{"id":2316,"date":"2026-04-21T06:05:44","date_gmt":"2026-04-21T06:05:44","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2316"},"modified":"2026-04-21T06:05:45","modified_gmt":"2026-04-21T06:05:45","slug":"ion-beam-etching-machine-for-si-sio2-and-metal-materials-in-semiconductor-fabrication","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/cs\/product\/ion-beam-etching-machine-for-si-sio2-and-metal-materials-in-semiconductor-fabrication\/","title":{"rendered":"Leptac\u00ed stroj s iontov\u00fdm paprskem pro Si SiO2 a kovov\u00e9 materi\u00e1ly p\u0159i v\u00fdrob\u011b polovodi\u010d\u016f"},"content":{"rendered":"<p data-start=\"297\" data-end=\"643\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2320 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication-300x300.webp\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication-300x300.webp 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication-150x150.webp 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication-12x12.webp 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication-600x600.webp 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication-100x100.webp 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication.webp 750w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Iontov\u00fd leptac\u00ed stroj pro Si, SiO2 a kovov\u00e9 materi\u00e1ly je vysoce p\u0159esn\u00fd such\u00fd leptac\u00ed syst\u00e9m ur\u010den\u00fd pro pokro\u010dil\u00e9 mikrofabrika\u010dn\u00ed a nanotechnologick\u00e9 aplikace. Toto za\u0159\u00edzen\u00ed vyu\u017e\u00edv\u00e1 lept\u00e1n\u00ed iontov\u00fdm paprskem (IBE), zn\u00e1m\u00e9 tak\u00e9 jako iontov\u00e9 fr\u00e9zov\u00e1n\u00ed, a umo\u017e\u0148uje tak vysoce \u00fa\u010dinn\u00e9 odstra\u0148ov\u00e1n\u00ed materi\u00e1lu \u010dist\u011b fyzik\u00e1ln\u00edm rozpra\u0161ov\u00e1n\u00edm.<\/p>\n<p data-start=\"645\" data-end=\"961\">Na rozd\u00edl od b\u011b\u017en\u00fdch technologi\u00ed lept\u00e1n\u00ed plazmou nen\u00ed p\u0159i lept\u00e1n\u00ed iontov\u00fdm svazkem substr\u00e1t vystaven p\u0159\u00edm\u00e9mu p\u016fsoben\u00ed plazmatu. T\u00edm se v\u00fdrazn\u011b sni\u017euje riziko po\u0161kozen\u00ed, kontaminace a akumulace n\u00e1boje zp\u016fsoben\u00e9 plazmatem, co\u017e je obzvl\u00e1\u0161t\u011b vhodn\u00e9 pro v\u00fdrobu citliv\u00fdch polovodi\u010dov\u00fdch a optick\u00fdch za\u0159\u00edzen\u00ed.<\/p>\n<p data-start=\"963\" data-end=\"1148\">Tento syst\u00e9m s p\u0159esnost\u00ed na \u00farovni nanometr\u016f a vynikaj\u00edc\u00ed ovladatelnost\u00ed procesu se \u0161iroce pou\u017e\u00edv\u00e1 p\u0159i v\u00fdrob\u011b polovodi\u010d\u016f, zpracov\u00e1n\u00ed tenk\u00fdch vrstev a v\u00fdzkumu pokro\u010dil\u00fdch materi\u00e1l\u016f.<\/p>\n<hr data-start=\"1150\" data-end=\"1153\" \/>\n<h2 data-section-id=\"17sw59i\" data-start=\"1155\" data-end=\"1184\"><span role=\"text\"><img decoding=\"async\" class=\"wp-image-2324 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication7-300x125.png\" alt=\"\" width=\"458\" height=\"191\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication7-300x125.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication7-18x7.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication7-600x250.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication7.png 680w\" sizes=\"(max-width: 458px) 100vw, 458px\" \/>Kl\u00ed\u010dov\u00e9 technick\u00e9 vlastnosti<\/span><\/h2>\n<ul data-start=\"1186\" data-end=\"1929\">\n<li data-section-id=\"7yo1gz\" data-start=\"1186\" data-end=\"1324\">Velmi vysok\u00e1 p\u0159esnost<br data-start=\"1212\" data-end=\"1215\" \/>Dosahuje rozli\u0161en\u00ed lept\u00e1n\u00ed \u226410 nm, co\u017e spl\u0148uje po\u017eadavky na pokro\u010dil\u00e9 polovodi\u010de a nanov\u00fdrobu.<\/li>\n<li data-section-id=\"csgjgf\" data-start=\"1326\" data-end=\"1497\">Mo\u017enost neselektivn\u00edho lept\u00e1n\u00ed<br data-start=\"1364\" data-end=\"1367\" \/>Umo\u017e\u0148uje rovnom\u011brn\u00e9 lept\u00e1n\u00ed r\u016fzn\u00fdch materi\u00e1l\u016f v\u010detn\u011b kov\u016f, polovodi\u010d\u016f a dielektrik bez chemick\u00e9 z\u00e1vislosti.<\/li>\n<li data-section-id=\"1xlwjqh\" data-start=\"1499\" data-end=\"1667\">Anizotropn\u00ed a sm\u011brov\u00e9 \u0159\u00edzen\u00ed<br data-start=\"1540\" data-end=\"1543\" \/>Nastaviteln\u00e9 \u00fahly iontov\u00e9ho svazku umo\u017e\u0148uj\u00ed anizotropn\u00ed i izotropn\u00ed leptac\u00ed profily a podporuj\u00ed komplexn\u00ed p\u0159enos obrazce.<\/li>\n<li data-section-id=\"1ialgp0\" data-start=\"1669\" data-end=\"1793\">Prost\u0159ed\u00ed pro zpracov\u00e1n\u00ed bez plazmatu<br data-start=\"1709\" data-end=\"1712\" \/>Eliminuje po\u0161kozen\u00ed zp\u016fsoben\u00e9 plazmou, \u010d\u00edm\u017e zaji\u0161\u0165uje vy\u0161\u0161\u00ed spolehlivost a v\u00fdt\u011b\u017enost za\u0159\u00edzen\u00ed.<\/li>\n<li data-section-id=\"1squn5z\" data-start=\"1795\" data-end=\"1929\">Vynikaj\u00edc\u00ed kvalita povrchu<br data-start=\"1826\" data-end=\"1829\" \/>Vytv\u00e1\u0159\u00ed hladk\u00e9 povrchy se sn\u00ed\u017eenou drsnost\u00ed, co\u017e je d\u016fle\u017eit\u00e9 pro optick\u00e9 a elektronick\u00e9 aplikace.<\/li>\n<\/ul>\n<hr data-start=\"1931\" data-end=\"1934\" \/>\n<h2 data-section-id=\"crb813\" data-start=\"1936\" data-end=\"1965\"><span role=\"text\">Z\u00e1kladn\u00ed sou\u010d\u00e1sti syst\u00e9mu<\/span><\/h2>\n<p data-start=\"1967\" data-end=\"2042\">Kompletn\u00ed syst\u00e9m lept\u00e1n\u00ed iontov\u00fdm svazkem se skl\u00e1d\u00e1 z n\u011bkolika kritick\u00fdch subsyst\u00e9m\u016f:<\/p>\n<h3 data-section-id=\"j86wbp\" data-start=\"2044\" data-end=\"2068\"><span role=\"text\">1. Vakuov\u00fd syst\u00e9m<\/span><\/h3>\n<p data-start=\"2069\" data-end=\"2118\">Poskytuje prost\u0159ed\u00ed s vysok\u00fdm vakuem, kter\u00e9 je nezbytn\u00e9 pro:<\/p>\n<ul data-start=\"2119\" data-end=\"2193\">\n<li data-section-id=\"1vzt3vq\" data-start=\"2119\" data-end=\"2137\">Stabilita nosn\u00edku<\/li>\n<li data-section-id=\"svkbf3\" data-start=\"2138\" data-end=\"2163\">Kontrola kontaminace<\/li>\n<li data-section-id=\"19d0yza\" data-start=\"2164\" data-end=\"2193\">Vysoce p\u0159esn\u00e9 zpracov\u00e1n\u00ed<\/li>\n<\/ul>\n<h3 data-section-id=\"8jigvj\" data-start=\"2195\" data-end=\"2216\"><span role=\"text\">2. Zdroj iont\u016f<\/span><\/h3>\n<p data-start=\"2217\" data-end=\"2272\">Generuje vysokoenergetick\u00fd iontov\u00fd svazek (obvykle ionty argonu):<\/p>\n<ul data-start=\"2273\" data-end=\"2386\">\n<li data-section-id=\"116c4dh\" data-start=\"2273\" data-end=\"2315\">Ur\u010duje rychlost a rovnom\u011brnost lept\u00e1n\u00ed<\/li>\n<li data-section-id=\"bdpzju\" data-start=\"2316\" data-end=\"2386\">Podporuje r\u016fzn\u00e9 typy zdroj\u016f, jako jsou RF a Kaufmanovy iontov\u00e9 zdroje.<\/li>\n<\/ul>\n<h3 data-section-id=\"1tpsqxl\" data-start=\"2388\" data-end=\"2411\"><span role=\"text\">3. F\u00e1ze vzorku<\/span><\/h3>\n<ul data-start=\"2412\" data-end=\"2530\">\n<li data-section-id=\"d3z3he\" data-start=\"2412\" data-end=\"2468\">Podpora v\u00edceos\u00e9ho ot\u00e1\u010den\u00ed pro rovnom\u011brn\u00e9 lept\u00e1n\u00ed<\/li>\n<li data-section-id=\"15yipgz\" data-start=\"2469\" data-end=\"2530\">Integrovan\u00e1 regulace teploty zlep\u0161uje stabilitu procesu<\/li>\n<\/ul>\n<h3 data-section-id=\"qoosxq\" data-start=\"2532\" data-end=\"2557\"><span role=\"text\">4. \u0158\u00eddic\u00ed syst\u00e9m<\/span><\/h3>\n<ul data-start=\"2558\" data-end=\"2705\">\n<li data-section-id=\"1mqnqw1\" data-start=\"2558\" data-end=\"2587\">Pln\u011b automatizovan\u00fd provoz<\/li>\n<li data-section-id=\"ymbyxd\" data-start=\"2588\" data-end=\"2643\">Umo\u017e\u0148uje p\u0159esnou kontrolu parametr\u016f a opakovatelnost<\/li>\n<li data-section-id=\"1kjf28e\" data-start=\"2644\" data-end=\"2705\">Voliteln\u00e1 detekce koncov\u00e9ho bodu pro pokro\u010dil\u00e9 \u0159\u00edzen\u00ed procesu<\/li>\n<\/ul>\n<h3 data-section-id=\"97rafg\" data-start=\"2707\" data-end=\"2729\"><span role=\"text\">5. Neutraliz\u00e1tor<\/span><\/h3>\n<ul data-start=\"2730\" data-end=\"2836\">\n<li data-section-id=\"12j0ebp\" data-start=\"2730\" data-end=\"2772\">Zabra\u0148uje hromad\u011bn\u00ed n\u00e1boje p\u0159i lept\u00e1n\u00ed<\/li>\n<li data-section-id=\"1o4nvb1\" data-start=\"2773\" data-end=\"2836\">Nezbytn\u00e9 pro izola\u010dn\u00ed materi\u00e1ly, jako jsou SiO\u2082 a Si\u2083N\u2084.<\/li>\n<\/ul>\n<hr data-start=\"2838\" data-end=\"2841\" \/>\n<h2 data-section-id=\"sgqumq\" data-start=\"2843\" data-end=\"2867\"><span role=\"text\">Princip fungov\u00e1n\u00ed<\/span><\/h2>\n<p data-start=\"2869\" data-end=\"3006\"><img decoding=\"async\" class=\"size-medium wp-image-2321 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-1-300x235.png\" alt=\"\" width=\"300\" height=\"235\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-1-300x235.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-1-15x12.png 15w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-1-600x469.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-1.png 680w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Lept\u00e1n\u00ed iontov\u00fdm svazkem prob\u00edh\u00e1 tak, \u017ee se na povrch c\u00edlov\u00e9ho materi\u00e1lu ve vakuu nasm\u011bruje vysokoenergetick\u00fd kolimovan\u00fd iontov\u00fd svazek.<\/p>\n<p data-start=\"3008\" data-end=\"3253\">Ionty (obvykle Ar\u207a) se sr\u00e1\u017eej\u00ed s povrchov\u00fdmi atomy, p\u0159en\u00e1\u0161ej\u00ed hybnost a zp\u016fsobuj\u00ed vyvr\u017een\u00ed atom\u016f fyzik\u00e1ln\u00edm rozpra\u0161ov\u00e1n\u00edm. Tento proces odstra\u0148uje materi\u00e1l vrstvu po vrstv\u011b, co\u017e umo\u017e\u0148uje p\u0159esn\u00e9 definov\u00e1n\u00ed vzoru bez chemick\u00fdch reakc\u00ed.<\/p>\n<p data-start=\"3255\" data-end=\"3296\">D\u00edky tomu je IBE vhodn\u00e1 zejm\u00e9na pro:<\/p>\n<ul data-start=\"3297\" data-end=\"3403\">\n<li data-section-id=\"jy9ydi\" data-start=\"3297\" data-end=\"3333\">P\u0159enos vzoru s vysok\u00fdm rozli\u0161en\u00edm<\/li>\n<li data-section-id=\"1ihgsm0\" data-start=\"3334\" data-end=\"3376\">Materi\u00e1ly s n\u00edzkou chemickou reaktivitou<\/li>\n<li data-section-id=\"hl3mzt\" data-start=\"3377\" data-end=\"3403\">V\u00edcevrstv\u00e9 struktury<\/li>\n<\/ul>\n<hr data-start=\"3405\" data-end=\"3408\" \/>\n<h2 data-section-id=\"gimyd4\" data-start=\"3410\" data-end=\"3440\"><span role=\"text\">Schopnosti zpracov\u00e1n\u00ed<\/span><\/h2>\n<h3 data-section-id=\"ww5vbk\" data-start=\"3442\" data-end=\"3469\"><span role=\"text\">Podporovan\u00e9 materi\u00e1ly<\/span><\/h3>\n<ul data-start=\"3470\" data-end=\"3622\">\n<li data-section-id=\"4dwycu\" data-start=\"3470\" data-end=\"3504\">Kovy: Au, Pt, Cu, Ta, Al<\/li>\n<li data-section-id=\"12wc4i0\" data-start=\"3505\" data-end=\"3537\">Polovodi\u010de: Si, GaAs<\/li>\n<li data-section-id=\"75kyg7\" data-start=\"3538\" data-end=\"3570\">Dielektrika: SiO\u2082, Si\u2083N\u2084<\/li>\n<li data-section-id=\"1xmdv1x\" data-start=\"3571\" data-end=\"3622\">Pokro\u010dil\u00e9 materi\u00e1ly: AlN, keramika, polymery<\/li>\n<\/ul>\n<hr data-start=\"3624\" data-end=\"3627\" \/>\n<h2 data-section-id=\"12vl3dy\" data-start=\"3629\" data-end=\"3656\"><span role=\"text\">Typick\u00fd pr\u016fb\u011bh procesu<\/span><\/h2>\n<ol data-start=\"3658\" data-end=\"4078\">\n<li data-section-id=\"1lq2akh\" data-start=\"3658\" data-end=\"3742\">P\u0159\u00edprava vzorku<br data-start=\"3683\" data-end=\"3686\" \/>Vy\u010di\u0161t\u011bn\u00ed a mont\u00e1\u017e substr\u00e1tu ve vakuov\u00e9 komo\u0159e<\/li>\n<li data-section-id=\"1uf7qj1\" data-start=\"3744\" data-end=\"3821\">Maskov\u00e1n\u00ed<br data-start=\"3758\" data-end=\"3761\" \/>Nanesen\u00ed fotorezistu nebo kovov\u00e9 masky pro vymezen\u00ed leptac\u00edch oblast\u00ed<\/li>\n<li data-section-id=\"1sq3ygn\" data-start=\"3823\" data-end=\"3910\">Generov\u00e1n\u00ed iontov\u00e9ho paprsku<br data-start=\"3849\" data-end=\"3852\" \/>Aktivace iontov\u00e9ho zdroje pomoc\u00ed inertn\u00edho plynu (obvykle argonu).<\/li>\n<li data-section-id=\"46esbg\" data-start=\"3912\" data-end=\"4006\">Proces lept\u00e1n\u00ed<br data-start=\"3934\" data-end=\"3937\" \/>Nastaven\u00ed energie, \u00fahlu a \u010dasu paprsku pro dosa\u017een\u00ed po\u017eadovan\u00e9 struktury<\/li>\n<li data-section-id=\"oeifr6\" data-start=\"4008\" data-end=\"4078\">Odstran\u011bn\u00ed masky<br data-start=\"4027\" data-end=\"4030\" \/>Odstran\u011bn\u00edm masky odhal\u00edte fin\u00e1ln\u00ed vyleptan\u00e9 vzory<\/li>\n<\/ol>\n<hr data-start=\"4080\" data-end=\"4083\" \/>\n<h2 data-section-id=\"1myoacb\" data-start=\"4085\" data-end=\"4109\"><span role=\"text\">Oblasti pou\u017eit\u00ed<\/span><\/h2>\n<h3 data-section-id=\"bm5nu5\" data-start=\"4111\" data-end=\"4146\"><span role=\"text\"><img loading=\"lazy\" decoding=\"async\" class=\"wp-image-2322 aligncenter\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication6-300x65.png\" alt=\"\" width=\"724\" height=\"157\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication6-300x65.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication6-18x4.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication6-600x130.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Ion-Beam-Etching-Machine-for-Si-SiO2-and-Metal-Materials-in-Semiconductor-Fabrication6.png 680w\" sizes=\"(max-width: 724px) 100vw, 724px\" \/>V\u00fdroba polovodi\u010d\u016f<\/span><\/h3>\n<ul data-start=\"4147\" data-end=\"4236\">\n<li data-section-id=\"13vctk4\" data-start=\"4147\" data-end=\"4180\">Vzorkov\u00e1n\u00ed integrovan\u00fdch obvod\u016f<\/li>\n<li data-section-id=\"ofwy8d\" data-start=\"4181\" data-end=\"4206\">Strukturov\u00e1n\u00ed tenk\u00fdch vrstev<\/li>\n<li data-section-id=\"1x3kzva\" data-start=\"4207\" data-end=\"4236\">Pokro\u010dil\u00e1 v\u00fdroba uzl\u016f<\/li>\n<\/ul>\n<h3 data-section-id=\"1tse075\" data-start=\"4238\" data-end=\"4261\"><span role=\"text\">Optick\u00e1 za\u0159\u00edzen\u00ed<\/span><\/h3>\n<ul data-start=\"4262\" data-end=\"4356\">\n<li data-section-id=\"v6a7ly\" data-start=\"4262\" data-end=\"4309\">P\u0159esn\u00e9 zpracov\u00e1n\u00ed m\u0159\u00ed\u017eek a \u010do\u010dek<\/li>\n<li data-section-id=\"lq2w9m\" data-start=\"4310\" data-end=\"4356\">Modifikace povrchu optick\u00fdch sou\u010d\u00e1st\u00ed<\/li>\n<\/ul>\n<h3 data-section-id=\"1wc0my6\" data-start=\"4358\" data-end=\"4380\"><span role=\"text\">Nanotechnologie<\/span><\/h3>\n<ul data-start=\"4381\" data-end=\"4441\">\n<li data-section-id=\"178ey7v\" data-start=\"4381\" data-end=\"4441\">V\u00fdroba nanodr\u00e1tk\u016f, nanop\u00f3r\u016f a struktur MEMS<\/li>\n<\/ul>\n<h3 data-section-id=\"krs816\" data-start=\"4443\" data-end=\"4468\"><span role=\"text\">V\u011bda o materi\u00e1lech<\/span><\/h3>\n<ul data-start=\"4469\" data-end=\"4541\">\n<li data-section-id=\"18ntl16\" data-start=\"4469\" data-end=\"4506\">Anal\u00fdza a \u00faprava povrchu<\/li>\n<li data-section-id=\"1b8wqpz\" data-start=\"4507\" data-end=\"4541\">P\u0159\u00edprava funk\u010dn\u00edho povlaku<\/li>\n<\/ul>\n<hr data-start=\"4543\" data-end=\"4546\" \/>\n<h2 data-section-id=\"13lz0w7\" data-start=\"4548\" data-end=\"4591\"><span role=\"text\">V\u00fdhody oproti b\u011b\u017en\u00e9mu lept\u00e1n\u00ed<\/span><\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"4593\" data-end=\"4927\">\n<thead data-start=\"4593\" data-end=\"4646\">\n<tr data-start=\"4593\" data-end=\"4646\">\n<th class=\"\" data-start=\"4593\" data-end=\"4603\" data-col-size=\"sm\">Funkce<\/th>\n<th class=\"\" data-start=\"4603\" data-end=\"4622\" data-col-size=\"sm\">Lept\u00e1n\u00ed iontov\u00fdm paprskem<\/th>\n<th class=\"\" data-start=\"4622\" data-end=\"4646\" data-col-size=\"sm\">Reaktivn\u00ed iontov\u00e9 lept\u00e1n\u00ed<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"4697\" data-end=\"4927\">\n<tr data-start=\"4697\" data-end=\"4746\">\n<td data-start=\"4697\" data-end=\"4712\" data-col-size=\"sm\">Typ procesu<\/td>\n<td data-start=\"4712\" data-end=\"4723\" data-col-size=\"sm\">Fyzick\u00e1 str\u00e1nka<\/td>\n<td data-start=\"4723\" data-end=\"4746\" data-col-size=\"sm\">Fyzik\u00e1ln\u00ed + chemick\u00e9<\/td>\n<\/tr>\n<tr data-start=\"4747\" data-end=\"4805\">\n<td data-start=\"4747\" data-end=\"4765\" data-col-size=\"sm\">Expozice plazmy<\/td>\n<td data-start=\"4765\" data-end=\"4786\" data-col-size=\"sm\">\u017d\u00e1dn\u00e1 p\u0159\u00edm\u00e1 expozice<\/td>\n<td data-start=\"4786\" data-end=\"4805\" data-col-size=\"sm\">P\u0159\u00edm\u00e1 expozice<\/td>\n<\/tr>\n<tr data-start=\"4806\" data-end=\"4853\">\n<td data-start=\"4806\" data-end=\"4829\" data-col-size=\"sm\">Selektivita materi\u00e1lu<\/td>\n<td data-start=\"4829\" data-end=\"4845\" data-col-size=\"sm\">N\u00edzk\u00e1 (jednotn\u00e1)<\/td>\n<td data-start=\"4845\" data-end=\"4853\" data-col-size=\"sm\">Vysok\u00e1<\/td>\n<\/tr>\n<tr data-start=\"4854\" data-end=\"4893\">\n<td data-start=\"4854\" data-end=\"4871\" data-col-size=\"sm\">Po\u0161kozen\u00ed povrchu<\/td>\n<td data-start=\"4871\" data-end=\"4881\" data-col-size=\"sm\">Minim\u00e1ln\u00ed<\/td>\n<td data-start=\"4881\" data-end=\"4893\" data-col-size=\"sm\">Mo\u017en\u00e9<\/td>\n<\/tr>\n<tr data-start=\"4894\" data-end=\"4927\">\n<td data-start=\"4894\" data-end=\"4906\" data-col-size=\"sm\">P\u0159esnost<\/td>\n<td data-start=\"4906\" data-end=\"4919\" data-col-size=\"sm\">Velmi vysok\u00fd<\/td>\n<td data-start=\"4919\" data-end=\"4927\" data-col-size=\"sm\">Vysok\u00e1<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"4929\" data-end=\"4932\" \/>\n<h2 data-section-id=\"elc90z\" data-start=\"4934\" data-end=\"4944\"><span role=\"text\">\u010cASTO KLADEN\u00c9 DOTAZY<\/span><\/h2>\n<h3 data-section-id=\"1h3z74f\" data-start=\"4946\" data-end=\"4978\"><span role=\"text\">Co je lept\u00e1n\u00ed iontov\u00fdm paprskem\uff1f<\/span><\/h3>\n<p data-start=\"4979\" data-end=\"5122\">Lept\u00e1n\u00ed iontov\u00fdm svazkem je such\u00fd proces lept\u00e1n\u00ed, p\u0159i kter\u00e9m se materi\u00e1l odstra\u0148uje fyzik\u00e1ln\u00edm rozpra\u0161ov\u00e1n\u00edm pomoc\u00ed vysokoenergetick\u00fdch iont\u016f ve vakuu.<\/p>\n<h3 data-section-id=\"1oyreis\" data-start=\"5124\" data-end=\"5153\"><span role=\"text\">Rozd\u00edl mezi IBE a RIE\uff1f<\/span><\/h3>\n<ul data-start=\"5154\" data-end=\"5316\">\n<li data-section-id=\"6o7nxe\" data-start=\"5154\" data-end=\"5219\">IBE: \u010dist\u011b fyzik\u00e1ln\u00ed, bez kontaktu s plazmou, vy\u0161\u0161\u00ed p\u0159esnost<\/li>\n<li data-section-id=\"d79ynl\" data-start=\"5220\" data-end=\"5316\">RIE: kombinuje chemick\u00e9 reakce s plazmou, vy\u0161\u0161\u00ed selektivita, ale v\u011bt\u0161\u00ed riziko po\u0161kozen\u00ed.<\/li>\n<\/ul>","protected":false},"excerpt":{"rendered":"<p>Iontov\u00fd leptac\u00ed stroj pro Si, SiO2 a kovov\u00e9 materi\u00e1ly je vysoce p\u0159esn\u00fd such\u00fd leptac\u00ed syst\u00e9m ur\u010den\u00fd pro pokro\u010dil\u00e9 mikrofabrika\u010dn\u00ed a nanotechnologick\u00e9 aplikace. Toto za\u0159\u00edzen\u00ed vyu\u017e\u00edv\u00e1 lept\u00e1n\u00ed iontov\u00fdm paprskem (IBE), zn\u00e1m\u00e9 tak\u00e9 jako iontov\u00e9 fr\u00e9zov\u00e1n\u00ed, a umo\u017e\u0148uje tak vysoce \u00fa\u010dinn\u00e9 odstra\u0148ov\u00e1n\u00ed materi\u00e1lu \u010dist\u011b fyzik\u00e1ln\u00edm rozpra\u0161ov\u00e1n\u00edm.<\/p>","protected":false},"featured_media":2320,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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