{"id":2125,"date":"2026-04-08T05:30:39","date_gmt":"2026-04-08T05:30:39","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2125"},"modified":"2026-04-08T05:30:42","modified_gmt":"2026-04-08T05:30:42","slug":"wgp-1271-fully-automatic-wafer-thinning-polishing-integrated-machine","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/fr\/product\/wgp-1271-fully-automatic-wafer-thinning-polishing-integrated-machine\/","title":{"rendered":"WGP-1271 Machine int\u00e9gr\u00e9e enti\u00e8rement automatique pour l'amincissement et le polissage des wafers"},"content":{"rendered":"<p data-start=\"171\" data-end=\"540\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2126 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271-Fully-Automatic-Wafer-Thinning-Polishing-Integrated-Machine-300x300.jpg\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271-Fully-Automatic-Wafer-Thinning-Polishing-Integrated-Machine-300x300.jpg 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271-Fully-Automatic-Wafer-Thinning-Polishing-Integrated-Machine-150x150.jpg 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271-Fully-Automatic-Wafer-Thinning-Polishing-Integrated-Machine-768x768.jpg 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271-Fully-Automatic-Wafer-Thinning-Polishing-Integrated-Machine-12x12.jpg 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271-Fully-Automatic-Wafer-Thinning-Polishing-Integrated-Machine-600x600.jpg 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271-Fully-Automatic-Wafer-Thinning-Polishing-Integrated-Machine-100x100.jpg 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/WGP-1271-Fully-Automatic-Wafer-Thinning-Polishing-Integrated-Machine.jpg 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>La machine int\u00e9gr\u00e9e d'amincissement et de polissage enti\u00e8rement automatique des wafers WGP-1271 est une solution de nouvelle g\u00e9n\u00e9ration con\u00e7ue pour le traitement des wafers ultra-minces dans le domaine de l'emballage des semi-conducteurs avanc\u00e9s. En int\u00e9grant le broyage, le polissage, le nettoyage et la manipulation des bandes dans une seule plate-forme automatis\u00e9e, le syst\u00e8me r\u00e9duit consid\u00e9rablement le temps de traitement tout en am\u00e9liorant la coh\u00e9rence et le rendement.<\/p>\n<p data-start=\"542\" data-end=\"800\">Con\u00e7ue pour les plaquettes jusqu'\u00e0 300 mm, la WGP-1271 permet un amincissement stable des plaquettes jusqu'\u00e0 moins de 50 \u03bcm, r\u00e9pondant ainsi aux exigences rigoureuses des technologies d'emballage avanc\u00e9es telles que les circuits int\u00e9gr\u00e9s 3D, l'emballage au niveau de la plaquette (WLP) et l'int\u00e9gration des dispositifs d'alimentation.<\/p>\n<p data-start=\"802\" data-end=\"1092\">Contrairement aux syst\u00e8mes conventionnels \u00e0 plusieurs \u00e9tapes, cette machine combine le pr\u00e9polissage arri\u00e8re et le polissage de d\u00e9tente en un processus unifi\u00e9, ce qui minimise la manipulation des plaquettes et r\u00e9duit le risque de dommages. Il en r\u00e9sulte une meilleure int\u00e9grit\u00e9 des plaquettes, un d\u00e9bit plus \u00e9lev\u00e9 et un co\u00fbt total de possession (TCO) plus faible.<\/p>\n<p data-start=\"802\" data-end=\"1092\">\n<h2 data-section-id=\"1j5qwet\" data-start=\"1099\" data-end=\"1118\"><span role=\"text\"><strong data-start=\"1102\" data-end=\"1118\">Caract\u00e9ristiques principales<\/strong><\/span><\/h2>\n<h3 data-section-id=\"ezzx2y\" data-start=\"1120\" data-end=\"1172\"><span role=\"text\"><strong data-start=\"1124\" data-end=\"1172\">1. Processus int\u00e9gr\u00e9 d'\u00e9claircissage et de polissage<\/strong><\/span><\/h3>\n<p data-start=\"1173\" data-end=\"1415\">Le WGP-1271 combine le broyage grossier, le broyage fin et le polissage en un seul flux de travail. Cette conception int\u00e9gr\u00e9e \u00e9limine les \u00e9tapes de transfert interm\u00e9diaires, ce qui r\u00e9duit consid\u00e9rablement les temps morts et am\u00e9liore l'efficacit\u00e9 globale de la production.<\/p>\n<h3 data-section-id=\"gfp4a4\" data-start=\"1417\" data-end=\"1464\"><span role=\"text\"><strong data-start=\"1421\" data-end=\"1464\">2. Capacit\u00e9 de fabrication de plaquettes ultra-minces (&lt;50 \u03bcm)<\/strong><\/span><\/h3>\n<p data-start=\"1465\" data-end=\"1672\">Ce syst\u00e8me est sp\u00e9cialement con\u00e7u pour les applications de plaquettes ultra-minces. Il garantit un traitement stable et une manipulation s\u00fbre des plaquettes de moins de 50 microns, qui sont g\u00e9n\u00e9ralement fragiles et susceptibles de se d\u00e9former ou de se fissurer.<\/p>\n<h3 data-section-id=\"7af3dp\" data-start=\"1674\" data-end=\"1724\"><span role=\"text\"><strong data-start=\"1678\" data-end=\"1724\">3. Architecture \u00e0 trois broches et quatre stations<\/strong><\/span><\/h3>\n<p data-start=\"1725\" data-end=\"1901\">Avec un <strong data-start=\"1732\" data-end=\"1775\">configuration \u00e0 trois broches et quatre mandrins<\/strong>, Le WGP-1271 permet un traitement parall\u00e8le et un d\u00e9bit \u00e9lev\u00e9. Chaque broche est optimis\u00e9e pour les diff\u00e9rentes \u00e9tapes du processus :<\/p>\n<ul data-start=\"1903\" data-end=\"2037\">\n<li data-section-id=\"1usl451\" data-start=\"1903\" data-end=\"1933\">Broche 1 : Meulage grossier<\/li>\n<li data-section-id=\"1dwphy3\" data-start=\"1934\" data-end=\"1962\">Broche 2 : Broyage fin<\/li>\n<li data-section-id=\"42ukbb\" data-start=\"1963\" data-end=\"2037\">Broche 3 : Polissage \/ amincissement ultra-pr\u00e9cis (polissage \u00e0 sec en option)<\/li>\n<\/ul>\n<p data-start=\"2039\" data-end=\"2100\">Cette approche modulaire garantit \u00e0 la fois la flexibilit\u00e9 et la pr\u00e9cision.<\/p>\n<h3 data-section-id=\"1po43yb\" data-start=\"2102\" data-end=\"2168\"><span role=\"text\"><strong data-start=\"2106\" data-end=\"2168\">4. Mesure avanc\u00e9e de l'\u00e9paisseur en ligne (NCG + Auto TTV)<\/strong><\/span><\/h3>\n<p data-start=\"2169\" data-end=\"2415\">Le syst\u00e8me int\u00e8gre <strong data-start=\"2191\" data-end=\"2224\">Swing NCG (jauge sans contact)<\/strong> avec le contr\u00f4le Auto TTV, qui permet de mesurer l'\u00e9paisseur de la plaquette en temps r\u00e9el et sans contact. Cela permet une surveillance continue et un ajustement automatique de l'uniformit\u00e9 de l'\u00e9paisseur tout au long du processus.<\/p>\n<h3 data-section-id=\"1ocqp9t\" data-start=\"2417\" data-end=\"2465\"><span role=\"text\"><strong data-start=\"2421\" data-end=\"2465\">5. Traitement de bout en bout enti\u00e8rement automatis\u00e9<\/strong><\/span><\/h3>\n<p data-start=\"2466\" data-end=\"2529\">Le WGP-1271 prend en charge un flux de travail automatis\u00e9 complet, y compris :<\/p>\n<ul data-start=\"2531\" data-end=\"2619\">\n<li data-section-id=\"1siqx7i\" data-start=\"2531\" data-end=\"2543\">Broyage<\/li>\n<li data-section-id=\"1wv9td5\" data-start=\"2544\" data-end=\"2557\">Polissage<\/li>\n<li data-section-id=\"9b9610\" data-start=\"2558\" data-end=\"2576\">Transfert de plaquettes<\/li>\n<li data-section-id=\"sybkct\" data-start=\"2577\" data-end=\"2589\">Nettoyage<\/li>\n<li data-section-id=\"14k60ao\" data-start=\"2590\" data-end=\"2619\">Montage et retrait de la bande<\/li>\n<\/ul>\n<p data-start=\"2621\" data-end=\"2750\">Cela permet de r\u00e9duire les interventions manuelles, d'am\u00e9liorer la r\u00e9p\u00e9tabilit\u00e9 et de garantir la compatibilit\u00e9 avec les environnements modernes de fabrication intelligente.<\/p>\n<h3 data-section-id=\"lvtr63\" data-start=\"2752\" data-end=\"2812\"><span role=\"text\"><strong data-start=\"2756\" data-end=\"2812\">6. Polissage \u00e0 sec et pr\u00e9polissage de haute pr\u00e9cision en option<\/strong><\/span><\/h3>\n<p data-start=\"2813\" data-end=\"3012\">La troisi\u00e8me broche (axe Z3) prend en charge le mouvement de l'axe X et peut \u00eatre configur\u00e9e pour <strong data-start=\"2892\" data-end=\"2937\">polissage \u00e0 sec ou meulage de haute pr\u00e9cision<\/strong>, permettant ainsi diverses applications de processus en fonction des besoins des clients.<\/p>\n<h2 data-section-id=\"k0zlak\" data-start=\"3019\" data-end=\"3038\"><span role=\"text\"><strong data-start=\"3022\" data-end=\"3038\"><img decoding=\"async\" class=\"size-medium wp-image-2121 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Applications<\/strong><\/span><\/h2>\n<p data-start=\"3040\" data-end=\"3124\">Le WGP-1271 est id\u00e9al pour les processus de fabrication de semi-conducteurs avanc\u00e9s, notamment :<\/p>\n<ul data-start=\"3126\" data-end=\"3380\">\n<li data-section-id=\"1dsiu\" data-start=\"3126\" data-end=\"3169\">Traitement de plaquettes ultra-minces (\u2264 12 pouces)<\/li>\n<li data-section-id=\"fydjo\" data-start=\"3170\" data-end=\"3214\">Conditionnement avanc\u00e9 (WLP, Fan-out, 3D IC)<\/li>\n<li data-section-id=\"70hiro\" data-start=\"3215\" data-end=\"3255\">IGBT et dispositifs semi-conducteurs de puissance<\/li>\n<li data-section-id=\"18ik2nw\" data-start=\"3256\" data-end=\"3287\">\u00c9claircissement des plaquettes de silicium (Si)<\/li>\n<li data-section-id=\"zqmbwb\" data-start=\"3288\" data-end=\"3330\">Traitement des plaquettes de carbure de silicium (SiC)<\/li>\n<li data-section-id=\"1lxs47\" data-start=\"3331\" data-end=\"3380\">Fabrication de circuits int\u00e9gr\u00e9s \u00e0 haute densit\u00e9<\/li>\n<\/ul>\n<p data-start=\"3382\" data-end=\"3539\">Sa capacit\u00e9 \u00e0 traiter des plaquettes ultra-minces le rend particuli\u00e8rement adapt\u00e9 aux dispositifs \u00e9lectroniques de la prochaine g\u00e9n\u00e9ration qui n\u00e9cessitent une taille compacte et des performances \u00e9lev\u00e9es.<\/p>\n<h2 data-section-id=\"id1bjs\" data-start=\"3546\" data-end=\"3577\"><span role=\"text\"><strong data-start=\"3549\" data-end=\"3577\">Sp\u00e9cifications techniques<\/strong><\/span><\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"3579\" data-end=\"4062\">\n<thead data-start=\"3579\" data-end=\"3608\">\n<tr data-start=\"3579\" data-end=\"3608\">\n<th class=\"\" data-start=\"3579\" data-end=\"3591\" data-col-size=\"sm\">Param\u00e8tres<\/th>\n<th class=\"\" data-start=\"3591\" data-end=\"3608\" data-col-size=\"lg\">Sp\u00e9cifications<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"3636\" data-end=\"4062\">\n<tr data-start=\"3636\" data-end=\"3761\">\n<td data-start=\"3636\" data-end=\"3648\" data-col-size=\"sm\">Structure<\/td>\n<td data-start=\"3648\" data-end=\"3761\" data-col-size=\"lg\">3 broches \/ 4 mandrins \/ 1 poste de travail \/ Syst\u00e8me de transfert et de nettoyage automatique \/ Syst\u00e8me de montage et d'enl\u00e8vement de bandes<\/td>\n<\/tr>\n<tr data-start=\"3762\" data-end=\"3810\">\n<td data-start=\"3762\" data-end=\"3775\" data-col-size=\"sm\">Taille de la plaquette<\/td>\n<td data-start=\"3775\" data-end=\"3810\" data-col-size=\"lg\">8 pouces \/ 12 pouces (jusqu'\u00e0 300 mm)<\/td>\n<\/tr>\n<tr data-start=\"3811\" data-end=\"3856\">\n<td data-start=\"3811\" data-end=\"3827\" data-col-size=\"sm\">Puissance de la broche<\/td>\n<td data-start=\"3827\" data-end=\"3856\" data-col-size=\"lg\">7,5 kW \/ 11 kW (en option)<\/td>\n<\/tr>\n<tr data-start=\"3857\" data-end=\"3907\">\n<td data-start=\"3857\" data-end=\"3875\" data-col-size=\"sm\">Dossier sp\u00e9cial<\/td>\n<td data-start=\"3875\" data-end=\"3907\" data-col-size=\"lg\">Axe Z3 avec mouvement de l'axe X<\/td>\n<\/tr>\n<tr data-start=\"3908\" data-end=\"3983\">\n<td data-start=\"3908\" data-end=\"3932\" data-col-size=\"sm\">Capacit\u00e9 de traitement<\/td>\n<td data-start=\"3932\" data-end=\"3983\" data-col-size=\"lg\">Meulage + Polissage + Nettoyage + Manipulation de bandes<\/td>\n<\/tr>\n<tr data-start=\"3984\" data-end=\"4015\">\n<td data-start=\"3984\" data-end=\"4004\" data-col-size=\"sm\">\u00c9paisseur minimale<\/td>\n<td data-start=\"4004\" data-end=\"4015\" data-col-size=\"lg\">&lt; 50 \u03bcm<\/td>\n<\/tr>\n<tr data-start=\"4016\" data-end=\"4062\">\n<td data-start=\"4016\" data-end=\"4037\" data-col-size=\"sm\">Dimensions (L\u00d7P\u00d7H)<\/td>\n<td data-start=\"4037\" data-end=\"4062\" data-col-size=\"lg\">4050 \u00d7 3530 \u00d7 1900 mm<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h2 data-section-id=\"dfn86d\" data-start=\"4069\" data-end=\"4098\"><span role=\"text\"><strong data-start=\"4072\" data-end=\"4098\">Avantages en termes de performances<\/strong><\/span><\/h2>\n<h3 data-section-id=\"bii9jc\" data-start=\"4100\" data-end=\"4125\"><span role=\"text\"><strong data-start=\"4104\" data-end=\"4125\">Efficacit\u00e9 accrue<\/strong><\/span><\/h3>\n<p data-start=\"4126\" data-end=\"4273\">La conception int\u00e9gr\u00e9e r\u00e9duit les \u00e9tapes du processus et le temps de manipulation, ce qui permet d'augmenter consid\u00e9rablement le d\u00e9bit par rapport aux syst\u00e8mes traditionnels s\u00e9par\u00e9s.<\/p>\n<h3 data-section-id=\"1ywfgjp\" data-start=\"4275\" data-end=\"4297\"><span role=\"text\"><strong data-start=\"4279\" data-end=\"4297\">Am\u00e9lioration du rendement<\/strong><\/span><\/h3>\n<p data-start=\"4298\" data-end=\"4427\">Les mesures sans contact et le traitement \u00e0 faible contrainte minimisent les dommages caus\u00e9s aux plaquettes, ce qui se traduit par un rendement plus \u00e9lev\u00e9 et une meilleure fiabilit\u00e9 des dispositifs.<\/p>\n<h3 data-section-id=\"1llws6a\" data-start=\"4429\" data-end=\"4463\"><span role=\"text\"><strong data-start=\"4433\" data-end=\"4463\">Contr\u00f4le sup\u00e9rieur de l'\u00e9paisseur<\/strong><\/span><\/h3>\n<p data-start=\"4464\" data-end=\"4583\">Le r\u00e9glage en temps r\u00e9el du TTV garantit une excellente uniformit\u00e9 de l'\u00e9paisseur, ce qui est essentiel pour les applications d'emballage avanc\u00e9es.<\/p>\n<h3 data-section-id=\"1kw0bc8\" data-start=\"4585\" data-end=\"4622\"><span role=\"text\"><strong data-start=\"4589\" data-end=\"4622\">R\u00e9duction du risque de contamination<\/strong><\/span><\/h3>\n<p data-start=\"4623\" data-end=\"4737\">La r\u00e9duction du nombre d'\u00e9tapes de transfert et le contr\u00f4le de l'environnement du processus permettent de maintenir la propret\u00e9 des plaquettes et de r\u00e9duire les taux de d\u00e9faut.<\/p>\n<h3 data-section-id=\"1nwqyke\" data-start=\"4739\" data-end=\"4775\"><span role=\"text\"><strong data-start=\"4743\" data-end=\"4775\">Flexibilit\u00e9 accrue des processus<\/strong><\/span><\/h3>\n<p data-start=\"4776\" data-end=\"4889\">Le polissage \u00e0 sec et le meulage ultra-pr\u00e9cis en option permettent de personnaliser les produits en fonction des mat\u00e9riaux et des applications.<\/p>\n<h2 data-section-id=\"ue4rxw\" data-start=\"4896\" data-end=\"4944\"><span role=\"text\"><strong data-start=\"4899\" data-end=\"4944\"><img decoding=\"async\" class=\"size-medium wp-image-2122 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Back-Grinding-Machine.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Valeur d'ing\u00e9nierie et importance pour l'industrie<\/strong><\/span><\/h2>\n<p data-start=\"4946\" data-end=\"5218\">Alors que les dispositifs semi-conducteurs continuent d'\u00e9voluer vers des performances plus \u00e9lev\u00e9es et des facteurs de forme plus petits, les plaquettes ultra-minces sont devenues une exigence critique. Cependant, l'amincissement des plaquettes en dessous de 50 \u03bcm pose des d\u00e9fis importants en mati\u00e8re de manipulation, de contr\u00f4le des contraintes et de pr\u00e9vention des d\u00e9fauts.<\/p>\n<p data-start=\"5220\" data-end=\"5556\">Le WGP-1271 rel\u00e8ve ces d\u00e9fis gr\u00e2ce \u00e0 une conception technique int\u00e9gr\u00e9e, combinant plusieurs \u00e9tapes du processus en un seul syst\u00e8me automatis\u00e9. Cela permet non seulement d'am\u00e9liorer l'efficacit\u00e9 de la production, mais aussi la fiabilit\u00e9 du processus, ce qui en fait un atout pr\u00e9cieux pour les fabricants de semi-conducteurs qui passent \u00e0 des technologies d'emballage avanc\u00e9es.<\/p>\n<h2 data-section-id=\"9dt57q\" data-start=\"5563\" data-end=\"5580\"><span role=\"text\"><strong data-start=\"5925\" data-end=\"5932\">FAQ<\/strong><\/span><\/h2>\n<h3 data-section-id=\"1xqva1w\" data-start=\"5934\" data-end=\"6021\"><span role=\"text\"><strong data-start=\"5938\" data-end=\"6019\">1. Quel est le principal avantage d'un syst\u00e8me int\u00e9gr\u00e9 d'\u00e9claircissage et de polissage ?<\/strong><\/span><\/h3>\n<p data-start=\"6022\" data-end=\"6160\">Il r\u00e9duit les \u00e9tapes de manipulation des plaquettes, raccourcit le temps de traitement et minimise le risque d'endommagement des plaquettes, ce qui se traduit par une efficacit\u00e9 et un rendement accrus.<\/p>\n<h3 data-section-id=\"globyg\" data-start=\"6167\" data-end=\"6235\"><span role=\"text\"><strong data-start=\"6171\" data-end=\"6233\">2. Le WGP-1271 peut-il traiter des plaquettes ultraminces de moins de 50 \u03bcm ?<\/strong><\/span><\/h3>\n<p data-start=\"6236\" data-end=\"6359\">Oui, le syst\u00e8me est sp\u00e9cifiquement con\u00e7u pour manipuler et traiter des plaquettes d'une \u00e9paisseur inf\u00e9rieure \u00e0 50 \u03bcm avec une grande stabilit\u00e9 et une grande pr\u00e9cision.<\/p>\n<h3 data-section-id=\"12fpzs0\" data-start=\"6366\" data-end=\"6414\"><span role=\"text\"><strong data-start=\"6370\" data-end=\"6412\">3. Quels sont les types de plaquettes pris en charge ?<\/strong><\/span><\/h3>\n<p data-start=\"6415\" data-end=\"6517\">La machine prend en charge les plaquettes de silicium (Si), de carbure de silicium (SiC) et d'autres semi-conducteurs jusqu'\u00e0 300 mm.<\/p>\n<h3 data-section-id=\"1glipf9\" data-start=\"6524\" data-end=\"6576\"><span role=\"text\"><strong data-start=\"6528\" data-end=\"6574\">4. Comment l'uniformit\u00e9 de l'\u00e9paisseur est-elle contr\u00f4l\u00e9e ?<\/strong><\/span><\/h3>\n<p data-start=\"6577\" data-end=\"6692\">Gr\u00e2ce \u00e0 un syst\u00e8me de mesure sans contact int\u00e9gr\u00e9 (NCG) combin\u00e9 \u00e0 un r\u00e9glage automatique du TTV pour un contr\u00f4le en temps r\u00e9el.<\/p>\n<h3 data-section-id=\"193st77\" data-start=\"6699\" data-end=\"6764\"><span role=\"text\"><strong data-start=\"6703\" data-end=\"6762\">5. La machine permet-elle une production enti\u00e8rement automatis\u00e9e ?<\/strong><\/span><\/h3>\n<p data-start=\"6765\" data-end=\"6889\">Oui, il comprend des syst\u00e8mes automatiques de transfert, de nettoyage et de manipulation des bandes, ce qui le rend adapt\u00e9 aux fabs automatis\u00e9s \u00e0 grand volume.<\/p>","protected":false},"excerpt":{"rendered":"<p>La machine int\u00e9gr\u00e9e d'amincissement et de polissage enti\u00e8rement automatique des wafers WGP-1271 offre une solution compl\u00e8te pour le traitement des wafers ultrafins. Avec son automatisation avanc\u00e9e, son contr\u00f4le de pr\u00e9cision et son flux de travail int\u00e9gr\u00e9, elle convient parfaitement aux applications de semi-conducteurs haut de gamme o\u00f9 la performance, le rendement et l'efficacit\u00e9 sont essentiels.<\/p>","protected":false},"featured_media":2126,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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