\n| Taille de l'\u00e9quipement<\/td>\n | 5930 \u00d7 3000 \u00d7 2630 mm<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n
\nApplication<\/h2>\nFabrication de semi-conducteurs \u00e0 base de silicium<\/h3>\nUtilis\u00e9 dans la fabrication de dispositifs CMOS et logiques avanc\u00e9s, pour soutenir les processus pr\u00e9cis d'implantation de dopants.<\/p>\n Int\u00e9gration du processus Smart Cut<\/h3>\nConvient aux processus de collage des wafers et de transfert de couches bas\u00e9s sur les exigences de la technologie Smart Cut.<\/p>\n Ing\u00e9nierie avanc\u00e9e des plaquettes de silicium<\/h3>\nAppliqu\u00e9 \u00e0 la modification des tranches de silicium, \u00e0 l'optimisation structurelle et \u00e0 l'am\u00e9lioration des performances des dispositifs.<\/p>\n Production de circuits int\u00e9gr\u00e9s<\/h3>\nPermet la fabrication de circuits int\u00e9gr\u00e9s en volume moyen \u00e0 \u00e9lev\u00e9 avec un contr\u00f4le stable des processus et une capacit\u00e9 de production \u00e9lev\u00e9e.<\/p>\n
\nQuestions fr\u00e9quemment pos\u00e9es<\/h2>\n1. Quelles sont les tailles de plaquettes prises en charge par l'Ai200HC.D ?<\/h3>\nLe syst\u00e8me prend en charge les plaquettes de silicium de 6 et 8 pouces et convient aux principaux processus de fabrication de semi-conducteurs.<\/p>\n 2. Quelle est la gamme d'\u00e9nergie de ce syst\u00e8me ?<\/h3>\nLa gamme d'\u00e9nergie s'\u00e9tend de 5 keV \u00e0 180 keV, ce qui permet un large \u00e9ventail d'applications d'implantation dans les dispositifs semi-conducteurs \u00e0 base de silicium.<\/p>\n 3. Quelles sont les capacit\u00e9s de traitement sp\u00e9ciales que ce syst\u00e8me prend en charge ?<\/h3>\nLe syst\u00e8me est compatible avec les proc\u00e9d\u00e9s \u00e0 base de silicium et la technologie Smart Cut, ce qui permet de traiter des cibles par lots et de r\u00e9aliser des applications avanc\u00e9es d'ing\u00e9nierie des plaquettes de silicium.<\/p>","protected":false},"excerpt":{"rendered":" Le syst\u00e8me d'implantation ionique Ai200HC.D (High Beam) est con\u00e7u pour les lignes de production de semi-conducteurs sur tranches de silicium de 6 et 8 pouces. Il s'agit d'un implanteur ionique \u00e0 courant \u00e9lev\u00e9 d\u00e9velopp\u00e9 pour le dopage de pr\u00e9cision et les applications de processus avanc\u00e9s dans la fabrication de circuits int\u00e9gr\u00e9s.<\/p>","protected":false},"featured_media":2350,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}}},"product_brand":[],"product_cat":[1177],"product_tag":[],"class_list":{"0":"post-2349","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-ion-implantation-equipment","7":"desktop-align-left","8":"tablet-align-left","9":"mobile-align-left","10":"ast-product-gallery-layout-horizontal-slider","11":"ast-product-gallery-with-no-image","12":"ast-product-tabs-layout-horizontal","14":"first","15":"instock","16":"shipping-taxable","17":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/www.zmsh-semitech.com\/fr\/wp-json\/wp\/v2\/product\/2349","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.zmsh-semitech.com\/fr\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.zmsh-semitech.com\/fr\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/fr\/wp-json\/wp\/v2\/comments?post=2349"}],"version-history":[{"count":4,"href":"https:\/\/www.zmsh-semitech.com\/fr\/wp-json\/wp\/v2\/product\/2349\/revisions"}],"predecessor-version":[{"id":2373,"href":"https:\/\/www.zmsh-semitech.com\/fr\/wp-json\/wp\/v2\/product\/2349\/revisions\/2373"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/fr\/wp-json\/wp\/v2\/media\/2350"}],"wp:attachment":[{"href":"https:\/\/www.zmsh-semitech.com\/fr\/wp-json\/wp\/v2\/media?parent=2349"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/fr\/wp-json\/wp\/v2\/product_brand?post=2349"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/fr\/wp-json\/wp\/v2\/product_cat?post=2349"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/fr\/wp-json\/wp\/v2\/product_tag?post=2349"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}} |
![\"\"](\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-300x300.png\")
Le syst\u00e8me d'implantation ionique Ai200HC.D (High Beam) est con\u00e7u pour les lignes de production de semi-conducteurs sur tranches de silicium de 6 et 8 pouces. Il s'agit d'un implanteur ionique \u00e0 courant \u00e9lev\u00e9 d\u00e9velopp\u00e9 pour le dopage de pr\u00e9cision et les applications de processus avanc\u00e9s dans la fabrication de circuits int\u00e9gr\u00e9s.<\/p>\n![\"\"](\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-1024x388.png\")
<\/p>\n