafer material, diameter, thickness, frame size, dicing-street width, required kerf, maximum chipping, production volume and automation requirements.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">Conclusione<\/h2>\n\n\n\n<p>Choosing a wafer dicing saw for 8-inch or 12-inch wafers requires a complete evaluation of the process.<\/p>\n\n\n\n<p>An 8-inch machine is often suitable for flexible production, compound semiconductor wafers, MEMS, sensors, R&amp;D and moderate manufacturing volumes. A 12-inch system is generally selected for 300 mm wafer processing, high-volume production and automated factory integration.<\/p>\n\n\n\n<p>The final decision should be based on:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Wafer size and frame dimensions<\/li>\n\n\n\n<li>Material and thickness<\/li>\n\n\n\n<li>Dicing-street width<\/li>\n\n\n\n<li>Required kerf and chipping<\/li>\n\n\n\n<li>Spindle power and torque<\/li>\n\n\n\n<li>Positioning accuracy<\/li>\n\n\n\n<li>Automation level<\/li>\n\n\n\n<li>Cleaning requirements<\/li>\n\n\n\n<li>Production throughput<\/li>\n\n\n\n<li>Total cost of ownership<\/li>\n<\/ul>\n\n\n\n<p>Before requesting a quotation, prepare the wafer drawing, material information, thickness, cutting layout, tolerance requirements and production target. Sample cutting should be completed before the machine configuration is finalized.<\/p>\n\n\n\n<p><\/p>\n\n\n\n<p><\/p>","protected":false},"excerpt":{"rendered":"<p>Choosing a wafer dicing saw for 8-inch and 12-inch wafers requires more than confirming the maximum supported wafer diameter. An 8-inch wafer is generally referred to as a 200 mm wafer, while a 12-inch wafer is commonly specified as a 300 mm wafer. Although both can be processed by precision blade dicing equipment, they have [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":2624,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"","adv-header-id-meta":"","stick-header-meta":"","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"footnotes":""},"categories":[24],"tags":[1678,1679,1316,1676,1680,1681,1682,1683,1677],"class_list":["post-2623","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-industry-news","tag-12-inch-wafer-dicing","tag-200mm-wafer-dicing","tag-300mm-wafer-dicing","tag-8-inch-wafer-dicing","tag-dicing-saw-selection","tag-semiconductor-dicing-equipment","tag-wafer-cutting-machine","tag-wafer-dicing-accuracy","tag-wafer-dicing-saw"],"_links":{"self":[{"href":"https:\/\/www.zmsh-semitech.com\/it\/wp-json\/wp\/v2\/posts\/2623","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.zmsh-semitech.com\/it\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.zmsh-semitech.com\/it\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/it\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/it\/wp-json\/wp\/v2\/comments?post=2623"}],"version-history":[{"count":1,"href":"https:\/\/www.zmsh-semitech.com\/it\/wp-json\/wp\/v2\/posts\/2623\/revisions"}],"predecessor-version":[{"id":2625,"href":"https:\/\/www.zmsh-semitech.com\/it\/wp-json\/wp\/v2\/posts\/2623\/revisions\/2625"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/it\/wp-json\/wp\/v2\/media\/2624"}],"wp:attachment":[{"href":"https:\/\/www.zmsh-semitech.com\/it\/wp-json\/wp\/v2\/media?parent=2623"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/it\/wp-json\/wp\/v2\/categories?post=2623"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/it\/wp-json\/wp\/v2\/tags?post=2623"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}