{"id":2342,"date":"2026-04-22T05:35:46","date_gmt":"2026-04-22T05:35:46","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2342"},"modified":"2026-04-22T07:27:32","modified_gmt":"2026-04-22T07:27:32","slug":"high-efficiency-ai80hchigh-beam-ion-implantation-equipment-for-advanced-silicon-wafer-doping","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/fi\/product\/high-efficiency-ai80hchigh-beam-ion-implantation-equipment-for-advanced-silicon-wafer-doping\/","title":{"rendered":"Tehokas Ai80HC (High Beam) -ioni-implantointilaitteisto kehittyneiden piikiekkojen dopingia varten"},"content":{"rendered":"<p data-start=\"153\" data-end=\"528\"><img fetchpriority=\"high\" decoding=\"async\" class=\"alignright wp-image-2343 size-medium\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-300x300.png\" alt=\"Tehokas Ai80HC (High Beam) -ioni-implantointilaitteisto kehittyneiden piikiekkojen dopingia varten\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/AI80HC.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Ai80HC (High Beam) -ioni-implantaatiolaitteisto on suurivirtainen ioni-implantaattori, joka on suunniteltu erityisesti 12 tuuman piikiekon puolijohdetuotantolinjoille. Se on suunniteltu nykyaikaisen integroitujen piirien valmistuksen kehittyneisiin tarkkuusdopingprosesseihin, ja se tarjoaa vakaan s\u00e4teen suorituskyvyn, korkean prosessin toistettavuuden ja erinomaisen annoss\u00e4\u00e4t\u00f6tarkkuuden.<\/p>\n<p data-start=\"530\" data-end=\"891\">J\u00e4rjestelm\u00e4 toimii laajalla energia-alueella 0,5 keV:st\u00e4 80 keV:iin, mik\u00e4 mahdollistaa joustavat implantaatio-olosuhteet sek\u00e4 matalien ett\u00e4 keskisyvien liitosten suunnittelussa. J\u00e4rjestelm\u00e4 tukee useita implantointilajeja, kuten \u00b9\u00b9B\u207a, \u2074\u2079BF\u2082\u207a, \u00b3\u00b9P\u207a, \u2077\u2075As\u207a, \u00b9\u2074N\u207a ja \u00b9H\u207a, joten se soveltuu monenlaisiin CMOS- ja kehittyneiden logiikkalaitteiden valmistusprosesseihin.<\/p>\n<p data-start=\"893\" data-end=\"1243\">Implantointikulma-alueen ollessa 0\u00b0-45\u00b0 ja korkean kulmatarkkuuden \u2264 0,1\u00b0 j\u00e4rjestelm\u00e4 takaa dopingainejakauman ja liitosprofiilin suunnittelun tarkan hallinnan. Yhdistettyn\u00e4 s\u00e4teen yhdensuuntaisuuteen \u2264 0,3\u00b0 ja tasaisuuteen \u2264 1% (1\u03c3), Ai80HC (High Beam) tarjoaa johdonmukaisen wafer-to-wafer ja waferin sis\u00e4isen prosessin vakauden.<\/p>\n<p data-start=\"1245\" data-end=\"1496\">J\u00e4rjestelm\u00e4 on suunniteltu korkean tehokkuuden tuotantoymp\u00e4rist\u00f6ihin, ja sen l\u00e4pimenoteho on \u2265 200 kiekkoa tunnissa (WPH) s\u00e4ilytt\u00e4en samalla prosessin vakaan vakauden, joten se soveltuu LSI-yhteensopiviin kehittyneiden puolijohteiden valmistuslinjoihin.<\/p>\n<h2 data-section-id=\"12rj9ab\" data-start=\"1101\" data-end=\"1126\">J\u00e4rjestelm\u00e4n arkkitehtuuri<\/h2>\n<p data-start=\"1128\" data-end=\"1199\">Ai80HC:ss\u00e4 k\u00e4ytet\u00e4\u00e4n kyps\u00e4\u00e4 ja luotettavaa s\u00e4delinjasuunnittelua, joka koostuu seuraavista osista:<\/p>\n<ul data-start=\"1201\" data-end=\"1436\">\n<li data-section-id=\"1kfcth9\" data-start=\"1201\" data-end=\"1215\">Ionil\u00e4hde<\/li>\n<li data-section-id=\"1r1hm7c\" data-start=\"1216\" data-end=\"1237\">Uuttoj\u00e4rjestelm\u00e4<\/li>\n<li data-section-id=\"1twz66q\" data-start=\"1238\" data-end=\"1255\">Massa-analysaattori<\/li>\n<li data-section-id=\"ywuuxz\" data-start=\"1256\" data-end=\"1280\">Magneettinen linssij\u00e4rjestelm\u00e4<\/li>\n<li data-section-id=\"1s57tik\" data-start=\"1281\" data-end=\"1302\">Kiihtyvyysputki<\/li>\n<li data-section-id=\"pg1cgy\" data-start=\"1303\" data-end=\"1336\">S\u00e4hk\u00f6staattinen skannausj\u00e4rjestelm\u00e4<\/li>\n<li data-section-id=\"1iwk7km\" data-start=\"1337\" data-end=\"1367\">Rinnakkaisen s\u00e4teen muotoilulinssi<\/li>\n<li data-section-id=\"1cur4hx\" data-start=\"1368\" data-end=\"1401\">Prosessikammio (p\u00e4\u00e4teasema)<\/li>\n<li data-section-id=\"qtlnqu\" data-start=\"1402\" data-end=\"1436\">Kiekkokasetti\/latausj\u00e4rjestelm\u00e4<\/li>\n<\/ul>\n<p data-start=\"1438\" data-end=\"1458\">Se on varustettu seuraavilla laitteilla:<\/p>\n<ul data-start=\"1459\" data-end=\"1572\">\n<li data-section-id=\"1jzaueb\" data-start=\"1459\" data-end=\"1494\">S\u00e4hk\u00f6staattinen kiekkoj\u00e4nnitysvaihe<\/li>\n<li data-section-id=\"1s8wavu\" data-start=\"1495\" data-end=\"1530\">Pitk\u00e4ik\u00e4inen ionil\u00e4hdeteknologia<\/li>\n<li data-section-id=\"6mih95\" data-start=\"1531\" data-end=\"1572\">T\u00e4ysin automatisoitu kiekkojen k\u00e4sittelyj\u00e4rjestelm\u00e4<\/li>\n<\/ul>\n<p data-start=\"1574\" data-end=\"1686\">T\u00e4m\u00e4 arkkitehtuuri takaa korkean s\u00e4teen vakauden, lyhentyneet huoltoseisokit ja paremman prosessin toistettavuuden.<\/p>\n<p data-start=\"1574\" data-end=\"1686\"><img decoding=\"async\" class=\"aligncenter wp-image-2371 size-large\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-1024x388.png\" alt=\"\" width=\"1024\" height=\"388\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-1024x388.png 1024w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-300x114.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-768x291.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-18x7.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-600x227.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs.png 1216w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><\/p>\n<h2 data-section-id=\"106914\" data-start=\"1693\" data-end=\"1727\">T\u00e4rkeimm\u00e4t tekniset tiedot<\/h2>\n<table>\n<thead>\n<tr>\n<th>Kohde<\/th>\n<th>Tekniset tiedot<\/th>\n<\/tr>\n<\/thead>\n<tbody>\n<tr>\n<td>Kiekon koko<\/td>\n<td>12 tuumaa<\/td>\n<\/tr>\n<tr>\n<td>Energia-alue<\/td>\n<td>0,5 - 80 keV<\/td>\n<\/tr>\n<tr>\n<td>Implantoidut elementit<\/td>\n<td>\u00b9\u00b9B\u207a, \u2074\u2079BF\u2082\u207a, \u00b3\u00b9P\u207a, \u2077\u2075As\u207a, \u00b9\u2074N\u207a, \u00b9H\u207a.<\/td>\n<\/tr>\n<tr>\n<td>Implantin kulma<\/td>\n<td>0\u00b0 - 45\u00b0<\/td>\n<\/tr>\n<tr>\n<td>Kulman tarkkuus<\/td>\n<td>\u2264 0.1\u00b0<\/td>\n<\/tr>\n<tr>\n<td>Annosalue<\/td>\n<td>5E11 - 1E17 ionia\/cm\u00b2.<\/td>\n<\/tr>\n<tr>\n<td>Palkin vakaus<\/td>\n<td>\u2264 10% \/ tunti (60 minuutin kuluessa; s\u00e4teen keskeytyminen ja valokaari \u2264 1 kerta)<\/td>\n<\/tr>\n<tr>\n<td>Palkin rinnakkaisuus<\/td>\n<td>\u2264 0.3\u00b0<\/td>\n<\/tr>\n<tr>\n<td>L\u00e4pimeno (WPH)<\/td>\n<td>\u2265 200 kiekkoa\/tunti<\/td>\n<\/tr>\n<tr>\n<td>Tasaisuus (1\u03c3)<\/td>\n<td>\u2264 1%<\/td>\n<\/tr>\n<tr>\n<td>Toistettavuus (1\u03c3)<\/td>\n<td>\u2264 1%<\/td>\n<\/tr>\n<tr>\n<td>Prosessin yhteensopivuus<\/td>\n<td>Yhteensopiva LSI-prosessin kanssa<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<h2 data-section-id=\"yb78ly\" data-start=\"2475\" data-end=\"2506\">T\u00e4rkeimm\u00e4t ominaisuudet ja edut<\/h2>\n<h3 data-section-id=\"13hha2k\" data-start=\"2508\" data-end=\"2541\">1. \u00c4lyk\u00e4s ohjausj\u00e4rjestelm\u00e4<\/h3>\n<p data-start=\"2542\" data-end=\"2706\">Varustettu visualisoidulla ja \u00e4lykk\u00e4\u00e4ll\u00e4 ohjelmistoalustalla, joka mahdollistaa yksinkertaistetun k\u00e4yt\u00f6n, nopean vikadiagnoosin ja korkean j\u00e4rjestelm\u00e4n vakauden tuotannon aikana.<\/p>\n<h3 data-section-id=\"1cy4f9q\" data-start=\"2713\" data-end=\"2740\">2. Pitk\u00e4ik\u00e4inen ionil\u00e4hde<\/h3>\n<p data-start=\"2741\" data-end=\"2863\">Kehittynyt ionil\u00e4hdesuunnittelu, jonka k\u00e4ytt\u00f6ik\u00e4 on \u2265500 tuntia, mik\u00e4 v\u00e4hent\u00e4\u00e4 merkitt\u00e4v\u00e4sti k\u00e4ytt\u00f6katkoksia ja huoltokustannuksia.<\/p>\n<h3 data-section-id=\"4euk5j\" data-start=\"2870\" data-end=\"2903\">3. S\u00e4teen diagnostiikkakyky<\/h3>\n<p data-start=\"2904\" data-end=\"2988\">Integroitu 2D-s\u00e4teilyprofiilin mittausj\u00e4rjestelm\u00e4, joka pystyy seuraamaan tarkasti:<\/p>\n<ul data-start=\"2989\" data-end=\"3019\">\n<li data-section-id=\"1ct5xfp\" data-start=\"2989\" data-end=\"3003\">S\u00e4teen leveys<\/li>\n<li data-section-id=\"1vm2uvw\" data-start=\"3004\" data-end=\"3019\">Palkin korkeus<\/li>\n<\/ul>\n<p data-start=\"3021\" data-end=\"3092\">T\u00e4m\u00e4 parantaa istutustarkkuutta ja parantaa prosessin toistettavuutta.<\/p>\n<h3 data-section-id=\"qq9ajq\" data-start=\"3099\" data-end=\"3132\">4. Korkea tuotannon tehokkuus<\/h3>\n<p data-start=\"3133\" data-end=\"3310\">Ai80HC tarjoaa yli 1,5-kertaisen l\u00e4p\u00e4isykyvyn tavanomaisiin j\u00e4rjestelmiin verrattuna, joten se soveltuu suuren volyymin puolijohdevalmistusymp\u00e4rist\u00f6ihin.<\/p>\n<h3 data-section-id=\"1h2ge5m\" data-start=\"3317\" data-end=\"3357\">5. Kehittynyt malli-implantin toiminta<\/h3>\n<p data-start=\"3358\" data-end=\"3429\">Tukee kuvioitua ioni-istutusta, joka mahdollistaa annosjakelun:<\/p>\n<ul data-start=\"3430\" data-end=\"3488\">\n<li data-section-id=\"fqh2r6\" data-start=\"3430\" data-end=\"3450\">Ympyr\u00e4nmuotoiset alueet<\/li>\n<li data-section-id=\"1aoby05\" data-start=\"3451\" data-end=\"3488\">Kvadranttipohjainen kiekkojen segmentointi<\/li>\n<\/ul>\n<p data-start=\"3490\" data-end=\"3502\">T\u00e4m\u00e4 mahdollistaa:<\/p>\n<ul data-start=\"3503\" data-end=\"3617\">\n<li data-section-id=\"chxy3y\" data-start=\"3503\" data-end=\"3552\">Useita prosessiolosuhteita yhdell\u00e4 kiekolla<\/li>\n<li data-section-id=\"z1xkzj\" data-start=\"3553\" data-end=\"3589\">Prosessin kehityskustannusten alentaminen<\/li>\n<li data-section-id=\"15uh0gh\" data-start=\"3590\" data-end=\"3617\">T&amp;K-toiminnan tehokkuuden parantaminen<\/li>\n<\/ul>\n<p data-start=\"3619\" data-end=\"3780\">Esimerkki: T\u00e4m\u00e4 nopeuttaa merkitt\u00e4v\u00e4sti prosessin optimointia.<\/p>\n<h2 data-section-id=\"18zz1hm\" data-start=\"3787\" data-end=\"3810\">Hakemus<\/h2>\n<ul data-start=\"3812\" data-end=\"4005\">\n<li data-section-id=\"16inq9u\" data-start=\"3812\" data-end=\"3839\">CMOS-laitteiden valmistus<\/li>\n<li data-section-id=\"xjegvm\" data-start=\"3840\" data-end=\"3875\">Kehittynyt logiikka-IC-valmistus<\/li>\n<li data-section-id=\"1xlm3tz\" data-start=\"3876\" data-end=\"3906\">Tehopuolijohteiden seostaminen<\/li>\n<li data-section-id=\"1ursyu4\" data-start=\"3907\" data-end=\"3959\">Tutkimus- ja kehityspuolijohdepilottilinjat<\/li>\n<li data-section-id=\"1k6v1m6\" data-start=\"3960\" data-end=\"4005\">Piipohjaisten integroitujen piirien tuotanto<\/li>\n<\/ul>\n<h2 data-section-id=\"1idaiwr\" data-start=\"58\" data-end=\"95\">Usein kysytyt kysymykset (FAQ)<\/h2>\n<h3 data-section-id=\"squ7m7\" data-start=\"97\" data-end=\"166\">1. Mille kiekkokoolle Ai80HC (High Beam) -j\u00e4rjestelm\u00e4 on suunniteltu?<\/h3>\n<p data-start=\"167\" data-end=\"381\">Ai80HC (High Beam) -ioni-implantointij\u00e4rjestelm\u00e4 on suunniteltu 12 tuuman piikiekkojen tuotantolinjoille, joten se soveltuu kehittyneeseen puolijohdevalmistukseen ja suuren volyymin integroitujen piirien valmistukseen.<\/p>\n<h3 data-section-id=\"foelcb\" data-start=\"388\" data-end=\"458\">2. Mik\u00e4 on t\u00e4m\u00e4n j\u00e4rjestelm\u00e4n energia-alue ja prosessikapasiteetti?<\/h3>\n<p data-start=\"459\" data-end=\"716\">J\u00e4rjestelm\u00e4 toimii energia-alueella 0,5 keV-80 keV, mik\u00e4 tukee sek\u00e4 matalaa ett\u00e4 keskisyv\u00e4\u00e4 implantointia. J\u00e4rjestelm\u00e4 on yhteensopiva LSI-prosessien kanssa, mukaan lukien matalien liitosten muodostaminen ja source\/drain-tekniikka kehittyneiss\u00e4 laiterakenteissa.<\/p>\n<h3 data-section-id=\"jluc3f\" data-start=\"723\" data-end=\"792\">3. Millaisen tarkkuuden ja vakauden j\u00e4rjestelm\u00e4 tarjoaa?<\/h3>\n<p data-start=\"793\" data-end=\"850\">Ai80HC (High Beam) takaa prosessin korkean johdonmukaisuuden:<\/p>\n<ul data-start=\"851\" data-end=\"965\">\n<li data-section-id=\"8ldlzj\" data-start=\"851\" data-end=\"878\">Kulman tarkkuus \u2264 0,1\u00b0<\/li>\n<li data-section-id=\"nyztaj\" data-start=\"879\" data-end=\"905\">Tasaisuus (1\u03c3) \u2264 1%<\/li>\n<li data-section-id=\"ai4v3y\" data-start=\"906\" data-end=\"935\">Toistettavuus (1\u03c3) \u2264 1%<\/li>\n<li data-section-id=\"1hjdqzq\" data-start=\"936\" data-end=\"965\">Palkin yhdensuuntaisuus \u2264 0,3\u00b0<\/li>\n<\/ul>\n<p data-start=\"967\" data-end=\"1069\">N\u00e4m\u00e4 eritelm\u00e4t takaavat vakaan wafer-to-wafer-suorituskyvyn ja korkean tuoton puolijohdetuotannossa.<\/p>","protected":false},"excerpt":{"rendered":"<p>Ai80HC (High Beam) -sarjan ioni-implantointij\u00e4rjestelm\u00e4 on suurivirtainen ioni-implantointilaite, joka on suunniteltu erityisesti 12-tuumaisten piikiekkojen puolijohdetuotantolinjoille. Se on suunniteltu nykyaikaisen integroitujen piirien valmistuksen kehittyneisiin tarkkuusdopingprosesseihin, ja se tarjoaa vakaan s\u00e4teen suorituskyvyn, korkean prosessin toistettavuuden ja erinomaisen annoss\u00e4\u00e4t\u00f6tarkkuuden.<\/p>","protected":false},"featured_media":2343,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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