{"id":2048,"date":"2026-04-01T05:59:16","date_gmt":"2026-04-01T05:59:16","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2048"},"modified":"2026-04-01T06:04:59","modified_gmt":"2026-04-01T06:04:59","slug":"microfluidic-laser-equipment-for-high-precision-semiconductor-wafer-processing","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/es\/product\/microfluidic-laser-equipment-for-high-precision-semiconductor-wafer-processing\/","title":{"rendered":"Equipo l\u00e1ser microflu\u00eddico para el procesamiento de alta precisi\u00f3n de obleas semiconductoras"},"content":{"rendered":"<p data-start=\"245\" data-end=\"828\"><img decoding=\"async\" class=\"alignright wp-image-2054 size-thumbnail\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing-150x150.png\" alt=\"\" width=\"150\" height=\"150\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing-100x100.png 100w\" sizes=\"(max-width: 150px) 100vw, 150px\" \/>Los equipos l\u00e1ser microflu\u00eddicos utilizan tecnolog\u00eda l\u00e1ser de microchorro avanzada para proporcionar un procesamiento de alta precisi\u00f3n y bajo da\u00f1o t\u00e9rmico de obleas semiconductoras y otros materiales duros, quebradizos o de banda prohibida ancha. Al combinar un chorro de agua submicr\u00f3nico con un haz l\u00e1ser, el sistema gu\u00eda la energ\u00eda l\u00e1ser con precisi\u00f3n a la superficie de la pieza, mientras que el chorro de agua enfr\u00eda y elimina los residuos de forma continua. Esta tecnolog\u00eda resuelve eficazmente los problemas habituales del procesamiento mec\u00e1nico y por l\u00e1ser convencional, como los da\u00f1os t\u00e9rmicos, las microfisuras, la contaminaci\u00f3n, la conicidad y la deformaci\u00f3n.<\/p>\n<h2 data-section-id=\"1bqk1w5\" data-start=\"835\" data-end=\"856\"><span role=\"text\"><strong data-start=\"838\" data-end=\"854\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2055 alignleft\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing55-300x274.png\" alt=\"\" width=\"300\" height=\"274\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing55-300x274.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing55-13x12.png 13w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing55-600x548.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing55.png 641w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Caracter\u00edsticas principales<\/strong><\/span><\/h2>\n<ul data-start=\"857\" data-end=\"1548\">\n<li data-section-id=\"1vikzsj\" data-start=\"857\" data-end=\"984\"><strong data-start=\"859\" data-end=\"874\">Tipo de l\u00e1ser:<\/strong> L\u00e1ser Nd:YAG de estado s\u00f3lido bombeado por diodos, longitud de onda 532\/1064 nm, anchura de impulso en \u03bcs\/ns, potencia media 10-200 W<\/li>\n<li data-section-id=\"1huhii5\" data-start=\"985\" data-end=\"1128\"><strong data-start=\"987\" data-end=\"1008\">Sistema de chorro de agua:<\/strong> Agua filtrada, desionizada y a baja presi\u00f3n; el microchorro ultrafino consume s\u00f3lo 1 L\/h a 300 bar, fuerza insignificante (&lt;0,1 N)<\/li>\n<li data-section-id=\"6bpefa\" data-start=\"1129\" data-end=\"1211\"><strong data-start=\"1131\" data-end=\"1142\">Boquilla:<\/strong> Zafiro o diamante, 30-150 \u03bcm de di\u00e1metro para un guiado preciso del l\u00e1ser.<\/li>\n<li data-section-id=\"1kl8vyj\" data-start=\"1212\" data-end=\"1313\"><strong data-start=\"1214\" data-end=\"1235\">Sistema auxiliar:<\/strong> Las bombas de alta presi\u00f3n y las unidades de tratamiento del agua garantizan la estabilidad del chorro<\/li>\n<li data-section-id=\"xrg2jd\" data-start=\"1314\" data-end=\"1396\"><strong data-start=\"1316\" data-end=\"1330\">Precisi\u00f3n:<\/strong> Precisi\u00f3n de posicionamiento \u00b15 \u03bcm, precisi\u00f3n de posicionamiento repetido \u00b12 \u03bcm<\/li>\n<li data-section-id=\"17g1bmx\" data-start=\"1397\" data-end=\"1548\"><strong data-start=\"1399\" data-end=\"1425\">Capacidad de procesamiento:<\/strong> Rugosidad superficial Ra \u22641,2-1,6 \u03bcm, velocidad de corte lineal \u226550 mm\/s, velocidad de apertura \u22651,25 mm\/s, corte circunferencial \u22656 mm\/s.<\/li>\n<\/ul>\n<h2 data-section-id=\"10oaxfc\" data-start=\"1555\" data-end=\"1588\"><span role=\"text\"><strong data-start=\"1558\" data-end=\"1586\">Especificaciones t\u00e9cnicas<\/strong><\/span><\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"1590\" data-end=\"2259\">\n<thead data-start=\"1590\" data-end=\"1629\">\n<tr data-start=\"1590\" data-end=\"1629\">\n<th class=\"\" data-start=\"1590\" data-end=\"1606\" data-col-size=\"sm\">Especificaci\u00f3n<\/th>\n<th class=\"\" data-start=\"1606\" data-end=\"1617\" data-col-size=\"sm\">Opci\u00f3n 1<\/th>\n<th class=\"\" data-start=\"1617\" data-end=\"1629\" data-col-size=\"sm\">Opci\u00f3n 2<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"1670\" data-end=\"2259\">\n<tr data-start=\"1670\" data-end=\"1724\">\n<td data-start=\"1670\" data-end=\"1695\" data-col-size=\"sm\">Volumen de la encimera (mm)<\/td>\n<td data-col-size=\"sm\" data-start=\"1695\" data-end=\"1709\">300\u00d7300\u00d7150<\/td>\n<td data-col-size=\"sm\" data-start=\"1709\" data-end=\"1724\">400\u00d7400\u00d7200<\/td>\n<\/tr>\n<tr data-start=\"1725\" data-end=\"1773\">\n<td data-start=\"1725\" data-end=\"1742\" data-col-size=\"sm\">Eje lineal XY<\/td>\n<td data-col-size=\"sm\" data-start=\"1742\" data-end=\"1757\">Motor lineal<\/td>\n<td data-col-size=\"sm\" data-start=\"1757\" data-end=\"1773\">Motor lineal<\/td>\n<\/tr>\n<tr data-start=\"1774\" data-end=\"1803\">\n<td data-start=\"1774\" data-end=\"1790\" data-col-size=\"sm\">Eje lineal Z<\/td>\n<td data-col-size=\"sm\" data-start=\"1790\" data-end=\"1796\">150<\/td>\n<td data-col-size=\"sm\" data-start=\"1796\" data-end=\"1803\">200<\/td>\n<\/tr>\n<tr data-start=\"1804\" data-end=\"1843\">\n<td data-start=\"1804\" data-end=\"1832\" data-col-size=\"sm\">Precisi\u00f3n de posicionamiento (\u03bcm)<\/td>\n<td data-col-size=\"sm\" data-start=\"1832\" data-end=\"1837\">\u00b15<\/td>\n<td data-col-size=\"sm\" data-start=\"1837\" data-end=\"1843\">\u00b15<\/td>\n<\/tr>\n<tr data-start=\"1844\" data-end=\"1892\">\n<td data-start=\"1844\" data-end=\"1881\" data-col-size=\"sm\">Precisi\u00f3n de posicionamiento repetido (\u03bcm)<\/td>\n<td data-col-size=\"sm\" data-start=\"1881\" data-end=\"1886\">\u00b12<\/td>\n<td data-col-size=\"sm\" data-start=\"1886\" data-end=\"1892\">\u00b12<\/td>\n<\/tr>\n<tr data-start=\"1893\" data-end=\"1924\">\n<td data-start=\"1893\" data-end=\"1912\" data-col-size=\"sm\">Aceleraci\u00f3n (G)<\/td>\n<td data-col-size=\"sm\" data-start=\"1912\" data-end=\"1916\">1<\/td>\n<td data-col-size=\"sm\" data-start=\"1916\" data-end=\"1924\">0.29<\/td>\n<\/tr>\n<tr data-start=\"1925\" data-end=\"1998\">\n<td data-start=\"1925\" data-end=\"1945\" data-col-size=\"sm\">Control num\u00e9rico<\/td>\n<td data-col-size=\"sm\" data-start=\"1945\" data-end=\"1971\">3 ejes \/ 3+1 \/ 3+2 ejes<\/td>\n<td data-col-size=\"sm\" data-start=\"1971\" data-end=\"1998\">3 ejes \/ 3+1 \/ 3+2 ejes<\/td>\n<\/tr>\n<tr data-start=\"1999\" data-end=\"2040\">\n<td data-start=\"1999\" data-end=\"2017\" data-col-size=\"sm\">Longitud de onda (nm)<\/td>\n<td data-col-size=\"sm\" data-start=\"2017\" data-end=\"2028\">532\/1064<\/td>\n<td data-col-size=\"sm\" data-start=\"2028\" data-end=\"2040\">532\/1064<\/td>\n<\/tr>\n<tr data-start=\"2041\" data-end=\"2086\">\n<td data-start=\"2041\" data-end=\"2059\" data-col-size=\"sm\">Potencia nominal (W)<\/td>\n<td data-col-size=\"sm\" data-start=\"2059\" data-end=\"2072\">50\/100\/200<\/td>\n<td data-col-size=\"sm\" data-start=\"2072\" data-end=\"2086\">50\/100\/200<\/td>\n<\/tr>\n<tr data-start=\"2087\" data-end=\"2133\">\n<td data-start=\"2087\" data-end=\"2114\" data-col-size=\"sm\">Presi\u00f3n del chorro de agua (bar)<\/td>\n<td data-col-size=\"sm\" data-start=\"2114\" data-end=\"2123\">50-100<\/td>\n<td data-col-size=\"sm\" data-start=\"2123\" data-end=\"2133\">50-600<\/td>\n<\/tr>\n<tr data-start=\"2134\" data-end=\"2172\">\n<td data-start=\"2134\" data-end=\"2153\" data-col-size=\"sm\">Tama\u00f1o de la boquilla (\u03bcm)<\/td>\n<td data-col-size=\"sm\" data-start=\"2153\" data-end=\"2162\">30-150<\/td>\n<td data-col-size=\"sm\" data-start=\"2162\" data-end=\"2172\">30-150<\/td>\n<\/tr>\n<tr data-start=\"2173\" data-end=\"2234\">\n<td data-start=\"2173\" data-end=\"2199\" data-col-size=\"sm\">Dimensiones de la m\u00e1quina (mm)<\/td>\n<td data-col-size=\"sm\" data-start=\"2199\" data-end=\"2216\">1445\u00d71944\u00d72260<\/td>\n<td data-col-size=\"sm\" data-start=\"2216\" data-end=\"2234\">1700\u00d71500\u00d72120<\/td>\n<\/tr>\n<tr data-start=\"2235\" data-end=\"2259\">\n<td data-start=\"2235\" data-end=\"2248\" data-col-size=\"sm\">Peso (T)<\/td>\n<td data-col-size=\"sm\" data-start=\"2248\" data-end=\"2254\">2.5<\/td>\n<td data-col-size=\"sm\" data-start=\"2254\" data-end=\"2259\">3<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h2 data-section-id=\"3f2aoc\" data-start=\"2266\" data-end=\"2287\"><span role=\"text\"><strong data-start=\"2269\" data-end=\"2285\">Aplicaciones<\/strong><\/span><\/h2>\n<ol data-start=\"2289\" data-end=\"3456\">\n<li data-section-id=\"uspqzy\" data-start=\"2289\" data-end=\"2611\"><strong data-start=\"2292\" data-end=\"2318\">Corte de obleas<\/strong>\n<ul data-start=\"2324\" data-end=\"2611\">\n<li data-section-id=\"15n5kv\" data-start=\"2324\" data-end=\"2427\">Materiales: Silicio (Si), carburo de silicio (SiC), nitruro de galio (GaN) y otras obleas duras\/quebradizas.<\/li>\n<li data-section-id=\"4o8wnm\" data-start=\"2431\" data-end=\"2611\">Ventajas: Sustituye a los discos de diamante tradicionales, reduce la rotura de bordes (20 \u03bcm), aumenta la velocidad de corte en 30%, permite un corte en cubos sigiloso para obleas ultrafinas (&lt;50 \u03bcm).<\/li>\n<\/ul>\n<\/li>\n<li data-section-id=\"1yejyyv\" data-start=\"2613\" data-end=\"2857\"><strong data-start=\"2616\" data-end=\"2656\">Taladrado de virutas y procesamiento de microorificios<\/strong>\n<ul data-start=\"2662\" data-end=\"2857\">\n<li data-section-id=\"dt0vh3\" data-start=\"2662\" data-end=\"2758\">Aplicaciones: Perforaci\u00f3n de v\u00edas de silicio pasantes (TSV), conjuntos de microagujeros t\u00e9rmicos para dispositivos de potencia.<\/li>\n<li data-section-id=\"13sb21p\" data-start=\"2762\" data-end=\"2857\">Caracter\u00edsticas: Apertura 10-200 \u03bcm, relaci\u00f3n profundidad-anchura hasta 10:1, rugosidad superficial Ra &lt;0,5 \u03bcm.<\/li>\n<\/ul>\n<\/li>\n<li data-section-id=\"lwpk87\" data-start=\"2859\" data-end=\"3031\"><strong data-start=\"2862\" data-end=\"2884\">Envasado avanzado<\/strong>\n<ul data-start=\"2890\" data-end=\"3031\">\n<li data-section-id=\"c5ajme\" data-start=\"2890\" data-end=\"2963\">Aplicaciones: Apertura de ventanas RDL, empaquetado a nivel de oblea (Fan-Out WLP)<\/li>\n<li data-section-id=\"xf24nc\" data-start=\"2967\" data-end=\"3031\">Ventajas: Evita la tensi\u00f3n mec\u00e1nica, mejora el rendimiento a &gt;99,5%<\/li>\n<\/ul>\n<\/li>\n<li data-section-id=\"1drgwht\" data-start=\"3033\" data-end=\"3250\"><strong data-start=\"3036\" data-end=\"3073\">Procesado de semiconductores compuestos<\/strong>\n<ul data-start=\"3079\" data-end=\"3250\">\n<li data-section-id=\"s1h4sg\" data-start=\"3079\" data-end=\"3140\">Materiales: GaN, SiC y otros semiconductores de banda ancha<\/li>\n<li data-section-id=\"1vpfptr\" data-start=\"3144\" data-end=\"3250\">Caracter\u00edsticas: Grabado de la muesca de la puerta, recocido l\u00e1ser, control preciso de la energ\u00eda para evitar la descomposici\u00f3n t\u00e9rmica.<\/li>\n<\/ul>\n<\/li>\n<li data-section-id=\"l1d0bs\" data-start=\"3252\" data-end=\"3456\"><strong data-start=\"3255\" data-end=\"3286\">Reparaci\u00f3n de defectos y puesta a punto<\/strong>\n<ul data-start=\"3292\" data-end=\"3456\">\n<li data-section-id=\"qf6wq6\" data-start=\"3292\" data-end=\"3386\">Aplicaciones: Fusi\u00f3n l\u00e1ser para circuitos de memoria, ajuste de matrices de microlentes para sensores \u00f3pticos<\/li>\n<li data-section-id=\"1n1j7rx\" data-start=\"3390\" data-end=\"3456\">Precisi\u00f3n: Control de energ\u00eda \u00b11%, error de posicionamiento de reparaci\u00f3n &lt;0,1 \u03bcm.<\/li>\n<\/ul>\n<\/li>\n<\/ol>\n<p><img decoding=\"async\" class=\"wp-image-2056 size-full aligncenter\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing66.png\" alt=\"\" width=\"680\" height=\"145\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing66.png 680w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing66-300x64.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing66-18x4.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Microfluidic-Laser-Equipment-For-Semiconductor-Wafer-Processing66-600x128.png 600w\" sizes=\"(max-width: 680px) 100vw, 680px\" \/><\/p>\n<h2 data-section-id=\"pf3kxk\" data-start=\"3463\" data-end=\"3495\"><span role=\"text\"><strong data-start=\"3466\" data-end=\"3493\">Aspectos destacados y ventajas<\/strong><\/span><\/h2>\n<ul data-start=\"3496\" data-end=\"3989\">\n<li data-section-id=\"rm9qtv\" data-start=\"3496\" data-end=\"3584\">El procesamiento en fr\u00edo, limpio y controlado minimiza los da\u00f1os por calor, las microfisuras y la conicidad<\/li>\n<li data-section-id=\"11s5pkb\" data-start=\"3585\" data-end=\"3669\">El chorro de agua ultrafino garantiza un guiado preciso del l\u00e1ser y una eliminaci\u00f3n eficaz de los residuos<\/li>\n<li data-section-id=\"kr28gm\" data-start=\"3670\" data-end=\"3786\">Adecuado para materiales duros, quebradizos y transparentes como SiC, GaN, diamante, LTCC y cristales fotovoltaicos.<\/li>\n<li data-section-id=\"i2ose\" data-start=\"3787\" data-end=\"3911\">Compatible con la fabricaci\u00f3n de semiconductores de alta precisi\u00f3n, envasado avanzado, componentes aeroespaciales y microelectr\u00f3nica.<\/li>\n<li data-section-id=\"1f3ldb6\" data-start=\"3912\" data-end=\"3989\">Mejora el rendimiento, reduce el desperdicio de material y preserva sus propiedades<\/li>\n<\/ul>\n<h2 data-section-id=\"1yvhc7a\" data-start=\"3996\" data-end=\"4031\"><span role=\"text\"><strong data-start=\"3999\" data-end=\"4029\">Certificaci\u00f3n y conformidad<\/strong><\/span><\/h2>\n<ul data-start=\"4032\" data-end=\"4173\">\n<li data-section-id=\"vmmuwx\" data-start=\"4032\" data-end=\"4050\">Cumple la directiva RoHS<\/li>\n<li data-section-id=\"1drd7dj\" data-start=\"4051\" data-end=\"4109\">Dise\u00f1ado para aplicaciones de semiconductores de alta precisi\u00f3n<\/li>\n<li data-section-id=\"1kx7imt\" data-start=\"4110\" data-end=\"4173\">Admite procesos reproducibles, repetibles y automatizados<\/li>\n<\/ul>\n<h2 data-section-id=\"1fngur7\" data-start=\"78\" data-end=\"90\"><span role=\"text\"><strong data-start=\"81\" data-end=\"88\">PREGUNTAS FRECUENTES<\/strong><\/span><\/h2>\n<p data-start=\"92\" data-end=\"539\"><strong data-start=\"92\" data-end=\"174\">1. \u00bfQu\u00e9 tipos de materiales pueden procesarse con equipos l\u00e1ser microflu\u00eddicos?<\/strong><br data-start=\"174\" data-end=\"177\" \/>La tecnolog\u00eda l\u00e1ser microflu\u00eddica puede procesar con precisi\u00f3n materiales semiconductores duros, quebradizos y de banda prohibida ancha, como silicio (Si), carburo de silicio (SiC), nitruro de galio (GaN), diamante, sustratos cer\u00e1micos de carbono LTCC, cristales fotovoltaicos y otros materiales avanzados. Es ideal para aplicaciones que requieren un da\u00f1o t\u00e9rmico m\u00ednimo y una alta calidad superficial.<\/p>\n<p data-start=\"541\" data-end=\"931\"><strong data-start=\"541\" data-end=\"625\">2. \u00bfC\u00f3mo mejora la tecnolog\u00eda l\u00e1ser de microchorro la fabricaci\u00f3n de obleas semiconductoras?<\/strong><br data-start=\"625\" data-end=\"628\" \/>Al combinar un chorro de agua submicr\u00f3nico con un rayo l\u00e1ser, la tecnolog\u00eda consigue una precisi\u00f3n submicr\u00f3nica al tiempo que minimiza las zonas afectadas por el calor, la contaminaci\u00f3n y la rotura de bordes. Sustituye a las cuchillas mec\u00e1nicas tradicionales para cortar, perforar y microestructurar, mejorando el rendimiento y reduciendo el desperdicio de material.<\/p>\n<p data-start=\"933\" data-end=\"1044\"><strong data-start=\"933\" data-end=\"1006\">3. \u00bfPara qu\u00e9 aplicaciones son m\u00e1s adecuados los equipos l\u00e1ser microflu\u00eddicos?<\/strong><br data-start=\"1006\" data-end=\"1009\" \/>Este equipo se utiliza ampliamente en:<\/p>\n<ul data-start=\"1045\" data-end=\"1352\">\n<li data-section-id=\"2ulyh7\" data-start=\"1045\" data-end=\"1110\">Corte de obleas y corte sigiloso de obleas ultrafinas (&lt;50 \u03bcm)<\/li>\n<li data-section-id=\"o1ga99\" data-start=\"1111\" data-end=\"1199\">Perforaci\u00f3n de v\u00edas de silicio pasantes (TSV) y conjuntos de microagujeros para circuitos integrados 3D y dispositivos de potencia<\/li>\n<li data-section-id=\"skkgwb\" data-start=\"1200\" data-end=\"1352\">Embalaje avanzado, como apertura de ventanas RDL, embalaje a nivel de oblea (Fan-Out WLP) y grabado de compuertas\/ recocido por l\u00e1ser para semiconductores GaN y SiC.<\/li>\n<\/ul>","protected":false},"excerpt":{"rendered":"<p>Los equipos l\u00e1ser microflu\u00eddicos utilizan tecnolog\u00eda l\u00e1ser de microchorro avanzada para proporcionar un procesamiento de alta precisi\u00f3n y bajo da\u00f1o t\u00e9rmico para obleas semiconductoras y otros materiales duros, quebradizos o de banda prohibida 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