{"id":2400,"date":"2026-04-24T06:21:19","date_gmt":"2026-04-24T06:21:19","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2400"},"modified":"2026-04-24T06:21:22","modified_gmt":"2026-04-24T06:21:22","slug":"precision-silicon-ring-single-crystal-polycrystalline-for-semiconductor-plasma-etching","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/de\/product\/precision-silicon-ring-single-crystal-polycrystalline-for-semiconductor-plasma-etching\/","title":{"rendered":"Pr\u00e4zisions-Siliziumring (einkristallin\/polykristallin) f\u00fcr das Halbleiter-Plasma-\u00c4tzen"},"content":{"rendered":"<p data-start=\"228\" data-end=\"558\">\u00a0\u00a0<img fetchpriority=\"high\" decoding=\"async\" class=\"alignright wp-image-2404 size-medium\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Precision-Silicon-Ring-Single-Crystal-Polycrystalline-for-Semiconductor-Plasma-Etching-1-300x300.png\" alt=\"Pr\u00e4zisions-Siliziumring (einkristallin\/polykristallin) f\u00fcr das Halbleiter-Plasma-\u00c4tzen\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Precision-Silicon-Ring-Single-Crystal-Polycrystalline-for-Semiconductor-Plasma-Etching-1-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Precision-Silicon-Ring-Single-Crystal-Polycrystalline-for-Semiconductor-Plasma-Etching-1-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Precision-Silicon-Ring-Single-Crystal-Polycrystalline-for-Semiconductor-Plasma-Etching-1-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Precision-Silicon-Ring-Single-Crystal-Polycrystalline-for-Semiconductor-Plasma-Etching-1-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Precision-Silicon-Ring-Single-Crystal-Polycrystalline-for-Semiconductor-Plasma-Etching-1-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Precision-Silicon-Ring-Single-Crystal-Polycrystalline-for-Semiconductor-Plasma-Etching-1-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Precision-Silicon-Ring-Single-Crystal-Polycrystalline-for-Semiconductor-Plasma-Etching-1.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Der Siliziumring (Si-Ring) ist eine weit verbreitete Komponente in Halbleiter-Plasmabearbeitungsanlagen und dient als Fokusring, Kantenring oder Kammerauskleidung. Er spielt eine Schl\u00fcsselrolle bei der Steuerung der Plasmaverteilung, der Verbesserung der Gleichm\u00e4\u00dfigkeit des \u00c4tzens und dem Schutz kritischer Kammerkomponenten vor der direkten Einwirkung des Hochenergieplasmas.<\/p>\n<p data-start=\"560\" data-end=\"882\">Die aus hochreinem einkristallinem oder polykristallinem Silizium hergestellten Si-Ringe bieten eine hervorragende Kompatibilit\u00e4t mit Silizium-Waferprozessen. Diese inh\u00e4rente Materialkompatibilit\u00e4t verringert das Kontaminationsrisiko erheblich und macht Siliziumringe zu einer bevorzugten Wahl in vielen Halbleiterfertigungsumgebungen.<\/p>\n<p data-start=\"884\" data-end=\"1239\">W\u00e4hrend des Betriebs sind die Siliziumringe einem reaktiven Plasma ausgesetzt, das durch Gase wie CF\u2084, SF\u2086, NF\u2083 und Cl\u2082 erzeugt wird. Diese Bedingungen f\u00fchren allm\u00e4hlich zu Materialerosion und Oberfl\u00e4chenverschlechterung. Daher werden Siliziumringe als kritische Halbleiterverbrauchsmaterialien eingestuft, die regelm\u00e4\u00dfig ausgetauscht werden m\u00fcssen, um eine optimale Prozessleistung und Ausbeute zu gew\u00e4hrleisten.<\/p>\n<p data-start=\"1241\" data-end=\"1430\">Im Vergleich zu SiC-Ringen sind Siliziumringe kosteng\u00fcnstiger und leichter zu bearbeiten, was sie ideal f\u00fcr Anwendungen macht, bei denen die Austauschzyklen akzeptabel sind und die Kostenkontrolle wichtig ist.<\/p>\n<hr data-start=\"1432\" data-end=\"1435\" \/>\n<h2 data-section-id=\"1wht24f\" data-start=\"1437\" data-end=\"1457\">Wesentliche Merkmale<\/h2>\n<ul data-start=\"1458\" data-end=\"2054\">\n<li data-section-id=\"1wvx41j\" data-start=\"1458\" data-end=\"1549\">Hochreines Siliziummaterial: Erh\u00e4ltlich in einkristalliner und polykristalliner Form<\/li>\n<li data-section-id=\"16rlosp\" data-start=\"1550\" data-end=\"1653\">Ausgezeichnete Prozesskompatibilit\u00e4t: Ideal f\u00fcr die Verarbeitung von Siliziumwafern mit geringem Kontaminationsrisiko<\/li>\n<li data-section-id=\"h5tu82\" data-start=\"1654\" data-end=\"1727\">Stabile elektrische Eigenschaften: Unterst\u00fctzt konsistentes Plasmaverhalten<\/li>\n<li data-section-id=\"qwtj7n\" data-start=\"1728\" data-end=\"1814\">Pr\u00e4zisionsbearbeitung: Enge Toleranzen (&lt;10 \u03bcm) f\u00fcr moderne Halbleiterwerkzeuge<\/li>\n<li data-section-id=\"cd4ksl\" data-start=\"1815\" data-end=\"1903\">Mehrere Widerstandsoptionen: Geeignet f\u00fcr unterschiedliche Anforderungen an die Plasmakontrolle<\/li>\n<li data-section-id=\"vfz8a3\" data-start=\"1904\" data-end=\"1984\">Kosteneffiziente L\u00f6sung: Geringere Anfangskosten im Vergleich zu SiC-Alternativen<\/li>\n<li data-section-id=\"1q6rj8k\" data-start=\"1985\" data-end=\"2054\">Unterst\u00fctzung f\u00fcr kundenspezifische Designs: Komplexe Geometrien und Gr\u00f6\u00dfen verf\u00fcgbar<\/li>\n<\/ul>\n<hr data-start=\"2056\" data-end=\"2059\" \/>\n<h2 data-section-id=\"1vgwxle\" data-start=\"2061\" data-end=\"2093\">Technische Daten<\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2095\" data-end=\"2793\">\n<thead data-start=\"2095\" data-end=\"2124\">\n<tr data-start=\"2095\" data-end=\"2124\">\n<th class=\"\" data-start=\"2095\" data-end=\"2107\" data-col-size=\"sm\">Parameter<\/th>\n<th class=\"\" data-start=\"2107\" data-end=\"2124\" data-col-size=\"md\">Spezifikation<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2152\" data-end=\"2793\">\n<tr data-start=\"2152\" data-end=\"2215\">\n<td data-start=\"2152\" data-end=\"2163\" data-col-size=\"sm\">Material<\/td>\n<td data-col-size=\"md\" data-start=\"2163\" data-end=\"2215\">Einkristallines Silizium \/ Polykristallines Silizium<\/td>\n<\/tr>\n<tr data-start=\"2216\" data-end=\"2263\">\n<td data-start=\"2216\" data-end=\"2225\" data-col-size=\"sm\">Reinheit<\/td>\n<td data-col-size=\"md\" data-start=\"2225\" data-end=\"2263\">\u2265 99,999% (5N Halbleiterqualit\u00e4t)<\/td>\n<\/tr>\n<tr data-start=\"2264\" data-end=\"2297\">\n<td data-start=\"2264\" data-end=\"2281\" data-col-size=\"sm\">Durchmesser (Max)<\/td>\n<td data-col-size=\"md\" data-start=\"2281\" data-end=\"2297\">bis zu 480 mm<\/td>\n<\/tr>\n<tr data-start=\"2298\" data-end=\"2340\">\n<td data-start=\"2298\" data-end=\"2310\" data-col-size=\"sm\">Dicke<\/td>\n<td data-col-size=\"md\" data-start=\"2310\" data-end=\"2340\">Benutzerdefiniert (normalerweise 5-30 mm)<\/td>\n<\/tr>\n<tr data-start=\"2341\" data-end=\"2376\">\n<td data-start=\"2341\" data-end=\"2361\" data-col-size=\"sm\">Widerstandsf\u00e4higkeit (niedrig)<\/td>\n<td data-col-size=\"md\" data-start=\"2361\" data-end=\"2376\">&lt; 0,02 \u03a9-cm<\/td>\n<\/tr>\n<tr data-start=\"2377\" data-end=\"2414\">\n<td data-start=\"2377\" data-end=\"2400\" data-col-size=\"sm\">Spezifischer Widerstand (Medium)<\/td>\n<td data-col-size=\"md\" data-start=\"2400\" data-end=\"2414\">1 - 4 \u03a9-cm<\/td>\n<\/tr>\n<tr data-start=\"2415\" data-end=\"2452\">\n<td data-start=\"2415\" data-end=\"2436\" data-col-size=\"sm\">Widerstandsf\u00e4higkeit (hoch)<\/td>\n<td data-col-size=\"md\" data-start=\"2436\" data-end=\"2452\">70 - 90 \u03a9-cm<\/td>\n<\/tr>\n<tr data-start=\"2453\" data-end=\"2492\">\n<td data-start=\"2453\" data-end=\"2484\" data-col-size=\"sm\">Gleichm\u00e4\u00dfigkeit des Widerstands (RRG)<\/td>\n<td data-col-size=\"md\" data-start=\"2484\" data-end=\"2492\">&lt; 5%<\/td>\n<\/tr>\n<tr data-start=\"2493\" data-end=\"2543\">\n<td data-start=\"2493\" data-end=\"2513\" data-col-size=\"sm\">Zustand der Oberfl\u00e4che<\/td>\n<td data-col-size=\"md\" data-start=\"2513\" data-end=\"2543\">Poliert \/ gel\u00e4ppt \/ geschliffen<\/td>\n<\/tr>\n<tr data-start=\"2544\" data-end=\"2605\">\n<td data-start=\"2544\" data-end=\"2569\" data-col-size=\"sm\">Oberfl\u00e4chenrauhigkeit (Ra)<\/td>\n<td data-col-size=\"md\" data-start=\"2569\" data-end=\"2605\">\u2264 0,8 \u03bcm (poliert kann niedriger sein)<\/td>\n<\/tr>\n<tr data-start=\"2606\" data-end=\"2639\">\n<td data-start=\"2606\" data-end=\"2628\" data-col-size=\"sm\">Pr\u00e4zision in der Bearbeitung<\/td>\n<td data-col-size=\"md\" data-start=\"2628\" data-end=\"2639\">&lt; 10 \u03bcm<\/td>\n<\/tr>\n<tr data-start=\"2640\" data-end=\"2682\">\n<td data-start=\"2640\" data-end=\"2651\" data-col-size=\"sm\">Ebenheit<\/td>\n<td data-col-size=\"md\" data-start=\"2651\" data-end=\"2682\">\u2264 30 \u03bcm (je nach Gr\u00f6\u00dfe)<\/td>\n<\/tr>\n<tr data-start=\"2683\" data-end=\"2728\">\n<td data-start=\"2683\" data-end=\"2695\" data-col-size=\"sm\">Kanten-Typ<\/td>\n<td data-col-size=\"md\" data-start=\"2695\" data-end=\"2728\">Fase\/Radius anpassbar<\/td>\n<\/tr>\n<tr data-start=\"2729\" data-end=\"2793\">\n<td data-start=\"2729\" data-end=\"2747\" data-col-size=\"sm\">Qualit\u00e4tskontrolle<\/td>\n<td data-col-size=\"md\" data-start=\"2747\" data-end=\"2793\">Keine Risse, Chips, Kratzer, Verunreinigungen<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"2795\" data-end=\"2798\" \/>\n<h2 data-section-id=\"1gggyhy\" data-start=\"2800\" data-end=\"2820\">Anwendungen<\/h2>\n<p data-start=\"2821\" data-end=\"2903\">Siliziumringe sind in einer Vielzahl von Halbleiterverarbeitungsumgebungen unverzichtbar:<\/p>\n<ul data-start=\"2905\" data-end=\"3108\">\n<li data-section-id=\"qzqq98\" data-start=\"2905\" data-end=\"2943\">Plasma-\u00c4tzsysteme (ICP \/ RIE)<\/li>\n<li data-section-id=\"1iourx1\" data-start=\"2944\" data-end=\"2987\">Chemische Gasphasenabscheidung (CVD \/ PECVD)<\/li>\n<li data-section-id=\"1hekjdg\" data-start=\"2988\" data-end=\"3025\">Komponenten Fokusring \/ Kantenring<\/li>\n<li data-section-id=\"y1zl6l\" data-start=\"3026\" data-end=\"3065\">Kammerschutz und Auskleidungsteile<\/li>\n<li data-section-id=\"83pt8g\" data-start=\"3066\" data-end=\"3108\">Anwendungen zur Plasmakontrolle am Waferrand<\/li>\n<\/ul>\n<p data-start=\"3110\" data-end=\"3235\">Sie werden sowohl in ausgereiften als auch in intermedi\u00e4ren Prozessknoten eingesetzt, wo Kosteneffizienz und stabile Leistung erforderlich sind.<\/p>\n<p data-start=\"3110\" data-end=\"3235\"><img decoding=\"async\" class=\"aligncenter wp-image-2406 size-large\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/nqhpoIZB7ZFQ0FgmKSApdpD5LVDKRh2mgeWJ0h_n8YC-oFDqn-Z2JB5pyoBfyG-_oDLzw_pC2C1A3AoLJoKcLErEuU3bYIhN8vq8CwcolHLoXu8EmdfU22zT2CiuFBN0qxhzObBOZwWh-dASuFxcJnit1n-yH8VsKHv8U2e2dzbKmApkzAOkXyVy8SRUL7r0-1024x681.jpg\" alt=\"Pr\u00e4zisions-Siliziumring (einkristallin\/polykristallin) f\u00fcr das Halbleiter-Plasma-\u00c4tzen\" width=\"1024\" height=\"681\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/nqhpoIZB7ZFQ0FgmKSApdpD5LVDKRh2mgeWJ0h_n8YC-oFDqn-Z2JB5pyoBfyG-_oDLzw_pC2C1A3AoLJoKcLErEuU3bYIhN8vq8CwcolHLoXu8EmdfU22zT2CiuFBN0qxhzObBOZwWh-dASuFxcJnit1n-yH8VsKHv8U2e2dzbKmApkzAOkXyVy8SRUL7r0-1024x681.jpg 1024w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/nqhpoIZB7ZFQ0FgmKSApdpD5LVDKRh2mgeWJ0h_n8YC-oFDqn-Z2JB5pyoBfyG-_oDLzw_pC2C1A3AoLJoKcLErEuU3bYIhN8vq8CwcolHLoXu8EmdfU22zT2CiuFBN0qxhzObBOZwWh-dASuFxcJnit1n-yH8VsKHv8U2e2dzbKmApkzAOkXyVy8SRUL7r0-300x199.jpg 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/nqhpoIZB7ZFQ0FgmKSApdpD5LVDKRh2mgeWJ0h_n8YC-oFDqn-Z2JB5pyoBfyG-_oDLzw_pC2C1A3AoLJoKcLErEuU3bYIhN8vq8CwcolHLoXu8EmdfU22zT2CiuFBN0qxhzObBOZwWh-dASuFxcJnit1n-yH8VsKHv8U2e2dzbKmApkzAOkXyVy8SRUL7r0-768x510.jpg 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/nqhpoIZB7ZFQ0FgmKSApdpD5LVDKRh2mgeWJ0h_n8YC-oFDqn-Z2JB5pyoBfyG-_oDLzw_pC2C1A3AoLJoKcLErEuU3bYIhN8vq8CwcolHLoXu8EmdfU22zT2CiuFBN0qxhzObBOZwWh-dASuFxcJnit1n-yH8VsKHv8U2e2dzbKmApkzAOkXyVy8SRUL7r0-1536x1021.jpg 1536w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/nqhpoIZB7ZFQ0FgmKSApdpD5LVDKRh2mgeWJ0h_n8YC-oFDqn-Z2JB5pyoBfyG-_oDLzw_pC2C1A3AoLJoKcLErEuU3bYIhN8vq8CwcolHLoXu8EmdfU22zT2CiuFBN0qxhzObBOZwWh-dASuFxcJnit1n-yH8VsKHv8U2e2dzbKmApkzAOkXyVy8SRUL7r0-18x12.jpg 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/nqhpoIZB7ZFQ0FgmKSApdpD5LVDKRh2mgeWJ0h_n8YC-oFDqn-Z2JB5pyoBfyG-_oDLzw_pC2C1A3AoLJoKcLErEuU3bYIhN8vq8CwcolHLoXu8EmdfU22zT2CiuFBN0qxhzObBOZwWh-dASuFxcJnit1n-yH8VsKHv8U2e2dzbKmApkzAOkXyVy8SRUL7r0-600x399.jpg 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/nqhpoIZB7ZFQ0FgmKSApdpD5LVDKRh2mgeWJ0h_n8YC-oFDqn-Z2JB5pyoBfyG-_oDLzw_pC2C1A3AoLJoKcLErEuU3bYIhN8vq8CwcolHLoXu8EmdfU22zT2CiuFBN0qxhzObBOZwWh-dASuFxcJnit1n-yH8VsKHv8U2e2dzbKmApkzAOkXyVy8SRUL7r0.jpg 2048w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><\/p>\n<hr data-start=\"3237\" data-end=\"3240\" \/>\n<h2 data-section-id=\"1misgzs\" data-start=\"3242\" data-end=\"3274\">Vorteile &amp; Positionierung<\/h2>\n<p data-start=\"3275\" data-end=\"3371\">Siliziumringe bieten eine ausgewogene L\u00f6sung zwischen Leistung und Kosten. Verglichen mit SiC-Ringen:<\/p>\n<ul data-start=\"3373\" data-end=\"3681\">\n<li data-section-id=\"qgkkrh\" data-start=\"3373\" data-end=\"3449\">Geringere Kosten: Ideal f\u00fcr budgetabh\u00e4ngige Szenarien oder solche mit hohem Ersatzbedarf<\/li>\n<li data-section-id=\"fe5ihf\" data-start=\"3450\" data-end=\"3533\">Gute Prozesskompatibilit\u00e4t: Besonders geeignet f\u00fcr siliziumbasierte Prozesse<\/li>\n<li data-section-id=\"1wgvfgt\" data-start=\"3534\" data-end=\"3604\">Flexible Fertigung: Leichtere Bearbeitung komplexer Designs<\/li>\n<li data-section-id=\"1855g4l\" data-start=\"3605\" data-end=\"3681\">Zuverl\u00e4ssige Leistung: Bew\u00e4hrt in der Gro\u00dfserienproduktion von Halbleitern<\/li>\n<\/ul>\n<p data-start=\"3683\" data-end=\"3894\">Unter extrem rauen Plasmabedingungen k\u00f6nnen Siliziumringe jedoch schneller verschlei\u00dfen als SiC-Ringe. Daher sollte die Materialauswahl auf der Grundlage der Prozessintensit\u00e4t, der erwarteten Lebensdauer und der Kostenerw\u00e4gungen erfolgen.<\/p>\n<p data-start=\"3683\" data-end=\"3894\"><img decoding=\"async\" class=\"wp-image-2383 size-large aligncenter\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/\u5fae\u4fe1\u56fe\u7247_20260423181006_366_381-1024x486.png\" alt=\"\" width=\"1024\" height=\"486\" srcset=\"\" sizes=\"(max-width: 1024px) 100vw, 1024px\" data-srcset=\"\" \/><\/p>\n<hr data-start=\"3896\" data-end=\"3899\" \/>\n<h2 data-section-id=\"cpu4ih\" data-start=\"3901\" data-end=\"3912\">FAQ<\/h2>\n<p data-start=\"3914\" data-end=\"4070\">F1: Ist der Silikonring ein Verbrauchsprodukt?<br data-start=\"3963\" data-end=\"3966\" \/>Ja, es gilt als kritisches Halbleiter-Verbrauchsmaterial, da es in Plasma-Umgebungen allm\u00e4hlich erodiert.<\/p>\n<p data-start=\"4072\" data-end=\"4291\">F2: Was ist der Unterschied zwischen einkristallinen und polykristallinen Siliziumringen?<br data-start=\"4160\" data-end=\"4163\" \/>Einkristallines Silizium bietet bessere Gleichm\u00e4\u00dfigkeit und elektrische Eigenschaften, w\u00e4hrend polykristallines Silizium kosteng\u00fcnstiger ist.<\/p>\n<p data-start=\"4293\" data-end=\"4452\">Q3: Kann der Silikonring individuell angepasst werden?<br data-start=\"4336\" data-end=\"4339\" \/>Ja. Gr\u00f6\u00dfe, Dicke, Widerstand, Oberfl\u00e4chenbeschaffenheit und Geometrie k\u00f6nnen nach Ihren Zeichnungen angepasst werden.<\/p>\n<p data-start=\"4454\" data-end=\"4622\">F4: Wie oft muss ein Silikonring ausgetauscht werden?<br data-start=\"4509\" data-end=\"4512\" \/>Dies h\u00e4ngt von den Prozessbedingungen ab, ist jedoch aufgrund der geringeren Plasmabest\u00e4ndigkeit in der Regel h\u00e4ufiger als bei SiC-Ringen.<\/p>\n<p data-start=\"4624\" data-end=\"4743\">F5: Was ist die typische Vorlaufzeit?<br data-start=\"4662\" data-end=\"4665\" \/>Die Produktion dauert in der Regel 3-5 Wochen, je nach Spezifikation und Menge.<\/p>","protected":false},"excerpt":{"rendered":"<p>Der Siliziumring (Si-Ring) ist eine weit verbreitete Komponente in Halbleiter-Plasmabearbeitungsanlagen und dient als Fokusring, Kantenring oder Kammerauskleidung. Er spielt eine Schl\u00fcsselrolle bei der Steuerung der Plasmaverteilung, der Verbesserung der Gleichm\u00e4\u00dfigkeit des \u00c4tzens und dem Schutz kritischer Kammerkomponenten vor der direkten Einwirkung des Hochenergieplasmas.<\/p>","protected":false},"featured_media":2404,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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