{"id":2327,"date":"2026-04-21T06:21:20","date_gmt":"2026-04-21T06:21:20","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2327"},"modified":"2026-04-21T06:21:21","modified_gmt":"2026-04-21T06:21:21","slug":"wafer-thinning-system-precision-back-grinding-equipment-for-si-sic-and-4-to-12-inch-semiconductor-wafers","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/fi\/product\/wafer-thinning-system-precision-back-grinding-equipment-for-si-sic-and-4-to-12-inch-semiconductor-wafers\/","title":{"rendered":"Wafer Thinning System tarkkuus takaisin hionta laitteet Si SiC ja 4-12 tuuman puolijohdekiekot"},"content":{"rendered":"<p data-start=\"294\" data-end=\"629\"><img fetchpriority=\"high\" decoding=\"async\" class=\"alignright wp-image-2329 size-medium\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity2-300x300.webp\" alt=\"Wafer Thinning System tarkkuus takaisin hionta laitteet Si SiC ja 4-12 tuuman puolijohdekiekot\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity2-300x300.webp 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity2-150x150.webp 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity2-12x12.webp 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity2-600x600.webp 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity2-100x100.webp 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity2.webp 750w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Wafer Thinning System Precision Back Grinding Equipment on huipputarkka kiekkojen k\u00e4sittelyratkaisu, joka on suunniteltu kehittyneeseen puolijohdevalmistukseen. Se tukee 4-12 tuuman kiekkoja, mukaan lukien pii (Si), piikarbidi (SiC), galliumarsenidi (GaAs), safiiri ja muut hauraat puolijohdemateriaalit.<\/p>\n<p data-start=\"631\" data-end=\"924\">T\u00e4m\u00e4 j\u00e4rjestelm\u00e4 on suunniteltu eritt\u00e4in tarkkaan kiekon takapuolen ohentamiseen, joka mahdollistaa paksuuden pienent\u00e4misen mikronin ja mikronin alapuolelle s\u00e4ilytt\u00e4en samalla erinomaisen pinnan eheyden. J\u00e4rjestelm\u00e4ll\u00e4 on ratkaiseva merkitys kehittyneiss\u00e4 pakkauksissa, teholaitteissa, MEMS-laitteissa ja yhdistelm\u00e4puolijohteiden valmistuksessa.<\/p>\n<p data-start=\"926\" data-end=\"1135\">Yhdist\u00e4m\u00e4ll\u00e4 korkean j\u00e4ykkyyden mekaanisen rakenteen, tarkan Z-akselin ohjauksen ja reaaliaikaisen paksuuden seurannan laitteisto takaa vakaan ja toistettavan k\u00e4sittelytehon teollisen mittakaavan tuotantoa varten.<\/p>\n<hr data-start=\"1137\" data-end=\"1140\" \/>\n<h2 data-section-id=\"17sw59i\" data-start=\"1142\" data-end=\"1171\"><span role=\"text\">T\u00e4rkeimm\u00e4t tekniset ominaisuudet<\/span><\/h2>\n<h3 data-section-id=\"kcynyn\" data-start=\"1173\" data-end=\"1213\"><span role=\"text\">Tarkka paksuuden s\u00e4\u00e4t\u00f6<\/span><\/h3>\n<ul data-start=\"1214\" data-end=\"1353\">\n<li data-section-id=\"qvz3ew\" data-start=\"1214\" data-end=\"1245\">Paksuuden tarkkuus: \u00b11 \u03bcm<\/li>\n<li data-section-id=\"vbuidj\" data-start=\"1246\" data-end=\"1290\">Kokonaispaksuuden vaihtelu (TTV): \u22642 \u03bcm.<\/li>\n<li data-section-id=\"rxazu8\" data-start=\"1291\" data-end=\"1353\">Kehittyneill\u00e4 malleilla saavutetaan jopa \u00b10,5 \u03bcm:n submikroninen s\u00e4\u00e4t\u00f6.<\/li>\n<\/ul>\n<h3 data-section-id=\"15s8v24\" data-start=\"1355\" data-end=\"1390\"><span role=\"text\"><img decoding=\"async\" class=\"size-medium wp-image-2330 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity-300x300.webp\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity-300x300.webp 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity-150x150.webp 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity-12x12.webp 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity-600x600.webp 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity-100x100.webp 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/wafer_thinning_system_precision_thinning_equipment_sic_si_wafer_compatible_4_12inch_wafer_capacity.webp 750w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Laaja materiaaliyhteensopivuus<\/span><\/h3>\n<p data-start=\"1391\" data-end=\"1452\">Tukee monenlaisia puolijohde- ja hauraita materiaaleja:<\/p>\n<ul data-start=\"1453\" data-end=\"1574\">\n<li data-section-id=\"1mmq8pa\" data-start=\"1453\" data-end=\"1467\">Pii (Si)<\/li>\n<li data-section-id=\"1ah49cn\" data-start=\"1468\" data-end=\"1491\">Piikarbidi (SiC)<\/li>\n<li data-section-id=\"6pubop\" data-start=\"1492\" data-end=\"1517\">Galliumarsenidi (GaAs)<\/li>\n<li data-section-id=\"pz60z2\" data-start=\"1518\" data-end=\"1536\">Safiiri (Al\u2082O\u2083)<\/li>\n<li data-section-id=\"1x0u20i\" data-start=\"1537\" data-end=\"1574\">muut puolijohdekiekot<\/li>\n<\/ul>\n<h3 data-section-id=\"1k27fm2\" data-start=\"1576\" data-end=\"1608\"><span role=\"text\">Wafer-kokojen yhteensopivuus<\/span><\/h3>\n<ul data-start=\"1609\" data-end=\"1726\">\n<li data-section-id=\"fhdptx\" data-start=\"1609\" data-end=\"1662\">4 tuuman \/ 6 tuuman \/ 8 tuuman \/ 10 tuuman \/ 12 tuuman kiekot.<\/li>\n<li data-section-id=\"5k0pa3\" data-start=\"1663\" data-end=\"1726\">Joustava k\u00e4sittely sek\u00e4 vakiomuotoisille ett\u00e4 r\u00e4\u00e4t\u00e4l\u00f6idyille alustoille<\/li>\n<\/ul>\n<h3 data-section-id=\"rmjxfn\" data-start=\"1728\" data-end=\"1768\"><span role=\"text\">Eritt\u00e4in vakaa mekaaninen j\u00e4rjestelm\u00e4<\/span><\/h3>\n<ul data-start=\"1769\" data-end=\"1949\">\n<li data-section-id=\"1wor6l0\" data-start=\"1769\" data-end=\"1804\">Eritt\u00e4in j\u00e4ykk\u00e4 ilmalaakeroitu kara<\/li>\n<li data-section-id=\"7gqyrg\" data-start=\"1805\" data-end=\"1848\">V\u00e4h\u00e4n t\u00e4rin\u00e4\u00e4 aiheuttava tarkkuushionta-alusta<\/li>\n<li data-section-id=\"wf9b1q\" data-start=\"1849\" data-end=\"1892\">Maahantuotu kuularuuvi + lineaarinen ohjausj\u00e4rjestelm\u00e4<\/li>\n<li data-section-id=\"fj2519\" data-start=\"1893\" data-end=\"1949\">Korkean tarkkuuden servomoottorin ohjaus (0,1 \u03bcm resoluutio)<\/li>\n<\/ul>\n<h3 data-section-id=\"1e5oiya\" data-start=\"1951\" data-end=\"1982\"><span role=\"text\">Kehittynyt j\u00e4\u00e4hdytysj\u00e4rjestelm\u00e4<\/span><\/h3>\n<ul data-start=\"1983\" data-end=\"2088\">\n<li data-section-id=\"1u6gyvp\" data-start=\"1983\" data-end=\"2038\">Vesij\u00e4\u00e4hdytteinen karaj\u00e4rjestelm\u00e4 takaa l\u00e4mm\u00f6nkest\u00e4vyyden<\/li>\n<li data-section-id=\"1927cdq\" data-start=\"2039\" data-end=\"2088\">Est\u00e4\u00e4 muodonmuutokset suurnopeushionnan aikana<\/li>\n<\/ul>\n<hr data-start=\"2090\" data-end=\"2093\" \/>\n<h2 data-section-id=\"1ftdxrk\" data-start=\"2095\" data-end=\"2122\"><span role=\"text\">J\u00e4rjestelm\u00e4n konfigurointi<\/span><\/h2>\n<p data-start=\"2124\" data-end=\"2189\">Kiekkojen ohennusj\u00e4rjestelm\u00e4 sis\u00e4lt\u00e4\u00e4 useita toiminnallisia moduuleja:<\/p>\n<h3 data-section-id=\"djoygz\" data-start=\"2191\" data-end=\"2227\"><span role=\"text\">1. Tarkkuushiomoduuli<\/span><\/h3>\n<p data-start=\"2228\" data-end=\"2294\">Suorittaa hallitun materiaalinpoiston korkealla pinnan tasaisuudella.<\/p>\n<h3 data-section-id=\"gytvay\" data-start=\"2296\" data-end=\"2338\"><span role=\"text\">2. Z-akselin tarkkuusohjausj\u00e4rjestelm\u00e4<\/span><\/h3>\n<p data-start=\"2339\" data-end=\"2409\">Mahdollistaa eritt\u00e4in hienon pystysuuntaisen s\u00e4\u00e4d\u00f6n tasaisen kiekonpaksuuden saavuttamiseksi.<\/p>\n<h3 data-section-id=\"i93eki\" data-start=\"2411\" data-end=\"2450\"><span role=\"text\">3. Paksuuden mittausj\u00e4rjestelm\u00e4<\/span><\/h3>\n<p data-start=\"2451\" data-end=\"2519\">Reaaliaikainen kosketus-\/kosketukseton mittaus varmistaa prosessin vakauden.<\/p>\n<h3 data-section-id=\"ycd038\" data-start=\"2521\" data-end=\"2550\"><span role=\"text\">4. Tyhji\u00f6 kiekkojyrsin<\/span><\/h3>\n<p data-start=\"2551\" data-end=\"2626\">Kiekkojen turvallinen kiinnitys, mukaan lukien r\u00e4\u00e4t\u00e4l\u00f6idyt ratkaisut ep\u00e4s\u00e4\u00e4nn\u00f6llisille kiekoille.<\/p>\n<h3 data-section-id=\"1xwcykg\" data-start=\"2628\" data-end=\"2664\"><span role=\"text\">5. Automaation ohjausj\u00e4rjestelm\u00e4<\/span><\/h3>\n<ul data-start=\"2665\" data-end=\"2767\">\n<li data-section-id=\"mbtl4z\" data-start=\"2665\" data-end=\"2706\">T\u00e4ysautomaattinen \/ puoliautomaattinen toimintatila<\/li>\n<li data-section-id=\"1tpxb04\" data-start=\"2707\" data-end=\"2734\">Toimintalokin tallennus<\/li>\n<li data-section-id=\"1chqk9c\" data-start=\"2735\" data-end=\"2767\">Reseptipohjainen prosessinohjaus<\/li>\n<\/ul>\n<hr data-start=\"2769\" data-end=\"2772\" \/>\n<h2 data-section-id=\"gimyd4\" data-start=\"2774\" data-end=\"2804\"><span role=\"text\"><img decoding=\"async\" class=\"wp-image-2331 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Thinning-System-Precision-Back-Grinding-Equipment-for-Si-SiC-and-4-to-12-Inch-Semiconductor-Wafers2-300x81.png\" alt=\"\" width=\"393\" height=\"106\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Thinning-System-Precision-Back-Grinding-Equipment-for-Si-SiC-and-4-to-12-Inch-Semiconductor-Wafers2-300x81.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Thinning-System-Precision-Back-Grinding-Equipment-for-Si-SiC-and-4-to-12-Inch-Semiconductor-Wafers2-18x5.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Thinning-System-Precision-Back-Grinding-Equipment-for-Si-SiC-and-4-to-12-Inch-Semiconductor-Wafers2-600x162.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Wafer-Thinning-System-Precision-Back-Grinding-Equipment-for-Si-SiC-and-4-to-12-Inch-Semiconductor-Wafers2.png 680w\" sizes=\"(max-width: 393px) 100vw, 393px\" \/> Jalostusvalmiudet<\/span><\/h2>\n<p data-start=\"2806\" data-end=\"2876\">J\u00e4rjestelm\u00e4 on suunniteltu suorituskykyiseen kiekon takapuolen k\u00e4sittelyyn:<\/p>\n<ul data-start=\"2878\" data-end=\"3074\">\n<li data-section-id=\"xh3w3z\" data-start=\"2878\" data-end=\"2909\">Piikiekkojen takahionta<\/li>\n<li data-section-id=\"xar9m4\" data-start=\"2910\" data-end=\"2950\">SiC-kiekkojen ohentaminen teholaitteita varten<\/li>\n<li data-section-id=\"198a8mj\" data-start=\"2951\" data-end=\"2986\">GaN- ja GaAs-alustan ohentaminen<\/li>\n<li data-section-id=\"2lf608\" data-start=\"2987\" data-end=\"3024\">Safiirikiekon tarkkuusohentaminen<\/li>\n<li data-section-id=\"1kfyhfx\" data-start=\"3025\" data-end=\"3074\">Eritt\u00e4in ohuiden kiekkojen valmistelu 3D-pakkauksia varten<\/li>\n<\/ul>\n<hr data-start=\"3076\" data-end=\"3079\" \/>\n<h2 data-section-id=\"k0zlak\" data-start=\"3081\" data-end=\"3100\"><span role=\"text\">Sovellukset<\/span><\/h2>\n<h3 data-section-id=\"1jqwtfq\" data-start=\"3102\" data-end=\"3140\"><span role=\"text\">1. Tehopuolijohdekomponentit<\/span><\/h3>\n<p data-start=\"3141\" data-end=\"3222\">K\u00e4ytet\u00e4\u00e4n SiC MOSFETeiss\u00e4, IGBT:iss\u00e4 ja korkeaj\u00e4nnitelaitteissa, jotka vaativat eritt\u00e4in ohuita kiekkoja.<\/p>\n<h3 data-section-id=\"1a6priz\" data-start=\"3224\" data-end=\"3253\"><span role=\"text\"><img loading=\"lazy\" decoding=\"async\" class=\"wp-image-2332 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application3-300x188.png\" alt=\"\" width=\"421\" height=\"264\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application3-300x188.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application3-18x12.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application3-600x376.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application3.png 680w\" sizes=\"(max-width: 421px) 100vw, 421px\" \/>2. Kehittyneet pakkaukset<\/span><\/h3>\n<p data-start=\"3254\" data-end=\"3282\">Tukee kiekon ohentamista:<\/p>\n<ul data-start=\"3283\" data-end=\"3375\">\n<li data-section-id=\"18hyzkr\" data-start=\"3283\" data-end=\"3306\">Flip-sirujen pakkaaminen<\/li>\n<li data-section-id=\"16lrd61\" data-start=\"3307\" data-end=\"3335\">2.5D \/ 3D IC-integraatio<\/li>\n<li data-section-id=\"1s3z3q5\" data-start=\"3336\" data-end=\"3375\">TSV (Through Silicon Via) -prosessit<\/li>\n<\/ul>\n<h3 data-section-id=\"m46f4y\" data-start=\"3377\" data-end=\"3411\"><span role=\"text\">3. Yhdistetyt puolijohteet<\/span><\/h3>\n<p data-start=\"3412\" data-end=\"3464\">Soveltuu GaN-, GaAs- ja InP-laitteiden valmistukseen.<\/p>\n<h3 data-section-id=\"kz928f\" data-start=\"3466\" data-end=\"3500\"><span role=\"text\">4. LED ja optoelektroniikka<\/span><\/h3>\n<p data-start=\"3501\" data-end=\"3572\">Safiiri- ja yhdistelm\u00e4kiekkojen ohentaminen LED-siruja ja optisia laitteita varten.<\/p>\n<hr data-start=\"3574\" data-end=\"3577\" \/>\n<h2 data-section-id=\"d8omv1\" data-start=\"3579\" data-end=\"3596\"><span role=\"text\">Edut<\/span><\/h2>\n<ul data-start=\"3598\" data-end=\"3893\">\n<li data-section-id=\"u42zog\" data-start=\"3598\" data-end=\"3645\">Kyps\u00e4 ja vakaa kiekon ohentamisteknologia<\/li>\n<li data-section-id=\"1pb253f\" data-start=\"3646\" data-end=\"3688\">Korkean tarkkuuden sy\u00f6tt\u00f6hiontaj\u00e4rjestelm\u00e4<\/li>\n<li data-section-id=\"1b2hrea\" data-start=\"3689\" data-end=\"3728\">Erinomainen pinnankarheuden hallinta<\/li>\n<li data-section-id=\"swoy5t\" data-start=\"3729\" data-end=\"3787\">Korkea UPH (jopa 30 kiekkoa\/tunti vakioprosesseissa)<\/li>\n<li data-section-id=\"folyym\" data-start=\"3788\" data-end=\"3842\">Vahva sopeutumiskyky hauraille ja koville materiaaleille<\/li>\n<li data-section-id=\"kkjwmp\" data-start=\"3843\" data-end=\"3893\">T\u00e4ysin automatisoitu prosessien integrointivalmius<\/li>\n<\/ul>\n<hr data-start=\"3895\" data-end=\"3898\" \/>\n<h2 data-section-id=\"1nn32qm\" data-start=\"3900\" data-end=\"3929\"><span role=\"text\">Suorituskyvyn kohokohdat<\/span><\/h2>\n<ul data-start=\"3931\" data-end=\"4171\">\n<li data-section-id=\"ndqugr\" data-start=\"3931\" data-end=\"3980\">V\u00e4himm\u00e4isresoluutio: Z-akselin ohjaus: 0,1 \u03bcm\/s<\/li>\n<li data-section-id=\"1sfyown\" data-start=\"3981\" data-end=\"4020\">Paksuuden tasaisuus: \u22641-2 \u03bcm TTV<\/li>\n<li data-section-id=\"2ioyhe\" data-start=\"4021\" data-end=\"4066\">Nopea kara, jossa eritt\u00e4in alhainen t\u00e4rin\u00e4<\/li>\n<li data-section-id=\"1svxu2t\" data-start=\"4067\" data-end=\"4109\">Reaaliaikainen prosessin seuranta ja kirjaaminen<\/li>\n<li data-section-id=\"kjsadr\" data-start=\"4110\" data-end=\"4171\">Yhteensopiva sek\u00e4 T&amp;K- ett\u00e4 massatuotantoymp\u00e4rist\u00f6jen kanssa<\/li>\n<\/ul>\n<hr data-start=\"4173\" data-end=\"4176\" \/>\n<h2 data-section-id=\"lalgo8\" data-start=\"4178\" data-end=\"4206\"><span role=\"text\">Mukauttamisvaihtoehdot<\/span><\/h2>\n<p data-start=\"4208\" data-end=\"4273\">Tarjoamme joustavaa r\u00e4\u00e4t\u00e4l\u00f6inti\u00e4 teollisuuden erilaisiin tarpeisiin:<\/p>\n<ul data-start=\"4275\" data-end=\"4459\">\n<li data-section-id=\"kmxap1\" data-start=\"4275\" data-end=\"4315\">Erikoisvalmisteiset kiekkoj\u00e4nnittimet (ep\u00e4s\u00e4\u00e4nn\u00f6lliset muodot)<\/li>\n<li data-section-id=\"1om94rb\" data-start=\"4316\" data-end=\"4368\">Laajennettu paksuuden mittausalue (40 mm:iin asti)<\/li>\n<li data-section-id=\"1gmsugm\" data-start=\"4369\" data-end=\"4399\">Prosessin reseptin mukauttaminen<\/li>\n<li data-section-id=\"enumxl\" data-start=\"4400\" data-end=\"4459\">Automaatiointegraatio tuotantoketjun alkup\u00e4\u00e4n\/p\u00e4\u00e4osan laitteiden kanssa<\/li>\n<\/ul>\n<hr data-start=\"4461\" data-end=\"4464\" \/>\n<h2 data-section-id=\"elc90z\" data-start=\"4466\" data-end=\"4476\"><span role=\"text\">FAQ<\/span><\/h2>\n<h3 data-section-id=\"97umay\" data-start=\"4478\" data-end=\"4525\"><span role=\"text\">Kysymys 1: Voiko t\u00e4m\u00e4 j\u00e4rjestelm\u00e4 k\u00e4sitell\u00e4 SiC-kiekkoja?<\/span><\/h3>\n<p data-start=\"4526\" data-end=\"4649\">Kyll\u00e4, se on optimoitu erityisesti SiC-kiekkojen ohentamiseen ja takapuolen hiontaan, joka soveltuu teholaitesovelluksiin.<\/p>\n<h3 data-section-id=\"pwbsig\" data-start=\"4651\" data-end=\"4705\"><span role=\"text\">Kysymys 2: Mik\u00e4 on saavutettavissa oleva paksuuden tarkkuus?<\/span><\/h3>\n<p data-start=\"4706\" data-end=\"4802\">Vakiomalleilla saavutetaan \u00b11 \u03bcm, ja huippuluokan kokoonpanoilla voidaan saavuttaa \u00b10,5 \u03bcm ja TTV \u22641 \u03bcm.<\/p>\n<h3 data-section-id=\"4mq81u\" data-start=\"4804\" data-end=\"4848\"><span role=\"text\">Kysymys 3: Tukeeko se t\u00e4ytt\u00e4 automaatiota?<\/span><\/h3>\n<p data-start=\"4849\" data-end=\"4944\">Kyll\u00e4, sek\u00e4 t\u00e4ysautomaatti- ett\u00e4 puoliautomaattitilat ovat k\u00e4ytett\u00e4viss\u00e4 tuotantovaatimusten mukaan.<\/p>","protected":false},"excerpt":{"rendered":"<p>Wafer Thinning System Precision Back Grinding Equipment on huipputarkka kiekkojen k\u00e4sittelyratkaisu, joka on suunniteltu kehittyneeseen puolijohdevalmistukseen. Se tukee 4-12 tuuman kiekkoja, mukaan lukien pii (Si), piikarbidi (SiC), galliumarsenidi (GaAs), safiiri ja muut hauraat yhdistelm\u00e4puolijohdemateriaalit.J\u00e4rjestelm\u00e4 on suunniteltu eritt\u00e4in tarkkaan kiekon takapuolen ohentamiseen, mik\u00e4 mahdollistaa paksuuden pienent\u00e4misen mikronin ja alle mikronin tasolle s\u00e4ilytt\u00e4en samalla erinomaisen pinnan eheyden.<\/p>","protected":false},"featured_media":2330,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}}},"product_brand":[],"product_cat":[724],"product_tag":[1160,1000,1163,1165,1162,1164,804,1158,1159,1161,547,801,1157,1156],"class_list":{"0":"post-2327","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-grinding-machine","7":"product_tag-12-inch-wafer-equipment","8":"product_tag-advanced-packaging-equipment","9":"product_tag-compound-semiconductor-thinning","10":"product_tag-power-device-wafer-equipment","11":"product_tag-precision-wafer-grinder","12":"product_tag-sapphire-wafer-processing","13":"product_tag-semiconductor-grinding-machine","14":"product_tag-si-wafer-thinning","15":"product_tag-sic-wafer-thinning-equipment","16":"product_tag-ttv-control-system","17":"product_tag-ultra-thin-wafer-processing","18":"product_tag-wafer-back-grinding-machine","19":"product_tag-wafer-thinning-equipment","20":"product_tag-wafer-thinning-system","21":"desktop-align-left","22":"tablet-align-left","23":"mobile-align-left","24":"ast-product-gallery-layout-horizontal-slider","25":"ast-product-tabs-layout-horizontal","27":"first","28":"instock","29":"shipping-taxable","30":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/www.zmsh-semitech.com\/fi\/wp-json\/wp\/v2\/product\/2327","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.zmsh-semitech.com\/fi\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.zmsh-semitech.com\/fi\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/fi\/wp-json\/wp\/v2\/comments?post=2327"}],"version-history":[{"count":2,"href":"https:\/\/www.zmsh-semitech.com\/fi\/wp-json\/wp\/v2\/product\/2327\/revisions"}],"predecessor-version":[{"id":2334,"href":"https:\/\/www.zmsh-semitech.com\/fi\/wp-json\/wp\/v2\/product\/2327\/revisions\/2334"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/fi\/wp-json\/wp\/v2\/media\/2330"}],"wp:attachment":[{"href":"https:\/\/www.zmsh-semitech.com\/fi\/wp-json\/wp\/v2\/media?parent=2327"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/fi\/wp-json\/wp\/v2\/product_brand?post=2327"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/fi\/wp-json\/wp\/v2\/product_cat?post=2327"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/fi\/wp-json\/wp\/v2\/product_tag?post=2327"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}