{"id":2131,"date":"2026-04-08T05:53:25","date_gmt":"2026-04-08T05:53:25","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2131"},"modified":"2026-04-08T05:53:26","modified_gmt":"2026-04-08T05:53:26","slug":"wgp-1271c-fully-automatic-wafer-thinning-machine","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/fr\/product\/wgp-1271c-fully-automatic-wafer-thinning-machine\/","title":{"rendered":"WGP-1271C Fully Automatic Wafer Thinning Machine"},"content":{"rendered":"<p data-start=\"216\" data-end=\"635\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2132 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271C-Fully-Automatic-Wafer-Thinning-Machine-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271C-Fully-Automatic-Wafer-Thinning-Machine-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271C-Fully-Automatic-Wafer-Thinning-Machine-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271C-Fully-Automatic-Wafer-Thinning-Machine-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271C-Fully-Automatic-Wafer-Thinning-Machine-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271C-Fully-Automatic-Wafer-Thinning-Machine-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271C-Fully-Automatic-Wafer-Thinning-Machine-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271C-Fully-Automatic-Wafer-Thinning-Machine.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>The WGP-1271C is a high-efficiency, fully automatic wafer thinning machine, specifically engineered to handle the challenges of large-diameter SiC substrates and device wafers. Designed with precision and productivity in mind, this advanced GGG three-spindle, four-station system ensures stable, consistent, and high-quality wafer thinning for both 8-inch SiC device wafers and 12-inch SiC substrates.<\/p>\n<p data-start=\"637\" data-end=\"1067\">Equipped with ultra-high torque spindles and a fourth-generation high-load wafer carrier, the WGP-1271C easily manages the complex and demanding process of thinning SiC, one of the most challenging semiconductor materials. With automation at its core, the machine integrates wafer transfer, cleaning, and grinding into a single streamlined workflow, significantly improving production efficiency while reducing human intervention.<\/p>\n<h2 data-section-id=\"14yhrip\" data-start=\"1074\" data-end=\"1099\"><span role=\"text\">Technical Features<img decoding=\"async\" class=\"size-medium wp-image-2129 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-1-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-1-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-1-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-1-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-1-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-1-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-1-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-1.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/span><\/h2>\n<ul data-start=\"1101\" data-end=\"2077\">\n<li data-section-id=\"qumv08\" data-start=\"1101\" data-end=\"1217\">Triple-Spindle, Four-Station Configuration: Maximizes throughput while ensuring consistent wafer processing.<\/li>\n<li data-section-id=\"1xwv6ml\" data-start=\"1218\" data-end=\"1343\">Ultra-High Torque Spindles (11 kW): Guarantees stable thinning performance for hard-to-process materials such as SiC.<\/li>\n<li data-section-id=\"bm9v06\" data-start=\"1344\" data-end=\"1486\">Fourth-Generation High-Load Wafer Carrier: Provides precise wafer support and handling, minimizing stress and defects during thinning.<\/li>\n<li data-section-id=\"ud9rk3\" data-start=\"1487\" data-end=\"1629\">Autosetup Function: Automatically completes wheel dressing after replacement, eliminating manual intervention and reducing setup time.<\/li>\n<li data-section-id=\"ri4bll\" data-start=\"1630\" data-end=\"1795\">Versatile Consumable Options: Supports a variety of grinding materials and thickness targets, optimizing process efficiency while lowering operational costs.<\/li>\n<li data-section-id=\"1jxvu9l\" data-start=\"1796\" data-end=\"1929\">Full Automation: Integrated wafer transfer and cleaning system ensures minimal contamination and seamless process continuity.<\/li>\n<li data-section-id=\"185qigx\" data-start=\"1930\" data-end=\"2077\">Wide Compatibility: Supports multiple wafer diameters including \u03c66&#8243;, \u03c68&#8243;, and \u03c612&#8243;, making it ideal for modern SiC device production lines.<\/li>\n<\/ul>\n<h2 data-section-id=\"k0zlak\" data-start=\"2084\" data-end=\"2103\"><span role=\"text\">Applications<\/span><\/h2>\n<p data-start=\"2105\" data-end=\"2141\">The WGP-1271C is ideally suited for:<\/p>\n<ul data-start=\"2143\" data-end=\"2624\">\n<li data-section-id=\"1ws677k\" data-start=\"2143\" data-end=\"2245\">8-inch SiC device wafers: For high-power electronics, automotive, and industrial applications.<\/li>\n<li data-section-id=\"9q1l0i\" data-start=\"2246\" data-end=\"2364\">12-inch SiC substrates: For next-generation high-efficiency semiconductor devices requiring ultra-thin wafers.<\/li>\n<li data-section-id=\"13qyuxt\" data-start=\"2365\" data-end=\"2482\">Research and development: Universities and semiconductor R&amp;D centers working on SiC-based device prototyping.<\/li>\n<li data-section-id=\"f64rxn\" data-start=\"2483\" data-end=\"2624\">High-throughput production environments: Large-scale wafer fabrication facilities seeking stable, automated wafer thinning solutions.<\/li>\n<\/ul>\n<p data-start=\"2626\" data-end=\"2802\">Its ability to handle both device wafers and substrates makes it a versatile choice for facilities aiming to reduce downtime, increase yield, and lower overall operating costs.<\/p>\n<h2 data-section-id=\"14caze6\" data-start=\"2809\" data-end=\"2838\"><span role=\"text\">Machine Specifications<\/span><\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2840\" data-end=\"3127\">\n<thead data-start=\"2840\" data-end=\"2872\">\n<tr data-start=\"2840\" data-end=\"2872\">\n<th class=\"\" data-start=\"2840\" data-end=\"2851\" data-col-size=\"sm\">Objet<\/th>\n<th class=\"\" data-start=\"2851\" data-end=\"2872\" data-col-size=\"md\">Sp\u00e9cifications<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2904\" data-end=\"3127\">\n<tr data-start=\"2904\" data-end=\"3012\">\n<td data-start=\"2904\" data-end=\"2916\" data-col-size=\"sm\">Structure<\/td>\n<td data-col-size=\"md\" data-start=\"2916\" data-end=\"3012\">Spindle \u00d73 \/ Wafer Carrier \u00d74 \/ Worktable \u00d71 \/ Fully Automatic Transfer &amp; Cleaning System \u00d71<\/td>\n<\/tr>\n<tr data-start=\"3013\" data-end=\"3038\">\n<td data-start=\"3013\" data-end=\"3029\" data-col-size=\"sm\">Spindle Power<\/td>\n<td data-col-size=\"md\" data-start=\"3029\" data-end=\"3038\">11 kW<\/td>\n<\/tr>\n<tr data-start=\"3039\" data-end=\"3077\">\n<td data-start=\"3039\" data-end=\"3059\" data-col-size=\"sm\">Grinding Diameter<\/td>\n<td data-start=\"3059\" data-end=\"3077\" data-col-size=\"md\">\u03c66&#8243;, \u03c68&#8243;, \u03c612&#8243;<\/td>\n<\/tr>\n<tr data-start=\"3078\" data-end=\"3127\">\n<td data-start=\"3078\" data-end=\"3099\" data-col-size=\"sm\">Dimensions (W\u00d7D\u00d7H)<\/td>\n<td data-col-size=\"md\" data-start=\"3099\" data-end=\"3127\">1900mm \u00d7 3530mm \u00d7 1900mm<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h2 data-section-id=\"164zmy2\" data-start=\"3134\" data-end=\"3162\"><span role=\"text\"><img decoding=\"async\" class=\"size-medium wp-image-2128 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-1-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-1-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-1-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-1-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-1-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-1-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-1-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-1.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Why Choose WGP-1271C?<\/span><\/h2>\n<ol data-start=\"3164\" data-end=\"4095\">\n<li data-section-id=\"3r89dn\" data-start=\"3164\" data-end=\"3316\">High Efficiency &amp; Productivity: Triple-spindle and four-station configuration reduces process cycle time while maintaining high-quality output.<\/li>\n<li data-section-id=\"1tfvcbx\" data-start=\"3317\" data-end=\"3463\">Superior Thinning Accuracy: Fourth-generation wafer carrier and ultra-high torque spindles ensure precise wafer thickness and uniformity.<\/li>\n<li data-section-id=\"r0hwiw\" data-start=\"3464\" data-end=\"3601\">Reduced Human Intervention: Autosetup and fully automated transfer\/cleaning system minimize labor requirements and setup errors.<\/li>\n<li data-section-id=\"1y23yff\" data-start=\"3602\" data-end=\"3790\">Adaptable to Various Processes: Diverse consumable compatibility allows optimization for different wafer sizes and materials, meeting the unique needs of modern SiC manufacturing.<\/li>\n<li data-section-id=\"1vuc3pi\" data-start=\"3791\" data-end=\"3932\">Low Operational Costs: Optimized process design and efficient consumable use ensure lower running costs without compromising output.<\/li>\n<li data-section-id=\"1x9wday\" data-start=\"3933\" data-end=\"4095\">Future-Proof Production: Designed to accommodate larger wafers and next-generation SiC devices, supporting facility expansion and technological upgrades.<\/li>\n<\/ol>\n<h2 data-section-id=\"1nqqsko\" data-start=\"77\" data-end=\"116\"><span role=\"text\"><strong data-start=\"80\" data-end=\"116\">Foire aux questions (FAQ)<\/strong><\/span><\/h2>\n<ol data-start=\"118\" data-end=\"1410\">\n<li data-section-id=\"7eotsx\" data-start=\"118\" data-end=\"352\"><strong data-start=\"121\" data-end=\"170\">Q: What wafer sizes can the WGP-1271C handle?<\/strong><br data-start=\"170\" data-end=\"173\" \/><strong data-start=\"176\" data-end=\"182\">A :<\/strong> The machine supports \u03c66&#8243;, \u03c68&#8243;, and \u03c612&#8243; wafers, including both 8-inch SiC device wafers and 12-inch SiC substrates, providing flexibility for different production needs.<\/li>\n<li data-section-id=\"1k5g3db\" data-start=\"354\" data-end=\"598\"><strong data-start=\"357\" data-end=\"426\">Q: How does the Autosetup function improve production efficiency?<\/strong><br data-start=\"426\" data-end=\"429\" \/><strong data-start=\"432\" data-end=\"438\">A :<\/strong> Autosetup automatically performs wheel dressing after replacement, eliminating manual intervention, reducing setup errors, and saving valuable production time.<\/li>\n<li data-section-id=\"19bzu0f\" data-start=\"600\" data-end=\"879\"><strong data-start=\"603\" data-end=\"677\">Q: Can the WGP-1271C process hard-to-thin SiC wafers without cracking?<\/strong><br data-start=\"677\" data-end=\"680\" \/><strong data-start=\"683\" data-end=\"689\">A :<\/strong> Yes, with ultra-high torque spindles and a fourth-generation high-load wafer carrier, the machine ensures stable thinning even for hard-to-process SiC wafers, minimizing stress and defects.<\/li>\n<li data-section-id=\"2s2suf\" data-start=\"881\" data-end=\"1150\"><strong data-start=\"884\" data-end=\"961\">Q: Is the machine suitable for both R&amp;D and mass production environments?<\/strong><br data-start=\"961\" data-end=\"964\" \/><strong data-start=\"967\" data-end=\"973\">A :<\/strong> Absolutely. Its fully automated transfer and cleaning system, combined with high-precision spindles, makes it ideal for both research development and large-scale manufacturing.<\/li>\n<li data-section-id=\"nrkijx\" data-start=\"1152\" data-end=\"1410\"><strong data-start=\"1155\" data-end=\"1210\">Q: How does the WGP-1271C reduce operational costs?<\/strong><br data-start=\"1210\" data-end=\"1213\" \/><strong data-start=\"1216\" data-end=\"1222\">A :<\/strong> The machine offers optimized consumable configurations and high process efficiency, reducing material waste and labor costs while maintaining high throughput and consistent wafer quality.<\/li>\n<\/ol>","protected":false},"excerpt":{"rendered":"<p>The WGP-1271C Fully Automatic Wafer Thinning Machine is the ultimate solution for modern SiC wafer processing. By combining precision engineering, high automation, and versatile compatibility, it addresses the challenges of thinning large SiC substrates and device wafers efficiently and reliably. Whether for high-volume production or research development, WGP-1271C ensures consistent results, improved yield, and lower operational costs, making it an indispensable asset for semiconductor manufacturing facilities.<\/p>","protected":false},"featured_media":2132,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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