{"id":2077,"date":"2026-04-03T02:07:51","date_gmt":"2026-04-03T02:07:51","guid":{"rendered":"https:\/\/www.zmsh-semitech.com\/?post_type=product&#038;p=2077"},"modified":"2026-04-03T02:09:04","modified_gmt":"2026-04-03T02:09:04","slug":"integrated-vertical-airflow-sic-epitaxy-equipment-for-6-8-epi-wafers","status":"publish","type":"product","link":"https:\/\/www.zmsh-semitech.com\/cs\/product\/integrated-vertical-airflow-sic-epitaxy-equipment-for-6-8-epi-wafers\/","title":{"rendered":"Integrovan\u00e9 vertik\u00e1ln\u00ed za\u0159\u00edzen\u00ed pro epitaxi SiC s proud\u011bn\u00edm vzduchu pro 6\u201d\/8\u201d epitaxn\u00ed desky"},"content":{"rendered":"<p data-start=\"187\" data-end=\"641\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2079 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Integrovan\u00e9 za\u0159\u00edzen\u00ed pro epitaxii karbidu k\u0159em\u00edku (SiC) s vertik\u00e1ln\u00edm proud\u011bn\u00edm vzduchu je pokro\u010dil\u00fd epitaxn\u00ed r\u016fstov\u00fd syst\u00e9m navr\u017een\u00fd pro vysoce efektivn\u00ed v\u00fdrobu 6palcov\u00fdch a 8palcov\u00fdch SiC epitaxn\u00edch desti\u010dek. Tento syst\u00e9m je navr\u017een tak, aby spl\u0148oval rostouc\u00ed po\u017eadavky v\u00fdroby v\u00fdkonn\u00fdch polovodi\u010d\u016f, a integruje p\u0159esnou tepelnou regulaci, optimalizovanou dynamiku proud\u011bn\u00ed plynu a inteligentn\u00ed automatizaci, aby poskytoval v\u00fdjime\u010dn\u00fd v\u00fdkon v oblasti rovnom\u011brnosti, propustnosti a kontroly defekt\u016f.<\/p>\n<p data-start=\"643\" data-end=\"982\">J\u00e1drem syst\u00e9mu je inovativn\u00ed konstrukce vertik\u00e1ln\u00ed sprchov\u00e9 hlavice, kter\u00e1 umo\u017e\u0148uje rovnom\u011brnou distribuci procesn\u00edch plyn\u016f po povrchu desti\u010dky. V kombinaci s v\u00edcez\u00f3nov\u00fdm \u0159\u00edzen\u00edm teplotn\u00edho pole zaji\u0161\u0165uje vynikaj\u00edc\u00ed rovnom\u011brnost tlou\u0161\u0165ky a stabiln\u00ed koncentraci dopov\u00e1n\u00ed, co\u017e je pro vysoce v\u00fdkonn\u00e1 v\u00fdkonn\u00e1 SiC za\u0159\u00edzen\u00ed kl\u00ed\u010dov\u00e9.<\/p>\n<p data-start=\"984\" data-end=\"1310\">Syst\u00e9m m\u00e1 vysoce integrovanou strukturu s automatizovanou manipulac\u00ed s desti\u010dkami prost\u0159ednictv\u00edm syst\u00e9mu EFEM a vysokoteplotn\u00edho mechanismu pro p\u0159enos desti\u010dek. To umo\u017e\u0148uje bezprobl\u00e9movou integraci do modern\u00edch linek na v\u00fdrobu polovodi\u010d\u016f, omezuje manu\u00e1ln\u00ed z\u00e1sahy a zvy\u0161uje konzistenci procesu a provozn\u00ed efektivitu.<\/p>\n<p data-start=\"1312\" data-end=\"1615\">Pro podporu pr\u016fmyslov\u00e9 v\u00fdroby je za\u0159\u00edzen\u00ed vybaveno dvoukomorovou konfigurac\u00ed schopnou nep\u0159etr\u017eit\u00e9ho provozu s v\u00edce pecemi. S v\u00fdkonem v\u00edce ne\u017e 1100 pl\u00e1tk\u016f za m\u011bs\u00edc - a optimalizac\u00ed procesu a\u017e 1200 pl\u00e1tk\u016f - je vhodn\u00e9 pro velkos\u00e9riovou v\u00fdrobu.<\/p>\n<p data-start=\"1617\" data-end=\"1971\">Za\u0159\u00edzen\u00ed je kompatibiln\u00ed s 6palcov\u00fdmi i 8palcov\u00fdmi SiC desti\u010dkami, co\u017e nab\u00edz\u00ed flexibilitu v\u00fdrobc\u016fm, kte\u0159\u00ed p\u0159ech\u00e1zej\u00ed na v\u011bt\u0161\u00ed velikosti desti\u010dek. Vykazuje tak\u00e9 vynikaj\u00edc\u00ed schopnost r\u016fstu tlust\u00fdch epitaxn\u00edch vrstev a epitaxe s vypl\u0148ov\u00e1n\u00edm p\u0159\u00edkop\u016f, tak\u017ee je obzvl\u00e1\u0161t\u011b vhodn\u00e9 pro v\u00fdrobu pokro\u010dil\u00fdch vysokonap\u011b\u0165ov\u00fdch a vysoce v\u00fdkonn\u00fdch za\u0159\u00edzen\u00ed.<\/p>\n<p data-start=\"1973\" data-end=\"2214\">Optimalizovan\u00e1 konstrukce reaktoru nav\u00edc zaji\u0161\u0165uje n\u00edzkou hustotu defekt\u016f, vy\u0161\u0161\u00ed v\u00fdt\u011b\u017enost a ni\u017e\u0161\u00ed n\u00e1klady na vlastnictv\u00ed. Jeho robustn\u00ed konstrukce a konstrukce nen\u00e1ro\u010dn\u00e1 na \u00fadr\u017ebu d\u00e1le zvy\u0161uj\u00ed dlouhodobou spolehlivost a provozn\u00ed stabilitu.<\/p>\n<h2 data-section-id=\"qpn8c9\" data-start=\"2221\" data-end=\"2252\"><span role=\"text\"><img decoding=\"async\" class=\"size-medium wp-image-2078 alignright\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-300x300.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-150x150.png 150w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-768x768.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-12x12.png 12w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-600x600.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2-100x100.png 100w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/Integrated-Silicon-Carbide-Epitaxy-Equipment-with-Vertical-Airflow2.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Hlavn\u00ed technick\u00e9 v\u00fdhody<\/span><\/h2>\n<ul data-start=\"2254\" data-end=\"2704\">\n<li data-section-id=\"1q2t12k\" data-start=\"2254\" data-end=\"2321\">Vertik\u00e1ln\u00ed konstrukce sprchov\u00e9 hlavice pro rovnom\u011brnou distribuci plynu<\/li>\n<li data-section-id=\"1lzu0dd\" data-start=\"2322\" data-end=\"2387\">V\u00edcez\u00f3nov\u00e1 regulace teploty pro p\u0159esn\u00e9 \u0159\u00edzen\u00ed teploty<\/li>\n<li data-section-id=\"1emeqzr\" data-start=\"2388\" data-end=\"2449\">Dvoukomorov\u00e1 konfigurace pro vysoce v\u00fdkonnou v\u00fdrobu<\/li>\n<li data-section-id=\"rs6yfl\" data-start=\"2450\" data-end=\"2499\">N\u00edzk\u00e1 hustota defekt\u016f a vysok\u00e1 v\u00fdt\u011b\u017enost<\/li>\n<li data-section-id=\"h9m4ox\" data-start=\"2500\" data-end=\"2550\">Automatizovan\u00e1 manipulace s desti\u010dkami s integrac\u00ed EFEM<\/li>\n<li data-section-id=\"bze71o\" data-start=\"2551\" data-end=\"2594\">Kompatibilita s 6\u201d a 8\u201d SiC desti\u010dkami<\/li>\n<li data-section-id=\"xhhop\" data-start=\"2595\" data-end=\"2655\">Optimalizov\u00e1no pro procesy tlust\u00e9 epitaxe a vypl\u0148ov\u00e1n\u00ed p\u0159\u00edkop\u016f<\/li>\n<li data-section-id=\"1a3549x\" data-start=\"2656\" data-end=\"2704\">Vysok\u00e1 spolehlivost a zjednodu\u0161en\u00e1 \u00fadr\u017eba<\/li>\n<\/ul>\n<h2 data-section-id=\"ca04ra\" data-start=\"2711\" data-end=\"2737\"><span role=\"text\">V\u00fdkonnost procesu<\/span><\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2739\" data-end=\"3287\">\n<thead data-start=\"2739\" data-end=\"2768\">\n<tr data-start=\"2739\" data-end=\"2768\">\n<th class=\"\" data-start=\"2739\" data-end=\"2751\" data-col-size=\"sm\">Parametr<\/th>\n<th class=\"\" data-start=\"2751\" data-end=\"2768\" data-col-size=\"md\">Specifikace<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2796\" data-end=\"3287\">\n<tr data-start=\"2796\" data-end=\"2884\">\n<td data-start=\"2796\" data-end=\"2809\" data-col-size=\"sm\">Propustnost<\/td>\n<td data-start=\"2809\" data-end=\"2884\" data-col-size=\"md\">\u22651100 wafer\u016f\/m\u011bs\u00edc (dv\u011b komory), a\u017e 1200 wafer\u016f\/m\u011bs\u00edc (optimalizovan\u00e9)<\/td>\n<\/tr>\n<tr data-start=\"2885\" data-end=\"2938\">\n<td data-start=\"2885\" data-end=\"2912\" data-col-size=\"sm\">Kompatibilita velikosti desti\u010dek<\/td>\n<td data-col-size=\"md\" data-start=\"2912\" data-end=\"2938\">6\u201d \/ 8\u201d SiC epi-wafers<\/td>\n<\/tr>\n<tr data-start=\"2939\" data-end=\"2975\">\n<td data-start=\"2939\" data-end=\"2961\" data-col-size=\"sm\">\u0158\u00edzen\u00ed teploty<\/td>\n<td data-start=\"2961\" data-end=\"2975\" data-col-size=\"md\">V\u00edcez\u00f3nov\u00e9<\/td>\n<\/tr>\n<tr data-start=\"2976\" data-end=\"3035\">\n<td data-start=\"2976\" data-end=\"2993\" data-col-size=\"sm\">Syst\u00e9m proud\u011bn\u00ed vzduchu<\/td>\n<td data-start=\"2993\" data-end=\"3035\" data-col-size=\"md\">Vertik\u00e1ln\u011b nastaviteln\u00e9 v\u00edcez\u00f3nov\u00e9 proud\u011bn\u00ed vzduchu<\/td>\n<\/tr>\n<tr data-start=\"3036\" data-end=\"3067\">\n<td data-start=\"3036\" data-end=\"3053\" data-col-size=\"sm\">Rychlost ot\u00e1\u010den\u00ed<\/td>\n<td data-start=\"3053\" data-end=\"3067\" data-col-size=\"md\">0-1000 ot\u00e1\u010dek za minutu<\/td>\n<\/tr>\n<tr data-start=\"3068\" data-end=\"3101\">\n<td data-start=\"3068\" data-end=\"3086\" data-col-size=\"sm\">Maxim\u00e1ln\u00ed rychlost r\u016fstu<\/td>\n<td data-start=\"3086\" data-end=\"3101\" data-col-size=\"md\">\u226560 \u03bcm\/h<\/td>\n<\/tr>\n<tr data-start=\"3102\" data-end=\"3163\">\n<td data-start=\"3102\" data-end=\"3125\" data-col-size=\"sm\">Rovnom\u011brnost tlou\u0161\u0165ky<\/td>\n<td data-col-size=\"md\" data-start=\"3125\" data-end=\"3163\">\u22642% (optimalizov\u00e1no \u22641%, \u03c3\/avg, EE 5mm)<\/td>\n<\/tr>\n<tr data-start=\"3164\" data-end=\"3224\">\n<td data-start=\"3164\" data-end=\"3184\" data-col-size=\"sm\">Jednotnost dopingu<\/td>\n<td data-col-size=\"md\" data-start=\"3184\" data-end=\"3224\">\u22643% (optimalizov\u00e1no \u22641,5%, \u03c3\/avg, EE 5mm)<\/td>\n<\/tr>\n<tr data-start=\"3225\" data-end=\"3287\">\n<td data-start=\"3225\" data-end=\"3249\" data-col-size=\"sm\">Hustota vra\u017eedn\u00fdch defekt\u016f<\/td>\n<td data-col-size=\"md\" data-start=\"3249\" data-end=\"3287\">\u22640,2 cm-\u00b2 (optimalizov\u00e1no na 0,01 cm-\u00b2)<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<h2 data-section-id=\"1w46w82\" data-start=\"3294\" data-end=\"3322\"><span role=\"text\">Sc\u00e9n\u00e1\u0159e pou\u017eit\u00ed<\/span><\/h2>\n<p data-start=\"3324\" data-end=\"3514\">Toto za\u0159\u00edzen\u00ed se \u0161iroce pou\u017e\u00edv\u00e1 p\u0159i v\u00fdrob\u011b pokro\u010dil\u00fdch polovodi\u010dov\u00fdch sou\u010d\u00e1stek na b\u00e1zi SiC, zejm\u00e9na v pr\u016fmyslov\u00fdch odv\u011btv\u00edch vy\u017eaduj\u00edc\u00edch vysokou \u00fa\u010dinnost, vysok\u00e9 nap\u011bt\u00ed a vysok\u00fd tepeln\u00fd v\u00fdkon:<\/p>\n<ul data-start=\"3516\" data-end=\"4364\">\n<li data-section-id=\"qrtaas\" data-start=\"3516\" data-end=\"3707\">Elektrick\u00e1 vozidla (EV)<br data-start=\"3545\" data-end=\"3548\" \/>Pou\u017e\u00edv\u00e1 se p\u0159i v\u00fdrob\u011b SiC MOSFET\u016f a v\u00fdkonov\u00fdch modul\u016f pro m\u011bni\u010de, palubn\u00ed nab\u00edje\u010dky a DC-DC m\u011bni\u010de, kter\u00e9 zlep\u0161uj\u00ed energetickou \u00fa\u010dinnost a dojezd.<\/li>\n<li data-section-id=\"1j97evh\" data-start=\"3709\" data-end=\"3867\">Syst\u00e9my obnoviteln\u00e9 energie<br data-start=\"3739\" data-end=\"3742\" \/>Pou\u017e\u00edv\u00e1 se ve fotovoltaick\u00fdch st\u0159\u00edda\u010d\u00edch a syst\u00e9mech skladov\u00e1n\u00ed energie, co\u017e umo\u017e\u0148uje vy\u0161\u0161\u00ed \u00fa\u010dinnost p\u0159em\u011bny a spolehlivost syst\u00e9mu.<\/li>\n<li data-section-id=\"8pfhmh\" data-start=\"3869\" data-end=\"4041\">Pr\u016fmyslov\u00e1 v\u00fdkonov\u00e1 elektronika<br data-start=\"3903\" data-end=\"3906\" \/>Vhodn\u00e9 pro v\u00fdkonn\u00e9 motorov\u00e9 pohony, pr\u016fmyslov\u00e9 automatiza\u010dn\u00ed syst\u00e9my a nap\u00e1jec\u00ed zdroje vy\u017eaduj\u00edc\u00ed stabiln\u00ed a efektivn\u00ed provoz.<\/li>\n<li data-section-id=\"frfj8s\" data-start=\"4043\" data-end=\"4206\">\u017delezni\u010dn\u00ed tranzit a energetick\u00e9 s\u00edt\u011b<br data-start=\"4075\" data-end=\"4078\" \/>Podporuje vysokonap\u011b\u0165ov\u00e1 a vysokofrekven\u010dn\u00ed za\u0159\u00edzen\u00ed pou\u017e\u00edvan\u00e1 v inteligentn\u00edch s\u00edt\u00edch, trak\u010dn\u00edch syst\u00e9mech a infrastruktu\u0159e pro p\u0159enos energie.<\/li>\n<li data-section-id=\"1k6eb43\" data-start=\"4208\" data-end=\"4364\">\u0160pi\u010dkov\u00e1 nap\u00e1jec\u00ed za\u0159\u00edzen\u00ed<br data-start=\"4236\" data-end=\"4239\" \/>Ide\u00e1ln\u00ed pro v\u00fdrobu pokro\u010dil\u00fdch SiC za\u0159\u00edzen\u00ed, jako jsou Schottkyho diody, MOSFETy a vysokonap\u011b\u0165ov\u00e9 sou\u010d\u00e1stky nov\u00e9 generace.<\/li>\n<\/ul>\n<p><img decoding=\"async\" class=\"wp-image-2080 size-large aligncenter\" src=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-1024x578.png\" alt=\"\" width=\"1024\" height=\"578\" srcset=\"https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-1024x578.png 1024w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-300x169.png 300w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-768x433.png 768w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-18x10.png 18w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application-600x339.png 600w, https:\/\/www.zmsh-semitech.com\/wp-content\/uploads\/2026\/04\/application.png 1285w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><\/p>\n<h2 data-section-id=\"elc90z\" data-start=\"4371\" data-end=\"4381\"><span role=\"text\">\u010cASTO KLADEN\u00c9 DOTAZY<\/span><\/h2>\n<h3 data-section-id=\"1f731tm\" data-start=\"4383\" data-end=\"4453\"><span role=\"text\">1. Jak\u00e9 velikosti desti\u010dek podporuje toto epitaxn\u00ed za\u0159\u00edzen\u00ed?<\/span><\/h3>\n<p data-start=\"4454\" data-end=\"4606\">Syst\u00e9m podporuje 6palcov\u00e9 i 8palcov\u00e9 SiC desti\u010dky, co\u017e v\u00fdrobc\u016fm umo\u017e\u0148uje splnit sou\u010dasn\u00e9 v\u00fdrobn\u00ed po\u017eadavky a z\u00e1rove\u0148 se p\u0159ipravit na budouc\u00ed roz\u0161i\u0159ov\u00e1n\u00ed.<\/p>\n<h3 data-section-id=\"8a4v60\" data-start=\"4613\" data-end=\"4683\"><span role=\"text\">2. Jak\u00e9 v\u00fdhody p\u0159in\u00e1\u0161\u00ed vertik\u00e1ln\u00ed konstrukce proud\u011bn\u00ed vzduchu?<\/span><\/h3>\n<p data-start=\"4684\" data-end=\"4858\">Vertik\u00e1ln\u00ed syst\u00e9m proud\u011bn\u00ed vzduchu zaji\u0161\u0165uje rovnom\u011brnou distribuci plynu po desti\u010dce, co\u017e zlep\u0161uje konzistenci tlou\u0161\u0165ky, sni\u017euje po\u010det defekt\u016f a zvy\u0161uje celkovou epitaxn\u00ed kvalitu.<\/p>\n<h3 data-section-id=\"1rbmoqb\" data-start=\"4865\" data-end=\"4935\"><span role=\"text\">3. Je toto za\u0159\u00edzen\u00ed vhodn\u00e9 pro velkos\u00e9riovou v\u00fdrobu?<\/span><\/h3>\n<p data-start=\"4936\" data-end=\"5110\">Ano, syst\u00e9m je vybaven dvoukomorovou konfigurac\u00ed a re\u017eimem nep\u0159etr\u017eit\u00e9ho provozu s m\u011bs\u00ed\u010dn\u00ed kapacitou p\u0159esahuj\u00edc\u00ed 1100 pl\u00e1tk\u016f. Je vhodn\u00fd pro stabiln\u00ed pr\u016fmyslovou v\u00fdrobu ve velk\u00e9m m\u011b\u0159\u00edtku, kter\u00e1 zaji\u0161\u0165uje konzistentn\u00ed v\u00fdstup, vysokou stabilitu v\u00fdt\u011b\u017enosti a dlouhodobou provozn\u00ed efektivitu.<\/p>","protected":false},"excerpt":{"rendered":"<p>Integrovan\u00e9 za\u0159\u00edzen\u00ed pro epitaxii karbidu k\u0159em\u00edku (SiC) s vertik\u00e1ln\u00edm proud\u011bn\u00edm vzduchu je pokro\u010dil\u00fd epitaxn\u00ed r\u016fstov\u00fd syst\u00e9m navr\u017een\u00fd pro vysoce efektivn\u00ed v\u00fdrobu 6palcov\u00fdch a 8palcov\u00fdch SiC epitaxn\u00edch desti\u010dek.<\/p>","protected":false},"featured_media":2078,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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