{"id":2379,"date":"2026-04-24T05:38:15","date_gmt":"2026-04-24T05:38:15","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&p=2379"},"modified":"2026-06-07T03:14:53","modified_gmt":"2026-06-07T03:14:53","slug":"high-purity-single-crystal-silicon-electrode-for-semiconductor-plasma-etching-systems","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/cs\/product\/high-purity-single-crystal-silicon-electrode-for-semiconductor-plasma-etching-systems\/","title":{"rendered":"Elektroda z monokrystalick\u00e9ho k\u0159em\u00edku s vysokou \u010distotou pro syst\u00e9my plazmov\u00e9ho lept\u00e1n\u00ed polovodi\u010d\u016f"},"content":{"rendered":"![\"Elektroda](\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/qdOjBmoV8IvfXCCZyP_TScsFcvsnf_rXpW086f8iuioCNO5yQDt0Z9y7ezVD__Z9xzJIqXRfLcHey9Fywi2oJzAWqcbFTEAZfR8g7LsL3RbSqPh8llkzHKhu9Nukj7rB22Gxq5U3xKXDSW2VQzm-N5hCDNWN3CSGBxRIWYEm0DeDO8KSIBMjrAfKNQtx2jyA-300x262.jpg\")
K\u0159em\u00edkov\u00e1 elektroda je z\u00e1kladn\u00ed funk\u010dn\u00ed sou\u010d\u00e1stkou pou\u017e\u00edvanou v pokro\u010dil\u00fdch za\u0159\u00edzen\u00edch pro plazmov\u00e9 zpracov\u00e1n\u00ed polovodi\u010d\u016f, v\u010detn\u011b leptac\u00edch a depozi\u010dn\u00edch syst\u00e9m\u016f a syst\u00e9m\u016f pro modifikaci povrchu. Vyr\u00e1b\u00ed se z vysoce \u010dist\u00e9ho monokrystalick\u00e9ho k\u0159em\u00edku a hraje kl\u00ed\u010dovou roli p\u0159i zaji\u0161\u0165ov\u00e1n\u00ed stabiln\u00ed generace plazmatu, rovnom\u011brn\u00e9ho rozlo\u017een\u00ed elektrick\u00e9ho pole a p\u0159esn\u00e9ho zpracov\u00e1n\u00ed desti\u010dek.<\/p>\n
V modern\u00ed v\u00fdrob\u011b polovodi\u010d\u016f jsou stabilita procesu a v\u00fdt\u011b\u017enost p\u0159\u00edmo ovlivn\u011bny v\u00fdkonem vnit\u0159n\u00edch komponent komory. K\u0159em\u00edkov\u00e9 elektrody jsou \u0161iroce preferov\u00e1ny d\u00edky sv\u00e9 vynikaj\u00edc\u00ed kompatibilit\u011b s procesy na b\u00e1zi k\u0159em\u00edku, minimalizaci rizik kontaminace a zachov\u00e1n\u00ed vysok\u00e9 \u010distoty procesu. Ve srovn\u00e1n\u00ed s kovov\u00fdmi elektrodami vykazuj\u00ed k\u0159em\u00edkov\u00e9 materi\u00e1ly vy\u0161\u0161\u00ed odolnost v\u016f\u010di kontaminaci zp\u016fsoben\u00e9 plazmatem a poskytuj\u00ed konzistentn\u011bj\u0161\u00ed elektrick\u00e9 vlastnosti.<\/p>\n
Tyto elektrody se obvykle pou\u017e\u00edvaj\u00ed v n\u00e1ro\u010dn\u00fdch prost\u0159ed\u00edch s vysokoenergetick\u00fdm plazmatem, reaktivn\u00edmi plyny, jako jsou CF\u2084, SF\u2086 a Cl\u2082, a p\u0159i zv\u00fd\u0161en\u00fdch teplot\u00e1ch. V pr\u016fb\u011bhu \u010dasu podl\u00e9haj\u00ed postupn\u00e9 erozi, a proto jsou klasifikov\u00e1ny jako kritick\u00fd spot\u0159ebn\u00ed materi\u00e1l pro polovodi\u010de<\/strong>, kter\u00e9 vy\u017eaduj\u00ed pravidelnou v\u00fdm\u011bnu p\u0159i zachov\u00e1n\u00ed vysok\u00e9ho v\u00fdkonu po celou dobu jejich \u017eivotnosti.<\/p>\n
\nKl\u00ed\u010dov\u00e9 vlastnosti<\/h2>\n\n- Materi\u00e1l vysok\u00e9 \u010distoty<\/strong>: Vyrobeno z monokrystalick\u00e9ho k\u0159em\u00edku polovodi\u010dov\u00e9 kvality, aby bylo zaji\u0161t\u011bno minimum ne\u010distot a stabiln\u00ed elektrick\u00fd v\u00fdkon.
![\"Elektroda](\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/53ijDEI-Hbi31uz0t_L-DHLJsiyWWfRJlHlxVX1VI2hoHMMjCcOYgDxAcs06M_S4FBCl-zPueLgyH54wg3KtodiwkAok0zCME57k1CV0QE0UhxXuTtBJZpJPZ2eY9AembejJC0C5gN2j4R_87GHMZu-o2kMW4owmMIgDwzwwhM5_TvnzGqj9V0JcNVswUNE-300x281.jpg\")
<\/li>\n- V\u00edce mo\u017enost\u00ed rezistivity<\/strong>: K dispozici jsou t\u0159\u00eddy s n\u00edzk\u00fdm, st\u0159edn\u00edm a vysok\u00fdm m\u011brn\u00fdm odporem pro r\u016fzn\u00e9 po\u017eadavky na kontrolu plazmy.<\/li>\n
- Vynikaj\u00edc\u00ed kompatibilita s plazmou<\/strong>: Sni\u017euje tvorbu \u010d\u00e1stic a zlep\u0161uje v\u00fdt\u011b\u017enost pl\u00e1tk\u016f.<\/li>\n
- P\u0159esn\u00e9 obr\u00e1b\u011bn\u00ed<\/strong>: T\u011bsn\u00e9 tolerance (<10 \u03bcm) pro integraci \u0161pi\u010dkov\u00fdch polovodi\u010dov\u00fdch za\u0159\u00edzen\u00ed<\/li>\n
- Vlastn\u00ed design otvoru pro plyn<\/strong>: Podporuje rovnom\u011brn\u00e9 rozlo\u017een\u00ed plynu a optimalizovanou hustotu plazmatu.<\/li>\n
- Pru\u017enost povrchu<\/strong>: K dispozici jsou le\u0161t\u011bn\u00e9, lakovan\u00e9 nebo brou\u0161en\u00e9 povrchy podle pot\u0159eb aplikace.<\/li>\n<\/ul>\n
\nTechnick\u00e9 specifikace<\/h2>\n\n
\n
\n\n\n| Parametr<\/th>\n | Specifikace<\/th>\n<\/tr>\n<\/thead>\n |
\n\n| Materi\u00e1l<\/td>\n | Monokrystalick\u00fd k\u0159em\u00edk<\/td>\n<\/tr>\n |
\n| Purity<\/td>\n | \u2265 99,999% (polovodi\u010dov\u00e1 t\u0159\u00edda 5N)<\/td>\n<\/tr>\n |
\n| Pr\u016fm\u011br (max.)<\/td>\n | Do 480 mm<\/td>\n<\/tr>\n |
\n| Tlou\u0161\u0165ka<\/td>\n | Vlastn\u00ed (obvykle 5-50 mm v z\u00e1vislosti na proveden\u00ed)<\/td>\n<\/tr>\n |
\n| Odpor (n\u00edzk\u00fd)<\/td>\n | < 0,02 \u03a9-cm<\/td>\n<\/tr>\n |
\n| Odolnost (st\u0159edn\u00ed)<\/td>\n | 1 - 4 \u03a9-cm<\/td>\n<\/tr>\n |
\n| Odolnost (vysok\u00e1)<\/td>\n | 70 - 90 \u03a9-cm<\/td>\n<\/tr>\n |
\n| Rovnom\u011brnost odporu (RRG)<\/td>\n | < 5%<\/td>\n<\/tr>\n |
\n| Pr\u016fm\u011br otvoru pro plyn<\/td>\n | 0,2 - 0,8 mm (lze p\u0159izp\u016fsobit)<\/td>\n<\/tr>\n |
\n| Stav povrchu<\/td>\n | Le\u0161t\u011bn\u00e9 \/ le\u0161t\u011bn\u00e9 \/ brou\u0161en\u00e9<\/td>\n<\/tr>\n |
\n| Drsnost povrchu (Ra)<\/td>\n | \u2264 0,8 \u03bcm (le\u0161t\u011bn\u00e1 varianta ni\u017e\u0161\u00ed)<\/td>\n<\/tr>\n |
\n| P\u0159esnost obr\u00e1b\u011bn\u00ed<\/td>\n | < 10 \u03bcm<\/td>\n<\/tr>\n |
\n| Plochost<\/td>\n | \u2264 30 \u03bcm (v z\u00e1vislosti na velikosti)<\/td>\n<\/tr>\n |
\n| Hranat\u00fd profil<\/td>\n | Vlastn\u00ed zkosen\u00ed \/ r\u00e1dius<\/td>\n<\/tr>\n |
\n| Kontrola kvality<\/td>\n | bez t\u0159\u00edsek, prasklin, \u0161kr\u00e1banc\u016f a zne\u010di\u0161t\u011bn\u00ed<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n
\nAplikace<\/h2>\nK\u0159em\u00edkov\u00e9 elektrody se \u0161iroce pou\u017e\u00edvaj\u00ed v za\u0159\u00edzen\u00edch na v\u00fdrobu polovodi\u010d\u016f, kde je vy\u017eadov\u00e1na interakce s plazmou. Typick\u00e9 aplikace zahrnuj\u00ed:<\/p>\n \n- Plazmov\u00e9 leptac\u00ed syst\u00e9my (ICP, RIE)<\/li>\n
- Chemick\u00e9 napa\u0159ov\u00e1n\u00ed (CVD \/ PECVD)<\/li>\n
- Procesy povrchov\u00e9 \u00fapravy desti\u010dek<\/li>\n
- Vnit\u0159n\u00ed sou\u010d\u00e1sti polovodi\u010dov\u00e9 komory<\/li>\n
- Elektrostatick\u00e9 nebo plazmov\u00e9 distribu\u010dn\u00ed syst\u00e9my<\/li>\n<\/ul>\n
Jejich schopnost udr\u017eovat rovnom\u011brnost plazmatu a sni\u017eovat kontaminaci je z\u00e1sadn\u00ed jak ve vysp\u011bl\u00fdch, tak v pokro\u010dil\u00fdch technologick\u00fdch uzlech.<\/p>\n
\nPro\u010d si vybrat k\u0159em\u00edkov\u00e9 elektrody?<\/h2>\nK\u0159em\u00edkov\u00e9 elektrody nab\u00edzej\u00ed jedine\u010dnou rovnov\u00e1hu mezi cenovou efektivitou a v\u00fdkonem. V porovn\u00e1n\u00ed s komponenty SiC jsou k\u0159em\u00edkov\u00e9 elektrody ekonomi\u010dt\u011bj\u0161\u00ed a snadn\u011bji se obr\u00e1b\u011bj\u00ed, tak\u017ee jsou ide\u00e1ln\u00ed pro aplikace, kde jsou p\u0159ijateln\u00e9 cykly v\u00fdm\u011bny. Jejich vnit\u0159n\u00ed kompatibilita s procesy v\u00fdroby k\u0159em\u00edkov\u00fdch desti\u010dek nav\u00edc zaji\u0161\u0165uje minim\u00e1ln\u00ed riziko k\u0159\u00ed\u017eov\u00e9 kontaminace, co\u017e je rozhoduj\u00edc\u00ed pro udr\u017een\u00ed vysok\u00e9 v\u00fdt\u011b\u017enosti za\u0159\u00edzen\u00ed.<\/p>\n Pro aplikace vy\u017eaduj\u00edc\u00ed del\u0161\u00ed \u017eivotnost nebo vy\u0161\u0161\u00ed odolnost proti korozi lze zv\u00e1\u017eit pou\u017eit\u00ed elektrod SiC. Pro \u0161irokou \u0161k\u00e1lu standardn\u00edch polovodi\u010dov\u00fdch proces\u016f v\u0161ak k\u0159em\u00edkov\u00e9 elektrody z\u016fst\u00e1vaj\u00ed standardn\u00edm pr\u016fmyslov\u00fdm \u0159e\u0161en\u00edm.<\/p>\n ![\"\"](\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/\u5fae\u4fe1\u56fe\u7247_20260423181006_366_381-1024x486.png\") <\/p>\n
\n\u010cASTO KLADEN\u00c9 DOTAZY<\/h2>\nOt\u00e1zka 1: Je k\u0159em\u00edkov\u00e1 elektroda spot\u0159ebn\u00ed d\u00edl?<\/strong>
Ano, je klasifikov\u00e1n jako kritick\u00fd spot\u0159ebn\u00ed materi\u00e1l pro polovodi\u010de. V d\u016fsledku p\u016fsoben\u00ed plazmatu a chemick\u00fdch reakc\u00ed se postupn\u011b opot\u0159ebov\u00e1v\u00e1 a vy\u017eaduje pravidelnou v\u00fdm\u011bnu.<\/p>\nOt\u00e1zka 2: Jak\u00fd odpor m\u00e1m zvolit?<\/strong>
Z\u00e1le\u017e\u00ed na po\u017eadavc\u00edch na proces. N\u00edzk\u00fd odpor se obvykle pou\u017e\u00edv\u00e1 pro pot\u0159eby vy\u0161\u0161\u00ed vodivosti, zat\u00edmco vysok\u00fd odpor je vhodn\u00fd pro izolaci a prost\u0159ed\u00ed s \u0159\u00edzen\u00fdm plazmatem.<\/p>\nOt\u00e1zka 3: Lze elektrodu p\u0159izp\u016fsobit?<\/strong>
Ano. Rozm\u011bry, tlou\u0161\u0165ku, vzory otvor\u016f pro plyn, odpor a povrchovou \u00fapravu lze p\u0159izp\u016fsobit podle va\u0161ich v\u00fdkres\u016f nebo po\u017eadavk\u016f na za\u0159\u00edzen\u00ed.<\/p>","protected":false},"excerpt":{"rendered":"K\u0159em\u00edkov\u00e1 elektroda je z\u00e1kladn\u00ed funk\u010dn\u00ed sou\u010d\u00e1stkou pou\u017e\u00edvanou v pokro\u010dil\u00fdch za\u0159\u00edzen\u00edch pro plazmov\u00e9 zpracov\u00e1n\u00ed polovodi\u010d\u016f, v\u010detn\u011b leptac\u00edch a depozi\u010dn\u00edch syst\u00e9m\u016f a syst\u00e9m\u016f pro modifikaci povrchu. Vyr\u00e1b\u00ed se z vysoce \u010dist\u00e9ho monokrystalick\u00e9ho k\u0159em\u00edku a hraje kl\u00ed\u010dovou roli p\u0159i zaji\u0161\u0165ov\u00e1n\u00ed stabiln\u00ed generace plazmatu, rovnom\u011brn\u00e9ho rozlo\u017een\u00ed elektrick\u00e9ho pole a p\u0159esn\u00e9ho zpracov\u00e1n\u00ed desti\u010dek.<\/p>","protected":false},"featured_media":2397,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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