{"id":2226,"date":"2026-04-15T03:41:10","date_gmt":"2026-04-15T03:41:10","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2226"},"modified":"2026-04-15T04:01:00","modified_gmt":"2026-04-15T04:01:00","slug":"wp-301d-double-side-wafer-grinding-machine-for-6-inch-semiconductor-materials-and-precision-lapping","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/fr\/product\/wp-301d-double-side-wafer-grinding-machine-for-6-inch-semiconductor-materials-and-precision-lapping\/","title":{"rendered":"WP-301D Machine \u00e0 rectifier les plaquettes de silicium sur deux faces pour les mat\u00e9riaux semi-conducteurs de 6 pouces et le rodage de pr\u00e9cision"},"content":{"rendered":"<p data-start=\"284\" data-end=\"683\"><img fetchpriority=\"high\" decoding=\"async\" class=\"alignright wp-image-2229\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WP-301D-Double-Side-Wafer-Grinding-Machine-for-6-Inch-Semiconductor-Materials-and-Precision-Lapping-1-300x300.png\" alt=\"WP-301D Machine \u00e0 rectifier les plaquettes de silicium sur deux faces pour les mat\u00e9riaux semi-conducteurs de 6 pouces et le rodage de pr\u00e9cision\" width=\"283\" height=\"283\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WP-301D-Double-Side-Wafer-Grinding-Machine-for-6-Inch-Semiconductor-Materials-and-Precision-Lapping-1-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WP-301D-Double-Side-Wafer-Grinding-Machine-for-6-Inch-Semiconductor-Materials-and-Precision-Lapping-1-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WP-301D-Double-Side-Wafer-Grinding-Machine-for-6-Inch-Semiconductor-Materials-and-Precision-Lapping-1-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WP-301D-Double-Side-Wafer-Grinding-Machine-for-6-Inch-Semiconductor-Materials-and-Precision-Lapping-1-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WP-301D-Double-Side-Wafer-Grinding-Machine-for-6-Inch-Semiconductor-Materials-and-Precision-Lapping-1-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WP-301D-Double-Side-Wafer-Grinding-Machine-for-6-Inch-Semiconductor-Materials-and-Precision-Lapping-1-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WP-301D-Double-Side-Wafer-Grinding-Machine-for-6-Inch-Semiconductor-Materials-and-Precision-Lapping-1.png 1000w\" sizes=\"(max-width: 283px) 100vw, 283px\" \/>La machine de meulage double face WP-301D est un syst\u00e8me de haute pr\u00e9cision con\u00e7u pour le meulage et le polissage double face simultan\u00e9s des plaquettes de semi-conducteurs et des mat\u00e9riaux fragiles. Gr\u00e2ce \u00e0 un syst\u00e8me avanc\u00e9 de mouvement \u00e0 engrenages plan\u00e9taires, la machine permet un enl\u00e8vement de mati\u00e8re uniforme sur les surfaces sup\u00e9rieures et inf\u00e9rieures de la plaquette, ce qui am\u00e9liore consid\u00e9rablement la plan\u00e9it\u00e9 et le parall\u00e9lisme.<\/p>\n<p data-start=\"685\" data-end=\"996\">Con\u00e7u pour les plaquettes de 150 mm et moins, le WP-301D est largement utilis\u00e9 pour le traitement des mat\u00e9riaux semi-conducteurs compos\u00e9s tels que le CdZnTe (CZT), le HgCdTe (MCT), le GaAs, l'InP et l'InSb. Ces mat\u00e9riaux sont essentiels dans des applications telles que la d\u00e9tection infrarouge, l'opto\u00e9lectronique et les dispositifs \u00e0 haute fr\u00e9quence.<\/p>\n<p data-start=\"998\" data-end=\"1200\">Gr\u00e2ce \u00e0 sa structure m\u00e9canique robuste, \u00e0 son syst\u00e8me de contr\u00f4le de pr\u00e9cision et \u00e0 la conception optimis\u00e9e de la broche, le WP-301D garantit une grande efficacit\u00e9, une excellente qualit\u00e9 de surface et des performances stables en mati\u00e8re de traitement par lots.<\/p>\n<hr data-start=\"1202\" data-end=\"1205\" \/>\n<h2 data-section-id=\"m7ukan\" data-start=\"1207\" data-end=\"1250\">Principales caract\u00e9ristiques et avantages techniques<\/h2>\n<h3 data-section-id=\"1ggl47b\" data-start=\"1252\" data-end=\"1296\">Traitement simultan\u00e9 des deux c\u00f4t\u00e9s<\/h3>\n<p data-start=\"1297\" data-end=\"1372\">La machine traite les deux faces de la plaquette en m\u00eame temps, ce qui garantit.. :<\/p>\n<ul data-start=\"1373\" data-end=\"1463\">\n<li data-section-id=\"1i7ktds\" data-start=\"1373\" data-end=\"1406\">Meilleure uniformit\u00e9 de l'\u00e9paisseur<\/li>\n<li data-section-id=\"1da8f9g\" data-start=\"1407\" data-end=\"1429\">Meilleur parall\u00e9lisme<\/li>\n<li data-section-id=\"12e74mo\" data-start=\"1430\" data-end=\"1463\">R\u00e9duction du temps de traitement total<\/li>\n<\/ul>\n<h3 data-section-id=\"2t7dsg\" data-start=\"1465\" data-end=\"1501\">Syst\u00e8me de mouvement \u00e0 engrenages plan\u00e9taires<\/h3>\n<p data-start=\"1502\" data-end=\"1689\">Le syst\u00e8me int\u00e9gr\u00e9 de pignon solaire et de couronne peut fonctionner de mani\u00e8re synchrone ou ind\u00e9pendante, ce qui permet un contr\u00f4le flexible du processus et des trajectoires de broyage optimis\u00e9es pour diff\u00e9rents mat\u00e9riaux.<\/p>\n<h3 data-section-id=\"dbg2ti\" data-start=\"1691\" data-end=\"1728\">Syst\u00e8me de broche de haute pr\u00e9cision<\/h3>\n<p data-start=\"1729\" data-end=\"1901\">\u00c9quip\u00e9 d'une broche int\u00e9gr\u00e9e de haute pr\u00e9cision, le WP-301D assure une rotation stable et des vibrations minimales, ce qui est essentiel pour obtenir une qualit\u00e9 de surface constante.<\/p>\n<h3 data-section-id=\"bbwmxj\" data-start=\"1903\" data-end=\"1944\">Syst\u00e8me de contr\u00f4le de la pression en temps r\u00e9el<\/h3>\n<p data-start=\"1945\" data-end=\"2030\">La machine est dot\u00e9e d'un syst\u00e8me avanc\u00e9 de contr\u00f4le de la pression en boucle ferm\u00e9e, ce qui permet.. :<\/p>\n<ul data-start=\"2031\" data-end=\"2200\">\n<li data-section-id=\"5pkops\" data-start=\"2031\" data-end=\"2077\">R\u00e9glage pr\u00e9cis de la pression (0,1 - 50 kg)<\/li>\n<li data-section-id=\"18clroc\" data-start=\"2078\" data-end=\"2200\">Contr\u00f4le en temps r\u00e9el et correction automatique<br data-start=\"2125\" data-end=\"2128\" \/>Cela garantit un enl\u00e8vement de mati\u00e8re constant et \u00e9vite un polissage excessif.<\/li>\n<\/ul>\n<h3 data-section-id=\"mqy6u6\" data-start=\"2202\" data-end=\"2237\">Conception de la plaque sup\u00e9rieure flottante<\/h3>\n<p data-start=\"2238\" data-end=\"2440\">La plaque sup\u00e9rieure adopte une structure de connexion flottante, garantissant qu'elle reste parall\u00e8le \u00e0 la plaque inf\u00e9rieure pendant le traitement. Cela permet d'am\u00e9liorer consid\u00e9rablement la plan\u00e9it\u00e9 de la tranche et de r\u00e9duire les variations d'\u00e9paisseur.<\/p>\n<h2 data-section-id=\"8lu2ky\" data-start=\"2447\" data-end=\"2477\">Sp\u00e9cifications techniques<\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2479\" data-end=\"2829\">\n<thead data-start=\"2479\" data-end=\"2503\">\n<tr data-start=\"2479\" data-end=\"2503\">\n<th class=\"\" data-start=\"2479\" data-end=\"2486\" data-col-size=\"sm\">Objet<\/th>\n<th class=\"\" data-start=\"2486\" data-end=\"2503\" data-col-size=\"sm\">Sp\u00e9cifications<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2527\" data-end=\"2829\">\n<tr data-start=\"2527\" data-end=\"2570\">\n<td data-start=\"2527\" data-end=\"2544\" data-col-size=\"sm\">Taille de la pi\u00e8ce<\/td>\n<td data-start=\"2544\" data-end=\"2570\" data-col-size=\"sm\">Jusqu'\u00e0 \u00d8150 mm (6 pouces)<\/td>\n<\/tr>\n<tr data-start=\"2571\" data-end=\"2605\">\n<td data-start=\"2571\" data-end=\"2591\" data-col-size=\"sm\">Vitesse inf\u00e9rieure de la plaque<\/td>\n<td data-start=\"2591\" data-end=\"2605\" data-col-size=\"sm\">0 - 30 tr\/min<\/td>\n<\/tr>\n<tr data-start=\"2606\" data-end=\"2658\">\n<td data-start=\"2606\" data-end=\"2624\" data-col-size=\"sm\">M\u00e9thode de broyage<\/td>\n<td data-start=\"2624\" data-end=\"2658\" data-col-size=\"sm\">Broyage plan\u00e9taire double face<\/td>\n<\/tr>\n<tr data-start=\"2659\" data-end=\"2683\">\n<td data-start=\"2659\" data-end=\"2678\" data-col-size=\"sm\">Quantit\u00e9 de transporteur<\/td>\n<td data-start=\"2678\" data-end=\"2683\" data-col-size=\"sm\">5<\/td>\n<\/tr>\n<tr data-start=\"2684\" data-end=\"2716\">\n<td data-start=\"2684\" data-end=\"2701\" data-col-size=\"sm\">Gamme de pression<\/td>\n<td data-start=\"2701\" data-end=\"2716\" data-col-size=\"sm\">0,1 - 50 kg<\/td>\n<\/tr>\n<tr data-start=\"2717\" data-end=\"2753\">\n<td data-start=\"2717\" data-end=\"2734\" data-col-size=\"sm\">Mat\u00e9riau de la plaque<\/td>\n<td data-start=\"2734\" data-end=\"2753\" data-col-size=\"sm\">Verre \/ C\u00e9ramique<\/td>\n<\/tr>\n<tr data-start=\"2754\" data-end=\"2800\">\n<td data-start=\"2754\" data-end=\"2775\" data-col-size=\"sm\">Dimensions de la machine<\/td>\n<td data-start=\"2775\" data-end=\"2800\" data-col-size=\"sm\">1572 \u00d7 1053 \u00d7 2533 mm<\/td>\n<\/tr>\n<tr data-start=\"2801\" data-end=\"2829\">\n<td data-start=\"2801\" data-end=\"2810\" data-col-size=\"sm\">Poids<\/td>\n<td data-start=\"2810\" data-end=\"2829\" data-col-size=\"sm\">Environ 2300 kg<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"2831\" data-end=\"2834\" \/>\n<h2 data-section-id=\"13yq5fc\" data-start=\"2836\" data-end=\"2859\">Principe de fonctionnement<\/h2>\n<p data-start=\"2903\" data-end=\"3050\">Le WP-301D fonctionne \u00e0 l'aide d'un m\u00e9canisme de mouvement plan\u00e9taire, o\u00f9 les plaquettes sont plac\u00e9es \u00e0 l'int\u00e9rieur de supports positionn\u00e9s entre les plaques sup\u00e9rieure et inf\u00e9rieure.<\/p>\n<p data-start=\"3052\" data-end=\"3069\">Pendant le fonctionnement :<\/p>\n<ul data-start=\"3071\" data-end=\"3205\">\n<li data-section-id=\"307xpo\" data-start=\"3071\" data-end=\"3115\">La plaque inf\u00e9rieure tourne en continu<\/li>\n<li data-section-id=\"155dzsx\" data-start=\"3116\" data-end=\"3156\">Le plan\u00e9taire entra\u00eene les porteuses<\/li>\n<li data-section-id=\"1h7nv9d\" data-start=\"3157\" data-end=\"3205\">La couronne dent\u00e9e contr\u00f4le le mouvement de rotation<\/li>\n<\/ul>\n<p data-start=\"3207\" data-end=\"3357\">Cette combinaison cr\u00e9e un mouvement relatif complexe entre la plaquette et les plateaux de polissage, garantissant un enl\u00e8vement de mati\u00e8re uniforme sur les deux surfaces.<\/p>\n<p data-start=\"3359\" data-end=\"3527\">Simultan\u00e9ment, le syst\u00e8me de contr\u00f4le de la pression maintient une force constante, tandis que la plaque sup\u00e9rieure flottante s'adapte dynamiquement pour maintenir un contact parall\u00e8le. Cela se traduit par :<\/p>\n<ul data-start=\"3529\" data-end=\"3598\">\n<li data-section-id=\"5m7g9e\" data-start=\"3529\" data-end=\"3546\">Grande plan\u00e9it\u00e9<\/li>\n<li data-section-id=\"1uescvu\" data-start=\"3547\" data-end=\"3568\">Epaisseur uniforme<\/li>\n<li data-section-id=\"19qiivl\" data-start=\"3569\" data-end=\"3598\">Dommages minimes au sous-sol<\/li>\n<\/ul>\n<hr data-start=\"3600\" data-end=\"3603\" \/>\n<h2 data-section-id=\"4t5b8m\" data-start=\"3605\" data-end=\"3623\"><img decoding=\"async\" class=\"size-medium wp-image-2176 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/silicon_carbide_wafer_4inch_hpsi_350um_widely_used_for_ar_glasses3-300x300.webp\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/silicon_carbide_wafer_4inch_hpsi_350um_widely_used_for_ar_glasses3-300x300.webp 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/silicon_carbide_wafer_4inch_hpsi_350um_widely_used_for_ar_glasses3-150x150.webp 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/silicon_carbide_wafer_4inch_hpsi_350um_widely_used_for_ar_glasses3-768x768.webp 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/silicon_carbide_wafer_4inch_hpsi_350um_widely_used_for_ar_glasses3-12x12.webp 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/silicon_carbide_wafer_4inch_hpsi_350um_widely_used_for_ar_glasses3-600x600.webp 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/silicon_carbide_wafer_4inch_hpsi_350um_widely_used_for_ar_glasses3-100x100.webp 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/silicon_carbide_wafer_4inch_hpsi_350um_widely_used_for_ar_glasses3.webp 800w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Applications<\/h2>\n<p data-start=\"3625\" data-end=\"3684\">La rectifieuse WP-301D \u00e0 double face est largement utilis\u00e9e dans.. :<\/p>\n<ul data-start=\"3686\" data-end=\"3896\">\n<li data-section-id=\"lsdmsu\" data-start=\"3686\" data-end=\"3729\">Traitement des plaquettes de semi-conducteurs compos\u00e9s<\/li>\n<li data-section-id=\"1re9cdn\" data-start=\"3730\" data-end=\"3763\">Mat\u00e9riaux infrarouges (CZT, MCT)<\/li>\n<li data-section-id=\"1kwz9qu\" data-start=\"3764\" data-end=\"3801\">Mat\u00e9riaux III-V (GaAs, InP, InSb)<\/li>\n<li data-section-id=\"qagg2f\" data-start=\"3802\" data-end=\"3849\">Substrats optiques et composants de pr\u00e9cision<\/li>\n<li data-section-id=\"ir3gdc\" data-start=\"3850\" data-end=\"3896\">Laboratoires de recherche et production par lots<\/li>\n<\/ul>\n<p data-start=\"3898\" data-end=\"4021\">Il est particuli\u00e8rement adapt\u00e9 aux mat\u00e9riaux fragiles de 6 pouces et moins, pour lesquels la pr\u00e9cision et l'int\u00e9grit\u00e9 de la surface sont essentielles.<\/p>\n<hr data-start=\"4023\" data-end=\"4026\" \/>\n<h2 data-section-id=\"1116wfg\" data-start=\"4028\" data-end=\"4049\"><img decoding=\"async\" class=\"size-medium wp-image-2122 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Avantages principaux<\/h2>\n<ul data-start=\"4051\" data-end=\"4440\">\n<li data-section-id=\"1ar7oz7\" data-start=\"4051\" data-end=\"4131\">Haute efficacit\u00e9<br data-start=\"4072\" data-end=\"4075\" \/>L'usinage double face r\u00e9duit le temps total d'usinage<\/li>\n<li data-section-id=\"1wr2j5g\" data-start=\"4133\" data-end=\"4202\">Haute pr\u00e9cision<br data-start=\"4153\" data-end=\"4156\" \/>Assure une excellente plan\u00e9it\u00e9 et un bon parall\u00e9lisme<\/li>\n<li data-section-id=\"esn72i\" data-start=\"4204\" data-end=\"4283\">Stabilit\u00e9 du processus<br data-start=\"4227\" data-end=\"4230\" \/>Le contr\u00f4le de la pression en boucle ferm\u00e9e am\u00e9liore l'homog\u00e9n\u00e9it\u00e9<\/li>\n<li data-section-id=\"1crbhdt\" data-start=\"4285\" data-end=\"4356\">Fonctionnement souple<br data-start=\"4309\" data-end=\"4312\" \/>Contr\u00f4le ind\u00e9pendant ou synchronis\u00e9 de l'engrenage<\/li>\n<li data-section-id=\"1hbjrp7\" data-start=\"4358\" data-end=\"4440\">Optimis\u00e9 pour les mat\u00e9riaux fragiles<br data-start=\"4395\" data-end=\"4398\" \/>Minimise les contraintes et pr\u00e9vient les fissures<\/li>\n<\/ul>\n<hr data-start=\"4442\" data-end=\"4445\" \/>\n<h2 data-section-id=\"w1cnyx\" data-start=\"4447\" data-end=\"4456\">FAQ<\/h2>\n<p data-start=\"4458\" data-end=\"4662\">Q1 : Quel est le principal avantage du broyage double face ?<br data-start=\"4517\" data-end=\"4520\" \/>R : Il permet de traiter simultan\u00e9ment les deux surfaces de la plaquette, ce qui am\u00e9liore la plan\u00e9it\u00e9, le parall\u00e9lisme et l'efficacit\u00e9 par rapport au meulage d'une seule face.<\/p>\n<p data-start=\"4664\" data-end=\"4820\">Q2 : Quels mat\u00e9riaux peuvent \u00eatre trait\u00e9s ?<br data-start=\"4704\" data-end=\"4707\" \/>R : La machine est adapt\u00e9e aux mat\u00e9riaux semi-conducteurs CZT, MCT, GaAs, InP, InSb et autres mat\u00e9riaux semi-conducteurs souples et cassants.<\/p>\n<p data-start=\"4822\" data-end=\"4924\">Q3 : Quelle taille de wafer le WP-301D prend-il en charge ?<br data-start=\"4871\" data-end=\"4874\" \/>R : Il prend en charge les plaquettes jusqu'\u00e0 150 mm (6 pouces).<\/p>","protected":false},"excerpt":{"rendered":"<p>La machine de meulage double face WP-301D est un syst\u00e8me de haute pr\u00e9cision con\u00e7u pour le meulage et le polissage double face simultan\u00e9s des plaquettes de semi-conducteurs et des mat\u00e9riaux fragiles. Gr\u00e2ce \u00e0 un syst\u00e8me avanc\u00e9 de mouvement \u00e0 engrenages plan\u00e9taires, la machine permet un enl\u00e8vement de mati\u00e8re uniforme sur les surfaces sup\u00e9rieures et inf\u00e9rieures de la plaquette, ce qui am\u00e9liore consid\u00e9rablement la plan\u00e9it\u00e9 et le parall\u00e9lisme.<\/p>","protected":false},"featured_media":2229,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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