{"id":2349,"date":"2026-04-22T06:17:36","date_gmt":"2026-04-22T06:17:36","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2349"},"modified":"2026-04-22T07:24:00","modified_gmt":"2026-04-22T07:24:00","slug":"ai200hc-d-high-beam-ion-implantation-system-for-6-8-inch-silicon-wafer-processing-and-smart-cut-applications","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/de\/product\/ai200hc-d-high-beam-ion-implantation-system-for-6-8-inch-silicon-wafer-processing-and-smart-cut-applications\/","title":{"rendered":"Ai200HC.D Hochstrahl-Ionenimplantationssystem f\u00fcr die Bearbeitung von 6\/8-Zoll-Siliziumwafern und Smart-Cut-Anwendungen"},"content":{"rendered":"<p data-start=\"155\" data-end=\"421\"><img decoding=\"async\" class=\"wp-image-2350 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-300x300.png\" alt=\"\" width=\"209\" height=\"209\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ai200HC.D-High-Beam-Ion-Implantation-System.png 1000w\" sizes=\"(max-width: 209px) 100vw, 209px\" \/>Das Ionenimplantationssystem Ai200HC.D (High Beam) ist f\u00fcr Halbleiterproduktionslinien f\u00fcr 6- und 8-Zoll-Siliziumwafer konzipiert. Es handelt sich um einen Hochstrom-Ionenimplantator, der f\u00fcr Pr\u00e4zisionsdotierung und fortschrittliche Prozessanwendungen in der Herstellung integrierter Schaltkreise entwickelt wurde.<\/p>\n<p data-start=\"423\" data-end=\"698\">Das System unterst\u00fctzt einen Energiebereich von 5 keV bis 180 keV und bietet eine stabile Strahlleistung und hohe Prozesswiederholbarkeit. Es eignet sich f\u00fcr die Halbleiterfertigung auf Siliziumbasis und fortschrittliche Prozesse im Zusammenhang mit dem Wafer-Bonding, einschlie\u00dflich der Integration der Smart-Cut-Technologie.<\/p>\n<hr data-start=\"700\" data-end=\"703\" \/>\n<h2 data-section-id=\"1d7mrtu\" data-start=\"705\" data-end=\"716\">Eigenschaften<\/h2>\n<h3 data-section-id=\"11asise\" data-start=\"718\" data-end=\"753\">Fernlichtstabilit\u00e4t Leistung<\/h3>\n<p data-start=\"754\" data-end=\"897\">Das System sorgt f\u00fcr eine stabile Ionenstrahlleistung mit kontrollierten Schwankungen und gew\u00e4hrleistet so eine gleichbleibende Implantationsqualit\u00e4t bei kontinuierlicher Produktion.<\/p>\n<h3 data-section-id=\"38j0c\" data-start=\"899\" data-end=\"929\">Breite Prozesskompatibilit\u00e4t<\/h3>\n<p data-start=\"930\" data-end=\"1057\">Kompatibel mit siliziumbasierten Prozessen und Smart-Cut-bezogenen Anwendungen, die fortschrittliche Anforderungen an die Waferentwicklung unterst\u00fctzen.<\/p>\n<h3 data-section-id=\"2v7p6\" data-start=\"1059\" data-end=\"1093\">Hochpr\u00e4zise Implantatkontrolle<\/h3>\n<p data-start=\"1094\" data-end=\"1142\">Bietet eine genaue Implantationsleistung mit:<\/p>\n<ul data-start=\"1143\" data-end=\"1231\">\n<li data-section-id=\"1irf1o\" data-start=\"1143\" data-end=\"1166\">Winkelgenauigkeit \u2264 0,2\u00b0<\/li>\n<li data-section-id=\"1hml6xy\" data-start=\"1167\" data-end=\"1192\">Strahlparallelit\u00e4t \u2264 0,3\u00b0<\/li>\n<li data-section-id=\"1danezc\" data-start=\"1193\" data-end=\"1210\">Gleichm\u00e4\u00dfigkeit \u2264 1%<\/li>\n<li data-section-id=\"mbe4el\" data-start=\"1211\" data-end=\"1231\">Reproduzierbarkeit \u2264 1%<\/li>\n<\/ul>\n<h3 data-section-id=\"8aw6q\" data-start=\"1233\" data-end=\"1263\">Hohe Durchsatzleistung<\/h3>\n<p data-start=\"1264\" data-end=\"1369\">Unterst\u00fctzt \u2265 220 Wafer pro Stunde, geeignet f\u00fcr mittlere bis hohe St\u00fcckzahlen in der Halbleiterproduktion.<\/p>\n<h3 data-section-id=\"1e3kdu8\" data-start=\"1371\" data-end=\"1409\">Batch-Zielverarbeitungsfunktion<\/h3>\n<p data-start=\"1410\" data-end=\"1554\">Unterst\u00fctzt die Stapelverarbeitung von Targets, verbessert die Prozessflexibilit\u00e4t und erm\u00f6glicht die Integration mit fortschrittlichen Technologien zur Herstellung von Siliziumwafern.<\/p>\n<p data-start=\"1410\" data-end=\"1554\"><img fetchpriority=\"high\" decoding=\"async\" class=\"aligncenter wp-image-2371 size-large\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-1024x388.png\" alt=\"\" width=\"1024\" height=\"388\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-1024x388.png 1024w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-300x114.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-768x291.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-18x7.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs-600x227.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/rs.png 1216w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><\/p>\n<hr data-start=\"1556\" data-end=\"1559\" \/>\n<h2 data-section-id=\"rkota4\" data-start=\"1561\" data-end=\"1582\">Wichtige Spezifikationen<\/h2>\n<h3 data-section-id=\"rc5knr\" data-start=\"1584\" data-end=\"1606\">Prozess-Parameter<\/h3>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"1608\" data-end=\"1813\">\n<thead data-start=\"1608\" data-end=\"1632\">\n<tr data-start=\"1608\" data-end=\"1632\">\n<th class=\"\" data-start=\"1608\" data-end=\"1615\" data-col-size=\"sm\">Artikel<\/th>\n<th class=\"\" data-start=\"1615\" data-end=\"1632\" data-col-size=\"sm\">Spezifikation<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"1657\" data-end=\"1813\">\n<tr data-start=\"1657\" data-end=\"1697\">\n<td data-start=\"1657\" data-end=\"1670\" data-col-size=\"sm\">Wafer Gr\u00f6\u00dfe<\/td>\n<td data-start=\"1670\" data-end=\"1697\" data-col-size=\"sm\">6-8-Zoll-Silizium-Wafer<\/td>\n<\/tr>\n<tr data-start=\"1698\" data-end=\"1726\">\n<td data-start=\"1698\" data-end=\"1713\" data-col-size=\"sm\">Energiebereich<\/td>\n<td data-start=\"1713\" data-end=\"1726\" data-col-size=\"sm\">5-180 keV<\/td>\n<\/tr>\n<tr data-start=\"1727\" data-end=\"1777\">\n<td data-start=\"1727\" data-end=\"1748\" data-col-size=\"sm\">Implantierte Elemente<\/td>\n<td data-start=\"1748\" data-end=\"1777\" data-col-size=\"sm\">B+, BF2+, P+, As+, N+, H+<\/td>\n<\/tr>\n<tr data-start=\"1778\" data-end=\"1813\">\n<td data-start=\"1778\" data-end=\"1791\" data-col-size=\"sm\">Dosisbereich<\/td>\n<td data-start=\"1791\" data-end=\"1813\" data-col-size=\"sm\">5E11-1E17 Ionen\/cm\u00b2<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h3 data-section-id=\"h0mtjp\" data-start=\"1815\" data-end=\"1835\">Strahlenleistung<\/h3>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"1837\" data-end=\"1951\">\n<thead data-start=\"1837\" data-end=\"1861\">\n<tr data-start=\"1837\" data-end=\"1861\">\n<th class=\"\" data-start=\"1837\" data-end=\"1844\" data-col-size=\"sm\">Artikel<\/th>\n<th class=\"\" data-start=\"1844\" data-end=\"1861\" data-col-size=\"sm\">Spezifikation<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"1886\" data-end=\"1951\">\n<tr data-start=\"1886\" data-end=\"1921\">\n<td data-start=\"1886\" data-end=\"1903\" data-col-size=\"sm\">Balkenstabilit\u00e4t<\/td>\n<td data-start=\"1903\" data-end=\"1921\" data-col-size=\"sm\">\u2264 10% pro Stunde<\/td>\n<\/tr>\n<tr data-start=\"1922\" data-end=\"1951\">\n<td data-start=\"1922\" data-end=\"1941\" data-col-size=\"sm\">Parallelit\u00e4t der Strahlen<\/td>\n<td data-start=\"1941\" data-end=\"1951\" data-col-size=\"sm\">\u2264 0.3\u00b0<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h3 data-section-id=\"ieoahx\" data-start=\"1953\" data-end=\"1978\">Implantationsgenauigkeit<\/h3>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"1980\" data-end=\"2191\">\n<thead data-start=\"1980\" data-end=\"2004\">\n<tr data-start=\"1980\" data-end=\"2004\">\n<th class=\"\" data-start=\"1980\" data-end=\"1987\" data-col-size=\"sm\">Artikel<\/th>\n<th class=\"\" data-start=\"1987\" data-end=\"2004\" data-col-size=\"sm\">Spezifikation<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2029\" data-end=\"2191\">\n<tr data-start=\"2029\" data-end=\"2066\">\n<td data-start=\"2029\" data-end=\"2051\" data-col-size=\"sm\">Implantat-Winkelbereich<\/td>\n<td data-start=\"2051\" data-end=\"2066\" data-col-size=\"sm\">-11\u00b0 bis 11\u00b0<\/td>\n<\/tr>\n<tr data-start=\"2067\" data-end=\"2094\">\n<td data-start=\"2067\" data-end=\"2084\" data-col-size=\"sm\">Winkel-Genauigkeit<\/td>\n<td data-start=\"2084\" data-end=\"2094\" data-col-size=\"sm\">\u2264 0.2\u00b0<\/td>\n<\/tr>\n<tr data-start=\"2095\" data-end=\"2141\">\n<td data-start=\"2095\" data-end=\"2113\" data-col-size=\"sm\">Gleichm\u00e4\u00dfigkeit (1\u03c3)<\/td>\n<td data-start=\"2113\" data-end=\"2141\" data-col-size=\"sm\">\u2264 1% (B+, 2E14, 150 keV)<\/td>\n<\/tr>\n<tr data-start=\"2142\" data-end=\"2191\">\n<td data-start=\"2142\" data-end=\"2163\" data-col-size=\"sm\">Reproduzierbarkeit (1\u03c3)<\/td>\n<td data-start=\"2163\" data-end=\"2191\" data-col-size=\"sm\">\u2264 1% (B+, 2E14, 150 keV)<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h3 data-section-id=\"1i84h7f\" data-start=\"2193\" data-end=\"2215\">Systemleistung<\/h3>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2217\" data-end=\"2347\">\n<thead data-start=\"2217\" data-end=\"2241\">\n<tr data-start=\"2217\" data-end=\"2241\">\n<th class=\"\" data-start=\"2217\" data-end=\"2224\" data-col-size=\"sm\">Artikel<\/th>\n<th class=\"\" data-start=\"2224\" data-end=\"2241\" data-col-size=\"sm\">Spezifikation<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2266\" data-end=\"2347\">\n<tr data-start=\"2266\" data-end=\"2304\">\n<td data-start=\"2266\" data-end=\"2279\" data-col-size=\"sm\">Durchsatz<\/td>\n<td data-start=\"2279\" data-end=\"2304\" data-col-size=\"sm\">\u2265 220 Wafer pro Stunde<\/td>\n<\/tr>\n<tr data-start=\"2305\" data-end=\"2347\">\n<td data-start=\"2305\" data-end=\"2322\" data-col-size=\"sm\">Ausr\u00fcstung Gr\u00f6\u00dfe<\/td>\n<td data-start=\"2322\" data-end=\"2347\" data-col-size=\"sm\">5930 \u00d7 3000 \u00d7 2630 mm<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"2349\" data-end=\"2352\" \/>\n<h2 data-section-id=\"1nd7jny\" data-start=\"2354\" data-end=\"2375\">Anmeldung<\/h2>\n<h3 data-section-id=\"kkfbvw\" data-start=\"2377\" data-end=\"2422\">Halbleiterherstellung auf Siliziumbasis<\/h3>\n<p data-start=\"2423\" data-end=\"2524\">Wird bei der Herstellung von CMOS- und fortschrittlichen Logikbauteilen verwendet und unterst\u00fctzt pr\u00e4zise Dotierstoffimplantationsprozesse.<\/p>\n<h3 data-section-id=\"167rxyg\" data-start=\"2526\" data-end=\"2559\">Smart Cut Prozessintegration<\/h3>\n<p data-start=\"2560\" data-end=\"2659\">Geeignet f\u00fcr Wafer-Bonding und Schicht\u00fcbertragungsprozesse, die auf den Anforderungen der Smart-Cut-Technologie basieren.<\/p>\n<h3 data-section-id=\"13cjew6\" data-start=\"2661\" data-end=\"2691\">Fortgeschrittene Wafer-Technik<\/h3>\n<p data-start=\"2692\" data-end=\"2791\">Angewandt bei der Modifizierung von Siliziumwafern, der strukturellen Optimierung und der Verbesserung der Ger\u00e4teleistung.<\/p>\n<h3 data-section-id=\"4uip35\" data-start=\"2793\" data-end=\"2826\">Produktion integrierter Schaltkreise<\/h3>\n<p data-start=\"2827\" data-end=\"2934\">Unterst\u00fctzt die IC-Fertigung mittlerer bis hoher St\u00fcckzahlen mit stabiler Prozesssteuerung und hoher Durchsatzleistung.<\/p>\n<hr data-start=\"2936\" data-end=\"2939\" \/>\n<h2 data-section-id=\"1r8frcv\" data-start=\"2941\" data-end=\"2970\">H\u00e4ufig gestellte Fragen<\/h2>\n<h3 data-section-id=\"1og21xu\" data-start=\"2972\" data-end=\"3022\">1. Welche Wafergr\u00f6\u00dfen unterst\u00fctzt der Ai200HC.D<\/h3>\n<p data-start=\"3023\" data-end=\"3145\">Das System unterst\u00fctzt 6- und 8-Zoll-Siliziumwafer und eignet sich f\u00fcr g\u00e4ngige Halbleiterfertigungsprozesse.<\/p>\n<h3 data-section-id=\"rdwc10\" data-start=\"3147\" data-end=\"3193\">2. Was ist der Energiebereich dieses Systems?<\/h3>\n<p data-start=\"3194\" data-end=\"3324\">Der Energiebereich reicht von 5 keV bis 180 keV und unterst\u00fctzt eine breite Palette von Implantationsanwendungen in siliziumbasierten Halbleiterbauelementen.<\/p>\n<h3 data-section-id=\"nor4nw\" data-start=\"3326\" data-end=\"3391\">3. Welche besonderen Prozessf\u00e4higkeiten unterst\u00fctzt dieses System?<\/h3>\n<p data-start=\"3392\" data-end=\"3551\">Das System ist mit siliziumbasierten Prozessen und der Smart-Cut-Technologie kompatibel und unterst\u00fctzt Batch-Target-Processing und fortschrittliche Wafer-Engineering-Anwendungen.<\/p>","protected":false},"excerpt":{"rendered":"<p>Das Ionenimplantationssystem Ai200HC.D (High Beam) ist f\u00fcr Halbleiterproduktionslinien f\u00fcr 6- und 8-Zoll-Siliziumwafer konzipiert. Es handelt sich um einen Hochstrom-Ionenimplantator, der f\u00fcr Pr\u00e4zisionsdotierung und fortschrittliche Prozessanwendungen in der Herstellung integrierter Schaltkreise entwickelt wurde.<\/p>","protected":false},"featured_media":2350,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}}},"product_brand":[],"product_cat":[1177],"product_tag":[],"class_list":{"0":"post-2349","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-ion-implantation-equipment","7":"desktop-align-left","8":"tablet-align-left","9":"mobile-align-left","10":"ast-product-gallery-layout-horizontal-slider","11":"ast-product-gallery-with-no-image","12":"ast-product-tabs-layout-horizontal","14":"first","15":"instock","16":"shipping-taxable","17":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/www.zmsh-semitech.com\/de\/wp-json\/wp\/v2\/product\/2349","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.zmsh-semitech.com\/de\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.zmsh-semitech.com\/de\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/de\/wp-json\/wp\/v2\/comments?post=2349"}],"version-history":[{"count":4,"href":"https:\/\/www.zmsh-semitech.com\/de\/wp-json\/wp\/v2\/product\/2349\/revisions"}],"predecessor-version":[{"id":2373,"href":"https:\/\/www.zmsh-semitech.com\/de\/wp-json\/wp\/v2\/product\/2349\/revisions\/2373"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/de\/wp-json\/wp\/v2\/media\/2350"}],"wp:attachment":[{"href":"https:\/\/www.zmsh-semitech.com\/de\/wp-json\/wp\/v2\/media?parent=2349"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/de\/wp-json\/wp\/v2\/product_brand?post=2349"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/de\/wp-json\/wp\/v2\/product_cat?post=2349"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.zmsh-semitech.com\/de\/wp-json\/wp\/v2\/product_tag?post=2349"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}