{"id":2077,"date":"2026-04-03T02:07:51","date_gmt":"2026-04-03T02:07:51","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2077"},"modified":"2026-04-03T02:09:04","modified_gmt":"2026-04-03T02:09:04","slug":"integrated-vertical-airflow-sic-epitaxy-equipment-for-6-8-epi-wafers","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/fi\/product\/integrated-vertical-airflow-sic-epitaxy-equipment-for-6-8-epi-wafers\/","title":{"rendered":"Integroitu pystysuora ilmavirta SiC-epitaksilaitteisto 6\u201d\/8\u201d Epi-kiekkoille"},"content":{"rendered":"<p data-start=\"187\" data-end=\"641\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2079 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Integroitu pystysuora ilmavirtaus piikarbidi (SiC) epitaksilaitteisto on edistyksellinen epitaksiaalinen kasvuj\u00e4rjestelm\u00e4, joka on suunniteltu 6 tuuman ja 8 tuuman SiC-epitaksiaaltojen tehokkaaseen tuotantoon. J\u00e4rjestelm\u00e4 on suunniteltu vastaamaan tehopuolijohteiden valmistuksen kasvaviin vaatimuksiin, ja siin\u00e4 yhdistyv\u00e4t tarkka l\u00e4mm\u00f6ns\u00e4\u00e4t\u00f6, optimoitu kaasuvirtausdynamiikka ja \u00e4lyk\u00e4s automaatio, jotka tuottavat poikkeuksellisen hyv\u00e4n suorituskyvyn tasalaatuisuuden, l\u00e4pimenon ja vikojen hallinnan osalta.<\/p>\n<p data-start=\"643\" data-end=\"982\">J\u00e4rjestelm\u00e4n ytimess\u00e4 on innovatiivinen pystysuuntainen ilmavirtaussuihkup\u00e4\u00e4n rakenne, joka mahdollistaa prosessikaasujen tasaisen jakautumisen kiekon pinnalle. Yhdess\u00e4 monialueisen l\u00e4mp\u00f6tilakent\u00e4n hallinnan kanssa se takaa erinomaisen paksuuden tasaisuuden ja vakaan dopingkonsentraation, mik\u00e4 on kriittisen t\u00e4rke\u00e4\u00e4 suorituskykyisille SiC-teholaitteille.<\/p>\n<p data-start=\"984\" data-end=\"1310\">J\u00e4rjestelm\u00e4ss\u00e4 on pitk\u00e4lle integroitu rakenne, jossa kiekkojen k\u00e4sittely on automatisoitu EFEM-j\u00e4rjestelm\u00e4n avulla ja jossa on korkean l\u00e4mp\u00f6tilan kiekonsiirtomekanismi. T\u00e4m\u00e4 mahdollistaa saumattoman integroinnin nykyaikaisiin puolijohdevalmistuslinjoihin, v\u00e4hent\u00e4\u00e4 manuaalisia toimenpiteit\u00e4 ja parantaa prosessin johdonmukaisuutta ja toiminnan tehokkuutta.<\/p>\n<p data-start=\"1312\" data-end=\"1615\">Teollisen mittakaavan valmistuksen tukemiseksi laitteistossa on kaksikammiokokoonpano, joka pystyy jatkuvaan monipolttoainek\u00e4ytt\u00f6\u00f6n. Laitteen l\u00e4pimenoteho on yli 1100 kiekkoa kuukaudessa - ja prosessin optimoinnin avulla jopa 1200 kiekkoa - ja se soveltuu hyvin suuren volyymin tuotantoymp\u00e4rist\u00f6ihin.<\/p>\n<p data-start=\"1617\" data-end=\"1971\">Laitteisto on yhteensopiva sek\u00e4 6-tuumaisten ett\u00e4 8-tuumaisten SiC-kiekkojen kanssa, mik\u00e4 tarjoaa joustavuutta valmistajille, jotka siirtyv\u00e4t suurempiin kiekkokokoihin. Laitteella on my\u00f6s erinomaiset valmiudet paksun epitaksikerroksen kasvattamiseen ja trench-filling-epitaksiaan, joten se soveltuu erityisen hyvin kehittyneiden suurj\u00e4nnite- ja suuritehoisten laitteiden valmistukseen.<\/p>\n<p data-start=\"1973\" data-end=\"2214\">Lis\u00e4ksi optimoitu reaktorisuunnittelu takaa alhaisen vikatiheyden, paremman tuoton ja alhaisemmat k\u00e4ytt\u00f6kustannukset. Sen vankka rakenne ja huoltoyst\u00e4v\u00e4llinen rakenne parantavat entisest\u00e4\u00e4n pitk\u00e4aikaista luotettavuutta ja toiminnan vakautta.<\/p>\n<h2 data-section-id=\"qpn8c9\" data-start=\"2221\" data-end=\"2252\"><span role=\"text\"><img decoding=\"async\" class=\"size-medium wp-image-2078 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>T\u00e4rkeimm\u00e4t tekniset edut<\/span><\/h2>\n<ul data-start=\"2254\" data-end=\"2704\">\n<li data-section-id=\"1q2t12k\" data-start=\"2254\" data-end=\"2321\">Pystysuora ilmavirtaussuihkup\u00e4\u00e4n muotoilu tasaista kaasunjakelua varten<\/li>\n<li data-section-id=\"1lzu0dd\" data-start=\"2322\" data-end=\"2387\">Monialueinen l\u00e4mp\u00f6tilan s\u00e4\u00e4t\u00f6 tarkkaa l\u00e4mm\u00f6nhallintaa varten<\/li>\n<li data-section-id=\"1emeqzr\" data-start=\"2388\" data-end=\"2449\">Kaksoiskammiokokoonpano suurta l\u00e4pimenoa varten<\/li>\n<li data-section-id=\"rs6yfl\" data-start=\"2450\" data-end=\"2499\">Alhainen vikatiheys ja korkea saantotehokkuus<\/li>\n<li data-section-id=\"h9m4ox\" data-start=\"2500\" data-end=\"2550\">Automaattinen kiekkojen k\u00e4sittely EFEM-integraatiolla<\/li>\n<li data-section-id=\"bze71o\" data-start=\"2551\" data-end=\"2594\">Yhteensopivuus 6\u201d ja 8\u201d SiC-kiekkojen kanssa<\/li>\n<li data-section-id=\"xhhop\" data-start=\"2595\" data-end=\"2655\">Optimoitu paksuihin epitaksia- ja trench-filling-prosesseihin<\/li>\n<li data-section-id=\"1a3549x\" data-start=\"2656\" data-end=\"2704\">Korkea luotettavuus ja yksinkertaistettu huolto<\/li>\n<\/ul>\n<h2 data-section-id=\"ca04ra\" data-start=\"2711\" data-end=\"2737\"><span role=\"text\">Prosessin suorituskyky<\/span><\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2739\" data-end=\"3287\">\n<thead data-start=\"2739\" data-end=\"2768\">\n<tr data-start=\"2739\" data-end=\"2768\">\n<th class=\"\" data-start=\"2739\" data-end=\"2751\" data-col-size=\"sm\">Parametri<\/th>\n<th class=\"\" data-start=\"2751\" data-end=\"2768\" data-col-size=\"md\">Tekniset tiedot<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2796\" data-end=\"3287\">\n<tr data-start=\"2796\" data-end=\"2884\">\n<td data-start=\"2796\" data-end=\"2809\" data-col-size=\"sm\">L\u00e4p\u00e4isykyky<\/td>\n<td data-start=\"2809\" data-end=\"2884\" data-col-size=\"md\">\u22651100 kiekkoa\/kk (kaksoiskammiot), jopa 1200 kiekkoa\/kk (optimoitu).<\/td>\n<\/tr>\n<tr data-start=\"2885\" data-end=\"2938\">\n<td data-start=\"2885\" data-end=\"2912\" data-col-size=\"sm\">Wafer-kokojen yhteensopivuus<\/td>\n<td data-col-size=\"md\" data-start=\"2912\" data-end=\"2938\">6\u201d \/ 8\u201d SiC epi-laipat<\/td>\n<\/tr>\n<tr data-start=\"2939\" data-end=\"2975\">\n<td data-start=\"2939\" data-end=\"2961\" data-col-size=\"sm\">L\u00e4mp\u00f6tilan s\u00e4\u00e4t\u00f6<\/td>\n<td data-start=\"2961\" data-end=\"2975\" data-col-size=\"md\">Monialueinen<\/td>\n<\/tr>\n<tr data-start=\"2976\" data-end=\"3035\">\n<td data-start=\"2976\" data-end=\"2993\" data-col-size=\"sm\">Ilmavirtaj\u00e4rjestelm\u00e4<\/td>\n<td data-start=\"2993\" data-end=\"3035\" data-col-size=\"md\">Pystysuora s\u00e4\u00e4dett\u00e4v\u00e4 monialueinen ilmavirta<\/td>\n<\/tr>\n<tr data-start=\"3036\" data-end=\"3067\">\n<td data-start=\"3036\" data-end=\"3053\" data-col-size=\"sm\">Py\u00f6rimisnopeus<\/td>\n<td data-start=\"3053\" data-end=\"3067\" data-col-size=\"md\">0-1000 rpm<\/td>\n<\/tr>\n<tr data-start=\"3068\" data-end=\"3101\">\n<td data-start=\"3068\" data-end=\"3086\" data-col-size=\"sm\">Max kasvuvauhti<\/td>\n<td data-start=\"3086\" data-end=\"3101\" data-col-size=\"md\">\u226560 \u03bcm\/tunti<\/td>\n<\/tr>\n<tr data-start=\"3102\" data-end=\"3163\">\n<td data-start=\"3102\" data-end=\"3125\" data-col-size=\"sm\">Paksuuden tasaisuus<\/td>\n<td data-col-size=\"md\" data-start=\"3125\" data-end=\"3163\">\u22642% (optimoitu \u22641%, \u03c3\/avg, EE 5mm)<\/td>\n<\/tr>\n<tr data-start=\"3164\" data-end=\"3224\">\n<td data-start=\"3164\" data-end=\"3184\" data-col-size=\"sm\">Dopingin tasaisuus<\/td>\n<td data-col-size=\"md\" data-start=\"3184\" data-end=\"3224\">\u22643% (optimoitu \u22641,5%, \u03c3\/avg, EE 5mm)<\/td>\n<\/tr>\n<tr data-start=\"3225\" data-end=\"3287\">\n<td data-start=\"3225\" data-end=\"3249\" data-col-size=\"sm\">Tappava vian tiheys<\/td>\n<td data-col-size=\"md\" data-start=\"3249\" data-end=\"3287\">\u22640,2 cm-\u00b2 (optimoitu 0,01 cm-\u00b2:iin)<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h2 data-section-id=\"1w46w82\" data-start=\"3294\" data-end=\"3322\"><span role=\"text\">Sovellusskenaariot<\/span><\/h2>\n<p data-start=\"3324\" data-end=\"3514\">T\u00e4t\u00e4 laitetta k\u00e4ytet\u00e4\u00e4n laajalti kehittyneiden SiC-pohjaisten puolijohdekomponenttien tuotannossa, erityisesti teollisuudenaloilla, jotka vaativat korkeaa hy\u00f6tysuhdetta, korkeaa j\u00e4nnitett\u00e4 ja korkeaa l\u00e4mp\u00f6tehoa:<\/p>\n<ul data-start=\"3516\" data-end=\"4364\">\n<li data-section-id=\"qrtaas\" data-start=\"3516\" data-end=\"3707\">S\u00e4hk\u00f6ajoneuvot (EV)<br data-start=\"3545\" data-end=\"3548\" \/>K\u00e4ytet\u00e4\u00e4n SiC MOSFETien ja tehomoduulien valmistuksessa inverttereiss\u00e4, ajoneuvolatureissa ja DC-DC-muuntimissa, mik\u00e4 parantaa energiatehokkuutta ja toimintas\u00e4dett\u00e4.<\/li>\n<li data-section-id=\"1j97evh\" data-start=\"3709\" data-end=\"3867\">Uusiutuvat energiaj\u00e4rjestelm\u00e4t<br data-start=\"3739\" data-end=\"3742\" \/>Sovelletaan aurinkos\u00e4hk\u00f6isiss\u00e4 vaihtosuuntaajissa ja energian varastointij\u00e4rjestelmiss\u00e4, mik\u00e4 mahdollistaa suuremman muuntotehokkuuden ja j\u00e4rjestelm\u00e4n luotettavuuden.<\/li>\n<li data-section-id=\"8pfhmh\" data-start=\"3869\" data-end=\"4041\">Teollinen tehoelektroniikka<br data-start=\"3903\" data-end=\"3906\" \/>Soveltuu suuritehoisiin moottorik\u00e4ytt\u00f6ihin, teollisuusautomaatioj\u00e4rjestelmiin ja tehol\u00e4hteisiin, jotka vaativat vakaata ja tehokasta toimintaa.<\/li>\n<li data-section-id=\"frfj8s\" data-start=\"4043\" data-end=\"4206\">Rautatieliikenne ja s\u00e4hk\u00f6verkot<br data-start=\"4075\" data-end=\"4078\" \/>Tukee \u00e4lykk\u00e4iss\u00e4 s\u00e4hk\u00f6verkoissa, vetoj\u00e4rjestelmiss\u00e4 ja s\u00e4hk\u00f6nsiirtoinfrastruktuurissa k\u00e4ytett\u00e4vi\u00e4 suurj\u00e4nnite- ja suurtaajuuslaitteita.<\/li>\n<li data-section-id=\"1k6eb43\" data-start=\"4208\" data-end=\"4364\">Huipputeholaitteet<br data-start=\"4236\" data-end=\"4239\" \/>Ihanteellinen kehittyneiden SiC-laitteiden, kuten Schottky-diodien, MOSFETien ja seuraavan sukupolven korkeaj\u00e4nnitekomponenttien valmistukseen.<\/li>\n<\/ul>\n<p><img decoding=\"async\" class=\"wp-image-2080 size-large aligncenter\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-1024x578.png\" alt=\"\" width=\"1024\" height=\"578\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-1024x578.png 1024w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-300x169.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-768x433.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-18x10.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-600x339.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application.png 1285w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><\/p>\n<h2 data-section-id=\"elc90z\" data-start=\"4371\" data-end=\"4381\"><span role=\"text\">FAQ<\/span><\/h2>\n<h3 data-section-id=\"1f731tm\" data-start=\"4383\" data-end=\"4453\"><span role=\"text\">1. Mit\u00e4 kiekkokokoja t\u00e4m\u00e4 epitaksilaitteisto tukee?<\/span><\/h3>\n<p data-start=\"4454\" data-end=\"4606\">J\u00e4rjestelm\u00e4 tukee sek\u00e4 6- ett\u00e4 8-tuumaisia SiC-kiekkoja, joten valmistajat voivat vastata nykyisiin tuotantovaatimuksiin ja valmistautua samalla tulevaan skaalautumiseen.<\/p>\n<h3 data-section-id=\"8a4v60\" data-start=\"4613\" data-end=\"4683\"><span role=\"text\">2. Mit\u00e4 etuja pystysuora ilmavirtaus tarjoaa?<\/span><\/h3>\n<p data-start=\"4684\" data-end=\"4858\">Pystysuora ilmavirtausj\u00e4rjestelm\u00e4 varmistaa kaasun tasaisen jakautumisen kiekon poikki, mik\u00e4 parantaa paksuuden tasaisuutta, v\u00e4hent\u00e4\u00e4 vikoja ja parantaa epitaksiaalista kokonaislaatua.<\/p>\n<h3 data-section-id=\"1rbmoqb\" data-start=\"4865\" data-end=\"4935\"><span role=\"text\">3. Soveltuvatko n\u00e4m\u00e4 laitteet suuren volyymin valmistukseen?<\/span><\/h3>\n<p data-start=\"4936\" data-end=\"5110\">Kyll\u00e4, j\u00e4rjestelm\u00e4ss\u00e4 on kaksikammiokokoonpano ja jatkuva toimintatila, ja sen kuukausittainen l\u00e4pimeno ylitt\u00e4\u00e4 1100 kiekkoa. Se soveltuu hyvin vakaaseen, laajamittaiseen teolliseen tuotantoon, joka takaa tasaisen tuotoksen, korkean saantovakauden ja pitk\u00e4n aikav\u00e4lin toiminnan tehokkuuden.<\/p>","protected":false},"excerpt":{"rendered":"<p>Integroitu pystysuora ilmavirtaus piikarbidi (SiC) epitaksilaitteisto on edistyksellinen epitaksiaalinen kasvuj\u00e4rjestelm\u00e4, joka on suunniteltu 6 tuuman ja 8 tuuman SiC-epitaksiaaltojen tehokkaaseen tuotantoon.<\/p>","protected":false},"featured_media":2078,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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