{"id":2077,"date":"2026-04-03T02:07:51","date_gmt":"2026-04-03T02:07:51","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2077"},"modified":"2026-04-03T02:09:04","modified_gmt":"2026-04-03T02:09:04","slug":"integrated-vertical-airflow-sic-epitaxy-equipment-for-6-8-epi-wafers","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/es\/product\/integrated-vertical-airflow-sic-epitaxy-equipment-for-6-8-epi-wafers\/","title":{"rendered":"Equipo vertical integrado de flujo de aire para epitaxia de SiC para obleas Epi de 6\u201d\/8"},"content":{"rendered":"<p data-start=\"187\" data-end=\"641\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2079 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>El equipo vertical integrado de flujo de aire para epitaxia de carburo de silicio (SiC) es un sistema avanzado de crecimiento epitaxial dise\u00f1ado para la producci\u00f3n de alta eficiencia de obleas epitaxiales de SiC de 6 y 8 pulgadas. Dise\u00f1ado para satisfacer las crecientes demandas de la fabricaci\u00f3n de semiconductores de potencia, este sistema integra un control t\u00e9rmico preciso, una din\u00e1mica de flujo de gas optimizada y una automatizaci\u00f3n inteligente para ofrecer un rendimiento excepcional en uniformidad, rendimiento y control de defectos.<\/p>\n<p data-start=\"643\" data-end=\"982\">El n\u00facleo del sistema es un innovador dise\u00f1o de cabezal de ducha de flujo de aire vertical, que permite una distribuci\u00f3n uniforme de los gases de proceso por toda la superficie de la oblea. Combinado con el control del campo de temperatura multizona, garantiza una excelente uniformidad del grosor y una concentraci\u00f3n de dopaje estable, algo fundamental para los dispositivos de potencia de SiC de alto rendimiento.<\/p>\n<p data-start=\"984\" data-end=\"1310\">El sistema adopta una estructura altamente integrada con manipulaci\u00f3n automatizada de obleas mediante un sistema EFEM, junto con un mecanismo de transferencia de obleas a alta temperatura. Esto permite una integraci\u00f3n perfecta en las modernas l\u00edneas de fabricaci\u00f3n de semiconductores, reduce la intervenci\u00f3n manual y mejora la coherencia del proceso y la eficiencia operativa.<\/p>\n<p data-start=\"1312\" data-end=\"1615\">Para apoyar la fabricaci\u00f3n a escala industrial, el equipo cuenta con una configuraci\u00f3n de doble c\u00e1mara capaz de funcionar continuamente en varios hornos. Con un rendimiento de m\u00e1s de 1.100 obleas al mes -y de hasta 1.200 obleas mediante la optimizaci\u00f3n del proceso-, es id\u00f3neo para entornos de producci\u00f3n de gran volumen.<\/p>\n<p data-start=\"1617\" data-end=\"1971\">El equipo es compatible con obleas de SiC de 6 y 8 pulgadas, lo que ofrece flexibilidad a los fabricantes en transici\u00f3n hacia obleas de mayor tama\u00f1o. Tambi\u00e9n demuestra una excelente capacidad de crecimiento de capas epitaxiales gruesas y epitaxia de relleno de zanjas, lo que lo hace especialmente adecuado para la fabricaci\u00f3n de dispositivos avanzados de alto voltaje y alta potencia.<\/p>\n<p data-start=\"1973\" data-end=\"2214\">Adem\u00e1s, el dise\u00f1o optimizado del reactor garantiza una baja densidad de defectos, un rendimiento mejorado y un coste de propiedad reducido. Su construcci\u00f3n robusta y su dise\u00f1o de f\u00e1cil mantenimiento mejoran a\u00fan m\u00e1s la fiabilidad a largo plazo y la estabilidad operativa.<\/p>\n<h2 data-section-id=\"qpn8c9\" data-start=\"2221\" data-end=\"2252\"><span role=\"text\"><img decoding=\"async\" class=\"size-medium wp-image-2078 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Principales ventajas t\u00e9cnicas<\/span><\/h2>\n<ul data-start=\"2254\" data-end=\"2704\">\n<li data-section-id=\"1q2t12k\" data-start=\"2254\" data-end=\"2321\">Dise\u00f1o de cabezal de ducha de flujo de aire vertical para una distribuci\u00f3n uniforme del gas<\/li>\n<li data-section-id=\"1lzu0dd\" data-start=\"2322\" data-end=\"2387\">Control de temperatura multizona para una gesti\u00f3n t\u00e9rmica precisa<\/li>\n<li data-section-id=\"1emeqzr\" data-start=\"2388\" data-end=\"2449\">Configuraci\u00f3n de doble c\u00e1mara para una producci\u00f3n de alto rendimiento<\/li>\n<li data-section-id=\"rs6yfl\" data-start=\"2450\" data-end=\"2499\">Baja densidad de defectos y alto rendimiento<\/li>\n<li data-section-id=\"h9m4ox\" data-start=\"2500\" data-end=\"2550\">Manipulaci\u00f3n automatizada de obleas con integraci\u00f3n de EFEM<\/li>\n<li data-section-id=\"bze71o\" data-start=\"2551\" data-end=\"2594\">Compatibilidad con obleas de SiC de 6\u201d y 8<\/li>\n<li data-section-id=\"xhhop\" data-start=\"2595\" data-end=\"2655\">Optimizado para procesos de epitaxia gruesa y relleno de zanjas<\/li>\n<li data-section-id=\"1a3549x\" data-start=\"2656\" data-end=\"2704\">Alta fiabilidad con mantenimiento simplificado<\/li>\n<\/ul>\n<h2 data-section-id=\"ca04ra\" data-start=\"2711\" data-end=\"2737\"><span role=\"text\">Rendimiento del proceso<\/span><\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2739\" data-end=\"3287\">\n<thead data-start=\"2739\" data-end=\"2768\">\n<tr data-start=\"2739\" data-end=\"2768\">\n<th class=\"\" data-start=\"2739\" data-end=\"2751\" data-col-size=\"sm\">Par\u00e1metro<\/th>\n<th class=\"\" data-start=\"2751\" data-end=\"2768\" data-col-size=\"md\">Especificaci\u00f3n<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2796\" data-end=\"3287\">\n<tr data-start=\"2796\" data-end=\"2884\">\n<td data-start=\"2796\" data-end=\"2809\" data-col-size=\"sm\">Rendimiento<\/td>\n<td data-start=\"2809\" data-end=\"2884\" data-col-size=\"md\">\u22651100 obleas\/mes (c\u00e1maras dobles), hasta 1200 obleas\/mes (optimizado)<\/td>\n<\/tr>\n<tr data-start=\"2885\" data-end=\"2938\">\n<td data-start=\"2885\" data-end=\"2912\" data-col-size=\"sm\">Compatibilidad de tama\u00f1os de oblea<\/td>\n<td data-col-size=\"md\" data-start=\"2912\" data-end=\"2938\">6\u201d \/ 8\u201d SiC epi-wafers<\/td>\n<\/tr>\n<tr data-start=\"2939\" data-end=\"2975\">\n<td data-start=\"2939\" data-end=\"2961\" data-col-size=\"sm\">Control de la temperatura<\/td>\n<td data-start=\"2961\" data-end=\"2975\" data-col-size=\"md\">Multizona<\/td>\n<\/tr>\n<tr data-start=\"2976\" data-end=\"3035\">\n<td data-start=\"2976\" data-end=\"2993\" data-col-size=\"sm\">Sistema de flujo de aire<\/td>\n<td data-start=\"2993\" data-end=\"3035\" data-col-size=\"md\">Flujo de aire multizona ajustable verticalmente<\/td>\n<\/tr>\n<tr data-start=\"3036\" data-end=\"3067\">\n<td data-start=\"3036\" data-end=\"3053\" data-col-size=\"sm\">Velocidad de rotaci\u00f3n<\/td>\n<td data-start=\"3053\" data-end=\"3067\" data-col-size=\"md\">0-1000 rpm<\/td>\n<\/tr>\n<tr data-start=\"3068\" data-end=\"3101\">\n<td data-start=\"3068\" data-end=\"3086\" data-col-size=\"sm\">Tasa de crecimiento m\u00e1xima<\/td>\n<td data-start=\"3086\" data-end=\"3101\" data-col-size=\"md\">\u226560 \u03bcm\/hora<\/td>\n<\/tr>\n<tr data-start=\"3102\" data-end=\"3163\">\n<td data-start=\"3102\" data-end=\"3125\" data-col-size=\"sm\">Uniformidad de espesor<\/td>\n<td data-col-size=\"md\" data-start=\"3125\" data-end=\"3163\">\u22642% (optimizado \u22641%, \u03c3\/avg, EE 5mm)<\/td>\n<\/tr>\n<tr data-start=\"3164\" data-end=\"3224\">\n<td data-start=\"3164\" data-end=\"3184\" data-col-size=\"sm\">Uniformidad del dopaje<\/td>\n<td data-col-size=\"md\" data-start=\"3184\" data-end=\"3224\">\u22643% (optimizado \u22641,5%, \u03c3\/avg, EE 5mm)<\/td>\n<\/tr>\n<tr data-start=\"3225\" data-end=\"3287\">\n<td data-start=\"3225\" data-end=\"3249\" data-col-size=\"sm\">Densidad de defectos asesinos<\/td>\n<td data-col-size=\"md\" data-start=\"3249\" data-end=\"3287\">\u22640,2 cm-\u00b2 (optimizado a 0,01 cm-\u00b2)<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h2 data-section-id=\"1w46w82\" data-start=\"3294\" data-end=\"3322\"><span role=\"text\">Escenarios de aplicaci\u00f3n<\/span><\/h2>\n<p data-start=\"3324\" data-end=\"3514\">Este equipo se utiliza ampliamente en la producci\u00f3n de dispositivos semiconductores avanzados basados en SiC, especialmente en industrias que requieren alta eficiencia, alto voltaje y alto rendimiento t\u00e9rmico:<\/p>\n<ul data-start=\"3516\" data-end=\"4364\">\n<li data-section-id=\"qrtaas\" data-start=\"3516\" data-end=\"3707\">Veh\u00edculos el\u00e9ctricos<br data-start=\"3545\" data-end=\"3548\" \/>Se utiliza en la producci\u00f3n de MOSFET de SiC y m\u00f3dulos de potencia para inversores, cargadores de a bordo y convertidores CC-CC, mejorando la eficiencia energ\u00e9tica y la autonom\u00eda de conducci\u00f3n.<\/li>\n<li data-section-id=\"1j97evh\" data-start=\"3709\" data-end=\"3867\">Sistemas de energ\u00eda renovable<br data-start=\"3739\" data-end=\"3742\" \/>Se aplica en inversores fotovoltaicos y sistemas de almacenamiento de energ\u00eda, permitiendo una mayor eficiencia de conversi\u00f3n y fiabilidad del sistema.<\/li>\n<li data-section-id=\"8pfhmh\" data-start=\"3869\" data-end=\"4041\">Electr\u00f3nica de potencia industrial<br data-start=\"3903\" data-end=\"3906\" \/>Adecuado para accionamientos de motores de alta potencia, sistemas de automatizaci\u00f3n industrial y fuentes de alimentaci\u00f3n que requieren un funcionamiento estable y eficiente.<\/li>\n<li data-section-id=\"frfj8s\" data-start=\"4043\" data-end=\"4206\">Tr\u00e1nsito ferroviario y redes el\u00e9ctricas<br data-start=\"4075\" data-end=\"4078\" \/>Admite dispositivos de alta tensi\u00f3n y alta frecuencia utilizados en redes inteligentes, sistemas de tracci\u00f3n e infraestructuras de transmisi\u00f3n de energ\u00eda.<\/li>\n<li data-section-id=\"1k6eb43\" data-start=\"4208\" data-end=\"4364\">Dispositivos de potencia de gama alta<br data-start=\"4236\" data-end=\"4239\" \/>Ideal para la fabricaci\u00f3n de dispositivos SiC avanzados, como diodos Schottky, MOSFET y componentes de alto voltaje de \u00faltima generaci\u00f3n.<\/li>\n<\/ul>\n<p><img decoding=\"async\" class=\"wp-image-2080 size-large aligncenter\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-1024x578.png\" alt=\"\" width=\"1024\" height=\"578\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-1024x578.png 1024w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-300x169.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-768x433.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-18x10.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-600x339.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application.png 1285w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><\/p>\n<h2 data-section-id=\"elc90z\" data-start=\"4371\" data-end=\"4381\"><span role=\"text\">PREGUNTAS FRECUENTES<\/span><\/h2>\n<h3 data-section-id=\"1f731tm\" data-start=\"4383\" data-end=\"4453\"><span role=\"text\">1. \u00bfQu\u00e9 tama\u00f1os de oblea admite este equipo de epitaxia?<\/span><\/h3>\n<p data-start=\"4454\" data-end=\"4606\">El sistema admite obleas de SiC de 6 y 8 pulgadas, lo que permite a los fabricantes satisfacer las demandas de producci\u00f3n actuales al tiempo que se preparan para el escalado futuro.<\/p>\n<h3 data-section-id=\"8a4v60\" data-start=\"4613\" data-end=\"4683\"><span role=\"text\">2. \u00bfQu\u00e9 ventajas ofrece el dise\u00f1o de flujo de aire vertical?<\/span><\/h3>\n<p data-start=\"4684\" data-end=\"4858\">El sistema de flujo de aire vertical garantiza una distribuci\u00f3n uniforme del gas por la oblea, lo que mejora la consistencia del espesor, reduce los defectos y mejora la calidad epitaxial general.<\/p>\n<h3 data-section-id=\"1rbmoqb\" data-start=\"4865\" data-end=\"4935\"><span role=\"text\">3. \u00bfEs este equipo adecuado para la fabricaci\u00f3n de grandes vol\u00famenes?<\/span><\/h3>\n<p data-start=\"4936\" data-end=\"5110\">S\u00ed, el sistema presenta una configuraci\u00f3n de doble c\u00e1mara y un modo de funcionamiento continuo, con un rendimiento mensual superior a 1.100 obleas. Es id\u00f3neo para una producci\u00f3n industrial estable a gran escala, garantizando una producci\u00f3n constante, una alta estabilidad de rendimiento y una eficiencia operativa a largo plazo.<\/p>","protected":false},"excerpt":{"rendered":"<p>El equipo vertical integrado de flujo de aire para epitaxia de carburo de silicio (SiC) es un sistema avanzado de crecimiento epitaxial dise\u00f1ado para la producci\u00f3n de alta eficiencia de obleas epitaxiales de SiC de 6 y 8 pulgadas.<\/p>","protected":false},"featured_media":2078,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}}},"product_brand":[],"product_cat":[730],"product_tag":[734,735,737,738,745,740,744,739,733,731,603,732,742,741,736,743],"class_list":{"0":"post-2077","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-epitaxy-equipment","7":"product_tag-6-inch-sic-wafer","8":"product_tag-8-inch-sic-wafer","9":"product_tag-cvd-epitaxy-system","10":"product_tag-epitaxial-growth-system","11":"product_tag-ev-power-semiconductors","12":"product_tag-high-voltage-sic-devices","13":"product_tag-industrial-power-electronics","14":"product_tag-semiconductor-manufacturing-equipment","15":"product_tag-sic-epi-wafer-production","16":"product_tag-sic-epitaxy-equipment","17":"product_tag-sic-power-devices","18":"product_tag-silicon-carbide-epitaxy-reactor","19":"product_tag-thick-epitaxy-growth","20":"product_tag-trench-filling-epitaxy","21":"product_tag-vertical-airflow-epitaxy","22":"product_tag-wafer-epitaxy-reactor","23":"desktop-align-left","24":"tablet-align-left","25":"mobile-align-left","26":"ast-product-gallery-layout-horizontal-slider","27":"ast-product-tabs-layout-horizontal","29":"first","30":"instock","31":"shipping-taxable","32":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/www.zmsh-semitech.com\/es\/wp-json\/wp\/v2\/product\/2077","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.zmsh-semitech.com\/es\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.zmsh-semitech.com\/es\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/es\/wp-json\/wp\/v2\/comments?post=2077"}],"version-history":[{"count":2,"href":"https:\/\/www.zmsh-semitech.com\/es\/wp-json\/wp\/v2\/product\/2077\/revisions"}],"predecessor-version":[{"id":2082,"href":"https:\/\/www.zmsh-semitech.com\/es\/wp-json\/wp\/v2\/product\/2077\/revisions\/2082"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/es\/wp-json\/wp\/v2\/media\/2078"}],"wp:attachment":[{"href":"https:\/\/www.zmsh-semitech.com\/es\/wp-json\/wp\/v2\/media?parent=2077"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/es\/wp-json\/wp\/v2\/product_brand?post=2077"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/es\/wp-json\/wp\/v2\/product_cat?post=2077"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/es\/wp-json\/wp\/v2\/product_tag?post=2077"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}